公开(公告)号：US20180151331A1

公开(公告)日：2018-05-31

申请号：US15365864

申请日：2016-11-30

Applicant: Lam Research Corporation

Inventor： Chin-Yi Liu ,  David Schaefer ,  Dan Marohl

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32155 ,  H01J37/3299 ,  H01J2237/24564 ,  H01J2237/327 ,  H01L21/26

Abstract: A system is disclosed for measuring an impedance of a plasma processing chamber. The system includes a radiofrequency signal generator configured to output a radiofrequency signal based on a frequency setpoint and provide an indication of an actual frequency of the radiofrequency signal, where the actual frequency can be different than the frequency setpoint. The system includes an impedance control module including at least one variable impedance control device. A difference between the actual frequency of the radiofrequency signal as output by the radiofrequency signal generator and the frequency setpoint is partially dependent upon a setting of the at least one variable impedance control device and is partially dependent upon the impedance of the plasma processing chamber. The system includes a connector configured to connect with a radiofrequency signal supply line of the plasma processing chamber. The impedance control module is connected between the radiofrequency signal generator and the connector.

公开(公告)号：US09355884B2

公开(公告)日：2016-05-31

申请号：US14470477

申请日：2014-08-27

Applicant: Lam Research Corporation

Inventor： Rish Chhatre ,  David Schaefer ,  Sung Lee ,  Dan Haber

IPC: H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68735 ,  H01L21/67069 ,  H01L21/6719 ,  Y10T29/49826 ,  Y10T29/49863 ,  Y10T29/53 ,  Y10T29/53657

Abstract: A kit comprising an installation fixture, a plurality of mechanical fasteners and an embedding tool is provided which allows for an elastomer band to be disposed in a mounting groove around a semiconductor substrate support in a manner that relieves the internal stresses of the elastomer band, leading to an elastomer band with a longer operational lifetime. The installation fixture is secured to a substrate support with mechanical fasteners. An elastomer band is placed around an outer circumference of the installation fixture and rotated back and forth to relieve internal stresses of the elastomer band. The fixture is inverted and the elastomer band is slid vertically off the fixture and into the mounting groove. An embedding tool can be used to completely insert the elastomer band into the mounting groove.

Abstract translation: 提供一种包括安装夹具，多个机械紧固件和嵌入工具的套件，其允许弹性体带以减轻弹性体带的内部应力的方式设置在半导体衬底支撑件周围的安装槽中，引导 到具有更长使用寿命的弹性体带。 安装夹具用机械紧固件固定到基板支架上。 弹性体带围绕安装夹具的外周放置并且来回旋转以减轻弹性体带的内应力。 夹具被倒置，弹性体带从夹具垂直滑入安装槽。 可以使用嵌入工具将弹性体带完全插入到安装槽中。

公开(公告)号：US20180106371A1

公开(公告)日：2018-04-19

申请号：US15843849

申请日：2017-12-15

Applicant: Lam Research Corporation

Inventor： David Schaefer ,  Ambarish Chhatre ,  Keith William Gaff ,  Sung Lee ,  Brooke Mesler Lai

IPC: F16J15/02 ,  H01J37/32 ,  H02N13/00 ,  H01L21/683

Abstract: An edge seal for sealing an outer surface of a lower electrode assembly configured to support a semiconductor substrate in a plasma processing chamber, the lower electrode assembly including an annular groove defined between a lower member and an upper member of the lower electrode assembly. The edge seal includes an elastomeric band configured to be arranged within the groove, the elastomeric band having an annular upper surface, an annular lower surface, an inner surface, and an outer surface. When the elastomeric band is in an uncompressed state, the outer surface of the elastomeric band is concave. When the upper and lower surfaces are axially compressed at least 1% such that the elastomeric band is in a compressed state, an outward bulging of the outer surface is not greater than a predetermined distance. The predetermined distance corresponds to a maximum outer diameter of the elastomeric band in the uncompressed state.

公开(公告)号：US09583377B2

公开(公告)日：2017-02-28

申请号：US14109400

申请日：2013-12-17

Applicant: Lam Research Corporation

Inventor： Rish Chhatre ,  David Schaefer

IPC: B23Q1/70 ,  H01L21/70 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/70 ,  H01L21/67126 ,  H01L21/68785 ,  Y10T29/4987 ,  Y10T29/53657

Abstract: An installation fixture adapted to mount an elastomer band in a mounting groove around a semiconductor substrate support used for supporting a semiconductor substrate in a plasma processing chamber is disclosed, which includes an annular ring having a vertically extending portion on an outer edge of the ring and adapted to receive the elastomer band, and a base plate configured to be attached to the annular ring, the base plate having a plurality of radially extending portions adapted to receive a plurality of mechanical fasteners at locations corresponding to mounting holes in the semiconductor substrate support.

Abstract translation: 公开了一种适于将弹性体带安装在用于在等离子体处理室中用于支撑半导体衬底的半导体衬底支架周围的安装槽中的安装夹具，其包括在环的外边缘上具有垂直延伸部分的环形环， 适于容纳弹性体带和配置成附接到环形圈的基板，所述基板具有多个径向延伸部分，其适于在对应于半导体衬底支撑件中的安装孔的位置处容纳多个机械紧固件。

公开(公告)号：US20150179412A1

公开(公告)日：2015-06-25

申请号：US14136953

申请日：2013-12-20

Applicant: Lam Research Corporation

Inventor： Ambarish Chhatre ,  David Schaefer ,  Keith Gaff

IPC: H01J37/32 ,  H01L21/3065

CPC classification number: H01J37/32642 ,  H01J37/32477 ,  H01J37/32715

Abstract: An edge ring configured to surround an outer periphery of a substrate support in a plasma processing chamber wherein plasma is generated and used to process a substrate is disclosed, the substrate support comprising a base plate, a top plate, an elastomer seal assembly between the base plate and the top plate, and an elastomer seal configured to surround the elastomer seal assembly. The edge ring includes an upper inner surface having an edge step directed towards an interior portion of the edge ring and arranged to extend from an outer periphery of a top surface of the top plate to an outer periphery of an upper surface of the base plate, a lower inner surface, an outer surface, a lower surface extending from the lower inner surface to the outer surface, and a top surface extending from the outer surface to the upper inner surface.

Abstract translation: 公开了一种边缘环，其被配置为围绕等离子体处理室中的衬底支撑件的外周围，其中产生等离子体并用于处理衬底，所述衬底支撑件包括基板，顶板，基底之间的弹性体密封组件 板和顶板，以及构造成围绕弹性体密封组件的弹性体密封件。 边缘环包括上内表面，其具有朝向边缘环的内部的边缘台阶，并且布置成从顶板的顶表面的外周延伸到基板的上表面的外周， 下内表面，外表面，从下内表面延伸到外表面的下表面，以及从外表面延伸到上内表面的顶表面。

公开(公告)号：US11781650B2

公开(公告)日：2023-10-10

申请号：US15843849

申请日：2017-12-15

Applicant: Lam Research Corporation

Inventor： David Schaefer ,  Ambarish Chhatre ,  Keith William Gaff ,  Sung Je Kim ,  Brooke Mesler Lai

IPC: F16J15/02 ,  H01J37/32 ,  H02N13/00 ,  H01L21/683

CPC classification number: F16J15/021 ,  H01J37/3255 ,  H01J37/32495 ,  H01J37/32532 ,  H01J37/32568 ,  H01J37/32715 ,  H01J37/32724 ,  H01L21/6831 ,  H01L21/6833 ,  H01L21/6838 ,  H02N13/00 ,  Y10T29/49908

Abstract: An edge seal for sealing an outer surface of a lower electrode assembly configured to support a semiconductor substrate in a plasma processing chamber, the lower electrode assembly including an annular groove defined between a lower member and an upper member of the lower electrode assembly. The edge seal includes an elastomeric band configured to be arranged within the groove, the elastomeric band having an annular upper surface, an annular lower surface, an inner surface, and an outer surface. When the elastomeric band is in an uncompressed state, the outer surface of the elastomeric band is concave. When the upper and lower surfaces are axially compressed at least 1% such that the elastomeric band is in a compressed state, an outward bulging of the outer surface is not greater than a predetermined distance. The predetermined distance corresponds to a maximum outer diameter of the elastomeric band in the uncompressed state.

公开(公告)号：US10804081B2

公开(公告)日：2020-10-13

申请号：US14136953

申请日：2013-12-20

Applicant: Lam Research Corporation

Inventor： Ambarish Chhatre ,  David Schaefer ,  Keith Gaff

IPC: H01J37/32 ,  H01L21/3065

Abstract: An edge ring configured to surround an outer periphery of a substrate support in a plasma processing chamber wherein plasma is generated and used to process a substrate is disclosed, the substrate support comprising a base plate, a top plate, an elastomer seal assembly between the base plate and the top plate, and an elastomer seal configured to surround the elastomer seal assembly. The edge ring includes an upper inner surface having an edge step directed towards an interior portion of the edge ring and arranged to extend from an outer periphery of a top surface of the top plate to an outer periphery of an upper surface of the base plate, a lower inner surface, an outer surface, a lower surface extending from the lower inner surface to the outer surface, and a top surface extending from the outer surface to the upper inner surface.

公开(公告)号：US10109460B2

公开(公告)日：2018-10-23

申请号：US15365864

申请日：2016-11-30

Applicant: Lam Research Corporation

Inventor： Chin-Yi Liu ,  David Schaefer ,  Dan Marohl

IPC: H01J37/32 ,  H01L21/26

Abstract: A system is disclosed for measuring an impedance of a plasma processing chamber. The system includes a radiofrequency signal generator configured to output a radiofrequency signal based on a frequency setpoint and provide an indication of an actual frequency of the radiofrequency signal, where the actual frequency can be different than the frequency setpoint. The system includes an impedance control module including at least one variable impedance control device. A difference between the actual frequency of the radiofrequency signal as output by the radiofrequency signal generator and the frequency setpoint is partially dependent upon a setting of the at least one variable impedance control device and is partially dependent upon the impedance of the plasma processing chamber. The system includes a connector configured to connect with a radiofrequency signal supply line of the plasma processing chamber. The impedance control module is connected between the radiofrequency signal generator and the connector.

公开(公告)号：US20150235889A1

公开(公告)日：2015-08-20

申请号：US14704602

申请日：2015-05-05

Applicant: Lam Research Corporation

Inventor： Hong Shih ,  Tuochuan Huang ,  David Schaefer ,  Ambarish Chhatre ,  John Daugherty ,  MingHang Wu ,  Clifford La Croix

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  B05D5/12 ,  B05D7/52 ,  C23C8/02 ,  C23C22/66 ,  H01L21/6831 ,  Y10T279/23

Abstract: A method is provided for treating a bipolar ESC having a front surface and a back surface, the front surface including an anodized layer. The method includes eliminating the anodized layer, disposing a new anodized layer onto the front surface, and treating the new anodized layer with water to seal the new anodized layer.

Abstract translation: 提供了一种用于处理具有前表面和后表面的双极ESC的方法，前表面包括阳极氧化层。 该方法包括消除阳极氧化层，将新的阳极氧化层设置在前表面上，以及用水处理新的阳极氧化层以密封新的阳极氧化层。

公开(公告)号：US20150170942A1

公开(公告)日：2015-06-18

申请号：US14109400

申请日：2013-12-17

Applicant: Lam Research Corporation

Inventor： Rish Chhatre ,  David Schaefer

IPC: H01L21/67 ,  H01L21/70

CPC classification number: H01L21/70 ,  H01L21/67126 ,  H01L21/68785 ,  Y10T29/4987 ,  Y10T29/53657

Abstract: An installation fixture adapted to mount an elastomer band in a mounting groove around a semiconductor substrate support used for supporting a semiconductor substrate in a plasma processing chamber is disclosed, which includes an annular ring having a vertically extending portion on an outer edge of the ring and adapted to receive the elastomer band, and a base plate configured to be attached to the annular ring, the base plate having a plurality of radially extending portions adapted to receive a plurality of mechanical fasteners at locations corresponding to mounting holes in the semiconductor substrate support.

Abstract translation: 公开了一种适于将弹性体带安装在用于在等离子体处理室中用于支撑半导体衬底的半导体衬底支架周围的安装槽中的安装夹具，其包括在环的外边缘上具有垂直延伸部分的环形环， 适于容纳弹性体带和配置成附接到环形圈的基板，所述基板具有多个径向延伸部分，其适于在对应于半导体衬底支撑件中的安装孔的位置处容纳多个机械紧固件。