Synthetic silica glass optical material having high resistance to laser induced damage
    3.
    发明申请
    Synthetic silica glass optical material having high resistance to laser induced damage 有权
    合成石英玻璃光学材料具有较高的抗激光损伤能力

    公开(公告)号:US20050187092A1

    公开(公告)日:2005-08-25

    申请号:US11064341

    申请日:2005-02-22

    摘要: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3,and preferably less than about 2.0×1017 molecules/cm3.

    摘要翻译: 公开了一种合成石英玻璃光学材料,其特征在于波长小于约250nm,特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤, 特别是在经受100nm脉冲激光在约193nm下操作的激光诱导波前失真(在633nm处),介于约-1.0和1.0nm / cm之间,并且流量约为70μJ/ cm 2 。 本发明的合成石英玻璃光学材料包含小于约600ppm,优选小于200ppm的OH浓度水平和小于约5.0×10 17 H 2 O 2浓度水平, SUP>分子/ cm 3,优选小于约2.0×10 17分子/ cm 3。