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    Candida antarctica lipase B mutant, and methods for making and using the same
    1.
    发明授权
    Candida antarctica lipase B mutant, and methods for making and using the same 有权

    公开(公告)号：US10131889B1

    公开(公告)日：2018-11-20

    申请号：US15810007

    申请日：2017-11-11

    Applicant: Liming Liu ,  Bin Yang

    Inventor： Liming Liu ,  Bin Yang

    IPC: C12N9/20 ,  C12N15/74 ,  C12N15/00 ,  C12P9/00

    Abstract: The present invention relates to the field of bioengineering. It provides a Candida antarctica lipase B mutant and its application. The mutant enzyme overcomes the limit of the parent enzyme that can exhibit high enantioselectivity towards (R)-3-TBDMSO glutaric acid methyl monoester only at temperatures below 5° C. The mutant enzyme successfully increased R-ee value at 5-70° C. The mutant D223V/A281S exhibits high R-ee value (>99%), high conversion rate (80%), and high space-time yield (107.54 g L−1 d−1). The present invention lays a foundation for industrial production of (R)-3-TBDMSO glutaric acid methyl monoester using a biosynthesis approach and provide insights into conformational dynamics-based enzyme design.

    ROBOT SYSTEM
    2.
    发明申请
    ROBOT SYSTEM 审中-公开

    公开(公告)号：US20180104815A1

    公开(公告)日：2018-04-19

    申请号：US15686822

    申请日：2017-08-25

    Applicant: Bin Yang

    Inventor： Bin Yang

    IPC: B25J9/08 ,  B25J11/00 ,  B25J19/02

    CPC classification number: B25J9/08 ,  B25J9/1617 ,  B25J9/162 ,  B25J11/0085 ,  B25J19/005 ,  B25J19/023 ,  G05B2219/31094 ,  G05B2219/40302 ,  G05B2219/40304 ,  Y02P90/18 ,  Y10S901/01

    Abstract: A robot system includes a primary robot frame including a computerized control module providing control commands for the robot system, the primary robot frame including an outer perimeter. The robot system further includes a plurality of submodules, each submodule capable of being selectively docked with the primary robot frame, the submodules each providing different functionality to the robot system. The submodules, when docked with the primary robot frame, fit within the outer perimeter, enabling the robot system to operate in a closed mode, wherein all movement of the robot system is based upon the outer perimeter.

    Watermarking image block division method and device for western language watermarking processing
    4.
    发明授权
    Watermarking image block division method and device for western language watermarking processing 有权
    水印图像块分割方法和西装水印处理装置

    公开(公告)号：US09111341B2

    公开(公告)日：2015-08-18

    申请号：US13997258

    申请日：2011-12-23

    Applicant: Gaoyang Wang ,  Wenfa Qi ,  Lidong Wang ,  Bin Yang

    Inventor： Gaoyang Wang ,  Wenfa Qi ,  Lidong Wang ,  Bin Yang

    IPC: G06K9/00 ,  G06T1/00 ,  G06K9/34

    CPC classification number: G06T1/0021 ,  G06K9/348 ,  G06K2209/01 ,  G06T2201/0051 ,  G06T2201/0062 ,  G06T2201/0083

    Abstract: The application provides a method for partitioning a watermark image with western language characters, comprising: partitioning a western language characters image along rows and columns to form a plurality of character image blocks; identifying valid character image blocks from the formed character image blocks; counting sizes of the valid character image blocks to determine if the image corresponds to a document with a large font size or a document with a small font size; dividing words in the image into a plurality of groups, wherein each divided group in the document with large font size has different numbers of words from that with small font size; and dividing equally the divided word groups into multiple portions corresponding to watermark image blocks. The application further provides a device for partitioning a watermark image with western language characters. The operability of watermark embedding process can be ensured through the above technical solution.

    Abstract translation: 该应用程序提供了一种用于用西方语言字符分割水印图像的方法，包括：沿着行和列划分西方语言字符图像以形成多个字符图像块; 从形成的字符图像块中识别有效的字符图像块; 计算有效字符图像块的大小，以确定图像是否对应于具有较大字体大小的文档或具有小字体大小的文档; 将图像中的单词划分成多个组，其中具有大字体大小的文档中的每个划分组具有与具有小字体尺寸的单词不同的字数; 并将划分的字组分成相当于水印图像块的多个部分。 该应用还提供了一种用于用西语字符分割水印图像的设备。 通过上述技术方案可以确保水印嵌入过程的可操作性。

    Screening Method And Apparatus For Use In Intaglio Printing
    7.
    发明申请
    Screening Method And Apparatus For Use In Intaglio Printing 有权
    用于凹版印刷的筛选方法和装置

    公开(公告)号：US20140033937A1

    公开(公告)日：2014-02-06

    申请号：US13996967

    申请日：2011-12-24

    Applicant: Haifeng Li ,  Bin Yang

    Inventor： Haifeng Li ,  Bin Yang

    IPC: G03F5/20

    CPC classification number: G03F5/20 ,  H04N1/4055

    Abstract: The present application provides a screen method for intaglio printing, comprising: dividing multiple classes of regions according to a brightness range; and generating screen dots with various screen patterns for the grouped classes of regions. The present application also provides a screen device for intaglio printing, comprising: a dividing module configured to group multiple classes of regions according to the brightness range; and a generating module configured to generate screen dots with various screen patterns for the grouped classes of regions. Since multiple kinds of screen patterns are applied in the technical solutions in present application, the problem, i.e., water ripple will occur in the prior art, may be addressed, so as to improve the quality of printing.

    Abstract translation: 本申请提供了一种用于凹版印刷的屏幕方法，包括：根据亮度范围划分多个类别的区域; 并且为分组的区域类别生成具有各种屏幕图案的屏幕点。 本申请还提供了一种用于凹版印刷的屏幕装置，包括：分割模块，被配置为根据亮度范围对多个类别的区域进行分组; 以及生成模块，被配置为生成用于所述分组的区域类别的各种屏幕图案的屏幕点。 由于在本申请中的技术方案中应用了多种屏幕图案，所以可以解决现有技术中出现的水波纹问题，以提高打印质量。

    Integrated microchannel synthesis and separation
    8.
    发明授权
    Integrated microchannel synthesis and separation 有权
    集成微通道的合成和分离

    公开(公告)号：US08497308B2

    公开(公告)日：2013-07-30

    申请号：US12439872

    申请日：2007-09-05

    Applicant: Anna Lee Y. Tonkovich ,  Robert D. Litt ,  Timothy M. Werner ,  Bin Yang

    Inventor： Anna Lee Y. Tonkovich ,  Robert D. Litt ,  Timothy M. Werner ,  Bin Yang

    IPC: C07C27/00

    CPC classification number: B01J19/0093 ,  B01J19/1831 ,  B01J2219/00783 ,  B01J2219/00835 ,  B01J2219/00873 ,  B01J2219/00984 ,  C07C29/152 ,  C10G2/341 ,  C07C31/04

    Abstract: A process for carrying out at least two unit operations in series, the process comprising the step of: (a) directing a feed stream into an integrated assembly which comprises a first microchannel unit operation upon at least one chemical of the feed stream to generate a distributed output stream that exits the first microchannel unit operation in a first set of discrete microchannels isolating flow through the discrete microchannels; and (b) directing the distributed output stream of the first microchannel unit operation into a second microchannel unit operation as a distributed input stream, to continue isolating flow between the first set of discrete microchannels, and conducting at least one operation upon at least one chemical of the input stream to generate a product stream that exits the second microchannel unit operation, where the first microchannel unit operation and the second unit operation share a housing.

    Abstract translation: 一种用于串联进行至少两个单元操作的方法，该方法包括以下步骤：（a）将进料流引导到集成组件中，其包括在进料流的至少一种化学品上的第一微通道单元操作以产生 在第一组离散微通道中离开第一微通道单元操作的分布式输出流，其隔离通过离散微通道的流动; 和（b）将第一微通道单元操作的分布式输出流引导到作为分布式输入流的第二微通道单元操作中，以继续隔离第一组离散微通道之间的流动，并且至少一种化学物质进行至少一种操作 以产生离开第二微通道单元操作的产品流，其中第一微通道单元操作和第二单元操作共享外壳。

    Method to form uniform silicide by selective implantation
    9.
    发明授权
    Method to form uniform silicide by selective implantation 有权
    通过选择性植入形成均匀硅化物的方法

    公开(公告)号：US08492275B2

    公开(公告)日：2013-07-23

    申请号：US13186519

    申请日：2011-07-20

    Applicant: Emre Alptekin ,  Viraj Y. Sardesai ,  Cung D. Tran ,  Bin Yang

    Inventor： Emre Alptekin ,  Viraj Y. Sardesai ,  Cung D. Tran ,  Bin Yang

    IPC: H01L21/44

    CPC classification number: H01L23/485 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/2658 ,  H01L21/26586 ,  H01L21/28518 ,  H01L21/76814 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Methods form an integrated circuit structure by forming at least a portion of a plurality of devices within and/or on a substrate and patterning trenches in an inter-layer dielectric layer on the substrate adjacent the devices. The patterning forms relatively narrow trenches and relatively wide trenches. The methods then perform an angled implant of a compensating material into the trenches. The angle of the angled implant implants a greater concentration of the compensating material in the regions of the substrate at the bottom of the wider trenches relative to an amount of compensating material implanted in the regions of the substrate at the bottom of the narrower trenches. The methods then deposit a metallic material within the trenches and heat the metallic material to form silicide from the metallic material.

    Abstract translation: 方法通过在衬底内和/或衬底上形成多个器件的至少一部分形成集成电路结构，并且在邻近器件的衬底上的层间电介质层中图案化沟槽。 图案形成相对较窄的沟槽和较宽的沟槽。 然后，所述方法对沟槽进行补偿材料的成角度注入。 成角度的植入物的角度相对于在较窄沟槽的底部注入衬底的区域中的补偿材料的量，在较宽沟槽底部的衬底区域中植入更大浓度的补偿材料。 然后，该方法将金属材料沉积在沟槽内，并加热金属材料以从金属材料形成硅化物。

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