Plasma Process Control of Multi-Electrode Systems Equipped with Ion Energy Sensors

    公开(公告)号:US20240055228A1

    公开(公告)日:2024-02-15

    申请号:US17884711

    申请日:2022-08-10

    Abstract: A RF generator includes a first RF power source configured to output a first RF output signal to a first electrode of a load. The RF generator includes a first sensor for detecting a first parameter of the first RF output signal and determining a first characteristic of a plasma in the load. A second RF power source outputs a second RF output signal to a second electrode. A second sensor detects a second parameter of the second RF output signal and determines a second characteristic of a plasma in the load. A RF power controller receives the first characteristic and the second characteristic and generates a first control signal and a second control signal. The first control signal adjusts the first RF output signal, and the second control signal adjusts the second RF output signal.

    Pulsed RF Plasma Generator With High Dynamic Range

    公开(公告)号:US20240258071A1

    公开(公告)日:2024-08-01

    申请号:US18390694

    申请日:2023-12-20

    CPC classification number: H01J37/32146 H01J37/32183 H01J2237/3343

    Abstract: A RF power generator having a fixed power generation section. The fixed power generation section includes a first plurality of power amplifiers each configured to receive a supply voltage and to output a respective first voltage. The RF power generator also includes a weighted power generation section including a plurality of weighted power amplifier modules. Each weighted power amplifier module includes a weighted power amplifier and an associated transformer. Each weighted power amplifier of the weighted power amplifier module receives a respective weighted supply voltage. The voltage across the transformer of each weighted power amplifier module is a fraction of the first voltage.

    Switched Capacitor Modulator
    3.
    发明申请

    公开(公告)号:US20230087716A1

    公开(公告)日:2023-03-23

    申请号:US17993498

    申请日:2022-11-23

    Abstract: A switched capacitor modulator (SCM) includes a RF power amplifier. The RF power amplifier receives a rectified voltage and a RF drive signal and modulates an input signal in accordance with the rectified voltage to generate a RF output signal to an output terminal. A reactance in parallel with the output terminal is configured to vary in response to a control signal to vary an equivalent reactance in parallel with the output terminal. A controller generates the control signal and a commanded phase. The commanded phase controls the RF drive signal. The reactance is at least one of a capacitance or an inductance, and the capacitance or the inductance varies in accordance with the control signal.

    Non-Invasive IED Estimation For Pulsed-DC And Low Frequency Applications

    公开(公告)号:US20240249914A1

    公开(公告)日:2024-07-25

    申请号:US18158164

    申请日:2023-01-23

    CPC classification number: H01J37/32128 H01J37/32091 H01J37/321

    Abstract: A RF power generation system includes a power source configured to generate a periodic waveform applied to a load and a controller configured to receive at least one of a voltage signal or a current signal indicating a respective voltage and current applied to an electrode of the load. The controller determines a surface potential of a workpiece in the load in accordance with the at least one of the voltage signal or the current signal and a series capacitance of the electrode. The controller further determines an ion potential in accordance with an approximation of the surface potential. The periodic waveform may be one of a pulsed DC waveform, a RF waveform, or a pulsed RF waveform.

    Apparatus And Tuning Method For Mitigating RF Load Impedance Variations Due To Periodic Disturbances

    公开(公告)号:US20230049104A1

    公开(公告)日:2023-02-16

    申请号:US17979129

    申请日:2022-11-02

    Abstract: A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted in accordance with a cost function, and the cost function is determined by intruding a perturbation into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal.

    Pulsed RF Plasma Generator With High Dynamic Range

    公开(公告)号:US20240404788A1

    公开(公告)日:2024-12-05

    申请号:US18661049

    申请日:2024-05-10

    Abstract: A power generator has a first plurality of power amplifiers each configured to receive a first, common supply voltage and to output a plurality of discrete DC voltages. At least one of the plurality of discrete DC voltages may be varied by varying the first, common supply voltage. The RF power generator may also include a second plurality of power amplifiers receiving a second either common or distinct supply voltage that differs from the first supply voltage. At least one of the plurality of discrete DC voltages may be varied by varying the second common or distinct supply voltage. The output of each power amplifier is added in series to generate an output voltage for the power generator. One of the plurality of power amplifiers is actuated or deactuated at a first time and an other of the plurality of power amplifiers is actuated or deactuated at a second time.

    Enhanced Tuning Methods for Mitigating RF Load Impedance Variations Due to Periodic Disturbances

    公开(公告)号:US20240355585A1

    公开(公告)日:2024-10-24

    申请号:US18302141

    申请日:2023-04-18

    CPC classification number: H01J37/32174 H01J37/32128 H01J2237/334

    Abstract: A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted over a predetermined number of bins. The parameter is adjusted in accordance with a cost function, and the cost function is determined by introducing a perturbation for each bin into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal. The perturbation is determined in accordance with a basis set having fewer dimensions than the number of bins.

    Adaptive Pulse Shaping With Post Match Sensor

    公开(公告)号:US20230326721A1

    公开(公告)日:2023-10-12

    申请号:US18209243

    申请日:2023-06-13

    CPC classification number: H01J37/32183 H01J37/32155 H01J37/32146

    Abstract: A power generator includes a power source and a control module coupled to the power source. The control module is configured to generate at least one control signal to vary a respective at least one of an output signal from the power source or an impedance between the power source and a load. The output signal includes a signal modulated by a pulse signal, and the control module is further configured to adjust the at least one control signal to vary at least one of an amplitude or a frequency of the output signal or the impedance between the power source and the load to control a shape of the pulse signal. The at least one of the amplitude, the frequency, or the impedance is adjusted in accordance with respective feedforward adjustments that vary in accordance with a respective sensed pulse parameter detected between a matching network and the load.

    Real-Time, Non-Invasive IEDF Plasma Sensor
    9.
    发明公开

    公开(公告)号:US20230326727A1

    公开(公告)日:2023-10-12

    申请号:US17715672

    申请日:2022-04-07

    Abstract: A controller for a plasma generation system includes a model evaluation module receives a sensed value that varies in accordance with a state of a plasma controlled by a RF power generator. The model evaluation module generates a plasma parameter that varies in accordance with the sensed value. A model integration module receives the plasma parameter, integrates the plasma parameter, and outputs an integrated model parameter. An IEDF evaluation module receives the integrated model parameter and generates an ion energy distribution function (IEDF) in accordance with the integrated model parameter. An IEDF controller module receives the IEDF and generates a signal for controlling a RF generator. A RF generator control module receives the signal and generates an RF generator control signal to control at least one of power, frequency, or phase of the RF power generator.

    Pulse And Bias Synchronization Methods And Systems

    公开(公告)号:US20230223235A1

    公开(公告)日:2023-07-13

    申请号:US18084696

    申请日:2022-12-20

    Abstract: A radio frequency (RF) generator includes a RF power source configured to output an RF power signal, and a controller coupled to the RF power source. The controller is configured to generate a pulse to modulate the RF power signal of the RF power source. The pulse includes one or more state transitions. The controller is further configured to receive a sync signal indicative of one or more operating characteristics or parameters of another RF generator, and adjust at least one of the state transitions of the pulse to synchronize the state transition with a defined phase of the received sync signal. Other example RF generators, RF power delivery systems including one or more RF generators, and control methods for adjusting a state transition of a pulse to synchronize the state transition with a defined phase of a sync signal are also disclosed.

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