摘要:
In a method of manufacturing a thin film transistor, when impurity ions are introduced in a channel region between source and drain regions in a semiconductor layer, an insulator layer is first formed on the semiconductor layer. Then, impurity ions generated on high frequency discharge are introduced through the insulator layer into the semiconductor layer under a specified acceleration voltage. Then, the introduction depth of impurities and the amount of the impurities to be introduced in the channel region can be controlled or the threshold voltage of the thin film transistor can be controlled. This method can be applied to a large substrate.
摘要:
A laser beam is irradiated and scanned on a substrate of a liquid crystal display device of an active matrix type. Pairs of electrons and holes caused by the known internal photoelectric effect are produced by irradiation of the laser beam to electrical conductive thin films including silicon layered on the substrate, and pass through a defective part of short circuit in an intersection of the plural electrical conductive thin films, and thereby a current flowing through the intersection increases and a position of the defect determined on the basis of the scanning position of the laser beam and the increase of the current.
摘要:
An active matrix substrate includes a transparent substrate, pairs each having an n-type thin-film transistor and a p-type thin-film transistor formed on the transparent substrate, gate bus lines and source bus lines connected to the n-type and p-type transistors for controlling the n-type and p-type transistors, and pixel-corresponding electrodes controlled by the transistor pairs respectively. Drains of an n-type transistor and a p-type transistor in each of the pairs are connected to each other via a related pixel corresponding electrode. First pulses are applied to gates of the n-type transistors. Second pulses are applied to gates of the p-type transistors. There is provided a difference in phase between the first pulses and the second pulses.
摘要:
The present invention relates to a thinfilm transistor array designed to drive an active-matrix type liquid-crystal panel to be incorporated in a liquid-crystal display device, and is to offer a thinfilm transistor array solving the conventional problems of disconnections possible between the display electrodes and the drain electrodes and short-circuits possible between the display electrodes and the data wiring. By these, high-quality images can be displayed with a high reliability can be obtained together with an improved fabrication process thereof. In order to accomplish these objectives of the invention, the display electrodes of said thinfilm transistor array are disposed between the gate insulation layer and the inter-insulation layer, and the display electrodes are connected to the drain electrodes by means of a data wiring disposed through contact holes provided through the inter-insulation layer. Furthermore, the possibility of short-circuits can be minimized by insulating and isolating the display electrodes from the data wiring by means of inter-insulation layers, so that the distance between the data wiring and the display electrode can minimized and a remarkable improvement of the displayed image quality can be obtained.
摘要:
A method for forming a polycrystalline semiconductor thin film according to the present invention includes the steps of: forming a semiconductor thin film partially containing microcrystals serving as crystal nuclei for polycrystallization on an insulating substrate; and polycrystallizing the semiconductor thin film by laser annealing.
摘要:
A laser annealing method for a semiconductor thin film for irradiating the semiconductor thin film with a laser beam having a section whose outline includes a straight-line portion, so as to change the crystallinity of the semiconductor thin film is provided, wherein the semiconductor thin film is overlap-irradiated with the laser beam while the laser beam is shifted in a direction different from a direction along the straight-line portion. A thin film semiconductor device fabricated by use of the laser annealing method is also provided.
摘要:
A liquid crystal display apparatus includes: a liquid crystal layer; a first substrate and a second substrate interposing the liquid crystal layer therebetween; a pixel electrode and a counter electrode respectively provided on opposing faces of the first substrate and the second substrate for applying a voltage to the liquid crystal layer; and a thin-film transistor provided on the first substrate and electrically connected to the pixel electrode, the thin-film transistor including a semiconductor layer having a source region and a drain region, wherein the pixel electrode is divided into a first sub-pixel electrode and a second sub-pixel electrode; parts of the first and second sub-pixel electrodes are overlapped via an insulating layer with each other; and at least one of the first and second sub-pixel electrodes is made of the same transparent material as a material for the semiconductor layer.
摘要:
A semiconductor device includes an oxide semiconductor thin film layer primarily including zinc oxide having at least one orientation other than (002) orientation. The zinc oxide may have a mixed orientation including (002) orientation and (101) orientation. Alternatively, the zinc oxide may have a mixed orientation including (100) orientation and (101) orientation.
摘要:
A semiconductor device includes an oxide semiconductor thin film layer of zinc oxide. The (002) lattice planes of at least a part of the oxide semiconductor thin film layer have a preferred orientation along a direction perpendicular to a substrate of the semiconductor device and a lattice spacing d002 of at least 2.619 Å.
摘要:
A thin film transistor includes a substrate, and a pair of source/drain electrodes (i.e., a source electrode and a drain electrode) formed on the substrate and defining a gap therebetween. A pair of low resistance conductive thin films are provided such that each coats at least a part of one of the source/drain electrodes. The low resistance conductive thin films define a gap therebetween. An oxide semiconductor thin film layer is continuously formed on upper surfaces of the pair of low resistance conductive thin films and extends along the gap defined between the low resistance conductive thin films so as to function as a channel. Side surfaces of the oxide semiconductor thin film layer and corresponding side surfaces of the low resistance conductive thin films coincide with each other in a channel width direction of the channel.