公开(公告)号：US20060203221A1

公开(公告)日：2006-09-14

申请号：US11361049

申请日：2006-02-24

申请人： Marcus Van De Kerkhof ,  Wilhelmus Boeij ,  Hendrikus Van Greevenbroek ,  Michel Klaassen ,  Martijn Wehrens ,  Haico Kok ,  Wilhelmus Rooijakkers ,  Tammo Uitterdijk

发明人： Marcus Van De Kerkhof ,  Wilhelmus Boeij ,  Hendrikus Van Greevenbroek ,  Michel Klaassen ,  Martijn Wehrens ,  Haico Kok ,  Wilhelmus Rooijakkers ,  Tammo Uitterdijk

IPC分类号： G03B27/72

CPC分类号： G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

摘要： A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.

摘要翻译： 提供了一种用于测量用于光刻设备的投影光学器件的变迹的方法和装置，所述投影光学器件具有物体平面，其中在使用中放置了掩模版，瞳平面和图像平面， 放置晶片。 该方法包括将一个或多个适当的孔放置在所述物体平面中，以产生基本上均匀的光分布，照亮该孔或每个孔并测量与瞳平面共轭的平面处的强度分布，以便计算投影的变迹 光学。

公开(公告)号：US20060055906A1

公开(公告)日：2006-03-16

申请号：US11220389

申请日：2005-09-07

申请人： Marcus Van De Kerkhof ,  Haico Kok

发明人： Marcus Van De Kerkhof ,  Haico Kok

IPC分类号： G03B27/54

CPC分类号： G03F7/70591

摘要： A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.

摘要翻译： 提供了一种用于测量用于光刻设备的投影光学器件的变迹的方法和装置，所述投影光学器件具有物体平面，其中在使用中放置了掩模版，瞳平面和图像平面， 放置晶片。 该方法包括将一个或多个适当的孔放置在所述物体平面中，以产生基本上均匀的光分布，照亮该孔或每个孔并测量与瞳平面共轭的平面处的强度分布，以便计算投影的变迹 光学。

公开(公告)号：US20070108377A1

公开(公告)日：2007-05-17

申请号：US11591674

申请日：2006-11-02

申请人： Haico Kok ,  Marcus Van De Kerkhof ,  Borgert Kruizinga ,  Timotheus Sengers ,  Bearrach Moest ,  Marc Antonius Haast ,  Peter Weissbrodt ,  Manfred Helmut Gustav Schrenk ,  Torsten Harzendorf

发明人： Haico Kok ,  Marcus Van De Kerkhof ,  Borgert Kruizinga ,  Timotheus Sengers ,  Bearrach Moest ,  Marc Antonius Haast ,  Peter Weissbrodt ,  Manfred Helmut Gustav Schrenk ,  Torsten Harzendorf

IPC分类号： H01J40/14 ,  H01J3/14 ,  H01J5/16

CPC分类号： G03F7/7085

摘要： A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.

摘要翻译： 一种用于高数值孔径光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。 改进的耦合元件包括设置在透明板和感测元件之间的流动液体介质。

公开(公告)号：US20060050260A1

公开(公告)日：2006-03-09

申请号：US10935741

申请日：2004-09-08

申请人： Marcus Van De Kerkhof ,  Haico Kok

发明人： Marcus Van De Kerkhof ,  Haico Kok

IPC分类号： G03B27/72

CPC分类号： G03F7/70591

摘要： A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.

公开(公告)号：US20080007844A1

公开(公告)日：2008-01-10

申请号：US11896981

申请日：2007-09-07

申请人： Haico Kok ,  Marcus Van De Kerhof ,  Borgert Kruizinga ,  Timotheus Sengers ,  Bearrach Moest ,  Marc Haast ,  Peter Weissbrodt ,  Manfred Schrenk ,  Torsten Harzendorf

发明人： Haico Kok ,  Marcus Van De Kerhof ,  Borgert Kruizinga ,  Timotheus Sengers ,  Bearrach Moest ,  Marc Haast ,  Peter Weissbrodt ,  Manfred Schrenk ,  Torsten Harzendorf

IPC分类号： G02B3/08

CPC分类号： G03F7/7085

摘要： A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

公开(公告)号：US20060061746A1

公开(公告)日：2006-03-23

申请号：US11226468

申请日：2005-09-15

申请人： Haico Kok ,  Hoite Tolsma ,  Gerbrand Zouw ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Kuiper

发明人： Haico Kok ,  Hoite Tolsma ,  Gerbrand Zouw ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Kuiper

IPC分类号： G03B27/42

CPC分类号： G03F7/70666 ,  G03F7/709 ,  G03F9/7096

摘要： The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.

摘要翻译： 本发明提供了一种用于通过在投影平面中的图像位置处投射空中图像来确定振动相关信息的方法，将空间图像的强度映射到图像映射中，该图像映射被布置为包括采样位置的坐标值， 在每个采样位置采样的强度，以及测量通过槽模式接收的空间图像的强度。 该方法还包括从图像映射确定图像映射的斜率部分的检测位置，在斜率部分的检测位置处，测量空中图像的时间强度，以及测量狭槽图案的相对位置和 图像位置，将被测量的时隙的相对位置作为时隙图案的位置相关数据，并根据所述空间图像的空间图像振动相关信息的时间强度确定。

公开(公告)号：US20060058972A1

公开(公告)日：2006-03-16

申请号：US10941019

申请日：2004-09-15

申请人： Haico Kok ,  Koen Kivits ,  Ron De Laak ,  Hans Kuiper

发明人： Haico Kok ,  Koen Kivits ,  Ron De Laak ,  Hans Kuiper

IPC分类号： G01L7/00 ,  G01F17/00

CPC分类号： G03F7/70666 ,  G03F7/709 ,  G03F9/7096

摘要： According to one embodiment, a method for determining information relating to vibration includes projecting an aerial image at an image position in a projection plane; mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location; and measuring intensity of the aerial image received through a slot pattern. Further, the method includes determining from the image map a detection position of a slope portion of the image map; at the detection position of the slope portion, measuring a temporal intensity of the aerial image and relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern; and determining from the temporal intensity of the aerial image information relating to vibration for said aerial image.

摘要翻译： 根据一个实施例，一种用于确定与振动有关的信息的方法包括在投影平面中的图像位置投影空中图像; 将所述空间图像的强度映射到图像映射中，所述图像映射被布置为包括采样位置的坐标值和在每个采样位置采样的强度值; 并测量通过狭槽模式接收的空中图像的强度。 此外，该方法包括从图像映射确定图像映射的斜率部分的检测位置; 在斜坡部分的检测位置处，测量空中图像的时间强度和缝隙图案和图像位置的相对位置，测量的时隙的相对位置作为时隙图案的位置相关数据; 并根据与所述航空图像的振动有关的空中图像信息的时间强度来确定。

公开(公告)号：US20060103826A1

公开(公告)日：2006-05-18

申请号：US10988845

申请日：2004-11-16

申请人： Haico Kok ,  Johannes Baselmans

发明人： Haico Kok ,  Johannes Baselmans

IPC分类号： G03B27/54

CPC分类号： G03F7/706

摘要： A lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate using a projection system. The lithographic apparatus comprises: an interferometric sensor for measuring the wavefront of the radiation beam at the level of the substrate, the interferometric sensor having a detector; an actuator for displacing the interferometric sensor in a direction along the optical axis; a first module for determining the change of phase of the wavefront at each of a plurality of locations on the detector of the interferometric sensor, the change of phase resulting from displacement of the interferometric sensor by the actuator between a first position and a second position; and a second module for determining, for each of the plurality of locations on the detector, the corresponding pupil location at the pupil plane of the projection system traversed by the radiation, using the change of phase determined by the first module and the value of the displacement of the interferometric sensor by the actuator, to produce a mapping between locations on the detector and corresponding pupil locations. Once the mapping has been obtained, the numerical aperture and telecentricity of the projection system can be measured.

摘要翻译： 光刻设备布置成使用投影系统将图案化装置的图案化辐射束投影到基板上。 所述光刻设备包括：用于测量所述辐射束在所述衬底的水平处的所述波前的干涉测量传感器，所述干涉测量传感器具有检测器; 用于沿着所述光轴的方向移动所述干涉测量传感器的致动器; 第一模块，用于确定所述干涉测量传感器的检测器上的多个位置中的每个位置处的所述波前相位的变化，由所述致动器在所述干涉测量传感器在第一位置和第二位置之间移位所引起的相位变化; 以及第二模块，用于对于所述检测器上的所述多个位置中的每一个，通过使用由所述第一模块确定的相位变化和所述第一模块的值来确定由所述辐射穿过的所述投影系统的所述瞳孔平面处的对应瞳孔位置 通过致动器移动干涉测量传感器，以产生检测器上的位置与对应的瞳孔位置之间的映射。 一旦获得了映射，就可以测量投影系统的数值孔径和远心度。

公开(公告)号：US20050134824A1

公开(公告)日：2005-06-23

申请号：US10739525

申请日：2003-12-19

申请人： Sherman Poultney ,  Haico Kok

发明人： Sherman Poultney ,  Haico Kok

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/70516 ,  G03F7/70591

摘要： In one configuration of an arrangement according to an embodiment of the invention, a first grating patch on one module is aligned with a first grating patch on another module. In a different configuration of the arrangement, a second grating patch on the one module is aligned with a second grating patch on the other module. The two configurations do not exist at the same time.

摘要翻译： 在根据本发明实施例的装置的一种配置中，一个模块上的第一光栅贴片与另一模块上的第一光栅贴片对准。 在该布置的不同配置中，一个模块上的第二光栅贴片与另一个模块上的第二光栅贴片对准。 这两种配置在同一时间不存在。

公开(公告)号：US20060192093A1

公开(公告)日：2006-08-31

申请号：US11067491

申请日：2005-02-28

申请人： Haico Kok ,  Marcus Van De Kerhof ,  Borgert Kruizinga ,  Timotheus Sengers ,  Bearrach Moest ,  Marc Haast ,  Peter Weissbrodt ,  Manfred Schrenk ,  Torsten Harzendorf

发明人： Haico Kok ,  Marcus Van De Kerhof ,  Borgert Kruizinga ,  Timotheus Sengers ,  Bearrach Moest ,  Marc Haast ,  Peter Weissbrodt ,  Manfred Schrenk ,  Torsten Harzendorf

IPC分类号： H01J5/16 ,  H01J40/14

CPC分类号： G03F7/7085

摘要： A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

摘要翻译： 一种用于高数值温度光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。 元件包括菲涅尔透镜，全息光学元件，倒置的温斯顿锥体，球面透镜和表面粗糙化。