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1.发明申请公开(公告)号：US20060203221A1
公开(公告)日：2006-09-14
申请号：US11361049
申请日：2006-02-24
申请人： Marcus Van De Kerkhof , Wilhelmus Boeij , Hendrikus Van Greevenbroek , Michel Klaassen , Martijn Wehrens , Haico Kok , Wilhelmus Rooijakkers , Tammo Uitterdijk
发明人： Marcus Van De Kerkhof , Wilhelmus Boeij , Hendrikus Van Greevenbroek , Michel Klaassen , Martijn Wehrens , Haico Kok , Wilhelmus Rooijakkers , Tammo Uitterdijk
IPC分类号： G03B27/72
CPC分类号： G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.
摘要翻译： 提供了一种用于测量用于光刻设备的投影光学器件的变迹的方法和装置，所述投影光学器件具有物体平面，其中在使用中放置了掩模版，瞳平面和图像平面， 放置晶片。 该方法包括将一个或多个适当的孔放置在所述物体平面中，以产生基本上均匀的光分布，照亮该孔或每个孔并测量与瞳平面共轭的平面处的强度分布，以便计算投影的变迹 光学。
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公开(公告)号：US20060055906A1
公开(公告)日：2006-03-16
申请号：US11220389
申请日：2005-09-07
申请人： Marcus Van De Kerkhof , Haico Kok
发明人： Marcus Van De Kerkhof , Haico Kok
IPC分类号： G03B27/54
CPC分类号： G03F7/70591
摘要： A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.
摘要翻译： 提供了一种用于测量用于光刻设备的投影光学器件的变迹的方法和装置，所述投影光学器件具有物体平面，其中在使用中放置了掩模版，瞳平面和图像平面， 放置晶片。 该方法包括将一个或多个适当的孔放置在所述物体平面中，以产生基本上均匀的光分布，照亮该孔或每个孔并测量与瞳平面共轭的平面处的强度分布，以便计算投影的变迹 光学。
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公开(公告)号：US20070108377A1
公开(公告)日：2007-05-17
申请号：US11591674
申请日：2006-11-02
申请人： Haico Kok , Marcus Van De Kerkhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Antonius Haast , Peter Weissbrodt , Manfred Helmut Gustav Schrenk , Torsten Harzendorf
发明人： Haico Kok , Marcus Van De Kerkhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Antonius Haast , Peter Weissbrodt , Manfred Helmut Gustav Schrenk , Torsten Harzendorf
CPC分类号： G03F7/7085
摘要： A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
摘要翻译： 一种用于高数值孔径光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。 改进的耦合元件包括设置在透明板和感测元件之间的流动液体介质。
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公开(公告)号：US20060050260A1
公开(公告)日：2006-03-09
申请号：US10935741
申请日：2004-09-08
申请人： Marcus Van De Kerkhof , Haico Kok
发明人： Marcus Van De Kerkhof , Haico Kok
IPC分类号： G03B27/72
CPC分类号： G03F7/70591
摘要： A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.
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公开(公告)号：US20070132979A1
公开(公告)日：2007-06-14
申请号：US11482122
申请日：2006-07-07
申请人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
发明人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
IPC分类号： G03B27/72
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号：US20070211233A1
公开(公告)日：2007-09-13
申请号：US11373493
申请日：2006-03-13
IPC分类号： G03B27/52
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： Lithographic Apparatus, Control System and Device Manufacturing Method An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译： 光刻设备，控制系统和设备制造方法公开了一种浸没式光刻设备，其具有测量系统或预测系统，用于分别测量和/或预测与浸液的温度波动相关的影响，以及用于 基于由测量系统和/或预测系统获得的测量和/或预测，分别控制与浸液的温度相关联的或另一效应。 还公开了一种相关的控制系统和设备制造方法。
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公开(公告)号：US20060132775A1
公开(公告)日：2006-06-22
申请号：US11014236
申请日：2004-12-17
IPC分类号： G01B11/00
CPC分类号： G03F7/70566 , G03F7/706
摘要： An analyzer plate positioned between a projection system and a radiation sensor is illuminated by a projected beam of radiation. The analyzer plate includes two crossing regions, each of which transmits radiation with a different polarization direction. The beam of projection radiation is patterned without influencing the polarization of the beam. By patterning the beam of projection radiation so that one region receives more radiation than the other region, the radiation sensor is given polarization selectivity.
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公开(公告)号：US20060290910A1
公开(公告)日：2006-12-28
申请号：US11167945
申请日：2005-06-28
IPC分类号： G03B27/42
CPC分类号： G03F7/7085 , G03F7/70591 , G03F7/706
摘要： A lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate using a projection system. The lithographic apparatus comprises: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a measurement system for measuring the wavefront aberration or other property of the apparatus. The measurement system comprises: a source module at the level of the substrate table for providing an effective source of radiation; and a sensor unit at the level of the support, for receiving radiation from the source module through the projection system for performing the measurement.
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公开(公告)号：US20050264778A1
公开(公告)日：2005-12-01
申请号：US10857614
申请日：2004-06-01
申请人： Joeri Lof , Erik Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Meijer , Jeroen Maria Mertens , Johannes Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Meijer , Jeroen Maria Mertens , Johannes Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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公开(公告)号：US20050078287A1
公开(公告)日：2005-04-14
申请号：US10924202
申请日：2004-08-24
IPC分类号： G01B15/00 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
摘要翻译： 提供了一种光刻设备，其具有在基底水平的传感器，所述传感器包括辐射接收器，支撑辐射接收器的透射板和辐射探测器，其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。
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