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公开(公告)号：US20100128280A1
公开(公告)日：2010-05-27
申请号：US12509098
申请日：2009-07-24
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： In general, in one aspect, the invention features apparatus that includes a broadband scanning interferometry system including interferometer optics for combining test light from a test object with reference light from a reference object to form an interference pattern on a detector, wherein the test and reference light are derived from a common light source. The interferometry system further includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light from the common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, wherein the frequency of each OPD increment defines a frame rate. The interferometer optics are configured to produce at least two monitor interferometry signals each indicative of changes in the OPD as the OPD is scanned, wherein the detector system is further configured to record the monitor interferometry signals. The apparatus also includes an electronic processor electronically coupled to the detection system and scanning stage and configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.
摘要翻译： 一般来说，一方面，本发明的特征在于，包括宽带扫描干涉测量系统的装置，其包括用于将来自测试对象的测试光与来自参考物体的参考光组合在一起的干涉仪光学元件，以在检测器上形成干涉图案，其中测试和参考 光源自普通光源。 所述干涉测量系统还包括扫描级，其被配置为扫描来自所述公共源的所述测试参考光与所述检测器之间的光程差（OPD）;以及检测器系统，包括用于记录一系列OPD中的每一个的干涉图案的检测器 增量，其中每个OPD增量的频率定义帧速率。 干涉仪光学器件被配置为产生至少两个监视器干涉测量信号，每个监视器干涉测量信号指示当OPD被扫描时OPD的变化，其中检测器系统还被配置为记录监视器干涉测量信号。 该装置还包括电子处理器，其电耦合到检测系统和扫描级，并且被配置为以大于帧速率的频率灵敏地确定对OPD增量的扰动的OPD增量的信息。
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公开(公告)号：US20100128276A1
公开(公告)日：2010-05-27
申请号：US12541325
申请日：2009-08-14
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： Interferometry system are disclosed that include a detector sub-system including a monitor detector, interferometer optics for combining test light from a test object with primary reference light from a first reference interface and secondary reference light from a second reference interface to form a monitor interference pattern on a monitor detector, wherein the first and second reference interfaces are mechanically fixed with respect to each other and the test light, a scanning stage configured to scan an optical path difference (OPD) between the test light and the primary and secondary reference light to the monitor detector while the detector sub-system records the monitor interference pattern for each of a series of OPD increments, and an electronic processor electronically coupled to the detector sub-system and the scanning stage, the electronic processor being configured to determine information about the OPD increments based on the detected monitor interference pattern.
摘要翻译： 公开了一种干涉测量系统，其包括检测器子系统，该检测器子系统包括监视器检测器，用于将来自测试对象的测试光与来自第一参考接口的主要参考光组合的来自第二参考接口的第二参考光组合的干涉仪光学元件，以形成监视器干涉图案 在监视器检测器上，其中所述第一参考接口和所述第二参考接口相对于彼此和所述测试光机械地固定;扫描台，被配置为扫描所述测试光和所述主参考光与所述次参考光之间的光程差（OPD） 监视器检测器，同时检测器子系统记录用于一系列OPD增量中的每一个的监视器干涉图案，以及电子处理器，电子耦合到检测器子系统和扫描级，电子处理器被配置为确定关于 OPD根据检测到的监视器干扰模式递增。
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公开(公告)号：US20130155413A1
公开(公告)日：2013-06-20
申请号：US13765936
申请日：2013-02-13
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： A system includes an interference microscope having one or more optical elements arranged to image a test object to an image plane by combining test light from the test object with reference light from a reference object to form an interference pattern at the image plane, wherein the test and reference light are derived from a common broadband light source. The system includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light, a multi-element detector positioned at the image plane and configured to record the interference pattern for each of a series of OPD increments and to generate multiple interferometry signals each having a fringe carrier frequency indicative of changes in the OPD as the OPD is scanned, where there is phase diversity among the interferometry signals, and an electronic processor coupled to the multi-element detector and scanning stage and configured to process the interference signals based on the phase diversity to determine information about the OPD increments having sensitivity to perturbations to the OPD increments at frequencies greater than the fringe carrier frequency.
摘要翻译： 一种系统包括具有一个或多个光学元件的干涉显微镜，该光学元件被布置成通过将来自测试对象的测试光与来自参考对象的参考光组合在一起而在图像平面上形成干涉图案来将测试对象图像成像平面，其中测试 参考光源自普通宽带光源。 该系统包括被配置为扫描测试和参考光之间的光程差（OPD）的扫描级，位于图像平面处的多元件检测器，并且被配置为记录一系列OPD增量中的每一个的干涉图案，并且 生成多个干涉测量信号，每个干涉测量信号具有指示在扫描OPD时OPD变化的边缘载波频率，其中在干涉测量信号之间存在相位分集，以及耦合到多元件检测器和扫描级的电子处理器并且被配置为处理 基于相位分集的干扰信号以确定关于具有对大于边缘载波频率的频率的对OPD的扰动敏感度的OPD增量的信息。
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4.发明申请DATA INTERPOLATION METHODS FOR METROLOGY OF SURFACES, FILMS AND UNDERRESOLVED STRUCTURES 审中-公开表面，薄膜和底层结构体系的数据插值方法公开(公告)号：US20120089365A1
公开(公告)日：2012-04-12
申请号：US13267408
申请日：2011-10-06
CPC分类号： G01B11/2441 , G01B9/02011 , G01B9/02029 , G01B9/0203 , G01B9/02043 , G01B9/02083 , G01B9/0209 , G01B11/0675 , G01B2210/56 , G01B2290/70
摘要： A method includes fitting a function to a subset of reflectivity data comprising values for the reflectivity of a test object for different wavelengths, different scattering angles, and/or different polarization states; determining values for the function at certain wavelengths and scattering angles and/or polarization states; and determining information about the test object based on the determined values.
摘要翻译： 一种方法包括将功能拟合到包括不同波长，不同散射角和/或不同极化状态的测试对象的反射率的值的反射率数据子集; 确定在某些波长和散射角度和/或偏振状态下的功能的值; 以及基于所确定的值来确定关于所述测试对象的信息。
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公开(公告)号：US20110032535A1
公开(公告)日：2011-02-10
申请号：US12535357
申请日：2009-08-04
IPC分类号： G01B11/02
CPC分类号： G01B9/02043 , G01B9/02057 , G01B9/02083 , G01B9/0209 , G01B2290/70 , G03F7/70633 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.
摘要翻译： 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。
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公开(公告)号：US20090262362A1
公开(公告)日：2009-10-22
申请号：US12427079
申请日：2009-04-21
CPC分类号： G01B9/02084 , G01B9/02057 , G01B9/0209 , G01B2290/70 , G01N21/95607 , G03F7/70633 , Y10T29/49004
摘要： In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.
摘要翻译： 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。
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公开(公告)号：US08189202B2
公开(公告)日：2012-05-29
申请号：US12535357
申请日：2009-08-04
IPC分类号： G01B11/02
CPC分类号： G01B9/02043 , G01B9/02057 , G01B9/02083 , G01B9/0209 , G01B2290/70 , G03F7/70633 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.
摘要翻译： 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。
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公开(公告)号：US20090303493A1
公开(公告)日：2009-12-10
申请号：US12540709
申请日：2009-08-13
IPC分类号： G01B11/02
CPC分类号： G01B9/02063 , G01B9/02057 , G01B9/02087 , G01B9/0209
摘要： A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.
摘要翻译： 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。
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公开(公告)号：US20090128827A1
公开(公告)日：2009-05-21
申请号：US12267077
申请日：2008-11-07
IPC分类号： G01B9/02
CPC分类号： G02B21/0004
摘要： In one aspect, the disclosure features methods that include using a microscope to direct light to a test object and to direct the light reflected from the test object to a detector, where the light includes components having orthogonal polarization states, varying an optical path length difference (OPD) between the components of the light, acquiring an interference signal from the detector while varying the OPD between the components, and determining information about the test object based on the acquired interference signal.
摘要翻译： 在一个方面，本发明的特征在于包括使用显微镜将光引导到测试对象并将从测试对象反射的光引导到检测器的方法，其中光包括具有正交偏振态的分量，改变光路长度差 （OPD），在改变组件之间的OPD的同时获取来自检测器的干扰信号，并且基于所获取的干扰信号确定关于测试对象的信息。
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公开(公告)号：US09025162B2
公开(公告)日：2015-05-05
申请号：US12540709
申请日：2009-08-13
IPC分类号： G01B9/02
CPC分类号： G01B9/02063 , G01B9/02057 , G01B9/02087 , G01B9/0209
摘要： A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.
摘要翻译： 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。
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