INTERFEROMETER FOR DETERMINING OVERLAY ERRORS
    2.
    发明申请
    INTERFEROMETER FOR DETERMINING OVERLAY ERRORS 有权
    用于确定重叠错误的干涉仪

    公开(公告)号:US20110032535A1

    公开(公告)日:2011-02-10

    申请号:US12535357

    申请日:2009-08-04

    IPC分类号: G01B11/02

    摘要: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

    摘要翻译: 公开了一种系统,其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪,测试和参考光源自公共源,一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器,使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度,检测器被配置为基于组合的光产生干涉​​信号,以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构,并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

    INTERFEROMETER FOR OVERLAY MEASUREMENTS
    3.
    发明申请
    INTERFEROMETER FOR OVERLAY MEASUREMENTS 失效
    用于覆盖测量的干扰仪

    公开(公告)号:US20090262362A1

    公开(公告)日:2009-10-22

    申请号:US12427079

    申请日:2009-04-21

    IPC分类号: G01B11/02 H05K3/00 H01J9/42

    摘要: In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.

    摘要翻译: 通常,在第一方面,本发明的特征在于一种包括干涉仪的系统,该干涉仪被配置为将测试光引导到覆盖目标,并随后将其与参考光组合以形成干涉图案,测试和参考光源自公共源, 多元素检测器,用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案,并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。

    Interferometer for determining overlay errors
    4.
    发明授权
    Interferometer for determining overlay errors 有权
    用于确定重叠错误的干涉仪

    公开(公告)号:US08189202B2

    公开(公告)日:2012-05-29

    申请号:US12535357

    申请日:2009-08-04

    IPC分类号: G01B11/02

    摘要: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

    摘要翻译: 公开了一种系统,其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪,测试和参考光源自公共源,一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器,使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度,检测器被配置为基于组合的光产生干涉​​信号,以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构,并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

    SCAN ERROR CORRECTION IN LOW COHERENCE SCANNING INTERFEROMETRY
    5.
    发明申请
    SCAN ERROR CORRECTION IN LOW COHERENCE SCANNING INTERFEROMETRY 有权
    低相干扫描干涉测量中的扫描误差校正

    公开(公告)号:US20100128280A1

    公开(公告)日:2010-05-27

    申请号:US12509098

    申请日:2009-07-24

    IPC分类号: G01B9/02

    摘要: In general, in one aspect, the invention features apparatus that includes a broadband scanning interferometry system including interferometer optics for combining test light from a test object with reference light from a reference object to form an interference pattern on a detector, wherein the test and reference light are derived from a common light source. The interferometry system further includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light from the common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, wherein the frequency of each OPD increment defines a frame rate. The interferometer optics are configured to produce at least two monitor interferometry signals each indicative of changes in the OPD as the OPD is scanned, wherein the detector system is further configured to record the monitor interferometry signals. The apparatus also includes an electronic processor electronically coupled to the detection system and scanning stage and configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.

    摘要翻译: 一般来说,一方面,本发明的特征在于,包括宽带扫描干涉测量系统的装置,其包括用于将来自测试对象的测试光与来自参考物体的参考光组合在一起的干涉仪光学元件,以在检测器上形成干涉图案,其中测试和参考 光源自普通光源。 所述干涉测量系统还包括扫描级,其被配置为扫描来自所述公共源的所述测试参考光与所述检测器之间的光程差(OPD);以及检测器系统,包括用于记录一系列OPD中的每一个的干涉图案的检测器 增量,其中每个OPD增量的频率定义帧速率。 干涉仪光学器件被配置为产生至少两个监视器干涉测量信号,每个监视器干涉测量信号指示当OPD被扫描时OPD的变化,其中检测器系统还被配置为记录监视器干涉测量信号。 该装置还包括电子处理器,其电耦合到检测系统和扫描级,并且被配置为以大于帧速率的频率灵敏地确定对OPD增量的扰动的OPD增量的信息。

    COMPOUND REFERENCE INTERFEROMETER
    6.
    发明申请
    COMPOUND REFERENCE INTERFEROMETER 失效
    化合物参考干扰仪

    公开(公告)号:US20100128276A1

    公开(公告)日:2010-05-27

    申请号:US12541325

    申请日:2009-08-14

    IPC分类号: G01B9/02

    摘要: Interferometry system are disclosed that include a detector sub-system including a monitor detector, interferometer optics for combining test light from a test object with primary reference light from a first reference interface and secondary reference light from a second reference interface to form a monitor interference pattern on a monitor detector, wherein the first and second reference interfaces are mechanically fixed with respect to each other and the test light, a scanning stage configured to scan an optical path difference (OPD) between the test light and the primary and secondary reference light to the monitor detector while the detector sub-system records the monitor interference pattern for each of a series of OPD increments, and an electronic processor electronically coupled to the detector sub-system and the scanning stage, the electronic processor being configured to determine information about the OPD increments based on the detected monitor interference pattern.

    摘要翻译: 公开了一种干涉测量系统,其包括检测器子系统,该检测器子系统包括监视器检测器,用于将来自测试对象的测试光与来自第一参考接口的主要参考光组合的来自第二参考接口的第二参考光组合的干涉仪光学元件,以形成监视器干涉图案 在监视器检测器上,其中所述第一参考接口和所述第二参考接口相对于彼此和所述测试光机械地固定;扫描台,被配置为扫描所述测试光和所述主参考光与所述次参考光之间的光程差(OPD) 监视器检测器,同时检测器子系统记录用于一系列OPD增量中的每一个的监视器干涉图案,以及电子处理器,电子耦合到检测器子系统和扫描级,电子处理器被配置为确定关于 OPD根据检测到的监视器干扰模式递增。

    INTERFEROMETRIC METROLOGY OF SURFACES, FILMS AND UNDERRESOLVED STRUCTURES
    7.
    发明申请
    INTERFEROMETRIC METROLOGY OF SURFACES, FILMS AND UNDERRESOLVED STRUCTURES 审中-公开
    表面,膜和底层结构的间距计量

    公开(公告)号:US20120224183A1

    公开(公告)日:2012-09-06

    申请号:US13408003

    申请日:2012-02-29

    IPC分类号: G01B9/02

    摘要: An interferometry method for determining information about a test object includes directing test light to the test object positioned at a plane, wherein one or more properties of the test light vary over a range of incidence angles at the plane, the properties of the test light being selected from the group consisting of the spectral content, intensity, and polarization state; subsequently combining the test light with reference light to form an interference pattern on a multi-element detector so that different regions of the detector correspond to different angles of the test light emerging from the test object, wherein the test and reference light are derived from a common source; monitoring the interference pattern using the multi-element detector while varying an optical path difference between the test light and the reference light; determining the information about the test object based on the monitored interference pattern.

    摘要翻译: 用于确定关于测试对象的信息的干涉测量方法包括将测试光引导到位于平面处的测试对象,其中测试光的一个或多个属性在平面处的入射角范围内变化,测试光的特性为 选自光谱含量,强度和偏振态; 随后将测试光与参考光组合以在多元素检测器上形成干涉图案,使得检测器的不同区域对应于从测试对象出射的测试光的不同角度,其中测试和参考光源自 共同来源 在改变测试光和参考光之间的光程差的同时使用多元素检测器来监测干涉图案; 基于所监测的干扰模式确定关于测试对象的信息。

    INTERFEROMETRY FOR LATERAL METROLOGY
    8.
    发明申请
    INTERFEROMETRY FOR LATERAL METROLOGY 有权
    横向计量学的干涉

    公开(公告)号:US20090303493A1

    公开(公告)日:2009-12-10

    申请号:US12540709

    申请日:2009-08-13

    IPC分类号: G01B11/02

    摘要: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

    摘要翻译: 公开了一种方法,其包括:使用扫描干涉测量系统,在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列,识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列,并且基于相移干涉测量图像和扫描位置生成最终图像,其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小, 移位干涉图像。

    INTERFEROMETER UTILIZING POLARIZATION SCANNING
    9.
    发明申请
    INTERFEROMETER UTILIZING POLARIZATION SCANNING 有权
    使用偏振扫描的干涉仪

    公开(公告)号:US20090128827A1

    公开(公告)日:2009-05-21

    申请号:US12267077

    申请日:2008-11-07

    IPC分类号: G01B9/02

    CPC分类号: G02B21/0004

    摘要: In one aspect, the disclosure features methods that include using a microscope to direct light to a test object and to direct the light reflected from the test object to a detector, where the light includes components having orthogonal polarization states, varying an optical path length difference (OPD) between the components of the light, acquiring an interference signal from the detector while varying the OPD between the components, and determining information about the test object based on the acquired interference signal.

    摘要翻译: 在一个方面,本发明的特征在于包括使用显微镜将光引导到测试对象并将从测试对象反射的光引导到检测器的方法,其中光包括具有正交偏振态的分量,改变光路长度差 (OPD),在改变组件之间的OPD的同时获取来自检测器的干扰信号,并且基于所获取的干扰信号确定关于测试对象的信息。

    Interferometry for lateral metrology
    10.
    发明授权
    Interferometry for lateral metrology 有权
    侧向测量干涉测量

    公开(公告)号:US09025162B2

    公开(公告)日:2015-05-05

    申请号:US12540709

    申请日:2009-08-13

    IPC分类号: G01B9/02

    摘要: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

    摘要翻译: 公开了一种方法,其包括:使用扫描干涉测量系统,在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列,识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列,并且基于相移干涉测量图像和扫描位置生成最终图像,其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小, 移位干涉图像。