公开(公告)号：US20090303493A1

公开(公告)日：2009-12-10

申请号：US12540709

申请日：2009-08-13

Applicant: Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

Inventor： Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

Abstract: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

Abstract translation: 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。

公开(公告)号：US08189202B2

公开(公告)日：2012-05-29

申请号：US12535357

申请日：2009-08-04

Applicant: Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

Inventor： Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

IPC: G01B11/02

CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209 ,  G01B2290/70 ,  G03F7/70633 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

Abstract translation: 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉​​信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

公开(公告)号：US20120089365A1

公开(公告)日：2012-04-12

申请号：US13267408

申请日：2011-10-06

Applicant: Martin Fay ,  Jan Liesener ,  Peter de Groot ,  Xavier Colonna de Lega

Inventor： Martin Fay ,  Jan Liesener ,  Peter de Groot ,  Xavier Colonna de Lega

IPC: G01B11/24 ,  G01B11/06 ,  G06F17/10 ,  G06F19/00

CPC classification number: G01B11/2441 ,  G01B9/02011 ,  G01B9/02029 ,  G01B9/0203 ,  G01B9/02043 ,  G01B9/02083 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2210/56 ,  G01B2290/70

Abstract: A method includes fitting a function to a subset of reflectivity data comprising values for the reflectivity of a test object for different wavelengths, different scattering angles, and/or different polarization states; determining values for the function at certain wavelengths and scattering angles and/or polarization states; and determining information about the test object based on the determined values.

Abstract translation: 一种方法包括将功能拟合到包括不同波长，不同散射角和/或不同极化状态的测试对象的反射率的值的反射率数据子集; 确定在某些波长和散射角度和/或偏振状态下的功能的值; 以及基于所确定的值来确定关于所述测试对象的信息。

公开(公告)号：US20110032535A1

公开(公告)日：2011-02-10

申请号：US12535357

申请日：2009-08-04

Applicant: Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

Inventor： Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

IPC: G01B11/02

CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209 ,  G01B2290/70 ,  G03F7/70633 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

Abstract translation: 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉​​信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

公开(公告)号：US20090262362A1

公开(公告)日：2009-10-22

申请号：US12427079

申请日：2009-04-21

Applicant: Peter de Groot ,  Jan Liesener ,  Xavier Colonna de Lega

Inventor： Peter de Groot ,  Jan Liesener ,  Xavier Colonna de Lega

IPC: G01B11/02 ,  H05K3/00 ,  H01J9/42

CPC classification number: G01B9/02084 ,  G01B9/02057 ,  G01B9/0209 ,  G01B2290/70 ,  G01N21/95607 ,  G03F7/70633 ,  Y10T29/49004

Abstract: In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.

Abstract translation: 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。

公开(公告)号：US20090128827A1

公开(公告)日：2009-05-21

申请号：US12267077

申请日：2008-11-07

Applicant: Peter de Groot ,  Xavier Colonna de Lega

Inventor： Peter de Groot ,  Xavier Colonna de Lega

IPC: G01B9/02

CPC classification number: G02B21/0004

Abstract: In one aspect, the disclosure features methods that include using a microscope to direct light to a test object and to direct the light reflected from the test object to a detector, where the light includes components having orthogonal polarization states, varying an optical path length difference (OPD) between the components of the light, acquiring an interference signal from the detector while varying the OPD between the components, and determining information about the test object based on the acquired interference signal.

Abstract translation: 在一个方面，本发明的特征在于包括使用显微镜将光引导到测试对象并将从测试对象反射的光引导到检测器的方法，其中光包括具有正交偏振态的分量，改变光路长度差 （OPD），在改变组件之间的OPD的同时获取来自检测器的干扰信号，并且基于所获取的干扰信号确定关于测试对象的信息。

公开(公告)号：US20100128280A1

公开(公告)日：2010-05-27

申请号：US12509098

申请日：2009-07-24

Applicant: Mark Davidson ,  Jan Liesener ,  Peter de Groot ,  Xavier Colonna de Lega ,  Leslie L. Deck

Inventor： Mark Davidson ,  Jan Liesener ,  Peter de Groot ,  Xavier Colonna de Lega ,  Leslie L. Deck

IPC: G01B9/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: In general, in one aspect, the invention features apparatus that includes a broadband scanning interferometry system including interferometer optics for combining test light from a test object with reference light from a reference object to form an interference pattern on a detector, wherein the test and reference light are derived from a common light source. The interferometry system further includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light from the common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, wherein the frequency of each OPD increment defines a frame rate. The interferometer optics are configured to produce at least two monitor interferometry signals each indicative of changes in the OPD as the OPD is scanned, wherein the detector system is further configured to record the monitor interferometry signals. The apparatus also includes an electronic processor electronically coupled to the detection system and scanning stage and configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.

Abstract translation: 一般来说，一方面，本发明的特征在于，包括宽带扫描干涉测量系统的装置，其包括用于将来自测试对象的测试光与来自参考物体的参考光组合在一起的干涉仪光学元件，以在检测器上形成干涉图案，其中测试和参考 光源自普通光源。 所述干涉测量系统还包括扫描级，其被配置为扫描来自所述公共源的所述测试参考光与所述检测器之间的光程差（OPD）;以及检测器系统，包括用于记录一系列OPD中的每一个的干涉图案的检测器 增量，其中每个OPD增量的频率定义帧速率。 干涉仪光学器件被配置为产生至少两个监视器干涉测量信号，每个监视器干涉测量信号指示当OPD被扫描时OPD的变化，其中检测器系统还被配置为记录监视器干涉测量信号。 该装置还包括电子处理器，其电耦合到检测系统和扫描级，并且被配置为以大于帧速率的频率灵敏地确定对OPD增量的扰动的OPD增量的信息。

公开(公告)号：US09025162B2

公开(公告)日：2015-05-05

申请号：US12540709

申请日：2009-08-13

Applicant: Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

Inventor： Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

IPC: G01B9/02

CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

Abstract: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

Abstract translation: 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。

公开(公告)号：US20100128276A1

公开(公告)日：2010-05-27

申请号：US12541325

申请日：2009-08-14

Applicant: Peter De Groot ,  Mark Davidson ,  Jan Liesener ,  Xavier Colonna de Lega ,  Leslie L. Deck

Inventor： Peter De Groot ,  Mark Davidson ,  Jan Liesener ,  Xavier Colonna de Lega ,  Leslie L. Deck

IPC: G01B9/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: Interferometry system are disclosed that include a detector sub-system including a monitor detector, interferometer optics for combining test light from a test object with primary reference light from a first reference interface and secondary reference light from a second reference interface to form a monitor interference pattern on a monitor detector, wherein the first and second reference interfaces are mechanically fixed with respect to each other and the test light, a scanning stage configured to scan an optical path difference (OPD) between the test light and the primary and secondary reference light to the monitor detector while the detector sub-system records the monitor interference pattern for each of a series of OPD increments, and an electronic processor electronically coupled to the detector sub-system and the scanning stage, the electronic processor being configured to determine information about the OPD increments based on the detected monitor interference pattern.

Abstract translation: 公开了一种干涉测量系统，其包括检测器子系统，该检测器子系统包括监视器检测器，用于将来自测试对象的测试光与来自第一参考接口的主要参考光组合的来自第二参考接口的第二参考光组合的干涉仪光学元件，以形成监视器干涉图案 在监视器检测器上，其中所述第一参考接口和所述第二参考接口相对于彼此和所述测试光机械地固定;扫描台，被配置为扫描所述测试光和所述主参考光与所述次参考光之间的光程差（OPD） 监视器检测器，同时检测器子系统记录用于一系列OPD增量中的每一个的监视器干涉图案，以及电子处理器，电子耦合到检测器子系统和扫描级，电子处理器被配置为确定关于 OPD根据检测到的监视器干扰模式递增。

公开(公告)号：US06226092B1

公开(公告)日：2001-05-01

申请号：US09321475

申请日：1999-05-27

Applicant: Xavier Colonna de Lega

Inventor： Xavier Colonna de Lega

IPC: G01B902

CPC classification number: G01B9/02098 ,  G01B9/02022 ,  G01B11/2441

Abstract: A full-field, geometrically-desensitized interferometer (GDI) instrument incorporates a combination of reflecting and refracting optics to perform beam splitting and recombining operations for surface profilometry. Symmetrically-positioned inbound and outbound optical subassemblies typically are arranged to direct inbound collimated beams from a light generator to the profiled surface of a test object and to direct outbound reflected beams to an imaging device as a single recombined outbound interference beam. Every point on the detector has a corresponding point on the object from which reflected illumination originated from both reflected beams. The optical path difference between the two inbound beams or between the two reflected outbound beams can be substantially independent of field position. The resultant instrument, in addition to being capable of full-field imaging, exhibits several advantages including 1) a large working distance, 2) the employment of readily-available non-diffractive elements, and 3) the ability to transmit light with high efficiency.

Abstract translation: 全场，几何脱敏干涉仪（GDI）仪器结合了反射和折射光学元件，以进行表面轮廓测量的分束和重组操作。 对称定位的入射和出射光学子组件通常被布置成将来自光发生器的入射准直光束引导到测试对象的成型表面，并且将出射反射光束作为单个重新组合的出射干涉光束引导到成像装置。 检测器上的每个点在物体上具有对应的点，反射照明源自两个反射光束。 两个入射光束之间或两个反射出射光束之间的光程差可以基本上与场位置无关。 所得到的仪器除了能够进行全场成像外，还具有以下优点：1）工作距离大，2）使用易于获得的非衍射元件，以及3）高效传输光的能力 。