摘要:
This invention provides a fluoropolymer dispersion useful for coating applications. The dispersion is a homogeneous and non-ozone depleting dispersion comprising a lubricious fluoropolymer, an inert perfluorinated liquid, a polar solvent, and an effective amount of a surface active agent selected from the group consisting of a. perfluoroaliphatic amidoalkanols; b. polymerized products formed from the reaction of a mixture comprising a hydrophilic monomer and a monomer of the general formula: ##STR1## wherein p and q are integers between 1 and 4 inclusive, x and y are integers between 0 and 4 inclusive, m is 1 or 2, n is an integer between 3 and 10 inclusive, X' is either a methyl group or a single hydrogen atom, g is 0 or 1, and Q is a sulfonamido constituent group according to the formula: ##STR2## wherein R.sup.1 is a hydrogen or a lower alkyl group having from 1 to 6 carbon atoms and wherein the hydrophilic monomer is present in an amount constituting inclusively between five and twenty-five weight percent of the reactant mixture when the polar solvent employed is a polar organic solvent and wherein the hydrophilic monomer is present in an amount constituting inclusively between one and twenty-five weight percent of the reactant mixture when the polar solvent employed is water; and c. Perfluorinated ether acids according to the general formula: ##STR3## wherein z is between 1 and 10 inclusive, s is between 0 to 4, t is between 0 to 4, v between 0 to 5, w is 0 or 1, and Y is either F or CF.sub.3.
摘要:
This invention provides a fluoropolymer dispersion useful for coating applications, The dispersion is a homogeneous and non-ozone depleting dispersion comprising a lubricious fluoropolymer, an inert perfluorinated liquid, a polar solvent, and an effective amount of a surface active agent selected from the group consisting of:a. perfluoroaliphatic amidoalkanols;b. polymerized products formed from the reaction of a mixture comprising a hydrophilic monomer and a monomer of the general formula: ##STR1## wherein p and q are integers between 1 and 4 inclusive, x and y are integers between 0 and 4 inclusive, m is 1 or 2, n is an integer between 3 and 10 inclusive, X' is either a methyl group or a single hydrogen atom, g is 0 or 1, and Q is a sulfonamido constituent group according to the formula: ##STR2## wherein R.sup.1 is a hydrogen or a lower alkyl group having from 1 to 6 carbon atoms and wherein the hydrophilic monomer is present in an amount constituting inclusively between five and twenty-five weight percent of the reactant mixture when the polar solvent employed is a polar organic solvent and wherein the hydrophilic monomer is present in an amount constituting inclusively between one and twenty-five weight percent of the reactant mixture when the polar solvent employed is water; andc. Perfluorinated ether acids according to the general formula: ##STR3## wherein z is between 1 and 10 inclusive, s is between 0 to 4, t is between 0 to 4, v between 0 to 5, w is 0 or 1, and Y is either F or CF.sub.3.
摘要:
This invention provides a fluoropolymer dispersion useful for coating applications. The dispersion is a homogeneous and non-ozone depleting dispersion comprising a lubricious fluoropolymer, an inert perfluorinated liquid, a polar solvent, and an effective amount of a surface active agent selected from the group consisting of:a. perfluoroaliphatic amidoalkanols;b. polymerized products formed from the reaction of a mixture comprising a hydrophilic monomer and a monomer of the general formula: ##STR1## wherein p and q are integers between 1 and 4 inclusive, x and y are integers between 0 and 4 inclusive, m is 1 or 2, n is an integer between 3 and 10 inclusive, X' is either a methyl group or a single hydrogen atom, g is 0 or 1, and Q is a sulfonamido constituent group according to the formula: ##STR2## wherein R.sup.1 is a hydrogen or a lower alkyl group having from 1 to 6 carbon atoms and wherein the hydrophilic monomer is present in an amount constituting inclusively between five and twenty-five weight percent of the reactant mixture when the polar solvent employed is a polar organic solvent and wherein the hydrophilic monomer is present in an amount constituting inclusively between one and twenty-five weight percent of the reactant mixture when the polar solvent employed is water; andc. Perfluorinated ether acids according to the general formula: ##STR3## wherein z is between 1 and 10 inclusive, s is between 0 to 4, t is between 0 to 4, v between 0 to 5, w is 0 or 1, and Y is either F or CF.sub.3.
摘要:
Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
摘要:
The present invention is directed to certain fluorinated surfactants, and use thereof in acid etch solutions, such as in aqueous buffered acid etch solutions. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
摘要:
Perfluoro(cycloaliphatic methyleneoxyalkylene) compositions are provided. These compositions comprise perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds having (a) a perfluorocycloaliphatic moiety which can have up to two perfluoroalkyl substituents and a perfluoroalkylene substituent, and (b) a perfluoromethyleneoxyalkylene carbonyl fluoride radical, the methylene group of the radical being bonded to a ring carbon atom or the perfluoroalkylene substituent of the moiety and the alkylene group of the perfluoromethyleneoxyalkylene carbonyl fluoride being a perfluoro(methyl)methylene group, a perfluoroisopropyleneoxy(methyl)methylene group, or a poly(perfluoroisopropyleneoxy)perfluoro(methyl)methylene group having up to about 10 perfluoroisopropyleneoxy units. Also provided are functional derivatives of the perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds and nonfunctional derivatives of the perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds.
摘要:
Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
摘要:
Perfluoro(cycloaliphatic methyleneoxyalkylene) compositions are provided. These compositions comprise perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds having (a) a perfluorocycloaliphatic moiety which can have up to two perfluoroalkyl substituents and a perfluoroalkylene substituent, and (b) a perfluoromethyleneoxyalkylene carbonyl fluoride radical, the methylene group of the radical being bonded to a ring carbon atom or the perfluoroalkylene substituent of the moiety and the alkylene group of the perfluoromethyleneoxyalkylene carbonyl fluoride being a perfluoro(methyl)methylene group, a perfluoroisopropyleneoxy(methyl)methylene group, or a poly(perfluoroisopropyleneoxy)perfluoro(methyl)methylene group having up to about 10 perfluoroisopropyleneoxy units. Also provided are functional derivatives of the perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds and nonfunctional derivatives of the perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds.
摘要:
Perfluoro(cycloaliphatic methyleneoxyalkylene) compositions are provided. These compositions comprise perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds having (a) a perfluorocycloaliphatic moiety which can have up to two perfluoroalkyl substituents and a perfluoroalkylene substituent, and (b) a perfluoromethyleneoxyalkylene carbonyl fluoride radical, the methylene group of the radical being bonded to a ring carbon atom or the perfluoroalkylene substituent of the moiety and the alkylene group of the perfluoromethyleneoxyalkylene carbonyl fluoride being a perfluoro(methyl)methylene group, a perfluoroisopropyleneoxy(methyl)methylene group, or a poly(perfluoroisopropyleneoxy)perfluoro(methyl)methylene group having up to about 10 perfluoroisopropyleneoxy units. Also provided are functional derivatives of the perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds and nonfunctional derivatives of the perfluoro(cycloaliphatic methyleneoxyalkylene) carbonyl fluoride compounds.
摘要:
A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.