摘要:
A method for operating a substrate processing apparatus is provided which can contain generation of particles by generating plasma in a stable manner. After a substrate is disposed in an evacuated vacuum chamber, a rare gas is initially supplied into the vacuum chamber, a voltage is applied to a plasma generating means, and plasma of the rare gas is generated. Subsequently, a reaction gas is supplied into the vacuum chamber, the reaction gas is brought into contact with the plasma of the rare gas, and plasma of the reaction gas is generated. The plasma of the reaction gas is brought into contact with the substrate; and the substrate is processed. Plasma is stably generated not by turning the reaction gas into plasma but by first turning the rare gas into plasma by the plasma generating means, and generation of particles is subsequently suppressed.
摘要:
A method for operating a substrate processing apparatus is provided which can contain generation of particles by generating plasma in a stable manner. After a substrate is disposed in an evacuated vacuum chamber, a rare gas is initially supplied into the vacuum chamber, a voltage is applied to a plasma generating means, and plasma of the rare gas is generated. Subsequently, a reaction gas is supplied into the vacuum chamber, the reaction gas is brought into contact with the plasma of the rare gas, and plasma of the reaction gas is generated. The plasma of the reaction gas is brought into contact with the substrate; and the substrate is processed. Plasma is stably generated not by turning the reaction gas into plasma but by first turning the rare gas into plasma by the plasma generating means, and generation of particles is subsequently suppressed.
摘要:
A method for manufacturing a piezoelectric element, in which a ferroelectric film is processed in an appropriate shape by plasma etching, is provided. A metal mask made of a metal thin film which is hard to be etched by oxygen gas is placed on an object to be processed formed by laminating a lower electrode layer and a ferroelectric film on a substrate in this order. An etching gas containing a mixture gas of the oxygen gas and a reactive gas including fluorine in a chemical structure is turned into plasma and is brought into contact with the metal mask and the object to be processed. An AC voltage is applied to an electrode disposed beneath the object to be processed so that ions in the plasma are caused to enter the object to be processed to perform anisotropic etching on the ferroelectric film.
摘要:
[Object] To provide a method of manufacturing a dielectric device and an ashing method that are capable of suppressing the occurrence of resist residue.[Solving Means] In the ashing method, a base material having a surface etched by a plasma of chlorine gas or fluorocarbon gas via a resist mask (6) formed of an organic material is disposed in a chamber, bombardment treatment is performed on the resist mask (6) by using oxygen ions in the chamber, and the resist mask is removed by using oxygen radicals in the chamber. According to the ashing method described above, etching reactants adhering to the surface of the resist mask are physically removed by the bombardment treatment using oxygen ions. Thus, it is possible to suppress the occurrence of resist residue due to the etching reactants and efficiently remove the resist mask from the surface of the base material.
摘要:
An object of the present invention is to provide hydrogen-reduced water which contains a relatively large amount of dissolved hydrogen as a reactive substance having a relatively high reaction rate with respect to active oxygen in human body, has a relatively high rate of temperature change, and therefore is able to efficiently remove active oxygen, and also provide a production method and a storage method of the hydrogen-reduced water. To achieve the object, the present invention provides hydrogen-reduced water, having under a predetermined temperature condition a rate of temperature change higher than that of a water not containing hydrogen therein.
摘要:
The present invention relates to a mounting apparatus for leadless electronic parts wherein leadless electronic parts 3 supplied through a cylindrical chute 5 are dropped one by one into a part holding hole 7 of a part feeding pusher 6, with the part holding hole having a cutout, the part feeding pusher 6 transports the leadless electronic part 3 between chucks 10 and 11, and then a main block 8 including the chucks 10 and 11 is pivoted such that the leadless electronic parts 3 are taken out and mounted on a mounting portion of a printed circuit board 1 rapidly and reliably.
摘要:
A lid device for a wide-mouthed container comprises a metallic lid body having an inner margin defining an opening of a predetermined shape, a resinous rim member extending along and anchored to the inner margin of the lid body, and a closure film attached to the rim member to close the opening of the lid body. The lid body is fittable to an open mouth of the container. For opening, the closure film may be peeled off the rim member or torn along the rim member.
摘要:
An enzyme electrode unit having, on the surfaces of the base electrodes thereof, an enzyme-immobilized membrane for oxidizing or reducing a target substance to be measured, and a diffusion-limiting membrane unit of a two-layer structure disposed on the surface of the enzyme-immobilized membrane, only the diffusion-limiting membrane having a lower target substance diffusion limiting effect being replaceable, thus maintaining substantially constant the general target substance diffusion limiting effect of the diffusion-limiting membrane unit, even after the replaceable diffusion-limiting membrane has been replaced.
摘要:
When an open end spinning machine is stopped, a fiber supply to a spinning rotor is first stopped and thereafter, substantially simultaneously with stoppage of both a yarn take-up roller and a yarn winding roller, a yarn end is held by a yarn holding device at a time when it still remains in a region which undergoes the suction effect of a subatmospheric pressure produced in the spinning rotor. The spinning rotor is subsequently stopped. On starting, the holding of the yarn end by the yarn holding device continues even after restarting of the spinning machine until the subatmospheric pressure produced in the spinning rotor reaches substantially the same value as that produced during a normal spinning operation. Therefore, there is prevented any snarling phenomenon, resulting in a greatly increased success rate in the operation of connecting yarn ends on re-starting of the spinning machine.
摘要:
According to this invention, a spinning rotor is increased in speed until it reaches a predetermined higher speed beyond a lower speed region and then decreased in speed until it falls within the lower speed region, in which a yarn ending is effected. Thereafter, the speed of the spinning rotor is increased to a normal spinning speed beyond the predetermined higher speed. During rotation of the spinning rotor at the predetermined higher speed, sufficient subatmospheric pressure is produced in the spinning rotor to stretch out the yarn end thereby to prevent the yarn end from being snarled. Also, during this higher speed rotation of the spinning rotor, sufficient fibers in the spinning rotor can be collected in a maximum diameter portion in the spinning rotor to be connected with the snarl-free yarn end in a favorable condition. The period of time, during which the speed of the spinning rotor is decreased from the predetermined higher speed and falls within the lower speed region, is relatively short being in the order of a few or several seconds. Therefore, it will be understood that there is no fear that both the yarn end and the remaining fibers are restored to their initial state during that period of time.