NOVEL ALDOLASE, AND METHOD FOR PRODUCING OPTICALLY ACTIVE IHOG AND MONATIN
    1.
    发明申请
    NOVEL ALDOLASE, AND METHOD FOR PRODUCING OPTICALLY ACTIVE IHOG AND MONATIN 失效
    新型ALDOLASE和用于生产光学活性的IHOG和MONATIN的方法

    公开(公告)号:US20090258403A1

    公开(公告)日:2009-10-15

    申请号:US11953372

    申请日:2007-12-10

    IPC分类号: C12P17/10

    CPC分类号: C12P17/10 C12N9/88

    摘要: The present invention relates to a method for producing optically active IHOG, which can in turn be used for the production of monatin. The present invention further relates to a method for producing optically active monatin, and aldolase used for these methods. As such, the present invention enables the synthesis of 4-(Indole-3-ylmethyl)-4-hydroxy-2-oxoglutaric acid with high optical purity, which is useful as an intermediate in the synthesis of optically active monatin, from indole pyruvic acid and pyruvic acid (or oxaloacetic acid).

    摘要翻译: 本发明涉及一种用于制备光学活性的IHOG的方法,其可以用于制备莫纳甜。 本发明还涉及用于制备光学活性莫纳甜的方法和用于这些方法的醛缩酶。 因此,本发明能够合成具有高光学纯度的4-(吲哚-3-基甲基)-4-羟基-2-氧代戊二酸,其可用作在光学活性莫纳甜的合成中的吲哚丙酮酸的中间体 酸和丙酮酸(或草酰乙酸)。

    NANOSTRUCTURE FORMING METHOD AND BASE HAVING NANOSTRUCTURE
    10.
    发明申请
    NANOSTRUCTURE FORMING METHOD AND BASE HAVING NANOSTRUCTURE 审中-公开
    具有纳米结构的纳米结构形成方法和基础

    公开(公告)号:US20120308765A1

    公开(公告)日:2012-12-06

    申请号:US13566092

    申请日:2012-08-03

    IPC分类号: B44C1/22 B32B3/00

    摘要: A nanostructure forming method includes: preparing a substrate having an appropriate processing value; applying laser beam having a pulse duration of picosecond order or less to a planar surface oriented in a propagation direction of the laser beam and a direction perpendicular to a polarization direction (electric field direction) of the laser beam in the interior of the substrate at an irradiation intensity which is close to the appropriate processing value of the substrate; forming a structure-modified portion at a focus at which the laser beam is concentrated and in a region which is close to the focus; and forming a nanostructure formed of a nano-hole by selectively etching the structure-modified portion.

    摘要翻译: 纳米结构形成方法包括:制备具有适当处理值的基材; 对于在激光束的传播方向上定向的平面表面和垂直于基板内部的激光束的偏振方向(电场方向)的方向,施加具有皮秒级或更小脉冲持续时间的激光束, 接近基板的适当处理值的照射强度; 在激光束集中的焦点处和在靠近焦点的区域中形成结构改性部分; 以及通过选择性地蚀刻所述结构改性部分,形成由纳米孔形成的纳米结构。