摘要:
To perform digital processing of cyclical waveform signals that include random noise with high accuracy and high reliability without being practically affected by the noise. This is a waveform signal processor into which cyclical waveform signals are input and which outputs corresponding signals. It samples a cyclical waveform signal a plurality of times and then, based upon the obtained sampling values, it performs a Fourier Transform for all the various cycles. Next, the phase angle of a pre-selected frequency component in the Fourier series is determined based upon the Fourier Transform. Then a sampling point at the same phase for all cycles is specified by using the phase angle as a reference. The average of the sampling values at the same phase is calculated and output.
摘要:
In a magnetic recording and reproducing apparatus of a type wherein a magnetic disk having a magnetic recording layer formed on a rigid substrate is rotated at a high speed and magnetic recording and reproduction are conducted by the magnetic head disposed on the surface of the disk, the magnetic recording and reproducing apparatus being characterized in that the magnetic recording layer constitutes an oxide layer, a nitride layer or an oxidized coating film at at least its surface layer, and the magnetic recording and reproducing are conducted by the magnetic head which is caused to be substantially in contact with the surface of magnetic disk at at least the innermost cylinder of the magnetic disk.
摘要:
In a magnetic recording and reproducing apparatus of a type wherein a magnetic disk having a magnetic recording layer formed on a rigid substrate is rotated at a high speed and magnetic recording and reproduction are conducted by the magnetic head disposed on the surface of the disk, the magnetic recording and reproducing apparatus being characterized in that the magnetic recording and reproducing are conducted by the magnetic head which is caused to fly from the magnetic disk at at least an area of the outermost cylinder of the magnetic disk and is caused to be substantially in contact with the surface of magnetic disk at at least an innermost cylinder of the magnetic disk.
摘要:
A magnetic recording and reproducing apparatus of a type wherein a magnetic disk having a magnetic recording layer formed on a rigid substrate is rotatable at a high speed and a magnetic head is disposed on the surface of the disk so that magnetic recording and reproduction are conducted by the head while rotating the disk at a high speed, wherein the surface roughness R.sub.max of the magnetic disk is adjusted at a level of at most 100 .ANG., and the flying height of the magnetic head at the initiation of flying is adjusted at a level within a range of from 0.01 to 0.04 .mu.m.
摘要:
A thin film magnetic head includes a slider and thin film magnetic transducers, the slider supporting the thin film magnetic transducers. At least one of these thin film magnetic transducers is a magnetoresistive read element. The surface resistivity .rho. of the magnetic film of the magnetic disk is within the range of .rho..gtoreq.0.03.OMEGA..multidot.cm. Electric leak from the thin film magnetic head to the magnetic disk and electric discharge between these two are prevented.
摘要:
A magnetic head comprises a slider which holds recording/writing elements at its medium opposing surface constituting a lifting force generating part and the surface area of the medium opposing surface is at most 2 mm.sup.2.A magnetic recording and reproducing apparatus has such magnetic head which is disposed on a magnetic disk having a magnetic recording layer formed on a rigid substrate while the disk is rotated at a high speed so that magnetic recording and reproducing are conducted between the magnetic head and the magnetic disk, wherein the surface roughness R.sub.max of the magnetic disk is at most 100 .ANG..
摘要:
A method and apparatus for testing an integrated magnetic head assembly for normal operation. The head assembly includes an inductive write element and a MR read element. The method includes a step of applying an external alternating magnetic field to a plurality of magnetic head assemblies which are aligned on a head block and are not yet individually separated from the head block, in a direction perpendicular to an ABS of the head block, and also applying high frequency current to the inductive write element so that alternating leakage magnetic field from the inductive write element is applied to the MR read element, and a step of measuring varying resistance characteristics of the MR read element with respect to the variation of the external alternating magnetic field and to the variation of the alternating leakage magnetic field.
摘要:
Disclosed is a substrate processing apparatus, including: a processing chamber for processing a substrate; a substrate rotating mechanism for rotating the substrate; a gas supply unit for supplying gas to the substrate, at least two kinds of gases A and B being alternately supplied a plurality of times to form a desired film on the substrate; and a controller for controlling a rotation period of the substrate or a gas supply period defined as a time period between an instant when the gas A is made to flow and an instant when the gas A is made to flow next time such that the rotation period and the gas supply period are not brought into synchronization with each other at least while the alternate gas supply is carried out predetermined times.
摘要:
A TiN film is formed by a first step of forming a TiN intermediate film on a wafer by supplying TiCl4 and NH3 reacting with TiCl4 to the wafer and controlling a processing condition for causing a bonding branch that has not undergone a substitution reaction to remain at a predetermined concentration at a part of TiCl4 and a second step of substituting the bonding branch contained in the TiN intermediate film by supplying H2 to the wafer, the first step and the second step being performed in this order.
摘要:
A substrate processing apparatus cleaning method that includes: containing a cleaning gas in a reaction tube without generating a gas flow of the cleaning gas in the reaction tube by supplying the cleaning gas into the reaction tube and by completely stopping exhaustion of the cleaning gas from the reaction tube or by exhausting the cleaning gas at an exhausting rate which substantially does not affect uniform diffusion of the cleaning gas in the reaction tube from at a point of time of a period from a predetermined point of time before the cleaning gas is supplied into the reaction tube to a point of time when several seconds are elapsed after starting of supply of the cleaning gas into the reaction tube; and thereafter exhausting the cleaning gas from the reaction tube.