摘要:
A check is fed to a storage mechanism through a check carrier path. The storage mechanism carries the check to a check carrier unit by an operation of a gate mechanism. The check carrier unit carries the check as far as a storage box with carrier rollers. The check is discharged from the check carrier unit and stored in the storage box. The storage box is provided outside a safe. The storage box is detachably provided and has a cylinder lock provided on the door thereof.
摘要:
A medium issuing apparatus using at least a paper roll medium and an automatic teller machine including the apparatus are disclosed, in which the operation of changing the width of the paper rolls for issuing a medium, the maximum diameter of the paper rolls, the printing surface and the tandem arrangement or juxtaposition of the paper rolls is performed with a single apparatus. The medium issuing apparatus is so configured that the paper rolls are held on a replaceable holding frame, the roll paper from the desired paper roll is transported and printed in a common printing mechanism. The printed roll paper is cut off and a predetermined number of cut pieces are stored and bundled in a temporary storage section. The roll paper cut off and bundled are transported to a common ejection opening by a transport mechanism, and ejected from the same common ejection opening by another transport mechanism. The outer diameter, width and winding direction of the paper rolls can be changed by the holding frame.
摘要:
A method of manufacturing an SOI wafer includes a bonding step, a thinning and a bonding annealing step. Assuming refractive index n1 of SiO2 as 1.5, refractive index n2 of Si as 3.5, and optical thickness tOP of the silicon oxide film 2 and the SOI layer 15 in the infrared wavelength region as tOP=n1×t1+n2×t2, the thickness t1 of the silicon oxide film 2 and thickness t2 of the SOI layer so as to satisfy a relation of 0.1λ
摘要翻译:一种制造SOI晶片的方法包括接合步骤,薄化和接合退火步骤。 假设SiO 2的折射率n 1为1.5,Si的折射率n 2为3.5,氧化硅膜2和SOI层15的光学厚度t OP 在红外波长区域中,作为t OP = N 1×t 1 + n 2×t 2,氧化硅膜2的厚度t 1和SOI层的厚度t 2满足关系 并且使得(t 1×n 1)/(t 2×n 2)落在0.2-3范围内。通过在键合退火之前进行的核激光退火 在接合退火之后将基底晶片中的氧沉淀形成密度调节到小于1×10 9 / cm 3以上。 该结构成功地提供了制造具有薄氧化硅膜和SOI层的SOI晶片的方法,并且不太可能引起翘曲。
摘要:
A manufacturing method for semiconductor devices that can improve uniformity in the surface of a silicon nitride film or a nitride film to be formed and improve production efficiency is provided. A step of forming a first film that is a silicon oxide film or a silicon oxynitride film on a silicon substrate, a step of forming a second film that is a tetrachlorosilane monomolecular layer, and a step of forming a third film that is a silicon nitride monomolecular layer by performing a nitriding process on the second film are included. A silicon nitride film having a predetermined film thickness is formed by repeating the step of forming the second film and the step of forming the third film for a predetermined number of times. In a manufacturing apparatus, a plurality of silicon substrates are arranged on a stair-like wafer boat, and a process gas is supplied toward the upper side of a reaction tube from a process gas supply pipe.
摘要:
A pump body 10 of a drainage pump 1A comprises a pump chamber 12, inlet 15, and outlet 17. A rotary vane 300 mounted in the pump body 10 is coupled to a motor mounted above the pump body 10, and comprises a shaft 310 and four large-radial blades 320. Formed below the large-radial blades 320 are small-radial blades 350 to make a liquid at the inlet rise. Lower edges of the large-radial blades 320 are connected together by a disk 350 having an opening at the center and interceptively dividing the surface of the liquid rising from the inlet. Thus the amount of the liquid in contact with the large-radial blades 320 above the disk 350 decreases, and the load to the rotary vane decreases. At the same time, bubbles, noise and vibrations caused by bubbles also decrease. By surrounding the outer circumference of the large-radial blades 320 with a ring member, return water W5 moving back from the outlet 17 when the pump stops is damped by the wall member 360 and returns smoothly to the inlet 15.
摘要:
A lower back supporter including a pair of flat anchor parts that come into contact with the lower back of a wearer with a specified space in between, a pair of anchor belts that wrap around the abdomen with the end portions connected to each other, a first and second support belt that cross over each other on the back, and a connecting belt that connects the anchor parts. The inner side surface of the anchor part comprising a non-slip material that closely contacts the skin of the wearer, and the outer side surface comprising a material that fastens to surface fasteners. After the anchor belts are put on, operation belts connected to the first and second support belts are pulled, the surface fasteners are fastened to the outer side surfaces of the anchor parts, applying tensile force between the anchor parts in closely contact to the lower back.
摘要:
Oppositely of a temperature measuring surface of an object-to-be-measured 16, a reflecting member 28 is disposed while being spaced by a reflection gap 35 from the temperature measuring surface. The reflecting member 28 is composed of a heat ray reflecting material capable of reflecting heat ray in a specific wavelength band, in a portion including a reflection surface 35a. A heat ray extraction pathway section 30 is disposed through the reflecting member 28 so that one end thereof faces the temperature measuring surface. Heat ray extracted through the heat ray extraction pathway section from the reflection gap is detected by a temperature detection section 34. The heat ray reflecting material is configured in a form of a stack comprising a plurality of element reflecting layers composed of a material having transparent properties to the heat ray, in which every adjacent two element reflecting layers are composed of a combination of materials having refractive indices which differ from each other by 1.1 or more. This makes the measurement be hardly affected by radiation ratio of the object-to-be-measured when temperature of the object-to-be-measured is measured by a radiation thermometer, enables to measure its temperature more correctly irrespective of the surface state thereof, and can simplify configuration of a measurement system.
摘要:
A method of forming an insulating film containing silicon oxy-nitride includes a loading step, temperature raising step, oxidation step, cycle purge step, and annealing step, in this order. The temperature raising step is performed while supplying nitrogen gas and oxygen gas for preventing a silicon layer surface from being nitrided, at a supply ratio 100:1 to 1000:1. The oxidation step is performed at a temperature of 700 to 950° C. while supplying a gas that contains 1 to 5 vol % of water vapor and 95 to 99 vol % of nitrogen gas, to form a silicon oxide film. The annealing step is performed at a temperature of 800 to 950° C. while supplying a gas that contains 10 to 100 vol % of nitrogen monoxide gas, to convert a portion of the silicon oxide film into silicon oxy-nitride.
摘要:
A control valve for a variable capacity compressor, which comprises a solenoid magnetization portion disposed at a central portion, a main body disposed on one side of the solenoid magnetization portion, and a pressure sensitive portion disposed on the other side of the solenoid magnetization portion. The main body comprises a discharge coolant port communicating with a discharge pressure region of the variable capacity compressor, a first intermediate coolant port communicating with a first intermediate pressure region, a suction coolant port communicating with a suction pressure region, and a second intermediate coolant port communicating with a second intermediate pressure region of the variable capacity compressor.
摘要:
A drainage pump 1 comprises a pump housing 40 defining a suction inlet 42, a pumping chamber 44 and a delivery outlet 46, and a cover 32. An impeller 50 accommodated in the pump housing is driven by a motor 10. The impeller 50 comprises a shaft 52 coupled to an output shaft of the motor 10, large-radius vanes 60 in form of flat plates radially extending from the shaft 52, and small-radius vanes 54 continuous from the large-radius vanes 60. Outer circumferential edges of the large-radius vanes 60 are connected by a cylindrical wall member 64, and outer circumferential parts of lower edges of the large-radius vanes 60 are connected by an annular member 62. The cylindrical wall member 64 has a rounded portion 70 at its upper end, and the small-radius vanes 54 also have rounded portions 57 at their lower ends.