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公开(公告)号：US20060022694A1
公开(公告)日：2006-02-02
申请号：US10901936
申请日：2004-07-29
IPC分类号： G01R31/26
CPC分类号： H01J37/185 , G01R31/2886 , H01J2237/204
摘要： A method and system for testing one or more large substrates are provided. In one or more embodiments, the system includes a testing chamber having a substrate table disposed therein. The substrate table is adapted to move a substrate within the testing chamber in various directions. More particularly, the substrate table includes a first stage movable in a first direction, and a second stage movable in a second direction, wherein each of the stages moves in an X-direction, Y-direction or both X and Y directions. The system further includes a load lock chamber at least partially disposed below the testing chamber, and a transfer chamber coupled to the load lock chamber and the testing chamber. In one or more embodiments, the transfer chamber includes a robot disposed therein which is adapted to transfer substrates between the load lock chamber and the testing chamber.
摘要翻译： 提供了用于测试一个或多个大基板的方法和系统。 在一个或多个实施例中，系统包括具有设置在其中的衬底台的测试室。 衬底台适于在各个方向上移动测试室内的衬底。 更具体地，衬底台包括可在第一方向上移动的第一阶段和沿第二方向移动的第二阶段，其中每个阶段沿X方向，Y方向或X方向和Y方向两者移动。 该系统还包括至少部分地设置在测试室下方的负载锁定室和耦合到负载锁定室和测试室的传送室。 在一个或多个实施例中，传送室包括设置在其中的机器人，其适于在载荷锁定室和测试室之间传送基板。
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公开(公告)号：US20070086881A1
公开(公告)日：2007-04-19
申请号：US11613556
申请日：2006-12-20
IPC分类号： H01L21/677 , H01L21/306 , C23C16/00 , B65H1/00
CPC分类号： H01L21/68742 , B65G49/068 , B65G2249/02 , B65G2249/04 , C23C14/566 , C23C14/568 , C23C16/54 , H01L21/67103 , H01L21/67109 , H01L21/67167 , H01L21/67201 , H01L21/67739 , H01L21/67745 , H01L21/67748
摘要： One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as well as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.
摘要翻译： 一个实施例涉及一种其中具有第一支撑结构的负载锁，用于支撑一个未处理的基板和其中的第二支撑结构以支撑一个处理的基板。 第一支撑结构位于第二支撑结构的上方。 负载锁包括用于控制支撑结构的垂直位置的电梯。 负载锁还包括第一孔，以允许将未处理的衬底插入到装载锁中并从加载锁中移除经处理的衬底，以及第二孔，以允许将未处理的衬底从负载锁上移除并将经处理的衬底插入 负载锁。 一个冷却板也位于负载锁中。 冷却板包括适于在其上支撑经处理的基板的表面。 加热装置可以位于第一支撑结构上方的装载锁中。
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公开(公告)号：US20060051507A1
公开(公告)日：2006-03-09
申请号：US11145003
申请日：2005-06-02
IPC分类号： C23C16/00
CPC分类号： H01L21/67236 , H01L21/67196
摘要： In a first aspect, a first multi-piece chamber is provided. The first multi-piece chamber includes (1) a central piece having a first side and a second side; (2) a first side piece adapted to couple with the first side of the central piece; and (3) a second side piece adapted to couple with the second side of the central piece. The central piece, the first side piece and the second side piece form a substantially cylindrical inner chamber region when coupled together. Numerous other aspects are provided.
摘要翻译： 在第一方面，提供了第一多件式室。 第一多件式室包括（1）具有第一侧和第二侧的中心件; （2）适于与所述中心件的第一侧联接的第一侧件; 和（3）适于与所述中心件的第二侧联接的第二侧件。 当连接在一起时，中心件，第一侧件和第二侧件形成基本上圆柱形的内室区域。 提供了许多其他方面。
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公开(公告)号：US20050095088A1
公开(公告)日：2005-05-05
申请号：US10832795
申请日：2004-04-26
CPC分类号： H01L21/67201 , B65G49/064 , B65G49/067 , B65G49/068 , B65G2249/02 , H01L21/67236 , Y10S414/136 , Y10S414/137 , Y10S414/139
摘要： A load lock chamber and method for transferring large area substrates is provided. In one embodiment, a load lock chamber suitable for transferring large area substrates includes a plurality of vertically stacked single substrate transfer chambers. The configuration of vertically stacked single substrate transfer chambers contributes to reduced size and greater throughput as compared to conventional state of the art, dual slot dual substrate designs. Moreover, the increased throughput has been realized at reduced pumping and venting rates, which corresponds to reduced probability of substrate contamination due to particulates and condensation.
摘要翻译： 提供了一种负载锁定室和用于传送大面积基板的方法。 在一个实施例中，适于传送大面积衬底的负载锁定室包括多个垂直堆叠的单个衬底传送室。 垂直堆叠的单个基板传送室的配置与现有技术的双槽双面基板设计相比，有助于减小尺寸和更大的通量。 此外，在减少的泵送和排气速率下已经实现了增加的产量，这对应于由于颗粒和冷凝引起的底物污染的可能性降低。
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公开(公告)号：US20050063800A1
公开(公告)日：2005-03-24
申请号：US10990094
申请日：2004-11-16
IPC分类号： B65G49/07 , H01L21/205 , H01L21/68 , H01L21/687 , H05K1/14 , B65G1/00
CPC分类号： H01L21/68 , H01L21/68728 , H01L21/68778 , H01L21/68792 , Y10S414/136 , Y10S414/139 , Y10S414/141
摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.
摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。
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公开(公告)号：US20060182615A1
公开(公告)日：2006-08-17
申请号：US11278318
申请日：2006-03-31
申请人： Shinichi Kurita , Wendell Blonigan
发明人： Shinichi Kurita , Wendell Blonigan
IPC分类号： B65H1/00
CPC分类号： H01L21/67201 , H01L21/67196 , H01L21/67748
摘要： Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about the periphery of the transfer chamber. The load lock chamber comprises double dual slot load locks constructed at same location. Such system may be used for processing substrates for semiconductor manufacturing.
摘要翻译： 本文提供了一种基板处理系统，其包括盒装载台; 负载锁定室; 位于中心的传送室; 以及位于传送室的周边周围的一个或多个处理室。 负载锁定室包括在相同位置构造的双重双槽加载锁。 这种系统可用于处理用于半导体制造的衬底。
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公开(公告)号：US20080044259A1
公开(公告)日：2008-02-21
申请号：US11926720
申请日：2007-10-29
申请人： Shinichi Kurita , Wendell Blonigan
发明人： Shinichi Kurita , Wendell Blonigan
IPC分类号： H01L21/67
CPC分类号： H01L21/67201 , H01L21/67196 , H01L21/67748
摘要： Provided herein is a double dual slot load lock chamber. The double dual slot load lock chamber includes two isolated load lock regions that are vertically stacked and share a common wall, wherein each isolated load lock region comprises two substrate slots.
摘要翻译： 这里提供双重双槽加载锁定室。 双双插槽加载锁定室包括垂直堆叠并共享公共壁的两个隔离的负载锁定区域，其中每个隔离的负载锁定区域包括两个基板槽。
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公开(公告)号：US20060249701A1
公开(公告)日：2006-11-09
申请号：US11480615
申请日：2006-07-03
申请人： Shinichi Kurita , Ke Lee , Wendell Blonigan
发明人： Shinichi Kurita , Ke Lee , Wendell Blonigan
IPC分类号： F16K25/00
CPC分类号： H01L21/67126 , F16K3/188 , F16K51/02
摘要： In one embodiment, a slit valve is provided that is adapted to seal an opening and that includes a valve housing having a first wall, a first opening formed in the first wall, a second wall and a second opening formed in the second wall. The slit valve also includes a closure member having a sealing portion adapted to contact the second wall and seal the second opening, and a bracing member moveable relative to the sealing portion and adapted to contact the first wall. The slit valve further includes at least one actuating mechanism adapted to (1) move the sealing portion toward the second wall and into contact with the second wall; and (2) move the bracing member away from the sealing portion and into contact with the first wall so as to brace the sealing portion against the second wall. Numerous other aspects are provided.
摘要翻译： 在一个实施例中，提供了狭缝阀，其适于密封开口并且包括具有第一壁，形成在第一壁中的第一开口，形成在第二壁中的第二壁和第二开口的阀壳体。 狭缝阀还包括封闭构件，其具有适于接触第二壁并密封第二开口的密封部分，以及可相对于密封部分移动并适于接触第一壁的支撑构件。 狭缝阀还包括至少一个致动机构，其适于（1）将密封部分朝向第二壁移动并与第二壁接触; 和（2）将支撑构件移动离开密封部分并与第一壁接触，以将密封部分支撑在第二壁上。 提供了许多其他方面。
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公开(公告)号：US20060201074A1
公开(公告)日：2006-09-14
申请号：US11366831
申请日：2006-03-01
IPC分类号： E04H6/00
CPC分类号： H01L21/67236 , H01L21/67196
摘要： In a first aspect, a first multi-piece chamber is provided. The first multi-piece chamber includes (1) a central piece having a first side and a second side; (2) a first side piece adapted to couple with the first side of the central piece; and (3) a second side piece adapted to couple with the second side of the central piece. The central piece, the first side piece and the second side piece form a substantially cylindrical inner chamber region when coupled together. The pieces may each include openings in the top of the pieces and flat mounting surfaces for coupling the pieces together. Numerous other aspects are provided.
摘要翻译： 在第一方面，提供了第一多件式室。 第一多件式室包括（1）具有第一侧和第二侧的中心件; （2）适于与所述中心件的第一侧联接的第一侧件; 和（3）适于与所述中心件的第二侧联接的第二侧件。 当连接在一起时，中心件，第一侧件和第二侧件形成基本上圆柱形的内室区域。 这些片可以各自包括在片的顶部的开口和用于将片连接在一起的平坦安装表面。 提供了许多其他方面。
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公开(公告)号：US20060157340A1
公开(公告)日：2006-07-20
申请号：US11386257
申请日：2006-03-21
申请人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Wendell Blonigan
发明人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Wendell Blonigan
IPC分类号： C23C14/00
CPC分类号： H01L21/67196 , C23C14/566 , C23C16/54 , H01L21/67126 , H01L21/67739 , H01L21/67748 , Y10S414/135
摘要： A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.
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