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1.发明申请Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light 审中-公开投影曝光系统，光束投射系统和光束生成方法公开(公告)号：US20120013878A1
公开(公告)日：2012-01-19
申请号：US13173207
申请日：2011-06-30
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm
摘要翻译： 投影曝光系统的光束传送系统包括激光器，其从空腔中的多个纵向激光模式产生激光束，其中由单个纵向激光模式产生的光具有平均线宽度λlat，其中激光 所述光束在所述光束的各个横向位置处具有对应于横向激光模式的第二线宽度λl1，并且其中当所述光束的整个横截面上的平均时，所述光束的激光具有对应于 多个横向激光模式，并且其中λm<λlat<λb，并且其中设置在所述光束中的光学延迟装置提供光程差Dgr; l，其中0.8·λ0 2（2·＆Dgr;λλ） ; 其中λ0是第一激光束的光的平均波长，＆Dgr;λlat表示第二行宽。
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2.发明授权Projection exposure system, beam delivery system and method of generating a beam of light 有权投影曝光系统，光束传输系统和产生光束的方法公开(公告)号：US07995280B2
公开(公告)日：2011-08-09
申请号：US11792099
申请日：2005-12-01
IPC分类号： G02B27/14
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm
摘要翻译： 投影曝光系统的光束传送系统包括激光器，其从空腔中的多个纵向激光模式产生激光束，其中由单个纵向激光模式产生的光具有平均线宽度λlat，其中激光 所述光束在所述光束的各个横向位置处具有对应于横向激光模式的第二线宽度λl1，并且其中当所述光束的整个横截面上的平均时，所述光束的激光具有对应于 多个横向激光模式，并且其中λm<λlat<λb，并且其中设置在所述光束中的光学延迟装置提供光程差Dgr; l，其中0.8·λ0 2（2·＆Dgr;λl）<＆Dgr ; 其中λ0是第一激光束的光的平均波长，＆Dgr;λlat表示第二行宽。
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3.发明申请公开(公告)号：US20080225921A1
公开(公告)日：2008-09-18
申请号：US11792099
申请日：2005-12-01
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm
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4.发明授权公开(公告)号：US08004656B2
公开(公告)日：2011-08-23
申请号：US11505408
申请日：2006-08-17
申请人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
发明人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。
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5.发明授权公开(公告)号：US08730455B2
公开(公告)日：2014-05-20
申请号：US13181033
申请日：2011-07-12
申请人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
发明人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。
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6.发明申请公开(公告)号：US20070206171A1
公开(公告)日：2007-09-06
申请号：US11505408
申请日：2006-08-17
申请人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
发明人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
IPC分类号： G03B27/54
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。
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7.发明授权Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus 有权用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置公开(公告)号：US08339577B2
公开(公告)日：2012-12-25
申请号：US12506364
申请日：2009-07-21
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.
摘要翻译： 微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。 每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。 测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。 检测仪器在光束偏离元件偏离后记录测量光束。 评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。
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公开(公告)号：US07798676B2
公开(公告)日：2010-09-21
申请号：US11722631
申请日：2005-08-25
申请人： Manfred Maul , Damian Fiolka
发明人： Manfred Maul , Damian Fiolka
CPC分类号： G02B26/008 , G01J1/0488 , G02B27/0933 , G02B27/0994 , G03F7/70091 , G03F7/70191
摘要： The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device, including at least one filter element which can be introduced into the beam path of the bundle of illuminating rays, with the filter element including an actuating device, so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.
摘要翻译： 本发明涉及一种用于照明系统的过滤装置，特别是用于校正包括光源的照明光瞳的照明，照明系统通过一束照明光线从光源穿过到物平面 具有撞击在过滤装置上的一束照明光线，包括至少一个能够被引入照明光束的光束路径中的过滤元件，过滤元件包括致动装置，使得过滤元件可以是 在致动装置的帮助下带入照明光束。
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公开(公告)号：US20100002217A1
公开(公告)日：2010-01-07
申请号：US12496762
申请日：2009-07-02
申请人： Damian Fiolka , Manfred Maul , Markus Schwab , Wolfgang Seitz , Olaf Dittmann
发明人： Damian Fiolka , Manfred Maul , Markus Schwab , Wolfgang Seitz , Olaf Dittmann
CPC分类号： G03F7/70191 , G02B3/0056 , G02B5/1876 , G02B27/283 , G02B27/285 , G02B27/286 , G03F7/70566
摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.
摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括去极化器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地导致撞击在去极化器上的偏振光的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去极化器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列的下游的光瞳面中发生的残留极化分布产生的贡献具有最大的偏振度 不超过5％。
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公开(公告)号：US07593095B2
公开(公告)日：2009-09-22
申请号：US10590537
申请日：2005-02-22
申请人： Damian Fiolka , Manfred Maul , Nils Dieckmann
发明人： Damian Fiolka , Manfred Maul , Nils Dieckmann
CPC分类号： G03F7/70583 , G03F7/70058
摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then Passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.
摘要翻译： 本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射 。 第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。 然后将两个部分光束共同地通向照明平面。 除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。 在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。 谐振器主体设置有具有不同局部相位分布的相位板。
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