SEMICONDUCTOR DEVICE
    2.
    发明申请

    公开(公告)号:US20190074246A1

    公开(公告)日:2019-03-07

    申请号:US16177891

    申请日:2018-11-01

    Abstract: A semiconductor device includes a substrate, and interposer layers. The substrate has a first region, and a second region adjacent the first region. The interposer layers are sequentially stacked on the substrate. Each of the interposer layers has an active region and an open region, are respectively correspond to the first region and the second region of the substrate. Each of the interposer layers includes a device layout pattern, and a stress release structure. The device layout pattern is formed within the active region. The stress release structure is formed within the open region, and includes openings.

    Semiconductor device
    6.
    发明授权

    公开(公告)号:US10121734B2

    公开(公告)日:2018-11-06

    申请号:US15001255

    申请日:2016-01-20

    Abstract: A semiconductor device includes a substrate, and interposer layers. The substrate has a first region, and a second region adjacent the first region. The interposer layers are sequentially stacked on the substrate. Each of the interposer layers has an active region and an open region, which respectively correspond to the first region and the second region of the substrate. Each of the interposer layers includes a device layout pattern, and a stress release structure. The device layout pattern is formed within the active region. The stress release structure is formed within the open region, and includes openings.

    Method for fabricating semiconductor package

    公开(公告)号:US09748106B2

    公开(公告)日:2017-08-29

    申请号:US15002405

    申请日:2016-01-21

    CPC classification number: H01L21/304 H01L21/76898 H01L21/78

    Abstract: A method for fabricating a semiconductor package, the method includes forming at least one conductive via having a first end and a second end opposite the first end in a wafer, in which the wafer has a first surface and a second surface opposite the first surface, and the first end of the at least one conductive via is exposed of the first surface of the wafer; grinding the second surface of the wafer to form an inner portion and a ring portion surrounding the inner portion of the wafer, wherein the inner portion has a thinner thickness than that of the ring portion; and etching the inner portion to expose the second end of the at least one conductive via.

    METHOD FOR FABRICATING SEMICONDUCTOR PACKAGE

    公开(公告)号:US20170213740A1

    公开(公告)日:2017-07-27

    申请号:US15002405

    申请日:2016-01-21

    CPC classification number: H01L21/304 H01L21/76898 H01L21/78

    Abstract: A method for fabricating a semiconductor package, the method includes forming at least one conductive via having a first end and a second end opposite the first end in a wafer, in which the wafer has a first surface and a second surface opposite the first surface, and the first end of the conductive via is exposed of the first surface of the wafer; grinding the second surface of the wafer to form an inner portion and a ring portion surrounding the inner portion of the wafer, wherein the inner portion has a thinner thickness than that of the ring portion; and etching the inner portion to expose the second end of the conductive via.

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