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148 条记录 (耗时 0.046 秒)

    Method for manufacturing color filter
    6.
    发明授权
    Method for manufacturing color filter 有权
    彩色滤光片制造方法

    公开(公告)号：US07858274B2

    公开(公告)日：2010-12-28

    申请号：US11800489

    申请日：2007-05-04

    申请人： Hironori Kobayashi

    发明人： Hironori Kobayashi

    IPC分类号： G02B5/20 ,  G02F1/1335

    CPC分类号： B82Y30/00 ,  G02F1/133516

    摘要： In the present invention, a provision of a method for manufacturing a color filter capable of forming a highly sophisticated pattern, to be formed easily at a low cost is desired. The present invention achieves the above mentioned object by providing a method for manufacturing a color filter comprising: (1) forming a light shielding part on a transparent base material; (2) forming a wettability changeable layer which the wettability changes by the function of a photocatalyst, on the surface of the transparent base material on the side with the light shielding part formed; (3) placing the photocatalyst containing layer of the photocatalyst containing layer side substrate which is the photocatalyst containing layer containing a photocatalyst formed on the base member, and the wettability changeable layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part forming part comprising a lyophilic area where the contact angle to a liquid is lowered compared with the state before the energy irradiation to the wettability changeable layer, in a pattern; and (4) coloring the pixel part forming part by the ink jet method so as to form a pixel part.

    摘要翻译： 在本发明中，期望提供一种能够以低成本容易地形成能够形成高度复杂图案的滤色器的方法。 本发明通过提供一种制造滤色器的方法来实现上述目的，包括：（1）在透明基材上形成遮光部分; （2）在形成有遮光部的一侧的透明基材的表面上形成润湿性由光催化剂的功能而变化的润湿性变化层; （3）将含有形成在基材上的含有光催化剂的光催化剂含有层的光催化剂含有层侧基材的含光催化剂层和间隙为200μm以下的润湿性变化层进行放置， 形成像素部分形成部分，其形成部分包括亲液性区域，其中液体的接触角与向可润湿性变化层的能量照射之前的状态相比降低; 和（4）通过喷墨法着色像素部分形成部分以形成像素部分。

    Method of producing pattern-formed structure and photomask used in the same
    7.
    发明授权
    Method of producing pattern-formed structure and photomask used in the same 有权
    产生图案形成结构的方法和使用的光掩模

    公开(公告)号：US07846647B2

    公开(公告)日：2010-12-07

    申请号：US10922217

    申请日：2004-08-18

    申请人： Hironori Kobayashi

    发明人： Hironori Kobayashi

    IPC分类号： G03F7/26 ,  G03F7/20

    CPC分类号： B82Y30/00 ,  G03F7/0007 ,  G03F7/001 ,  G03F7/11 ,  G03F7/2014 ,  Y10S430/148

    摘要： The present invention discloses a method of producing a pattern-formed structure, comprising the processes of: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof can be modified by the action of photocatalyst; preparing a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing photocatalyst; arranging the substrate for a pattern-formed structure and the photocatalyst-containing-layer side substrate such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a clearance of no larger than 200 μm therebetween; and irradiating energy to the characteristic-modifiable layer from a predetermined direction, and modifying characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer. According to this method, a highly precise pattern can be formed without necessity to carry out any post-treatment after exposure. Further, there is no concern that the pattern-formed structure itself deteriorates because the produced pattern-formed structure is free of the photocatalyst.

    摘要翻译： 本发明公开了一种图案形成结构的制造方法，其特征在于，包括以下工序：制备具有特征可修改层的图案形成结构的基板，其表面的特性可以通过光催化剂的作用进行改性; 制备含有形成在基材上的含光催化剂层的含光催化剂的层侧基材，含有光催化剂的层含有光催化剂; 将图案形成结构的基板和含有光催化剂的层侧基板排列成使得特征可修改层面对含有光催化剂的层，间隙不大于200μm; 以及从预定方向向特征可修改层照射能量，并修改特征可修饰层的表面的特性，从而在特征可修饰层形成图案。 根据该方法，可以形成高精度图案，而不需要在曝光后进行任何后处理。 此外，由于所生成的图案形成结构体不含光催化剂，因此不会担心图案形成结构本身会劣化。

    Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light
    8.
    发明授权
    Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light 失效
    图案成型体的制造方法，真空紫外线光掩模

    公开(公告)号：US07781127B2

    公开(公告)日：2010-08-24

    申请号：US11523813

    申请日：2006-09-15

    申请人： Takashi Sawada ,  Masafumi Kamada ,  Kaori Yamashita ,  Hironori Kobayashi

    发明人： Takashi Sawada ,  Masafumi Kamada ,  Kaori Yamashita ,  Hironori Kobayashi

    IPC分类号： G03F1/00

    CPC分类号： G03F7/2014 ,  G03F1/50 ,  G03F7/7035

    摘要： A main object of the present invention is to provide a manufacturing method of a pattern formed body which makes it possible to form property varied patterns having a desired line width, even when plural pattern formed bodies are manufactured. To achieve the object, the invention provides a manufacturing method of pattern formed bodies, comprising: a pattern-forming step of radiating vacuum-ultraviolet light onto a patterning substrate, a surface property of which is varied by the vacuum-ultraviolet light, through a photomask having at least a transparent substrate and a light shielding part to form a pattern formed body having a property varied pattern, in which the surface property of the patterning substrate is varied; and a step of repeating the pattern-forming step to manufacture a plurality of the pattern formed bodies, wherein an interval between the transparent substrate and the patterning substrate upon the pattern-forming step is set into the range of 0.1 μm to 200 μm.

    摘要翻译： 本发明的主要目的是提供一种图案形成体的制造方法，即使制造多个图案形成体也能够形成具有期望的线宽的特性变化的图案。 为了实现该目的，本发明提供了一种图案形成体的制造方法，其特征在于，包括：图案形成步骤，通过真空紫外线照射真空紫外光，使其表面特性由真空紫外线变化 至少具有透明基板和遮光部的光掩模，形成具有不同图案的图案形成体，其中，图案形成基板的表面特性变化; 以及重复图案形成步骤以制造多个图案形成体的步骤，其中在图案形成步骤中，透明基板和图案形成基板之间的间隔被设定在0.1μm至200μm的范围内。

    Method of manufacturing for conductive pattern substrate
    9.
    发明授权
    Method of manufacturing for conductive pattern substrate 失效
    导电图案基板的制造方法

    公开(公告)号：US07569334B2

    公开(公告)日：2009-08-04

    申请号：US10417516

    申请日：2003-04-17

    申请人： Hironori Kobayashi ,  Yudai Yamashita

    发明人： Hironori Kobayashi ,  Yudai Yamashita

    IPC分类号： G03F7/16 ,  G03F7/20

    CPC分类号： H05K3/1208 ,  G03F7/0007 ,  G03F7/0757 ,  G03F7/09 ,  G03F7/26 ,  H05K2203/107 ,  H05K2203/1173

    摘要： In the present invention, the problem of stability deterioration of the obtained conductive pattern substrate at the time of forming a conductive pattern by an additive method when a layer having reactivity remains on the substrate is to be solved. According to pattern exposure with a photo catalyst substrate 4 having a photo catalyst layer 3 laminated on a second substrate 5 superimposed onto a wettability changeable substrate 1 with a wettability changeable layer 3 laminated on a first substrate 2, a wettability pattern is formed. And furthermore, by adhering a conductive coating solution, or the like, a conductive pattern substrate without containing a photo catalyst can be manufactured.

    摘要翻译： 在本发明中，解决了当具有反应性的层保留在基板上时通过添加法形成导电图案时所得到的导电图案基板的稳定性劣化的问题。 根据图案曝光，具有层叠在第二基板5上的光催化剂层3的光催化剂基板4，第二基板5叠加在层叠在第一基板2上的可润湿性变化层3的润湿性可变基板1上，形成润湿性图案。 此外，通过粘附导电性涂布液等，可以制造不含光催化剂的导电图案基板。