公开(公告)号：US07232763B2

公开(公告)日：2007-06-19

申请号：US10959501

申请日：2004-10-07

申请人： Mitsuhiro Omura ,  Makiko Katano ,  Shoko Ito ,  Takaya Matsushita ,  Hisashi Kaneko

发明人： Mitsuhiro Omura ,  Makiko Katano ,  Shoko Ito ,  Takaya Matsushita ,  Hisashi Kaneko

IPC分类号： H01L21/311

CPC分类号： H01L21/76838 ,  H01L21/02046 ,  H01L21/31116

摘要： A method of manufacturing a semiconductor device includes subjecting a semiconductor wafer, which includes a copper layer formed above a semiconductor substrate and covered with an insulating film, to a dry etching using a fluorocarbon gas to partially remove the insulating film, thereby at least partially exposing a surface of the copper layer. The copper layer, the surface of which is at least partially exposed is subjected to a nitrogen plasma treatment. The semiconductor wafer having the nitrogen plasma-treated copper layer is exposed to atmosphere, and then the semiconductor wafer is subjected to a surface treatment.

摘要翻译： 一种制造半导体器件的方法包括使用碳氟化合物气体对包含形成在半导体衬底之上并被绝缘膜形成的铜层的半导体晶片进行干蚀刻，以部分地去除绝缘膜，从而至少部分曝光 铜层的表面。 将其表面至少部分暴露的铜层进行氮等离子体处理。 将具有氮等离子体处理的铜层的半导体晶片暴露于大气中，然后对半导体晶片进行表面处理。

公开(公告)号：US20050106866A1

公开(公告)日：2005-05-19

申请号：US10959501

申请日：2004-10-07

申请人： Mitsuhiro Omura ,  Makiko Katano ,  Shoko Ito ,  Takaya Matsushita ,  Hisashi Kaneko

发明人： Mitsuhiro Omura ,  Makiko Katano ,  Shoko Ito ,  Takaya Matsushita ,  Hisashi Kaneko

IPC分类号： H01L21/00 ,  H01L21/26 ,  H01L21/302 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/324 ,  H01L21/44 ,  H01L21/461 ,  H01L21/4763 ,  H01L21/768

CPC分类号： H01L21/76838 ,  H01L21/02046 ,  H01L21/31116

摘要： A method of manufacturing a semiconductor device includes subjecting a semiconductor wafer, which includes a copper layer formed above a semiconductor substrate and covered with an insulating film, to a dry etching using a fluorocarbon gas to partially remove the insulating film, thereby at least partially exposing a surface of the copper layer. The copper layer, the surface of which is at least partially exposed is subjected to a nitrogen plasma treatment. The semiconductor wafer having the nitrogen plasma-treated copper layer is exposed to atmosphere, and then the semiconductor wafer is subjected to a surface treatment.

摘要翻译： 一种制造半导体器件的方法包括使用碳氟化合物气体对包含形成在半导体衬底之上并被绝缘膜形成的铜层的半导体晶片进行干蚀刻，以部分地去除绝缘膜，从而至少部分曝光 铜层的表面。 将其表面至少部分暴露的铜层进行氮等离子体处理。 将具有氮等离子体处理的铜层的半导体晶片暴露于大气中，然后对半导体晶片进行表面处理。

公开(公告)号：US08119020B2

公开(公告)日：2012-02-21

申请号：US11826922

申请日：2007-07-19

申请人： Shoko Ito ,  Makiko Katano ,  Atsuko Kawasaki ,  Masahiro Kiyotoshi

发明人： Shoko Ito ,  Makiko Katano ,  Atsuko Kawasaki ,  Masahiro Kiyotoshi

IPC分类号： B44C1/22

CPC分类号： H01L21/67393 ,  H01L21/67253 ,  H01L21/76224 ,  H01L27/115 ,  H01L27/11521 ,  Y10S414/135

摘要： A method for manufacturing an electronic device using a closed-type transport container, includes: controlling relative humidity inside the closed-type transport container to be lower than ambient relative humidity outside the closed-type transport container on a particular interprocess transport path in which an intermediate product stored in the closed-type transport container is transported from a first manufacturing process to a second manufacturing process. The first manufacturing process allows basic compounds containing nitrogen atoms to be released from the intermediate product. The second manufacturing process is susceptible to degradation due to contamination by the basic compounds.

摘要翻译： 一种使用封闭式输送容器的电子装置的制造方法，其特征在于，包括：在所述封闭式输送容器内部的相对湿度比所述封闭式输送容器外的环境相对湿度低的特定过程输送路径， 存储在封闭式运输容器中的中间产品从第一制造过程运输到第二制造过程。 第一制造方法允许含有氮原子的碱性化合物从中间产物中释放出来。 第二制造过程由于碱性化合物的污染而易于降解。

公开(公告)号：US20070274814A1

公开(公告)日：2007-11-29

申请号：US11797528

申请日：2007-05-04

申请人： Atsuko Kawasaki ,  Masahiro Kiyotoshi ,  Shoko Ito ,  Makiko Katano ,  Ayako Mizuno

发明人： Atsuko Kawasaki ,  Masahiro Kiyotoshi ,  Shoko Ito ,  Makiko Katano ,  Ayako Mizuno

IPC分类号： H01L21/677

CPC分类号： H01L21/67276 ,  H01L21/67271 ,  H01L21/67727 ,  H01L21/6773

摘要： A local clean robot-transport plant includes: a plurality of manufacturing apparatuses; a plurality of closed-type transport containers; a container discrimination/selection apparatus; an apparatus group control server. Each of the plurality of closed-type transport containers stores and transports an intermediate product of manufacturing processes along a plurality of interprocess transport paths defined among the plurality of manufacturing apparatuses in accordance with a flow of the manufacturing processes. The container discrimination/selection apparatus is configured to discriminate and select the closed-type transport container of transport type 1 and the closed-type transport container of transport type 2, respectively, from among the plurality of closed-type transport containers. The apparatus group control server is configured to collectively control operation of the plurality of manufacturing apparatuses and the container discrimination/selection apparatus to move the closed-type transport container of transport type 2 to a specific interprocess transport path and to move the closed-type transport container of transport type 1 to the interprocess transport path other than the specific interprocess transport path.

摘要翻译： 本地清洁机器人运输设备包括：多个制造装置; 多个封闭式运输容器; 容器辨认/选择装置; 设备组控制服务器。 多个封闭式运输容器中的每一个根据制造过程的流程，沿着多个制造装置之间限定的多个处理间传送路径来存储和传送制造过程的中间产品。 容器识别/选择装置被配置为分别从多个封闭式运输集装箱中分别选择运输类型1的封闭式运输集装箱和运输类型2的封闭式运输集装箱。 设备组控制服务器被配置为共同地控制多个制造设备和容器识别/选择设备的操作，以将传送类型2的封闭式运输容器移动到特定的处理间传送路径，并且移动封闭式传送 1类运输集装箱到特定进程间运输路径以外的进程间运输路径。

公开(公告)号：US20080023442A1

公开(公告)日：2008-01-31

申请号：US11826922

申请日：2007-07-19

申请人： Shoko Ito ,  Makiko Katano ,  Atsuko Kawasaki ,  Masahiro Kiyotoshi

发明人： Shoko Ito ,  Makiko Katano ,  Atsuko Kawasaki ,  Masahiro Kiyotoshi

IPC分类号： C03C25/68 ,  C23C16/00

CPC分类号： H01L21/67393 ,  H01L21/67253 ,  H01L21/76224 ,  H01L27/115 ,  H01L27/11521 ,  Y10S414/135

摘要： A method for manufacturing an electronic device using a closed-type transport container, includes: controlling relative humidity inside the closed-type transport container to be lower than ambient relative humidity outside the closed-type transport container on a particular interprocess transport path in which an intermediate product stored in the closed-type transport container is transported from a first manufacturing process to a second manufacturing process. The first manufacturing process allows basic compounds containing nitrogen atoms to be released from the intermediate product. The second manufacturing process is susceptible to degradation due to contamination by the basic compounds.

摘要翻译： 一种使用封闭式输送容器的电子装置的制造方法，其特征在于，包括：在所述封闭式输送容器内部的相对湿度比所述封闭式输送容器外的环境相对湿度低的特定过程输送路径， 存储在封闭式运输容器中的中间产品从第一制造过程运输到第二制造过程。 第一制造方法允许含有氮原子的碱性化合物从中间产物中释放出来。 第二制造过程由于碱性化合物的污染而易于降解。

公开(公告)号：US06269588B1

公开(公告)日：2001-08-07

申请号：US09376303

申请日：1999-08-18

申请人： Shoko Ito

发明人： Shoko Ito

IPC分类号： A47G700

CPC分类号： A01G9/022

摘要： A flower pot for group planting of flower plants or the like which is mounted on a pole comprises a flower pot body (1) having planting openings (6) of which upper part is opened and provided in a plurality of locations in the periphery of said body (1), and having a hole (8) provided in the bottom of said body for inserting the pole; and a cylindrical mounting member (2) for inserting the upper part of said pole, at least the bottom of said mounting member is opened and said mounting member is fixedly or removably mounted vertically around said hole (8). The outer face of said flower pot is covered by the group planted flower plants and not exposed when said flower pot in which flower plants have been group planted is mounted on the pole, and accordingly the beauty of the flowers planted in said flower pot is kept well and the decoration effect is increased, and said flower pot is securely mounted on the pole and accordingly does not fall even when subjected to strong winds.

摘要翻译： 安装在杆上的花卉植物等的组种植花盆包括花盆体（1），花盆体（1）具有种植开口（6），其上部被打开并设置在所述 主体（1），并且具有设置在所述主体的底部中的用于插入杆的孔（8）; 以及用于插入所述杆的上部的圆柱形安装构件（2），至少所述安装构件的底部打开，并且所述安装构件被固定地或可移除地垂直地安装在所述孔（8）周围。所述花的外表面 盆栽被种植的花卉植物覆盖，并且当将种植了花卉植物的花盆安装在杆上时不暴露，因此在花盆中种植的花的美丽保持良好，装饰效果为 并且所述花盆牢固地安装在杆上，因此即使经受强风也不会下降。

公开(公告)号：US4992026A

公开(公告)日：1991-02-12

申请号：US370080

申请日：1989-06-22

申请人： Fumio Ohtomo ,  Yasuo Okamoto ,  Shoko Ito ,  Yoshitaka Fukuyama ,  Hideo Iwasaki ,  Takeshi Watanabe

发明人： Fumio Ohtomo ,  Yasuo Okamoto ,  Shoko Ito ,  Yoshitaka Fukuyama ,  Hideo Iwasaki ,  Takeshi Watanabe

IPC分类号： F01D5/18

CPC分类号： F01D5/187 ,  F05D2260/202 ,  F05D2260/2212

摘要： A blade of a gas turbine includes a main body having a dovetail portion and a blade portion extending from the dovetail portion. A cooling air passage for flowing a cooling air is formed in the main body to cool the blade portion. The passage includes a cooling air inlet port open to the dovetail portion and an outlet port open to an extended tip of the blade portion. A first passage portion extends from the inlet port to the portion close to the extended tip along a leading edge of the blade portion. A final passage portion extends from the dovetail portion to the outlet port. The flow sectional area of the final passage portion is gradually decreased from the dovetail portion toward the outlet port. The final passage portion communicates with a number of film cooling holes which are open to the suction side surface of the blade portion.

摘要翻译： 燃气涡轮机的叶片包括具有燕尾部分的主体和从燕尾部分延伸的叶片部分。 在主体中形成用于流动冷却空气的冷却空气通道以冷却叶片部分。 通道包括通向燕尾部分的冷却空气入口和与叶片部分的延伸尖端相通的出口。 第一通道部分沿着叶片部分的前缘从入口延伸到靠近延伸尖端的部分。 最后通道部分从燕尾部分延伸到出口。 最终通道部分的流动截面积从燕尾部分朝向出口逐渐减小。 最后的通道部分与许多对叶片部分的吸力侧表面开口的薄膜冷却孔连通。

公开(公告)号：US06274505B1

公开(公告)日：2001-08-14

申请号：US09387801

申请日：1999-09-01

申请人： Shoko Ito ,  Mokuji Kageyama

发明人： Shoko Ito ,  Mokuji Kageyama

IPC分类号： H01L2100

CPC分类号： H01L21/67086

摘要： By locally heating or cooling a substrate in an etching process, temperature unevenness is controlled, and convection currents of an etching liquid are restricted simultaneously. By setting the etching temperature low in an initial stage of the etching process and increasing it in a final stage, uniform and quick etching is possible. In a drop etching method, generation of bubbles can be prevented to ensure uniform etching by providing gas release openings in a member opposed to the substrate.

摘要翻译： 通过在蚀刻工艺中局部加热或冷却衬底，控制温度不均匀性，同时限制蚀刻液体的对流。 通过在蚀刻工艺的初始阶段将蚀刻温度设置得较低，并且在最终阶段将其提高，可以进行均匀且快速的蚀刻。 在液滴蚀刻方法中，可以防止气泡的产生，以通过在与基板相对的构件中提供气体释放开口来确保均匀的蚀刻。

公开(公告)号：US6105362A

公开(公告)日：2000-08-22

申请号：US37036

申请日：1998-03-09

申请人： Fumio Ohtomo ,  Yuji Nakata ,  Yoshitaka Fukuyama ,  Asako Inomata ,  Sachio Shibuya ,  Akinori Koga ,  Junji Ishii ,  Shoko Ito ,  Hironobu Yamamoto

发明人： Fumio Ohtomo ,  Yuji Nakata ,  Yoshitaka Fukuyama ,  Asako Inomata ,  Sachio Shibuya ,  Akinori Koga ,  Junji Ishii ,  Shoko Ito ,  Hironobu Yamamoto

IPC分类号： F01K23/10 ,  F02C6/02 ,  F02C6/18 ,  F02C7/16

CPC分类号： F01K23/10 ,  F02C6/02 ,  F02C6/18 ,  F02C7/16 ,  F05D2260/2322 ,  Y02E20/16

摘要： A combined cycle power plant comprises a gas turbine system and a steam cycle system having a steam turbine to be driven by the steam generated by the waste heat of the exhaust gas of the gas turbine system, wherein the steam from the steam cycle system flows through a gas turbine cooling system of the gas turbine to cool the gas turbine blades and other elements of the gas turbine system to be cooled and the waste heat of the gas turbine system is effectively collected. The gas turbine cooling system is supplied selectively with bleed air from the compressor of the gas turbine or the steam provided from another steam cycle system in order to ensure a sufficient coolant supply at the time of starting and stopping the plant and during the operation with a partial load.

摘要翻译： 联合循环发电厂包括燃气轮机系统和蒸汽循环系统，该蒸汽循环系统具有蒸气涡轮机，由汽轮机系统的废气的废热产生的蒸汽驱动，其中来自蒸汽循环系统的蒸汽流过 燃气轮机的燃气轮机冷却系统，用于冷却燃气轮机叶片和待冷却的燃气轮机系统的其它元件，并有效地收集燃气轮机系统的废热。 燃气轮机冷却系统选择性地供应来自燃气轮机的压缩机的排出空气或从另一个蒸汽循环系统提供的蒸汽，以确保在启动和停止设备时以及在操作期间具有足够的冷却剂供应 部分负荷。

公开(公告)号：US09200526B2

公开(公告)日：2015-12-01

申请号：US13332106

申请日：2011-12-20

申请人： Shoko Ito ,  Daizo Saito ,  Yoshiaki Sakai

发明人： Shoko Ito ,  Daizo Saito ,  Yoshiaki Sakai

IPC分类号： F02C3/02 ,  F23R3/54 ,  F01D9/02

CPC分类号： F01D9/023

摘要： A transition piece 10 in an embodiment is provided with an inner duct 20 through which a combustion gas is led to a turbine part 130 and an outer duct 30 that is provided so as to cover an outer periphery of the inner duct 20 and has a plurality of ejection holes 31 to eject air onto an outer peripheral surface of the inner duct 20 formed therein. It is structured such that a channel cross-sectional area of a cooling air channel 50 that is formed between the inner duct 20 and the outer duct 30 and through which the air ejected from the ejection holes 31 flows gradually decreases at an air flow downstream side rather than the portion where the ejection holes 31 are formed, and gradually increases from a throat portion 60 having the minimized channel cross-sectional area to an air flow downstream side.

摘要翻译： 在一个实施例中的过渡件10设置有内部管道20，燃烧气体通过该管道20被引导到涡轮机部分130和外部管道30，外部管道30设置成覆盖内部管道20的外周并且具有多个 的喷射孔31以将空气喷射到形成在其中的内部管道20的外周表面上。 其结构使得形成在内部管道20和外部管道30之间的冷却空气通道50的通道横截面积，并且从喷射孔31喷出的空气流过的通道横截面积在空气流下游侧逐渐减小 而不是形成喷射孔31的部分，并且从具有最小的通道横截面积的喉部60逐渐增加到气流下游侧。