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253 条记录 (耗时 0.031 秒)

    Method of Transcribing Fine Pattern and Fine Structure Pattern Transcription Apparatus
    1.
    发明申请
    Method of Transcribing Fine Pattern and Fine Structure Pattern Transcription Apparatus 失效
    转录精细图案和精细结构图案转录装置的方法

    公开(公告)号：US20070243281A1

    公开(公告)日：2007-10-18

    申请号：US11736016

    申请日：2007-04-17

    申请人： Mitsuru Hasegawa ,  Masahiko Ogino ,  Takashi Ando ,  Hideaki Kataho

    发明人： Mitsuru Hasegawa ,  Masahiko Ogino ,  Takashi Ando ,  Hideaki Kataho

    IPC分类号： B29C43/02

    CPC分类号： B29C43/021 ,  B29C33/08 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/10 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3238 ,  B29C2059/023

    摘要： A method of transcribing a shape of a surface of a stamper on a transcription surface of a transcription object by pressing the stamper on the transcription object, which comprises steps of: having one of the stamper and the transcription object positioned opposite a plate surface and the other of the stamper and the transcription object placed on one surface of a pressure plate; and having the one of the stamper and the transcription object pressed onto the plate surface by applying a fluid on the other surface of the pressure plate, wherein an area of the one surface of the pressure plate is larger than a contact area in which the other of the stamper and the transcription object is in contact with the pressure plate.

    摘要翻译： 一种通过将转印体上的压模按压在转录物上的转印体转录面上的压模表面的形状的方法，该方法包括以下步骤：将压模和转录体中的一个定位在与板表面相对的位置， 放置在压板的一个表面上的压模和转录对象中的另一个; 并且通过在所述压力板的另一个表面上施加流体而将所述压模和转印体中的一个压在所述板表面上，其中所述压板的所述一个表面的面积大于所述压板的所述另一表面的面积 的压模和转录物体与压力板接触。

    Method of transcribing fine pattern and fine structure pattern transcription apparatus
    2.
    发明授权
    Method of transcribing fine pattern and fine structure pattern transcription apparatus 失效
    转录精细图案和精细结构图案转录装置的方法

    公开(公告)号：US08047835B2

    公开(公告)日：2011-11-01

    申请号：US11736016

    申请日：2007-04-17

    申请人： Mitsuru Hasegawa ,  Masahiko Ogino ,  Takashi Ando ,  Hideaki Kataho

    发明人： Mitsuru Hasegawa ,  Masahiko Ogino ,  Takashi Ando ,  Hideaki Kataho

    IPC分类号： B29C43/02 ,  B29C35/08

    CPC分类号： B29C43/021 ,  B29C33/08 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/10 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3238 ,  B29C2059/023

    摘要： A method of transcribing a shape of a surface of a stamper on a transcription surface of a transcription object by pressing the stamper on the transcription object, which comprises steps of: having one of the stamper and the transcription object positioned opposite a plate surface and the other of the stamper and the transcription object placed on one surface of a pressure plate; and having the one of the stamper and the transcription object pressed onto the plate surface by applying a fluid on the other surface of the pressure plate, wherein an area of the one surface of the pressure plate is larger than a contact area in which the other of the stamper and the transcription object is in contact with the pressure plate.

    摘要翻译： 一种通过将转印体上的压模按压在转录物上的转印体转录面上的压模表面的形状的方法，该方法包括以下步骤：将压模和转录体中的一个定位在与板表面相对的位置， 放置在压板的一个表面上的压模和转录对象中的另一个; 并且通过在所述压力板的另一个表面上施加流体而将所述压模和转印体中的一个压在所述板表面上，其中所述压板的所述一个表面的面积大于所述压板的所述另一表面的面积 的压模和转录物体与压力板接触。

    IMPRINT DEVICE AND MICROSTRUCTURE TRANSFER METHOD
    5.
    发明申请
    IMPRINT DEVICE AND MICROSTRUCTURE TRANSFER METHOD 审中-公开

    公开(公告)号：US20120074615A1

    公开(公告)日：2012-03-29

    申请号：US13312189

    申请日：2011-12-06

    申请人： Takashi Ando ,  Susumu Komoriya ,  Masahiko Ogino ,  Akihiro Miyauchi

    发明人： Takashi Ando ,  Susumu Komoriya ,  Masahiko Ogino ,  Akihiro Miyauchi

    IPC分类号： B29C59/02

    CPC分类号： B29C43/021 ,  B29C43/003 ,  B29C43/58 ,  B29C2043/025 ,  B29C2043/3634 ,  B29C2043/5808 ,  B29L2011/0016 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.

    摘要翻译： 提供了用于将精细图案转印到材料以形成图案化材料的压印装置。 该装置包括其上具有精细图案的压模和压力分布机构。 压模被压在材料上，并且压力分配机构在图案化材料的图案化区域中提供不均匀的压力分布，同时压模与材料接触。 提供了压印装置和微结构转印方法，通过该方法可以在压模和图案化材料之间以较低的压力充分地铺展树脂或其它材料以形成图案层，以便不损坏压模或 并且在图案化材料上形成具有均匀厚度的图案形成层。

    Cell culture vessel and cultured cell
    6.
    发明授权
    Cell culture vessel and cultured cell 失效
    细胞培养容器和培养细胞

    公开(公告)号：US07655457B2

    公开(公告)日：2010-02-02

    申请号：US10989910

    申请日：2004-11-17

    申请人： Kosuke Kuwabara ,  Akihiro Miyauchi ,  Masahiko Ogino ,  Takashi Ando

    发明人： Kosuke Kuwabara ,  Akihiro Miyauchi ,  Masahiko Ogino ,  Takashi Ando

    IPC分类号： C12M1/14 ,  C12M3/04 ,  C12M3/00 ,  C12M1/00

    CPC分类号： C12M23/20 ,  C12M21/08 ,  C12M23/10

    摘要： It is an object of this invention to provide a cell culture vessel which has a simple and convenient structure, can prevent the injury on the cells at the time of peeling, and accelerates the transportation of nutrients and discharge of waste materials. In order to solve the problem mentioned above, the cell culture vessel of this invention has protrusions having a corresponding diameter not smaller than 10 nm and not greater than 10 μm and a height not smaller than 10 nm and not greater than 1 mm on the surface of the cell culture vessel. The protrusions make the culture fluid permeate into the under part of the cells, accelerate the supply of nutrients and discharge of waste materials, and makes the contact between the cells and the vessel as a point-contact and thereby prevents the cells from the injury which the cells undergo at the time of peeling.

    摘要翻译： 本发明的目的是提供一种结构简单方便的细胞培养容器，可以防止剥离时对细胞的损伤，加速营养物质的运输和废料排出。 为了解决上述问题，本发明的细胞培养容器具有相对应的直径不小于10nm且不大于10um的突起，并且在表面上具有不小于10nm且不大于1mm的高度 的细胞培养容器。 突起使得培养液渗透到细胞的下部，加速营养物质的供给和排出废物，并使细胞与血管之间的接触作为点接触，从而防止细胞受损， 细胞在剥离时经历。

    Pattern transfer method and imprint device
    9.
    发明授权
    Pattern transfer method and imprint device 失效
    图案转印方法和印版装置

    公开(公告)号：US08491291B2

    公开(公告)日：2013-07-23

    申请号：US13366792

    申请日：2012-02-06

    申请人： Takashi Ando ,  Susumu Komoriya ,  Masahiko Ogino ,  Akihiro Miyauchi

    发明人： Takashi Ando ,  Susumu Komoriya ,  Masahiko Ogino ,  Akihiro Miyauchi

    IPC分类号： B29C59/16

    CPC分类号： G11B7/263 ,  B29C33/303 ,  B29C43/003 ,  B29C43/021 ,  B29C43/58 ,  B29C2043/025 ,  B29C2043/043 ,  B29C2043/3602 ,  B29C2043/3634 ,  B29C2043/5833 ,  B29L2011/0075 ,  B29L2017/005 ,  B29L2031/756

    摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.

    摘要翻译： 为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模和 检测被转移物体的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。

    Method and apparatus for imprinting microstructure and stamper therefor
    10.
    发明授权
    Method and apparatus for imprinting microstructure and stamper therefor 有权
    用于印刷微结构和压模的方法和装置

    公开(公告)号：US08192637B2

    公开(公告)日：2012-06-05

    申请号：US12388573

    申请日：2009-02-19

    申请人： Ryuta Washiya ,  Takashi Ando ,  Masahiko Ogino ,  Akihiro Miyauchi

    发明人： Ryuta Washiya ,  Takashi Ando ,  Masahiko Ogino ,  Akihiro Miyauchi

    IPC分类号： B44C1/22

    CPC分类号： B29C35/0888 ,  B29C37/0053 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B7/263

    摘要： A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.

    摘要翻译： 一种压印微结构的方法，包括：将包含图案层的压模与图案层的一个表面中的微米级至数毫米级的微结构接触;以及支撑图案层的基板，其具有可变形层的压印构件， 印刷微结构，其中图案层被支撑在具有规定的基底曲率半径的圆形表面上，圆形表面的中心朝向图案层的背面突出; 使压印构件上的可变形层产生; 以及将所述压模与所述固化的可变形层分离。