公开(公告)号：US06653024B1

公开(公告)日：2003-11-25

申请号：US09569849

申请日：2000-05-10

申请人： Naomasa Shiraishi ,  Hitoshi Takeuchi ,  Soichi Owa

发明人： Naomasa Shiraishi ,  Hitoshi Takeuchi ,  Soichi Owa

IPC分类号： G03F900

CPC分类号： G03F7/707 ,  G03F1/48 ,  G03F1/50 ,  G03F7/70866

摘要： A photomask including a substrate comprised of fluorite (calcium fluoride (CaF2)) and protective films comprised of chrome (Cr), chromium oxide (Cro), silicon oxide (SiO2 or SiO), etc. and formed at regions, other than the pattern region where the pattern to be transferred is formed, which contact other members when transporting the photomask or using it for exposure.

摘要翻译： 包括由萤石（氟化钙（CaF 2））构成的基板和由铬（Cr），氧化铬（Cro），氧化硅（SiO 2或SiO）等构成的保护膜的光掩模，并形成在图案以外的区域 形成要转印的图案的区域，其在运送光掩模时使用其它构件或将其用于曝光。

公开(公告)号：US20050122499A1

公开(公告)日：2005-06-09

申请号：US10982781

申请日：2004-11-08

申请人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Issey Tanaka ,  Soichi Owa ,  Toshihiko Ozawa ,  Shunsuke Niisaka

发明人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Issey Tanaka ,  Soichi Owa ,  Toshihiko Ozawa ,  Shunsuke Niisaka

IPC分类号： G02B13/24 ,  G02B17/08 ,  G03F7/20 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/24 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70566 ,  G03F7/70966

摘要： A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.

摘要翻译： 将第一表面的缩小图像形成到第二表面上的投影光学系统虽然使用具有固有双折射的光学材料，但是基本上不受双折射的影响，具有优异的光学性能。 这通过适当地布置构成投影光学系统的相对于投影光学系统的光轴的辐射透射构件的某些晶轴，并且通过将辐射透射构件的某些晶轴相对于晶体轴适当地布置 投影光学系统中的其他辐射透射构件。

公开(公告)号：US06707529B1

公开(公告)日：2004-03-16

申请号：US09913328

申请日：2001-10-15

申请人： Takashi Aoki ,  Naomasa Shiraishi ,  Soichi Owa

发明人： Takashi Aoki ,  Naomasa Shiraishi ,  Soichi Owa

IPC分类号： G03B2752

CPC分类号： G03F7/70883 ,  G02B3/0056 ,  G02B3/0068 ,  G03F7/70941

摘要： An exposure apparatus having an illumination system which applies an exposure energy beam to a mask on which a pattern for transfer is formed, and a stage system for positioning a substrate to which the pattern of the mask is transferred, is characterized in that: a gas supply apparatus for supplying a gas of a high transmittivity with respect to the exposure energy beam, and having good thermal conductivity, to at least a portion of an optical path of the exposure energy blam, and a gas recovery apparatus for recovering at least a portion of the gas after the gas is supplied to the optical path of the exposure energy beam from the gas supply apparatus, are provided.

摘要翻译： 一种曝光装置，具有对形成有转印图案的掩模施加曝光能量束的照明系统，以及用于定位掩模图案的基板的定位用台系统，其特征在于：气体 供给装置，用于向暴露能量束的光路的至少一部分提供相对于曝光能量射线的高透射率的气体，并且具有良好的导热性;以及气体回收装置，用于回收至少一部分 气体被供给到来自气体供给装置的曝光能量束的光路之后的气体。

公开(公告)号：US07301605B2

公开(公告)日：2007-11-27

申请号：US09769832

申请日：2001-01-26

申请人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Soichi Owa

发明人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Soichi Owa

IPC分类号： G03B27/54 ,  G03B27/70

CPC分类号： G02B17/0892 ,  G02B13/24 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70833

摘要： A projection exposure apparatus includes a projection optical system, which is arranged in an optical path between a first surface and a second surface, projects a pattern on a negative plate arranged on the first surface onto a workpiece arranged on the second surface and exposes the pattern thereon. The projection optical system includes a first imaging optical subsystem having a dioptric imaging optical system; a second imaging optical subsystem having a concave reflecting system; a third imaging optical subsystem having a dioptric imaging optical system; a first folding mirror arranged in an optical path between the first imaging optical subsystem and the second imaging optical subsystem; and a second folding mirror arranged in an optical path between the second imaging optical subsystem and the third imaging optical subsystem. The first imaging optical subsystem forms a first intermediate image and the second imaging optical subsystem forms a second intermediate image.

摘要翻译： 投影曝光装置包括投影光学系统，该投影光学系统布置在第一表面和第二表面之间的光路中，将布置在第一表面上的负极板上的图案投影到布置在第二表面上的工件上， 上。 投影光学系统包括具有屈光成像光学系统的第一成像光学子系统; 具有凹面反射系统的第二成像光学子系统; 具有屈光成像光学系统的第三成像光学子系统; 布置在第一成像光学子系统和第二成像光学子系统之间的光路中的第一折叠镜; 以及布置在第二成像光学子系统和第三成像光学子系统之间的光路中的第二折叠镜。 第一成像光学子系统形成第一中间图像，第二成像光学子系统形成第二中间图像。

公开(公告)号：US06844915B2

公开(公告)日：2005-01-18

申请号：US10207109

申请日：2002-07-30

申请人： Soichi Owa ,  Naomasa Shiraishi ,  Issey Tanaka ,  Yasuhiro Omura

发明人： Soichi Owa ,  Naomasa Shiraishi ,  Issey Tanaka ,  Yasuhiro Omura

IPC分类号： G03F7/20 ,  G03B27/42 ,  G02B13/14 ,  G02B9/00

CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70966

摘要： An optical system attains good optical performance without substantially receiving the effects of birefringence even when using an optical material having intrinsic birefringence. An optical system that includes at least one radiation transmissive member that transmits light having a wavelength of 200 nm or less has an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]. In addition, an optical system can include: a first group of radiation transmissive members that transmits light having a wavelength of 200 nm or less and having an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]; and a second group of radiation transmissive members that transmits light having a wavelength of 200 nm or less and having an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]; wherein the first group of radiation transmissive members and the second group of radiation transmissive members have a positional relationship rotated substantially 45° about the optical axis relative to each other.

摘要翻译： 即使使用具有固有双折射性的光学材料，光学系统也能获得良好的光学性能而基本上不会受到双折射的影响。 包括透射200nm以下的波长的光的至少一个透射性构件的光学系统具有基本上与晶轴[100]重合的光轴或与晶轴[100]相当的晶轴。 此外，光学系统可以包括：透射具有200nm或更小的波长的光并且具有基本上与晶轴[100]重合的光轴的第一组辐射透射构件或者与 晶轴[100]; 以及第二组透射波长为200nm以下并且具有与晶轴[100]大​​致一致的光轴或与晶轴[100]相当的晶轴的光的辐射透射部件。 其中第一组辐射透射构件和第二组辐射透射构件具有围绕光轴相对于彼此大致45度旋转的位置关系。

公开(公告)号：US06831731B2

公开(公告)日：2004-12-14

申请号：US10183612

申请日：2002-06-28

申请人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Issey Tanaka ,  Soichi Owa ,  Toshihiko Ozawa ,  Shunsuke Niisaka

发明人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Issey Tanaka ,  Soichi Owa ,  Toshihiko Ozawa ,  Shunsuke Niisaka

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B13/24 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70566 ,  G03F7/70966

摘要： A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.

摘要翻译： 将第一表面的缩小图像形成到第二表面上的投影光学系统虽然使用具有固有双折射的光学材料，但是基本上不受双折射的影响，具有优异的光学性能。 这通过适当地布置构成投影光学系统的相对于投影光学系统的光轴的辐射透射构件的某些晶轴，并且通过将辐射透射构件的某些晶轴相对于晶体轴适当地布置 投影光学系统中的其他辐射透射构件。

公开(公告)号：US20070268474A1

公开(公告)日：2007-11-22

申请号：US11878402

申请日：2007-07-24

申请人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Soichi Owa

发明人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Soichi Owa

IPC分类号： G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/24 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70833

摘要： A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.

摘要翻译： 反折射光学系统在第二表面上形成第一表面的图像。 该系统包括具有第一光轴的第一透镜，凹面镜和第二透镜的组合，所述组合具有第二光轴，具有第三光轴的第三透镜，配置在光学器件中的第一反射面 第一透镜和组合之间的路径，以及布置在组合和第三透镜之间的光路中的第二反射面。 第一反射面的延伸面和第二反射面的延伸面的交线被设定为使得第一光轴，第二光轴和第三光轴在一点相交。 此外，第一透镜和第三透镜中的至少一个是可移动的。

公开(公告)号：US07050149B2

公开(公告)日：2006-05-23

申请号：US11008631

申请日：2004-12-10

申请人： Soichi Owa ,  Naomasa Shiraishi ,  Takashi Aoki

发明人： Soichi Owa ,  Naomasa Shiraishi ,  Takashi Aoki

IPC分类号： G03B27/53

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F7/70825

摘要： An exposure apparatus able to maintain reflectances of mirrors and transmittances of lenses and to maintain initial performance over a long period by using exposure light of a wavelength of the vacuum ultraviolet region to illuminate a mask and transfer images of patterns on the mask to a substrate, provided with a gas feed unit for supplying a light path space through which the exposure light passes with a gas mainly comprised of an inert gas or rare gas and introducing a predetermined concentration of hydrogen into the gas fed to at least part of the light path space.

摘要翻译： 一种曝光装置，其能够保持透镜的反射镜和透镜的透射率，并且通过使用真空紫外线区域的波长的曝光光来长时间保持初始性能，以照亮掩模并将掩模上的图案的图像转印到基板上， 设置有供气单元，用于提供曝光光通过的光路空间，主要由惰性气体或稀有气体组成的气体，并将预定浓度的氢气引入供给到光路空间的至少一部分的气体 。

公开(公告)号：US07319508B2

公开(公告)日：2008-01-15

申请号：US11878402

申请日：2007-07-24

申请人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Soichi Owa

发明人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Soichi Owa

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G02B17/0892 ,  G02B13/24 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70833

摘要： A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.

摘要翻译： 反折射光学系统在第二表面上形成第一表面的图像。 该系统包括具有第一光轴的第一透镜，凹面镜和第二透镜的组合，该组合具有第二光轴，具有第三光轴的第三透镜，配置在光学器件中的第一反射面 第一透镜和组合之间的路径，以及布置在组合和第三透镜之间的光路中的第二反射面。 第一反射面的延伸面和第二反射面的延伸面的交线被设定为使得第一光轴，第二光轴和第三光轴在一点相交。 此外，第一透镜和第三透镜中的至少一个是可移动的。

公开(公告)号：US20050157278A1

公开(公告)日：2005-07-21

申请号：US11008631

申请日：2004-12-10

申请人： Soichi Owa ,  Naomasa Shiraishi ,  Takashi Aoki

发明人： Soichi Owa ,  Naomasa Shiraishi ,  Takashi Aoki

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F7/70825

摘要： An exposure apparatus able to maintain reflectances of mirrors and transmittances of lenses and to maintain initial performance over a long period by using exposure light of a wavelength of the vacuum ultraviolet region to illuminate a mask and transfer images of patterns on the mask to a substrate, provided with a gas feed unit for supplying a light path space through which the exposure light passes with a gas mainly comprised of an inert gas or rare gas and introducing a predetermined concentration of hydrogen into the gas fed to at least part of the light path space.

摘要翻译： 一种曝光装置，其能够保持透镜的反射镜和透镜的透射率，并且通过使用真空紫外线区域的波长的曝光光来长时间保持初始性能，以照亮掩模并将掩模上的图案的图像转印到基板上， 设置有供气单元，用于提供曝光光通过的光路空间，主要由惰性气体或稀有气体组成的气体，并将预定浓度的氢气引入供给到光路空间的至少一部分的气体 。