摘要:
To provide a process capable of producing a titanium oxide electric conductor layer having excellent electric conductivity and good transparency, with high productivity.A first layer and a second layer each made of titanium oxide doped with a dopant such as Nb, are formed in order on a substrate in a state where the substrate is heated to prepare an electric conductor layer comprising an electric conductor layer. The first layer is formed under film formation conditions under which it is a layer containing polycrystals which contain no rutile crystals. The second layer is formed under film formation conditions under which a layer containing polycrystals which contain rutile crystals is obtained when directly formed on a substrate.
摘要:
To provide a process whereby a titanium oxide type electrical conductor excellent in electrical conductivity with good transparency can be produced with good productivity.A process for producing an electrical conductor, which comprises a laminate-forming step of forming a precursor laminate having a first precursor layer and a second precursor layer laminated in an optional order on a substrate, and an annealing step of heating the precursor laminate in a reducing atmosphere for annealing to form a metal oxide layer from the first precursor layer and the second precursor layer, wherein the first precursor layer is a titanium oxide layer made of titanium oxide containing Nb, which, when subjected to a single layer annealing test, becomes a titanium oxide layer containing a polycrystal which is free from a rutile type crystal, and the second precursor layer is an amorphous titanium oxide layer made of titanium oxide containing Nb, which, when subjected to a single layer annealing test, becomes a titanium oxide layer containing a polycrystal which contains a rutile type crystal.
摘要:
An electric conductor having good electric conductivity and excellent heat resistance, and a process for its production are provided.An electric conductor comprising a substrate 10 and at least two layers formed on the substrate, each being a layer (Z) made of titanium oxide doped with at least one dopant selected from the group consisting of Nb, Ta, Mo, As, Sb, W, N, F, S, Se, Te, Cr, Ni, Tc, Re, P and Bi, wherein at least one layer among said at least two layers is a second layer (Z2) 12 wherein the percentage of the number of dopant atoms based on the total number of titanium and dopant atoms is from 0.01 to 4 atomic %; and between the second layer (Z2) 12 and the substrate 10, a first layer (Z1) 11 is formed wherein the percentage of the number of dopant atoms based on the total number of titanium and dopant atoms is larger than in the second layer (Z2).
摘要:
An electric conductor is provided, which is excellent in electric conductivity and has good transparency. A process for producing electric conductor comprising a step of forming on a surface of a substrate body 11 a precursor layer 12′ made of titanium oxide doped with one or at least two dopants selected from the group consisting of Nb, Ta, Mo, As, Sb, Al, Hf, Si, Ge, Zr, W, Co, Fe, Cr, Sn, Ni, V, Mn, Tc, Re, P and Bi; and a step of annealing the precursor layer 12′ in a reducing atmosphere to form a metal oxide layer 12.
摘要:
When a p-layer 4 composed of GaN is maintained at ordinary temperature and TNO is sputtered thereon by an RF magnetron sputtering method, a laminated TNO layer 5 is in an amorphous state. Then, there is included a step of thermally treating the amorphous TNO layer in a reduced-pressure atmosphere where hydrogen gas is substantially absent to thereby crystallize the TNO layer. At the sputtering, an inert gas is passed through together with oxygen gas, and volume % of the oxygen gas contained in the gas passed through is 0.10 to 0.15%. In this regard, oxygen partial pressure is 5×10−3 Pa or lower. The temperature of the thermal treatment is 500° C. for about 1 hour.
摘要:
There have been demands for transparent electrode materials and magnetic materials, each having a wide range of applications. In view of the situations, a novel functional device and a method for forming an oxide material are provided. A functional device includes an AlxGayInzN layer (wherein 0≦x≦1, 0≦y≦1, and 0≦z≦1) and an oxide material layer composed of a metal oxide and formed on the AlxGayInzN layer. The metal oxide may be TiO2. The present invention provides a functional device that includes a group III nitride layer having excellent physical and chemical properties and a film integrally formed thereon. The film reflects less light at the interface and has chemical resistance and high durability.
摘要翻译:已经有对透明电极材料和磁性材料的要求,各自具有广泛的应用。 鉴于这些情况,提供了新颖的功能装置和形成氧化物材料的方法。 功能元件包括AlxGayInzN层(其中0和nlE; x和nlE; 1,0和nlE; y和nlE; 1和0≦̸ z≦̸ 1)和由Al x Ga y In N N层形成的金属氧化物构成的氧化物材料层。 金属氧化物可以是TiO 2。 本发明提供了具有优异的物理和化学特性的III族氮化物层和在其上一体形成的膜的功能器件。 该膜在界面处反射较少的光,并具有耐化学性和高耐久性。
摘要:
There have been demands for transparent electrode materials and magnetic materials, each having a wide range of applications. In view of the situations, a novel functional device and a method for forming an oxide material are provided. A functional device includes an AlxGayInzN layer (wherein 0≦x≦1, 0≦y≦1, and 0≦z≦1) and an oxide material layer composed of a metal oxide and formed on the AlxGayInzN layer. The metal oxide may be TiO2. The present invention provides a functional device that includes a group III nitride layer having excellent physical and chemical properties and a film integrally formed thereon. The film reflects less light at the interface and has chemical resistance and high durability.
摘要翻译:已经有对透明电极材料和磁性材料的要求,各自具有广泛的应用。 鉴于这些情况,提供了新颖的功能装置和形成氧化物材料的方法。 功能器件包括AlxGayInzN层(其中0≤x≤1,0<= y <= 1且0 <= z <= 1)和由金属氧化物构成并形成在Al x Ga y In Zn层上的氧化物材料层 。 金属氧化物可以是TiO 2。 本发明提供了具有优异的物理和化学特性的III族氮化物层和在其上一体形成的膜的功能器件。 该膜在界面处反射较少的光,并具有耐化学性和高耐久性。
摘要:
When a p-layer 4 composed of GaN is maintained at ordinary temperature and TNO is sputtered thereon by an RF magnetron sputtering method, a laminated TNO layer 5 is in an amorphous state. Then, there is included a step of thermally treating the amorphous TNO layer in a reduced-pressure atmosphere where hydrogen gas is substantially absent to thereby crystallize the TNO layer. At the sputtering, an inert gas is passed through together with oxygen gas, and volume % of the oxygen gas contained in the gas passed through is 0.10 to 0.15%. In this regard, oxygen partial pressure is 5×10−3 Pa or lower. The temperature of the thermal treatment is 500° C. for about 1 hour.
摘要:
The refractive index of a titanium oxide layer is modified by adding an impurity (e.g., niobium (Nb)) thereto within a range where good electrical conductivity is obtained. The Group III nitride-based compound semiconductor light-emitting device of the invention includes a sapphire substrate, an aluminum nitride (AlN) buffer layer, an n-contact layer, an n-cladding layer, a multiple quantum well layer (emission wavelength: 470 nm), a p-cladding layer, and a p-contact layer. On the p-contact layer is provided a transparent electrode made of niobium titanium oxide and having an embossment. An electrode is provided on the n-contact layer. An electrode pad is provided on a portion of the transparent electrode. Since the transparent electrode is formed from titanium oxide containing 3% niobium, the refractive index with respect to light (wavelength: 470 nm) becomes almost equal to that of the p-contact layer. Thus, the total reflection at the interface between the p-contact layer and the transparent electrode can be avoided to the smallest possible extent. In addition, by virtue of the embossment, light extraction performance is increased by 30%.
摘要:
With regard to a substrate for a transparent electrode and transparent conductive thin film each having transparency and conductivity, a transparent metal material and transparent electrode are provided which are capable of being stably supplied and are composed of raw materials with superior chemical resistance. When a metal oxide layer (12) composed of an anatase type crystal structure is provided on a substrate (11) to constitute the metal oxide layer (12) by M:TiO2, low resistivity is achieved while internal transmittance is maintained. M:TiO2 obtained by substituting other atoms (Nb, Ta, Mo, As, Sb, or W) for Ti of the anatase type TiO2 enable maintenance of transparency and remarkably improvement of electric conductivity.