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    ELECTRON MICROSCOPE AND IMAGE CAPTURING METHOD USING ELECTRON BEAM
    1.
    发明申请
    ELECTRON MICROSCOPE AND IMAGE CAPTURING METHOD USING ELECTRON BEAM 有权
    使用电子束的电子显微镜和图像捕获方法

    公开(公告)号：US20140097342A1

    公开(公告)日：2014-04-10

    申请号：US14123744

    申请日：2012-05-24

    申请人： Natsuki Tsuno ,  Hideyuki Kazumi ,  Yuzuru Mochizuki ,  Takafumi Miwa ,  Yoshinobu Kimura ,  Toshiyuki Yokosuka

    发明人： Natsuki Tsuno ,  Hideyuki Kazumi ,  Yuzuru Mochizuki ,  Takafumi Miwa ,  Yoshinobu Kimura ,  Toshiyuki Yokosuka

    IPC分类号： H01J37/26 ,  G01B15/04 ,  H01J37/28

    CPC分类号： H01J37/265 ,  G01B15/04 ,  H01J37/28 ,  H01J2237/24585 ,  H01J2237/2803

    摘要： The present invention is characterized by an electron microscope which intermittently applies an electron beam to a sample and detects a secondary electron signal, wherein an arbitrarily defined detection time (T2) shorter than the pulse width (Tp) of the applied electron beam is selected, and a secondary electron image is formed using the secondary electron signal acquired during the detection time. Consequently, it is possible to reflect necessary sample information including the internal structure and laminated interface of the sample in the contrast of an image and prevent unnecessary information from being superimposed on the image, thereby making it possible to obtain the secondary electron image with improved sample information selectivity and image quality.

    摘要翻译： 本发明的特征在于电子显微镜，其间断地向样品施加电子束并检测二次电子信号，其中选择比所施加的电子束的脉冲宽度（Tp）短的任意定义的检测时间（T2） 并且使用在检测时间期间获取的二次电子信号形成二次电子图像。 因此，可以在图像的对比度中反映包括样本的内部结构和层叠界面的必要样本信息，并且防止不必要的信息被叠加在图像上，从而可以获得具有改进的样本的二次电子图像 信息选择性和图像质量。

    Electron microscope and image capturing method using electron beam
    2.
    发明授权
    Electron microscope and image capturing method using electron beam 有权
    电子显微镜和使用电子束的图像捕获方法

    公开(公告)号：US08907279B2

    公开(公告)日：2014-12-09

    申请号：US14123744

    申请日：2012-05-24

    申请人： Natsuki Tsuno ,  Hideyuki Kazumi ,  Yuzuru Mochizuki ,  Takafumi Miwa ,  Yoshinobu Kimura ,  Toshiyuki Yokosuka

    发明人： Natsuki Tsuno ,  Hideyuki Kazumi ,  Yuzuru Mochizuki ,  Takafumi Miwa ,  Yoshinobu Kimura ,  Toshiyuki Yokosuka

    IPC分类号： H01J37/26 ,  G01B15/04 ,  H01J37/28

    CPC分类号： H01J37/265 ,  G01B15/04 ,  H01J37/28 ,  H01J2237/24585 ,  H01J2237/2803

    摘要： The present invention is characterized by an electron microscope which intermittently applies an electron beam to a sample and detects a secondary electron signal, wherein an arbitrarily defined detection time (T2) shorter than the pulse width (Tp) of the applied electron beam is selected, and a secondary electron image is formed using the secondary electron signal acquired during the detection time. Consequently, it is possible to reflect necessary sample information including the internal structure and laminated interface of the sample in the contrast of an image and prevent unnecessary information from being superimposed on the image, thereby making it possible to obtain the secondary electron image with improved sample information selectivity and image quality.

    摘要翻译： 本发明的特征在于电子显微镜，其间断地向样品施加电子束并检测二次电子信号，其中选择比所施加的电子束的脉冲宽度（Tp）短的任意定义的检测时间（T2） 并且使用在检测时间期间获取的二次电子信号形成二次电子图像。 因此，可以在图像的对比度中反映包括样本的内部结构和层叠界面的必要样本信息，并且防止不必要的信息被叠加在图像上，从而可以获得具有改进的样本的二次电子图像 信息选择性和图像质量。

    Electron Beam Irradiation Method and Scanning Electron Microscope
    4.
    发明申请
    Electron Beam Irradiation Method and Scanning Electron Microscope 有权
    电子束照射方法和扫描电子显微镜

    公开(公告)号：US20130009057A1

    公开(公告)日：2013-01-10

    申请号：US13580288

    申请日：2011-02-09

    申请人： Toshiyuki Yokosuka ,  Minoru Yamazaki ,  Hideyuki Kazumi ,  Kazutami Tago

    发明人： Toshiyuki Yokosuka ,  Minoru Yamazaki ,  Hideyuki Kazumi ,  Kazutami Tago

    IPC分类号： H01J37/29

    CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/266 ,  H01J37/268 ,  H01J2237/0048 ,  H01J2237/24564 ,  H01J2237/2594

    摘要： The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions.To accomplish the above object, a charged particle beam irradiation method and a charged particle beam apparatus are provided according to which the pre-dosing area is divided into a plurality of divisional areas and electrifications are deposited to the plural divisional areas by using a beam under different beam irradiation conditions. With the above construction, the electrifications can be deposited to the pre-dosing area on the basis of such an irradiation condition that the differences in electrification at individual positions inside the pre-dosing area can be suppressed and consequently, an influence an electric field has upon the charged particle beam and electrons given off from the sample can be suppressed.

    摘要翻译： 本发明的目的是提供一种带电粒子束照射方法和带电粒子束装置，其即使在预给料区域中包含多种不同种类的材料或图案密度程度时也能抑制通电不均匀性 预给药区域内的位置与位置不同。 为了实现上述目的，提供一种带电粒子束照射方法和带电粒子束装置，根据该装置，预给料区域被分成多个分区，并且通过使用下面的束将电气沉积到多个分区域 不同的束照射条件。 通过上述结构，可以基于这样一种照射条件将电气沉积到预给料区域，即可以抑制预给料区域内各个位置的通电差异，从而影响电场 可以抑制带电粒子束和从样品发出的电子。

    Charged particle beam device and a method of improving image quality of the same
    5.
    发明授权
    Charged particle beam device and a method of improving image quality of the same 有权
    带电粒子束装置及其提高图像质量的方法

    公开(公告)号：US09019362B2

    公开(公告)日：2015-04-28

    申请号：US13513280

    申请日：2010-11-08

    申请人： Jie Bai ,  Kenji Nakahira ,  Atsushi Miyamoto ,  Chie Shishido ,  Hideyuki Kazumi

    发明人： Jie Bai ,  Kenji Nakahira ,  Atsushi Miyamoto ,  Chie Shishido ,  Hideyuki Kazumi

    IPC分类号： H04N7/18 ,  G01N23/00 ,  G21K7/00 ,  G06K9/00 ,  G06K9/46 ,  G06K9/66 ,  H01J37/28 ,  H01J37/244 ,  H01L21/66

    CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/24495 ,  H01J2237/2809 ,  H01J2237/2817 ,  H01L22/12

    摘要： The invention relates to a technique of improving a contrast of a lower-layer pattern in a multi layer by synthesizing detected signals from a plurality of detectors by using an appropriate allocation ratio in accordance with pattern arrangement. In a charged particle beam device capable of improving image quality by using detected images obtained from a plurality of detectors and in a method of improving the image quality, a method of generating one or more output images from detected images corresponding to respective outputs of the detectors that are arranged at different locations is controlled by using information of a pattern direction, an edge strength, or others calculated from a design data or the detected image. In this manner, a detection area of the detected signals can be expanded by using the plurality of detectors, and the image quality such as the contrast can be improved by synthesizing the detected signals by using the pattern direction or the edge strength calculated from the design data or the detected images.

    摘要翻译： 本发明涉及一种通过根据图案布置使用合适的分配比例来合成来自多个检测器的检测信号来提高多层下层图案的对比度的技术。 在能够通过使用从多个检测器获得的检测图像来提高图像质量的带电粒子束装置中，以及提高图像质量的方法中，提供一种从与检测器的各个输出对应的检测图像生成一个或多个输出图像的方法 通过使用从设计数据或检测到的图像计算的图案方向，边缘强度或其他的信息来控制布置在不同位置处的位置。 以这种方式，可以通过使用多个检测器来扩展检测信号的检测区域，并且可以通过使用从设计计算出的图案方向或边缘强度合成检测信号来提高诸如对比度的图像质量 数据或检测到的图像。

    Method for Detecting Information of an Electric Potential on a Sample and Charged Particle Beam Apparatus
    8.
    发明申请
    Method for Detecting Information of an Electric Potential on a Sample and Charged Particle Beam Apparatus 有权
    用于检测样品和带电粒子束装置上的电位信息的方法

    公开(公告)号：US20090272899A1

    公开(公告)日：2009-11-05

    申请号：US11958625

    申请日：2007-12-18

    申请人： Minoru YAMAZAKI ,  Akira Ikegami ,  Hideyuki Kazumi ,  Osamu Nasu

    发明人： Minoru YAMAZAKI ,  Akira Ikegami ,  Hideyuki Kazumi ,  Osamu Nasu

    IPC分类号： G01N23/00

    CPC分类号： G01N23/2251 ,  G01R29/24 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/221 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594

    摘要： An object of the present invention is to provide a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential on the sample induced by the charged particle beam application, or detecting a compensation value for a change in a condition for the apparatus caused by the sample being electrically charged. In order to achieve the above object, the present invention provides a method and apparatus for applying a voltage to a sample so that a charged particle beam does not reach the sample (hereinafter, this may be referred to as “mirror state”) in a state in which the charged particle beam is applied toward the sample, and detecting information relating to a potential on the sample using signals obtained by that voltage application.

    摘要翻译： 本发明的目的是提供一种方法和装置，用于使用带电粒子束测量样品表面上的电位，同时抑制由带电粒子束施加引起的样品上的电位变化，或检测补偿 用于由样品带电引起的装置的状况改变的值。 为了实现上述目的，本发明提供了一种向样品施加电压使得带电粒子束不能到达样品的方法和装置（以下称为“镜像状态”），其中 将带电粒子束施加到样品的状态，以及使用通过该电压施加获得的信号检测与样品上的电位有关的信息。