利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

37 条记录 (耗时 0.022 秒)

    Resist stripping methods using backfilling material layer
    1.
    发明授权
    Resist stripping methods using backfilling material layer 有权
    使用回填材料层的抗剥落方法

    公开(公告)号：US07935637B2

    公开(公告)日：2011-05-03

    申请号：US11839934

    申请日：2007-08-16

    申请人： Nicholas C. M. Fuller ,  Sivananda Kanakasabapathy ,  Ying Zhang

    发明人： Nicholas C. M. Fuller ,  Sivananda Kanakasabapathy ,  Ying Zhang

    IPC分类号： H01L21/302 ,  H01L21/461

    CPC分类号： H01L21/31133 ,  H01L21/31058 ,  H01L21/31138

    摘要： A method for fabricating a microelectronic structure provides for forming a backfilling material layer at least laterally adjacent, and preferably laterally adjoining, a resist layer located over a substrate. Preferably, the resist layer comprises a surface treated resist layer. Optionally, the backfilling material layer may be surface treated similarly to the surface treated resist layer. Under such circumstances: (1) surface portions of the backfilling material layer and resist layer; and (2) remaining portions of the backfilling material layer and resist layer, may be sequentially stripped using a two step etch method, such as a two step plasma etch method. Alternatively, a surface portion of the surface treated resist layer only may be stripped while using a first etch method, and the remaining portions of the resist layer and backfilling material layer may be planarized prior to being simultaneously stripped while using a second etch method.

    摘要翻译： 用于制造微电子结构的方法提供了形成位于衬底上方的至少侧向邻近且优选地横向邻接的抗蚀剂层的回填材料层。 优选地，抗蚀剂层包括表面处理的抗蚀剂层。 任选地，回填材料层可以与表面处理的抗蚀剂层类似地进行表面处理。 在这种情况下：（1）回填材料层和抗蚀剂层的表面部分; 和（2）回填材料层和抗蚀剂层的剩余部分可以使用两步蚀刻方法，例如两步等离子体蚀刻方法来顺序剥离。 或者，仅使用第一蚀刻方法剥离表面处理的抗蚀剂层的表面部分，并且可以在使用第二蚀刻方法同时剥离之前将抗蚀剂层和回填材料层的其余部分平坦化。

    RESIST STRIPPING METHODS USING BACKFILLING MATERIAL LAYER
    2.
    发明申请
    RESIST STRIPPING METHODS USING BACKFILLING MATERIAL LAYER 有权
    使用回填材料层的抗剥落方法

    公开(公告)号：US20090047784A1

    公开(公告)日：2009-02-19

    申请号：US11839934

    申请日：2007-08-16

    申请人： Nicholas C.M. Fuller ,  Sivananda Kanakasabapathy ,  Ying Zhang

    发明人： Nicholas C.M. Fuller ,  Sivananda Kanakasabapathy ,  Ying Zhang

    IPC分类号： H01L21/461 ,  H01L21/311

    CPC分类号： H01L21/31133 ,  H01L21/31058 ,  H01L21/31138

    摘要： A method for fabricating a microelectronic structure provides for forming a backfilling material layer at least laterally adjacent, and preferably laterally adjoining, a resist layer located over a substrate. Preferably, the resist layer comprises a surface treated resist layer. Optionally, the backfilling material layer may be surface treated similarly to the surface treated resist layer. Under such circumstances: (1) surface portions of the backfilling material layer and resist layer; and (2) remaining portions of the backfilling material layer and resist layer, may be sequentially stripped using a two step etch method, such as a two step plasma etch method. Alternatively, a surface portion of the surface treated resist layer only may be stripped while using a first etch method, and the remaining portions of the resist layer and backfilling material layer may be planarized prior to being simultaneously stripped while using a second etch method.

    摘要翻译： 用于制造微电子结构的方法提供了形成位于衬底上方的至少侧向邻近且优选地横向邻接的抗蚀剂层的回填材料层。 优选地，抗蚀剂层包括表面处理的抗蚀剂层。 任选地，回填材料层可以与表面处理的抗蚀剂层类似地进行表面处理。 在这种情况下：（1）回填材料层和抗蚀剂层的表面部分; 和（2）回填材料层和抗蚀剂层的剩余部分可以使用两步蚀刻方法，例如两步等离子体蚀刻方法来顺序剥离。 或者，仅使用第一蚀刻方法剥离表面处理的抗蚀剂层的表面部分，并且可以在使用第二蚀刻方法同时剥离之前将抗蚀剂层和回填材料层的其余部分平坦化。

    Method of eDRAM DT strap formation in FinFET device structure
    5.
    发明授权
    Method of eDRAM DT strap formation in FinFET device structure 有权
    FinFET器件结构中eDRAM DT带形成方法

    公开(公告)号：US08927365B2

    公开(公告)日：2015-01-06

    申请号：US13556437

    申请日：2012-07-24

    申请人： Veeraraghavan S. Basker ,  Sivananda Kanakasabapathy ,  Tenko Yamashita ,  Chun-Chen Yeb

    发明人： Veeraraghavan S. Basker ,  Sivananda Kanakasabapathy ,  Tenko Yamashita ,  Chun-Chen Yeb

    IPC分类号： H01L21/8242

    CPC分类号： H01L27/10867 ,  H01L21/845 ,  H01L27/10826 ,  H01L27/1087 ,  H01L27/10879 ,  H01L27/1211

    摘要： The specification and drawings present a new method, device and computer/software related product (e.g., a computer readable memory) are presented for realizing eDRAM strap formation in Fin FET device structures. Semiconductor on insulator (SOI) substrate comprising at least an insulator layer between a first semiconductor layer and a second semiconductor layer is provided. The (metal) strap formation is accomplished by depositing conductive layer on fins portion of the second semiconductor layer (Si) and a semiconductor material (polysilicon) in each DT capacitor extending to the second semiconductor layer. The metal strap is sealed by a nitride spacer to prevent the shorts between PWL and DT capacitors.

    摘要翻译： 说明书和附图提出了一种新的方法，设备和计算机/软件相关产品（例如，计算机可读存储器），用于实现Fin FET器件结构中的eDRAM带形成。 提供了在第一半导体层和第二半导体层之间至少包括绝缘体层的半导体绝缘体（SOI）衬底。 （金属）带形成是通过在第二半导体层（Si）的鳍部分上沉积导电层和延伸到第二半导体层的每个DT电容器中的半导体材料（多晶硅）来实现的。 金属带由氮化物间隔物密封，以防止PWL和DT电容器之间的短路。

    Sidewall image transfer process with multiple critical dimensions
    6.
    发明授权
    Sidewall image transfer process with multiple critical dimensions 有权
    具有多个关键尺寸的侧壁图像传输过程

    公开(公告)号：US08673165B2

    公开(公告)日：2014-03-18

    申请号：US13267198

    申请日：2011-10-06

    申请人： Sudharshanan Raghunathan ,  Sivananda Kanakasabapathy ,  Ryan O. Jung ,  Allen H Gabor ,  Sean D. Burns ,  Erin Catherine McLellan

    发明人： Sudharshanan Raghunathan ,  Sivananda Kanakasabapathy ,  Ryan O. Jung ,  Allen H Gabor ,  Sean D. Burns ,  Erin Catherine McLellan

    IPC分类号： H01L21/311

    CPC分类号： H01L21/0338 ,  H01L21/0337

    摘要： Embodiment of the present invention provides a method of forming a semiconductor device in a sidewall image transfer process with multiple critical dimensions. The method includes forming a multi-level dielectric layer over a plurality of mandrels, the multi-level dielectric layer having a plurality of regions covering the plurality of mandrels, the plurality of regions of the multi-level dielectric layer having different thicknesses; etching the plurality of regions of the multi-level dielectric layer into spacers by applying a directional etching process, the spacers being formed next to sidewalls of the plurality of mandrels and having different widths corresponding to the different thicknesses of the plurality of regions of the multi-level dielectric layer; removing the plurality of mandrels in-between the spacers; and transferring bottom images of the spacers into one or more layers underneath the spacers.

    摘要翻译： 本发明的实施例提供了一种在具有多个关键尺寸的侧壁图像转印工艺中形成半导体器件的方法。 该方法包括在多个心轴上形成多层介质层，多层介质层具有覆盖多个心轴的多个区域，多层介质层的多个区域具有不同的厚度; 通过施加定向蚀刻工艺将多层电介质层的多个区域蚀刻成间隔物，间隔物形成在多个心轴的侧壁旁边，并且具有对应于多个区域的多个区域的不同厚度的不同宽度 电介质层; 去除间隔件之间的多个心轴; 并将间隔物的底部图像转移到间隔物下面的一个或多个层中。

    Method of making a semiconductor device
    7.
    发明授权
    Method of making a semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号：US08586478B2

    公开(公告)日：2013-11-19

    申请号：US13424932

    申请日：2012-03-20

    申请人： Eiichi Soda ,  Yunpeng Yin ,  Sivananda Kanakasabapathy

    发明人： Eiichi Soda ,  Yunpeng Yin ,  Sivananda Kanakasabapathy

    IPC分类号： H01L21/44

    CPC分类号： H01L21/31144 ,  H01L21/0337 ,  H01L21/76811 ,  H01L21/76816 ,  H01L21/76897

    摘要： An improved method of making interconnect structures with self-aligned vias in semiconductor devices utilizes sidewall image transfer to define the trench pattern. The sidewall height acts as a sacrificial mask during etching of the via and subsequent etching of the trench, so that the underlying metal hard mask is protected. Thinner hard masks and/or a wider range of etch chemistries may thereby be utilized.

    摘要翻译： 在半导体器件中制造具有自对准通孔的互连结构的改进方法利用侧壁图像转移来限定沟槽图案。 在蚀刻通孔和​​随后蚀刻沟槽期间，侧壁高度用作牺牲掩模，使得下面的金属硬掩模被保护。 因此可以利用更薄的硬掩模和/或更广泛的蚀刻化学物质。

    Stacked Magnetic Devices
    8.
    发明申请
    Stacked Magnetic Devices 失效
    堆叠式磁性器件

    公开(公告)号：US20090279354A1

    公开(公告)日：2009-11-12

    申请号：US12504860

    申请日：2009-07-17

    申请人： Sivananda Kanakasabapathy ,  Yu Lu ,  Michael Christopher Gaidis, III

    发明人： Sivananda Kanakasabapathy ,  Yu Lu ,  Michael Christopher Gaidis, III

    IPC分类号： G11C11/14

    CPC分类号： G11C11/15

    摘要： Techniques for improving magnetic device performance are provided. In one aspect, a magnetic device, e.g., a magnetic random access memory device, is provided which comprises a plurality of current carrying lines; and two or more adjacent stacked magnetic toggling devices sharing at least one of the plurality of current carrying lines in common and positioned therebetween. The magnetic device is configured such that at least one of the adjacent magnetic toggling devices toggles mutually exclusively of another of the adjacent magnetic toggling devices. In an exemplary embodiment, the magnetic device comprises a plurality of levels with each of the adjacent stacked magnetic toggling devices residing in a different level.

    摘要翻译： 提供了提高磁性器件性能的技术。 在一个方面，提供一种磁性装置，例如磁性随机存取存储装置，其包括多个载流线; 以及两个或更多个相邻的层叠磁性切换装置，其共同地共享多个载流线中的至少一个并且位于它们之间。 磁性装置被配置成使得至少一个相邻的磁性切换装置互相切换另一个相邻的磁性切换装置。 在示例性实施例中，磁性装置包括多个级别，其中每个相邻的层叠磁性切换装置处于不同的水平。

    Utilizing sidewall spacer features to form magnetic tunnel junctions in an integrated circuit
    9.
    发明申请
    Utilizing sidewall spacer features to form magnetic tunnel junctions in an integrated circuit 有权
    利用侧壁间隔物特征在集成电路中形成磁隧道结

    公开(公告)号：US20070166840A1

    公开(公告)日：2007-07-19

    申请号：US11333997

    申请日：2006-01-18

    申请人： Solomon Assefa ,  Michael Gaidis ,  Sivananda Kanakasabapathy ,  John Hummel ,  David Abraham

    发明人： Solomon Assefa ,  Michael Gaidis ,  Sivananda Kanakasabapathy ,  John Hummel ,  David Abraham

    IPC分类号： H01L21/00 ,  H01L29/94

    CPC分类号： H01L43/12 ,  H01L27/222

    摘要： Novel methods for reliably and reproducibly forming magnetic tunnel junctions in integrated circuits are described. In accordance with aspects of the invention, sidewall spacer features are utilized during the processing of the film stack. Advantageously, these sidewall spacer features create a tapered masking feature which helps to avoid byproduct redeposition during the etching of the MTJ film stack, thereby improving process yield. Moreover, the sidewall spacer features may be used as encapsulating layers during subsequent processing steps and as vertical contacts to higher levels of metallization.

    摘要翻译： 描述了在集成电路中可靠且可重复地形成磁隧道结的新方法。 根据本发明的方面，在膜叠层的处理期间利用侧壁间隔物特征。 有利地，这些侧壁间隔物特征产生锥形掩蔽特征，其有助于避免在MTJ膜叠层的蚀刻期间的副产物再沉积，从而提高工艺产率。 此外，侧壁间隔物特征可以在随后的处理步骤期间用作包封层，并且可以用作垂直接触以进行更高级别的金属化。

    Method for semiconductor gate hardmask removal and decoupling of implants
    10.
    发明授权
    Method for semiconductor gate hardmask removal and decoupling of implants 有权
    半导体门硬掩模移除和植入物去耦方法

    公开(公告)号：US08133746B2

    公开(公告)日：2012-03-13

    申请号：US12714702

    申请日：2010-03-01

    申请人： Sivananda Kanakasabapathy ,  Hemanth Jagannathan

    发明人： Sivananda Kanakasabapathy ,  Hemanth Jagannathan

    IPC分类号： H01L21/00 ,  H01L21/336

    CPC分类号： H01L29/4908 ,  H01L29/66772

    摘要： A method is provided for fabricating a semiconductor device having implanted source/drain regions and a gate region, the gate region having been masked by the gate hardmask during source/drain implantation, the gate region having a polysilicon gate layered on a metal layered on a high-K dielectric layer. The gate region and the source/drain regions may be covered with a self planarizing spin on film. The film may be blanket etched back to uncover the gate hardmask while maintaining an etched back self planarizing spin on film on the implanted source/drain regions. The gate hardmask may be etched back while the etched back film remains in place to protect the implanted source/drain regions. The gate region may be low energy implanted to lower sheet resistance of the polysilicon layer. The etched back film may be then removed.

    摘要翻译： 提供了一种用于制造具有注入的源极/漏极区域和栅极区域的半导体器件的方法，栅极区域在源极/漏极注入期间被栅极硬掩模掩蔽，栅极区域具有层叠在金属层上的金属上的多晶硅栅极 高K电介质层。 栅极区域和源极/漏极区域可以用膜上的自平面旋转覆盖。 该膜可以被覆盖回蚀刻以露出栅极硬掩模，同时保持在植入的源极/漏极区域上的膜上的回蚀刻自平面化旋涂。 栅极硬掩模可以被蚀刻回来，同时蚀刻的后膜保持在适当位置以保护植入的源极/漏极区域。 栅极区域可以是低能量注入以降低多晶硅层的薄层电阻。 然后可以去除蚀刻后的膜。