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公开(公告)号：US08455847B2
公开(公告)日：2013-06-04
申请号：US13428682
申请日：2012-03-23
IPC分类号： H01J37/317 , H01J37/244 , H01J3/07
CPC分类号： H01J37/3171 , H01J2237/24507 , H01J2237/24528 , H01J2237/31711 , H01L21/26513 , H01L21/2658 , H01L21/266 , H01L31/0288 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is translated across the ion beam. The current of the ion beam directed through a plurality of apertures of the mask is measured using the ion current measurement device. In this manner, the position of the mask with respect to the ion beam as well as the condition of the mask may be determined based on the ion current profile measured by the ion current measurement device.
摘要翻译： 在离子注入机中，离子电流测量装置相对于目标基板的表面共面设置在掩模的后面，如同所述目标基板位于压板上一样。 离子电流测量装置通过离子束平移。 使用离子电流测量装置测量引导通过掩模的多个孔的离子束的电流。 以这种方式，掩模相对于离子束的位置以及掩模的条件可以基于由离子电流测量装置测量的离子电流分布来确定。
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公开(公告)号：US08921149B2
公开(公告)日：2014-12-30
申请号：US13034354
申请日：2011-02-24
IPC分类号： H01L21/266 , H01L21/265 , H01L31/068
CPC分类号： H01L21/266 , H01L21/26513 , H01L31/0682 , Y02E10/547
摘要： A first species selectively dopes a workpiece to form a first doped region. In one embodiment, a selective implant is performed using a mask with apertures. A soft mask is applied to the first doped region. A second species is implanted into the workpiece to form a second implanted region. The soft mask blocks a portion of the second species. Then the soft mask is removed. The first species and second species may be opposite conductivities such that one is p-type and the other is n-type.
摘要翻译： 第一种类选择性地掺杂工件以形成第一掺杂区域。 在一个实施例中，使用具有孔的掩模进行选择性植入。 软掩模被施加到第一掺杂区域。 将第二物质植入工件以形成第二注入区域。 软掩模阻挡了第二种物质的一部分。 然后去除软面膜。 第一种和第二种可能是相反的电导率，一个是p型，另一个是n型。
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公开(公告)号：US08912082B2
公开(公告)日：2014-12-16
申请号：US13070206
申请日：2011-03-23
IPC分类号： H01L21/265 , H01L31/0224 , H01L21/266 , H01L31/18 , H01L31/068
CPC分类号： H01L21/266 , H01L31/022441 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： Methods to form complementary implant regions in a workpiece are disclosed. A mask may be aligned with respect to implanted or doped regions on the workpiece. The mask also may be aligned with respect to surface modifications on the workpiece, such as deposits or etched regions. A masking material also may be deposited on the implanted regions using the mask. The workpiece may be a solar cell.
摘要翻译： 公开了在工件中形成互补植入区域的方法。 掩模可以相对于工件上的注入或掺杂区域排列。 掩模也可以相对于工件上的表面改性（例如沉积物或蚀刻区域）对准。 掩模材料也可以使用掩模沉积在注入区域上。 工件可以是太阳能电池。
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公开(公告)号：US08164068B2
公开(公告)日：2012-04-24
申请号：US12845665
申请日：2010-07-28
IPC分类号： H01J37/317 , H01J37/244 , H01J3/07
CPC分类号： H01J37/3171 , H01J2237/24507 , H01J2237/24528 , H01J2237/31711 , H01L21/26513 , H01L21/2658 , H01L21/266 , H01L31/0288 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is translated across the ion beam. The current of the ion beam directed through a plurality of apertures of the mask is measured using the ion current measurement device. In this manner, the position of the mask with respect to the ion beam as well as the condition of the mask may be determined based on the ion current profile measured by the ion current measurement device.
摘要翻译： 在离子注入机中，离子电流测量装置相对于目标基板的表面共面设置在掩模的后面，如同所述目标基板位于压板上一样。 离子电流测量装置通过离子束平移。 使用离子电流测量装置测量引导通过掩模的多个孔的离子束的电流。 以这种方式，掩模相对于离子束的位置以及掩模的条件可以基于由离子电流测量装置测量的离子电流分布来确定。
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公开(公告)号：US08685846B2
公开(公告)日：2014-04-01
申请号：US12695729
申请日：2010-01-28
IPC分类号： H01L21/425
CPC分类号： H01L21/266 , H01J37/09 , H01J37/3171 , H01J2237/0458 , H01J2237/31711 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate. The method may comprise ion implanting a substrate disposed downstream of the ion source with ions generated in an ion source; and disposing a first portion of a mask in front of the substrate to expose the first portion of the mask to the ions, the mask being supported by the first and second mask holders, the mask further comprising a second portion wound in the first mask holder.
摘要翻译： 公开了一种用于处理衬底的改进技术。 在一个特定的示例性实施例中，该技术可以被实现为用于处理衬底的方法。 该方法可以包括离子注入在离子源的下游设置的离子，其离子在离子源中产生; 以及将掩模的第一部分设置在所述基板的前面以将所述掩模的所述第一部分暴露于所述离子，所述掩模由所述第一和第二掩模保持器支撑，所述掩模还包括缠绕在所述第一掩模保持器中的第二部分 。
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公开(公告)号：US08008176B2
公开(公告)日：2011-08-30
申请号：US12853698
申请日：2010-08-10
IPC分类号： H01L21/425
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/31711 , H01L21/266 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.
摘要翻译： 制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。 离子束被引导通过掩模中的多个孔朝向衬底。 衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。 通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。 这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。
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公开(公告)号：US07888249B2
公开(公告)日：2011-02-15
申请号：US12760227
申请日：2010-04-14
IPC分类号： H01L21/425
CPC分类号： H01L31/18 , H01J37/3171 , H01J37/32412 , H01J2237/0827 , H01J2237/202 , H01J2237/31711 , H01L21/26513 , H01L21/266 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The manufacture of solar cells is simplified and cost reduced through by performing successive ion implants, without an intervening thermal cycle. In addition to reducing process time, the use of chained ion implantations may also improve the performance of the solar cell. In another embodiment, two different species are successively implanted without breaking vacuum. In another embodiment, the substrate is implanted, then flipped such that it can be and implanted on both sides before being annealed. In yet another embodiment, one or more different masks are applied and successive implantations are performed without breaking the vacuum condition, thereby reducing the process time.
摘要翻译： 太阳能电池的制造通过执行连续的离子注入而没有中间热循环而简化并降低成本。 除了缩短处理时间之外，使用链式离子注入也可以提高太阳能电池的性能。 在另一个实施方案中，连续地植入两种不同的物质而不破坏真空。 在另一个实施例中，植入衬底，然后翻转，使得其可以在退火之前两面植入。 在另一个实施例中，施加一个或多个不同的掩模，并且在不破坏真空条件的情况下执行连续的注入，由此减少处理时间。
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公开(公告)号：US08895325B2
公开(公告)日：2014-11-25
申请号：US13458441
申请日：2012-04-27
CPC分类号： H01J37/3171 , H01J37/3045 , H01J2237/31711 , H01L21/266
摘要： A system and method are disclosed for aligning substrates during successive process steps, such as ion implantation steps, is disclosed. Implanted regions are created on a substrate. After implantation, an image is obtained of the implanted regions, and a fiducial is provided on the substrate in known relation to at least one of the implanted regions. A thermal anneal process is performed on the substrate such that the implanted regions are no longer visible but the fiducial remains visible. The position of the fiducial may be used in downstream process steps to properly align pattern masks over the implanted regions. The fiducial also may be applied to the substrate before any ion implanting of the substrate is performed. The position of the fiducial with respect to an edge or a corner of the substrate may be used for aligning during downstream process steps. Other embodiments are described and claimed.
摘要翻译： 公开了用于在连续工艺步骤期间对准衬底的系统和方法，例如离子注入步骤。 在衬底上形成植入区域。 在植入之后，获得植入区域的图像，并且已知关系到至少一个植入区域的基底上提供了基准。 在基板上进行热退火处理，使得注入区域不再可见，但基准仍然可见。 基准的位置可以用于下游处理步骤，以便在注入区域上正确对准图案掩模。 在进行基板的任何离子注入之前，基准也可以应用于基板。 基准面相对于衬底的边缘或拐角的位置可用于在下游工艺步骤期间对准。 描述和要求保护其他实施例。
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公开(公告)号：US08461553B2
公开(公告)日：2013-06-11
申请号：US13188837
申请日：2011-07-22
IPC分类号： H01J37/317 , H01J37/244 , H01J3/07 , G21K5/10
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/31711 , H01L21/266 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.
摘要翻译： 制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。 离子束被引导通过掩模中的多个孔朝向衬底。 衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。 通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。 这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。
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10.发明授权公开(公告)号：US08372737B1
公开(公告)日：2013-02-12
申请号：US13170792
申请日：2011-06-28
IPC分类号： H01L21/425
CPC分类号： H01L21/266 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of implanting a solar cell is disclosed. A substrate is coated with a soft mask material. A shadow mask is used to perform a pattern ion implant and to set the soft mask material. After the soft mask material is set, the mask is removed and a blanket implant is performed.
摘要翻译： 公开了一种改进的植入太阳能电池的方法。 用软掩模材料涂覆基材。 阴影掩模用于执行图案离子注入并设置软掩模材料。 在软掩模材料被设置之后，去除掩模并执行覆盖植入。
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