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公开(公告)号：US20090176064A1
公开(公告)日：2009-07-09
申请号：US12225670
申请日：2007-03-28
IPC分类号： B32B3/10 , B05D3/02 , B05D5/12 , C23C16/513 , H01L21/306
CPC分类号： G01F1/692 , B81B2201/0278 , B81B2203/0127 , B81C1/00666 , B81C2201/0169 , B81C2201/0178 , C23C16/402 , C23C16/56 , Y10T428/24488 , Y10T428/24612
摘要： It is intended to provide a membrane structure element that can be easily manufactured, has an excellent insulating property and high quality; and a method for manufacturing the membrane structure element. The manufacturing method is for manufacturing a membrane structure element including a membrane formed of a silicon oxide film and a substrate which supports the membrane in a hollow state by supporting a part of a periphery of the membrane. The method includes: a film formation step of forming a heat-shrinkable silicon oxide film 13 on a surface of a silicon substrate 2 by plasma CVD method; a heat treatment step of performing a heat treatment to cause the thermal shrinkage of the silicon oxide film 13 formed on the substrate 1; and a removal step of removing a part of the substrate 2 in such a manner that a membrane-corresponding part of the silicon oxide film 13 is supported as a membrane in a hollow state with respect to the substrate 2 to form a recessed part 4.
摘要翻译： 本发明提供可以容易地制造，具有优异的绝缘性和高质量的膜结构元件; 和膜结构元件的制造方法。 该制造方法是用于制造包括由氧化硅膜形成的膜的膜结构元件和通过支撑膜的周边的一部分而将膜支撑在中空状态的基板。 该方法包括：通过等离子体CVD法在硅衬底2的表面上形成热收缩氧化硅膜13的成膜步骤; 对形成在基板1上的氧化硅膜13的热收缩进行热处理的热处理工序; 以及去除基板2的一部分的去除步骤，使得氧化硅膜13的膜相应部分作为相对于基板2的中空状态的膜被支撑以形成凹部4。
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公开(公告)号：US20090017255A1
公开(公告)日：2009-01-15
申请号：US12230689
申请日：2008-09-03
IPC分类号： B32B7/00
CPC分类号： H01P3/165 , H01P11/006 , Y10T428/24182
摘要： A dielectric line having a sufficient ensured strength and being suitable for mass production and a production method therefor are provided. The production method is a method for manufacturing a dielectric line having a dielectric strip which is provided between two conductive plates approximately parallel to each other and which has a width smaller than that of the conductive plates, and dielectric medium layers which are filled between the conductive plates other than the dielectric strip and which is composed of a porous material having a dielectric constant smaller than that of the dielectric strip. The dielectric line (NRD guide) is produced by film forming steps S11 and S12 in which a film of a dielectric raw material is formed on one of the conductive plates, a strip exposure step S13 in which a part of the above film having a shape corresponding to the dielectric strip is exposed to predetermined light, beams, or vapor, and pore forming steps S15 and S16 in which the entire film of the dielectric raw material is made porous.
摘要翻译： 提供具有足够的确保强度并适合于批量生产的介质线及其制造方法。 该制造方法是制造具有介电条的介质线的方法，该介质条设置在彼此大致平行的两个导电板之间，其宽度小于导电板的宽度，以及填充在导电性 除了介质条之外的板，其由介电常数小于介质条的介电常数的多孔材料构成。 介质线（NRD导向件）是通过在其中一个导电板上形成电介质原料的薄膜形成步骤S11和S12来制造的，条带曝光步骤S13，其中上述薄膜的一部分具有形状 相当于电介质条被暴露于预定的光，光束或蒸汽，以及孔形成步骤S15和S16，其中电介质原料的整个膜被制成多孔的。
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公开(公告)号：US07432038B2
公开(公告)日：2008-10-07
申请号：US10543135
申请日：2004-01-05
CPC分类号： H01P3/165 , H01P11/006 , Y10T428/24182
摘要： A dielectric line having a sufficient ensured strength and being suitable for mass production and a production method therefor are provided. The production method is a method for manufacturing a dielectric line having a dielectric strip which is provided between two conductive plates approximately parallel to each other and which has a width smaller than that of the conductive plates, and dielectric medium layers which are filled between the conductive plates other than the dielectric strip and which is composed of a porous material having a dielectric constant smaller than that of the dielectric strip. The dielectric line (NRD guide) is produced by film forming steps S11 and S12 in which a film of a dielectric raw material is formed on one of the conductive plates, a strip exposure step S13 in which a part of the above film having a shape corresponding to the dielectric strip is exposed to predetermined light, beams, or vapor, and pore forming steps S15 and S16 in which the entire film of the dielectric raw material is made porous.
摘要翻译： 提供具有足够的确保强度并适合于批量生产的介质线及其制造方法。 该制造方法是制造具有介电条的介质线的方法，该介质条设置在彼此大致平行的两个导电板之间，其宽度小于导电板的宽度，以及填充在导电性 除了介质条之外的板，其由介电常数小于介质条的介电常数的多孔材料构成。 电介质线（NRD导向件）通过其中在一个导电板上形成电介质原料的薄膜形成步骤S11和S12来制造，条带曝光步骤S13，其中部分上述膜 具有与介质条相对应的形状暴露于预定的光，光束或蒸汽，以及孔形成步骤S 15和S 16，其中电介质原料的整个膜是多孔的。
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公开(公告)号：US20060102937A1
公开(公告)日：2006-05-18
申请号：US10543135
申请日：2004-01-05
IPC分类号： H01L29/80
CPC分类号： H01P3/165 , H01P11/006 , Y10T428/24182
摘要： A dielectric line having a sufficient ensured strength and being suitable for mass production and a production method therefor are provided. The production method is a method for manufacturing a dielectric line having a dielectric strip which is provided between two conductive plates approximately parallel to each other and which has a width smaller than that of the conductive plates, and dielectric medium layers which are filled between the conductive plates other than the dielectric strip and which is composed of a porous material having a dielectric constant smaller than that of the dielectric strip. The dielectric line (NRD guide) is produced by film forming steps S11 and S12 in which a film of a dielectric raw material is formed on one of the conductive plates, a strip exposure step S13 in which a part of the above film having a shape corresponding to the dielectric strip is exposed to predetermined light, beams, or vapor, and pore forming steps S15 and S16 in which the entire film of the dielectric raw material is made porous.
摘要翻译： 提供具有足够的确保强度并适合于批量生产的介质线及其制造方法。 该制造方法是制造具有介电条的介质线的方法，该介质条设置在彼此大致平行的两个导电板之间，其宽度小于导电板的宽度，以及填充在导电性 除了介质条之外的板，其由介电常数小于介质条的介电常数的多孔材料构成。 电介质线（NRD导向件）通过其中在一个导电板上形成电介质原料的薄膜形成步骤S11和S12来制造，条带曝光步骤S13，其中部分上述膜 具有与介质条相对应的形状暴露于预定的光，光束或蒸汽，以及孔形成步骤S 15和S 16，其中电介质原料的整个膜是多孔的。
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公开(公告)号：US07209088B2
公开(公告)日：2007-04-24
申请号：US11000975
申请日：2004-12-02
IPC分类号： H01Q13/00
CPC分类号： H01Q9/045 , H01Q9/0407
摘要： A feed antenna includes a pair of conductive members, a dielectric waveguide placed therebetween, a dielectric member that is placed between the conductive members and located close to the dielectric waveguide, and a plurality of dielectric binding sections for binding the dielectric waveguide to the dielectric member. One of the conductive members has a plurality of openings.
摘要翻译： 馈电天线包括一对导电构件，介于其间的电介质波导，介于导电构件之间并位于电介质波导附近的电介质构件，以及用于将电介质波导结合到电介质构件 。 导电构件中的一个具有多个开口。
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公开(公告)号：US08057882B2
公开(公告)日：2011-11-15
申请号：US12225670
申请日：2007-03-28
CPC分类号： G01F1/692 , B81B2201/0278 , B81B2203/0127 , B81C1/00666 , B81C2201/0169 , B81C2201/0178 , C23C16/402 , C23C16/56 , Y10T428/24488 , Y10T428/24612
摘要： It is intended to provide a membrane structure element that can be easily manufactured, has an excellent insulating property and high quality; and a method for manufacturing the membrane structure element. The manufacturing method is for manufacturing a membrane structure element including a membrane formed of a silicon oxide film and a substrate which supports the membrane in a hollow state by supporting a part of a periphery of the membrane. The method includes: a film formation step of forming a heat-shrinkable silicon oxide film 13 on a surface of a silicon substrate 2 by plasma CVD method; a heat treatment step of performing a heat treatment to cause the thermal shrinkage of the silicon oxide film 13 formed on the substrate 1; and a removal step of removing a part of the substrate 2 in such a manner that a membrane-corresponding part of the silicon oxide film 13 is supported as a membrane in a hollow state with respect to the substrate 2 to form a recessed part 4.
摘要翻译： 本发明提供可以容易地制造，具有优异的绝缘性和高质量的膜结构元件; 和膜结构元件的制造方法。 该制造方法是用于制造包括由氧化硅膜形成的膜的膜结构元件和通过支撑膜的周边的一部分而将膜支撑在中空状态的基板。 该方法包括：通过等离子体CVD法在硅衬底2的表面上形成热收缩氧化硅膜13的成膜步骤; 对形成在基板1上的氧化硅膜13的热收缩进行热处理的热处理工序; 以及去除基板2的一部分的去除步骤，使得氧化硅膜13的膜相应部分作为相对于基板2的中空状态的膜被支撑以形成凹部4。
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公开(公告)号：US20060050003A1
公开(公告)日：2006-03-09
申请号：US11000975
申请日：2004-12-02
IPC分类号： H01Q13/00
CPC分类号： H01Q9/045 , H01Q9/0407
摘要： A feed antenna includes a pair of conductive members, a dielectric waveguide placed therebetween, a dielectric member that is placed between the conductive members and located close to the dielectric waveguide, and a plurality of dielectric binding sections for binding the dielectric waveguide to the dielectric member. One of the conductive members has a plurality of openings.
摘要翻译： 馈电天线包括一对导电构件，介于其间的电介质波导，介于导电构件之间并位于电介质波导附近的电介质构件，以及用于将电介质波导结合到电介质构件 。 导电构件中的一个具有多个开口。
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公开(公告)号：US20050119360A1
公开(公告)日：2005-06-02
申请号：US10995234
申请日：2004-11-24
IPC分类号： H01B3/08 , C01B33/113 , C08J9/00 , H01L21/316
CPC分类号： H01L21/31695 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02343
摘要： A method for producing a porous material exhibiting temporal stability includes the step of forming a primary material containing a matrix precursor for forming the matrix of the porous material and a porogen for forming pores; the step of removing the porogen from the primary material to form reactive sites exposed at the surface of the matrix; and the step of reacting the reactive sites with an inactivation promoter to inactivate the reactive sites. For a porous material hard to shrink even after heat treatment, the method includes the step of forming a primary material including a matrix formed of a matrix precursor and a pore-forming portions formed of a porogen; the step of supplying an additional matrix precursor for growing the matrix, dissolved in a supercritical or subcritical fluid; and the step of removing the porogen from the pore-forming portions.
摘要翻译： 具有时间稳定性的多孔材料的制造方法包括形成含有形成多孔质体的基质的基体前体的主材料和形成孔的致孔剂的工序; 从原料除去致孔剂以形成暴露在基体表面的反应性位点的步骤; 以及使反应性位点与失活启动子反应以使反应性位点失活的步骤。 对于即使在热处理后难以收缩的多孔材料，该方法包括形成包括由基质前体形成的基体和由致孔剂形成的成孔部分的基材的步骤; 提供用于生长基质的另外的基质前体溶解在超临界或亚临界流体中的步骤; 以及从孔隙形成部分除去致孔剂的步骤。
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公开(公告)号：US20070077409A1
公开(公告)日：2007-04-05
申请号：US11520738
申请日：2006-09-14
申请人： Takayuki Hirano , Nobuyuki Kawakami , Takeharu Tanaka , Tetsuo Suzuki , Yoshito Fukumoto , Kazuki Nakanishi , Kazuyoshi Kanamori
发明人： Takayuki Hirano , Nobuyuki Kawakami , Takeharu Tanaka , Tetsuo Suzuki , Yoshito Fukumoto , Kazuki Nakanishi , Kazuyoshi Kanamori
CPC分类号： H05K3/0011 , B32B21/04 , H05K1/024 , H05K1/0306 , H05K2201/0116 , Y10T428/249953 , Y10T428/249969
摘要： The porous substrate, comprises: three-dimensional-network skeletal solid phase inside the substrate, and a skin layer same in quality as the skeletal solid phase formed on at least one surface of the substrate, and a production method thereof, comprising: forming a wet gel having a three-dimensional-network skeletal solid phase and a fluid phase rich in solvent that are separated from each other in a space between a pair of flat plates by sol-gel reaction, removing the solvent in the wet gel by drying, and removing at least one flat plate of the pair of flat plates.
摘要翻译： 多孔基材包括：基材内部的三维网状骨架固相，和在基材的至少一个表面上形成的骨架固相质量相同的皮肤层及其制造方法，其特征在于， 湿凝胶，其具有通过溶胶 - 凝胶反应在一对平板之间的空间中彼此分离的富含溶剂的三维网络骨架固相和流体相，通过干燥除去湿凝胶中的溶剂， 以及去除所述一对平板中的至少一个平板。
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10.发明申请公开(公告)号：US20060051970A1
公开(公告)日：2006-03-09
申请号：US11219872
申请日：2005-09-07
申请人： Nobuyuki Kawakami , Takayuki Hirano
发明人： Nobuyuki Kawakami , Takayuki Hirano
IPC分类号： H01L21/31
CPC分类号： H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02343 , H01L21/31695
摘要： A method for forming a porous film includes the precursor film forming step of forming a precursor film containing a mixture of a skeleton material and a pore-forming material, the decomposition step of decomposing the pore-forming material in the precursor film by oxidation in an oxidizing atmosphere, and the extraction step of extracting the decomposed pore-forming material with a supercritical fluid. The pore-forming material may be a surfactant. The surfactant may be decomposed by oxidation in an oxidizing atmosphere at 100 to 150° C.
摘要翻译： 形成多孔膜的方法包括：前体膜形成步骤，形成含有骨架材料和成孔材料的混合物的前体膜，分解步骤，通过氧化在前体膜中分解成孔材料 氧化气氛和用超临界流体萃取分解的造孔材料的提取步骤。 造孔材料可以是表面活性剂。 表面活性剂可以在氧化气氛中在100〜150℃下分解。
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