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公开(公告)号：US20090176064A1
公开(公告)日：2009-07-09
申请号：US12225670
申请日：2007-03-28
IPC分类号： B32B3/10 , B05D3/02 , B05D5/12 , C23C16/513 , H01L21/306
CPC分类号： G01F1/692 , B81B2201/0278 , B81B2203/0127 , B81C1/00666 , B81C2201/0169 , B81C2201/0178 , C23C16/402 , C23C16/56 , Y10T428/24488 , Y10T428/24612
摘要： It is intended to provide a membrane structure element that can be easily manufactured, has an excellent insulating property and high quality; and a method for manufacturing the membrane structure element. The manufacturing method is for manufacturing a membrane structure element including a membrane formed of a silicon oxide film and a substrate which supports the membrane in a hollow state by supporting a part of a periphery of the membrane. The method includes: a film formation step of forming a heat-shrinkable silicon oxide film 13 on a surface of a silicon substrate 2 by plasma CVD method; a heat treatment step of performing a heat treatment to cause the thermal shrinkage of the silicon oxide film 13 formed on the substrate 1; and a removal step of removing a part of the substrate 2 in such a manner that a membrane-corresponding part of the silicon oxide film 13 is supported as a membrane in a hollow state with respect to the substrate 2 to form a recessed part 4.
摘要翻译： 本发明提供可以容易地制造，具有优异的绝缘性和高质量的膜结构元件; 和膜结构元件的制造方法。 该制造方法是用于制造包括由氧化硅膜形成的膜的膜结构元件和通过支撑膜的周边的一部分而将膜支撑在中空状态的基板。 该方法包括：通过等离子体CVD法在硅衬底2的表面上形成热收缩氧化硅膜13的成膜步骤; 对形成在基板1上的氧化硅膜13的热收缩进行热处理的热处理工序; 以及去除基板2的一部分的去除步骤，使得氧化硅膜13的膜相应部分作为相对于基板2的中空状态的膜被支撑以形成凹部4。
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公开(公告)号：US08057882B2
公开(公告)日：2011-11-15
申请号：US12225670
申请日：2007-03-28
CPC分类号： G01F1/692 , B81B2201/0278 , B81B2203/0127 , B81C1/00666 , B81C2201/0169 , B81C2201/0178 , C23C16/402 , C23C16/56 , Y10T428/24488 , Y10T428/24612
摘要： It is intended to provide a membrane structure element that can be easily manufactured, has an excellent insulating property and high quality; and a method for manufacturing the membrane structure element. The manufacturing method is for manufacturing a membrane structure element including a membrane formed of a silicon oxide film and a substrate which supports the membrane in a hollow state by supporting a part of a periphery of the membrane. The method includes: a film formation step of forming a heat-shrinkable silicon oxide film 13 on a surface of a silicon substrate 2 by plasma CVD method; a heat treatment step of performing a heat treatment to cause the thermal shrinkage of the silicon oxide film 13 formed on the substrate 1; and a removal step of removing a part of the substrate 2 in such a manner that a membrane-corresponding part of the silicon oxide film 13 is supported as a membrane in a hollow state with respect to the substrate 2 to form a recessed part 4.
摘要翻译： 本发明提供可以容易地制造，具有优异的绝缘性和高质量的膜结构元件; 和膜结构元件的制造方法。 该制造方法是用于制造包括由氧化硅膜形成的膜的膜结构元件和通过支撑膜的周边的一部分而将膜支撑在中空状态的基板。 该方法包括：通过等离子体CVD法在硅衬底2的表面上形成热收缩氧化硅膜13的成膜步骤; 对形成在基板1上的氧化硅膜13的热收缩进行热处理的热处理工序; 以及去除基板2的一部分的去除步骤，使得氧化硅膜13的膜相应部分作为相对于基板2的中空状态的膜被支撑以形成凹部4。
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公开(公告)号：US08670128B2
公开(公告)日：2014-03-11
申请号：US13138247
申请日：2010-01-26
申请人： Masato Kannaka , Eiji Takahashi , Masakazu Kajita
发明人： Masato Kannaka , Eiji Takahashi , Masakazu Kajita
IPC分类号： G01B9/02
CPC分类号： G01B9/02021 , G01B9/02003 , G01B9/02027 , G01B11/06 , G01B11/2441 , G01B2290/65 , G01B2290/70
摘要： A shape determining device (X) splits the original light beam from a light source (Y) into two light beams, directs the light beams to the front and back surfaces of the object (1) to be determined, and performs optical heterodyne interference using the split light beams at the front and back surfaces of the object (1) to be determined. In the shape determining device (X), each of the split light beams is further split into a main light beam and a subordinate light beam, the subordinate light beam interferes with the main light beam at each of the front and back surfaces before and after the illumination of the object (1) to be determined, the signals after the interference are phase-detected, and the difference between the phases acquired by the phase detection is detected at each of the front and back surfaces of the object (1) to be determined. In the shape determining device (X), optical modulation for performing the optical heterodyne interference is performed before the optical heterodyne interference of the split light beams after the split light beams are directed to the front and back surfaces of the object (1) to be determined. Furthermore, in the shape determining device (X), a measurement optical system before the phase detection and after the split light beams are directed to the front and back surfaces of the object (1) to be determined is maintained integrally.
摘要翻译： 形状确定装置（X）将来自光源（Y）的原始光束分成两束，将光束引导到物体（1）的正面和背面以确定，并且使用 在待确定物体（1）的前表面和后表面处的分束光束。 在形状确定装置（X）中，每个分束光束进一步被分割成主光束和从属光束，从属光束在前后表面的每一个前后干涉主光束 要确定的物体（1）的照明，干涉后的信号被相位检测，并且通过相位检测获得的相位之间的差异在物体（1）的前表面和后表面被检测到 确定。 在形状确定装置（X）中，在将分束光束分散在物体（1）的前后表面之前的分束光束的光学外差干涉之前进行用于执行光学外差干涉的光调制 决心。 此外，在形状确定装置（X）中，在相位检测之前和分割光束之后的测量光学系统被引导到待确定的物体（1）的前表面和后表面一体地保持。
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4.发明授权Analyzer for absorption spectrometry of impurity concentration contained in liquid using exciting light 有权使用激发光的液体中所含杂质浓度的吸收光谱分析仪公开(公告)号：US08023118B2
公开(公告)日：2011-09-20
申请号：US12224302
申请日：2007-03-16
CPC分类号： G01N21/00 , G01N21/171 , G01N21/45 , G01N21/85 , G01N21/94 , G01N33/18 , G01N2021/1712 , G01N2021/8557 , G01N2030/746
摘要： The concentration of impurities contained in ultrapure water or press water can be efficiently analyzed with high precision. A portion of a liquid to be measured is introduced into an absorption spectrometric portion from a predetermined line. The liquid is irradiated with exciting light from an exciting light irradiation system, and a measurement object region in which a photothermal effect of the impurities in the liquid is produced by the irradiation is irradiated with measuring light from a measuring light irradiation system. A change in phase of the measuring light is detected by a predetermined optical system and a photodetector, and the impurity concentration in the liquid is determined on the basis of the change in phase.
摘要翻译： 可以高精度地有效地分析超纯水或压水中所含杂质的浓度。 将待测量的液体的一部分从预定线引入吸收光谱测定部分。 用激发光照射系统的激发光照射液体，照射测量光照射系统的测量光照射通过照射产生液体中的杂质的光热效应的测量对象区域。 通过预定的光学系统和光电检测器检测测量光的相位变化，并且基于相位的变化来确定液体中的杂质浓度。
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公开(公告)号：US07715022B2
公开(公告)日：2010-05-11
申请号：US11707151
申请日：2007-02-16
申请人： Tsutomu Morimoto , Eiji Takahashi , Masato Kannaka
发明人： Tsutomu Morimoto , Eiji Takahashi , Masato Kannaka
CPC分类号： G01B11/24
摘要： A shape measuring apparatus and a shape measuring method suited for measuring an edge profile of a thin sample such as a semiconductor wafer or the like is provided. A distribution of surface angle and an edge profile of a measurement site is calculated by emitting light at sequentially different angle to the measurement site of a wafer by sequentially switching and lighting a plurality of LEDs each disposed at one of plurality of positions in one plane by an LED driving circuit, obtaining an image data showing a luminance distribution of the reflected light form the measurement site through a camera by a calculator each time light is emitted and, estimating an emitting angle of the light when the luminance of the reflected light becomes peak based on image data and emitting angle of the light corresponding to each LED by the calculator.
摘要翻译： 提供了适合于测量诸如半导体晶片等的薄样品的边缘轮廓的形状测量装置和形状测量方法。 通过顺序地切换和照亮各自设置在一个平面中的多个位置中的一个位置的多个LED，通过以与晶片的测量位置顺序不同的角度发射光来计算测量部位的表面角度和边缘轮廓的分布， LED驱动电路，每次发光时，通过计算机获得表示通过照相机形成测量部位的反射光的亮度分布的图像数据，并且当反射光的亮度变得高峰时，估计光的发射角度 基于图像数据和通过计算器发射对应于每个LED的光的角度。
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公开(公告)号：US20120002213A1
公开(公告)日：2012-01-05
申请号：US13138294
申请日：2010-01-28
申请人： Masato Kannaka , Eiji Takahashi , Masakazu Kajita , Hideki Matsuoka , Hidetoshi Tsunaki , Noritaka Morioka , Kazuhiko Tahara , Takuya Atsumi
发明人： Masato Kannaka , Eiji Takahashi , Masakazu Kajita , Hideki Matsuoka , Hidetoshi Tsunaki , Noritaka Morioka , Kazuhiko Tahara , Takuya Atsumi
CPC分类号： G01B11/0608 , G01B11/2441
摘要： An object of the present invention is to measure thickness distribution with precision by using a simple device configuration without being affected by vibrations of a to-be-measured object. In the present invention, for each of the front and the back surfaces of a to-be-measured object 1, each of light beams obtained by branching into two an emitted light beam from a laser light source 2 is further branched into two. Then, the light beams are reflected in reference surfaces and measurement points 1a and 1b mutually in a front and back relation, so that non-interference light beams Pax and Pbx each of which contains the reference light beam and the object light beam as mutually orthogonal polarization components are acquired. Then, each light beam is branched into a plurality. Onto one or more of the branched light beams, phase shift is performed in which a change is imparted to the phase difference between the orthogonal polarization components by using wavelength plates a261, a263, and a264 and the like. Then, in the branched light beams after the phase shift, common polarization components are extracted with adopting as a reference the polarization directions of the reference light beam and the object light beam so that interference light beams Qa1 to Qa4 and Qb1 to Qb4 are acquired. From their intensities, the phase difference between the polarization components of the reference light beam and the object light beam in the non-interference light beam is calculated. Then, thickness distribution in a to-be-measured object 1 is calculated from the distribution of the phase difference.
摘要翻译： 本发明的目的是通过使用简单的装置结构来精确地测量厚度分布，而不受被测物体的振动的影响。 在本发明中，对于被测量物体1的前表面和背面的每一个，通过将从激光光源2分离为两个发射光束而获得的每个光束进一步分为两个。 然后，光束在参考面和测量点1a和1b中以前后相互反映，使得不干涉光束Pax和Pbx各自包含参考光束和物体光束相互正交 获得偏振分量。 然后，将各光束分支成多个。 在一个或多个分支光束中，执行相移，其中通过使用波长板a261，a263和a264等对正交偏振分量之间的相位差赋予变化。 然后，在相移后的分支光束中，以参考基准光束和物体光束的偏振方向为参考，提取公共偏振分量，从而获得干涉光束Qa1至Qa4和Qb1至Qb4。 根据其强度，计算参考光束的偏振分量与非干涉光束中的物体光束之间的相位差。 然后，根据相位差的分布计算被测量物体1的厚度分布。
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公开(公告)号：US20090027654A1
公开(公告)日：2009-01-29
申请号：US12224302
申请日：2007-03-16
CPC分类号： G01N21/00 , G01N21/171 , G01N21/45 , G01N21/85 , G01N21/94 , G01N33/18 , G01N2021/1712 , G01N2021/8557 , G01N2030/746
摘要： The concentration of impurities contained in ultrapure water or press water can be efficiently analyzed with high precision.A portion of a liquid to be measured is introduced into an absorption spectrometric portion 2c from a predetermined line. The liquid is irradiated with exciting light Le from an exciting light irradiation system 10, and a measurement objet region AS in which a photothermal effect of the impurities in the liquid is produced by the irradiation is irradiated with measuring light Lm from a measuring light irradiation system 20. A change in phase of the measuring light Lm is detected by a predetermined optical system and a photodetector 36, and the impurity concentration in the liquid is determined on the basis of the change in phase.
摘要翻译： 可以高精度地有效地分析超纯水或压水中所含杂质的浓度。 将待测量的液体的一部分从预定线引入吸收光谱测量部分2c。 用激发光照射系统10的激励光Le照射液体，并且通过照射产生液体中的杂质的光热效应的测量对象区域AS从测量光照射系统 通过预定的光学系统和光电检测器36检测测量光Lm的相位变化，并且基于相位的变化来确定液体中的杂质浓度。
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公开(公告)号：US20070195314A1
公开(公告)日：2007-08-23
申请号：US11707151
申请日：2007-02-16
申请人： Tsutomu Morimoto , Eiji Takahashi , Masato Kannaka
发明人： Tsutomu Morimoto , Eiji Takahashi , Masato Kannaka
IPC分类号： G01J1/04
CPC分类号： G01B11/24
摘要： A shape measuring apparatus and a shape measuring method suited for measuring an edge profile of a thin sample such as a semiconductor wafer or the like is provided. A distribution of surface angle and an edge profile of a measurement site is calculated by emitting light at sequentially different angle to the measurement site of a wafer by sequentially switching and lighting a plurality of LEDs each disposed at one of plurality of positions in one plane by an LED driving circuit, obtaining an image data showing a luminance distribution of the reflected light form the measurement site through a camera by a calculator each time light is emitted and, estimating an emitting angle of the light when the luminance of the reflected light becomes peak based on image data and emitting angle of the light corresponding to each LED by the calculator.
摘要翻译： 提供了适合于测量诸如半导体晶片等的薄样品的边缘轮廓的形状测量装置和形状测量方法。 通过顺序地切换和照亮各自设置在一个平面中的多个位置中的一个位置的多个LED，通过以与晶片的测量位置顺序不同的角度发射光来计算测量部位的表面角度和边缘轮廓的分布， LED驱动电路，每次发光时，通过计算机获得表示通过照相机形成测量部位的反射光的亮度分布的图像数据，并且当反射光的亮度变得高峰时，估计光的发射角度 基于图像数据和通过计算器发射对应于每个LED的光的角度。
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公开(公告)号：US08649019B2
公开(公告)日：2014-02-11
申请号：US13138294
申请日：2010-01-28
申请人： Masato Kannaka , Eiji Takahashi , Masakazu Kajita , Hideki Matsuoka , Hidetoshi Tsunaki , Noritaka Morioka , Kazuhiko Tahara , Takuya Atsumi
发明人： Masato Kannaka , Eiji Takahashi , Masakazu Kajita , Hideki Matsuoka , Hidetoshi Tsunaki , Noritaka Morioka , Kazuhiko Tahara , Takuya Atsumi
IPC分类号： G01B9/02
CPC分类号： G01B11/0608 , G01B11/2441
摘要： A shape determining device includes first and second homodyne interferometers respectively provided for front and back surfaces of an object to be measured and a thickness distribution calculator that calculates a thickness distribution of the object based on intensities of first and second interference light beams respectively detected by the first and second homodyne interferometers for the front and back surfaces of the object at a plurality of measurement sites. The thickness distribution calculator calculates, for each interference light beam for which the intensity is detected by the first and second homodyne interferometers, a phase difference between the polarization components of a corresponding reference light beam and a corresponding object light beam in a corresponding non-interference light beam based on the intensity of the interference light beam, and calculates the thickness distribution based on a distribution of the calculated phase differences.
摘要翻译： 形状确定装置包括分别设置在待测物体的前表面和后表面上的第一和第二零差干涉仪;以及厚度分布计算器，其基于由所述第一和第二干涉光束分别检测的第一和第二干涉光束的强度来计算物体的厚度分布 用于在多个测量位置处的物体的前表面和后表面的第一和第二零差干涉仪。 厚度分布计算器对于由第一和第二零差干涉仪检测到的强度的每个干涉光束计算相应的参考光束的偏振分量与相应的对象光束之间的相对差异 基于干涉光束的强度的光束，并且基于计算出的相位差的分布来计算厚度分布。
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公开(公告)号：US20110279822A1
公开(公告)日：2011-11-17
申请号：US13138247
申请日：2010-01-26
申请人： Masato Kannaka , Eiji Takahashi , Masakazu Kajita
发明人： Masato Kannaka , Eiji Takahashi , Masakazu Kajita
IPC分类号： G01B11/02
CPC分类号： G01B9/02021 , G01B9/02003 , G01B9/02027 , G01B11/06 , G01B11/2441 , G01B2290/65 , G01B2290/70
摘要： A shape determining device (X) splits the original light beam from a light source (Y) into two light beams, directs the light beams to the front and back surfaces of the object (1) to be determined, and performs optical heterodyne interference using the split light beams at the front and back surfaces of the object (1) to be determined. In the shape determining device (X), each of the split light beams is further split into a main light beam and a subordinate light beam, the subordinate light beam interferes with the main light beam at each of the front and back surfaces before and after the illumination of the object (1) to be determined, the signals after the interference are phase-detected, and the difference between the phases acquired by the phase detection is detected at each of the front and back surfaces of the object (1) to be determined. In the shape determining device (X), optical modulation for performing the optical heterodyne interference is performed before the optical heterodyne interference of the split light beams after the split light beams are directed to the front and back surfaces of the object (1) to be determined. Furthermore, in the shape determining device (X), a measurement optical system before the phase detection and after the split light beams are directed to the front and back surfaces of the object (1) to be determined is maintained integrally.
摘要翻译： 形状确定装置（X）将来自光源（Y）的原始光束分成两束，将光束引导到物体（1）的正面和背面以确定，并且使用 在待确定物体（1）的前表面和后表面处的分束光束。 在形状确定装置（X）中，每个分束光束进一步被分割成主光束和从属光束，从属光束在前后表面的每一个前后干涉主光束 要确定的物体（1）的照明，干涉后的信号被相位检测，并且通过相位检测获得的相位之间的差异在物体（1）的前表面和后表面被检测到 确定。 在形状确定装置（X）中，在将分束光束分散在物体（1）的前后表面之前的分束光束的光学外差干涉之前进行用于执行光学外差干涉的光调制 决心。 此外，在形状确定装置（X）中，在相位检测之前和分割光束之后的测量光学系统被引导到待确定的物体（1）的前表面和后表面一体地保持。
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