公开(公告)号：US20110165825A1

公开(公告)日：2011-07-07

申请号：US12673294

申请日：2008-07-23

申请人： Norio Kimura ,  Kenya Ito ,  Tamami Takahashi ,  Masaya Seki

发明人： Norio Kimura ,  Kenya Ito ,  Tamami Takahashi ,  Masaya Seki

IPC分类号： B24B9/00

CPC分类号： B24B9/065

摘要： A polishing apparatus according to the present invention is a polishing apparatus for polishing a periphery (a bevel portion, a notch portion, an edge-cut portion) of a substrate (W) by bringing a polishing tool (41) into sliding contact with the periphery of the substrate. The polishing apparatus includes a substrate holder (20) configured to hold the substrate (W); and a polishing head (42) configured to polish the periphery of the substrate (W) held by the substrate holder (20) using the polishing tool (41). The polishing head (42) includes a press pad (50) for pressing the polishing tool (41) against the periphery of the substrate (W), and a linear motor (90) configured to reciprocate the press pad (50).

摘要翻译： 根据本发明的研磨装置是通过使研磨工具（41）与所述基板（W）滑动接触来研磨基板（W）的周边（斜面部，切口部，边缘切断部）的研磨装置 衬底周边。 抛光装置包括：基板保持架（20），其构造成保持基板（W）; 以及抛光头（42），其被配置为使用所述抛光工具（41）抛光由所述基板保持器（20）保持的所述基板（W）的周边。 抛光头（42）包括用于将抛光工具（41）压靠在基板（W）的周边上的压垫（50）和构造成使压垫（50）往复运动的直线电动机（90）。

公开(公告)号：US08393935B2

公开(公告)日：2013-03-12

申请号：US12673294

申请日：2008-07-23

申请人： Norio Kimura ,  Kenya Ito ,  Tamami Takahashi ,  Masaya Seki

发明人： Norio Kimura ,  Kenya Ito ,  Tamami Takahashi ,  Masaya Seki

IPC分类号： B24B9/00 ,  B24B21/00

CPC分类号： B24B9/065

摘要： A polishing apparatus polishes a periphery (a bevel portion, a notch portion, an edge-cut portion) of a substrate by bringing a polishing tool into sliding contact with the periphery of the substrate. The polishing apparatus includes a substrate holder configured to hold the substrate, and a polishing head configured to polish the periphery of the substrate held by the substrate holder using the polishing tool. The polishing head includes a press pad for pressing the polishing tool against the periphery of the substrate, and a linear motor configured to reciprocate the press pad.

摘要翻译： 抛光装置通过使抛光工具与基板的周边滑动接触来抛光基板的周边（斜面部分，切口部分，边缘切割部分）。 抛光装置包括：被配置为保持基板的基板保持器，以及抛光头，其被构造成使用抛光工具抛光由基板保持器保持的基板的周边。 抛光头包括用于将抛光工具压靠在基板的周边上的压垫，以及配置成使压垫往复运动的线性电动机。

公开(公告)号：US5639388A

公开(公告)日：1997-06-17

申请号：US588241

申请日：1996-01-18

申请人： Norio Kimura ,  Fumihiko Sakata ,  Tamami Takahashi

发明人： Norio Kimura ,  Fumihiko Sakata ,  Tamami Takahashi

IPC分类号： B24B37/013 ,  B24B37/07 ,  B24B49/16 ,  H01L21/66

CPC分类号： B24B37/013 ,  B24B49/16

摘要： An endpoint detection in a polishing process of a polishing object which has a first layer and a second layer, formed under the first layer, is performed by holding the polishing object on a top ring and pressing a surface of the first layer of the polishing object onto a polishing cloth mounted on a rotating turntable so as to remove the first layer, oscillating the top ring in contact with the turntable, periodically measuring a torque on the rotating turntable when the top ring is positioned at a specific radial location defined by a radius from a rotational center of the turntable, and determining the endpoint based on a change in the torque generated when the first layer is removed and the second layer comes into contact with the polishing cloth.

摘要翻译： 通过将抛光对象保持在顶环上并按压抛光对象的第一层的表面来进行在第一层下方形成有第一层和第二层的抛光对象的抛光工序中的端点检测 到安装在旋转转台上的抛光布上，以便去除第一层，使顶环与转台相接触，使顶环周期性地测量旋转转台上的转矩，当顶环位于由半径限定的特定径向位置时 并且基于当去除第一层并且第二层与抛光布接触时产生的扭矩的变化来确定端点。

公开(公告)号：US5830041A

公开(公告)日：1998-11-03

申请号：US743361

申请日：1996-11-04

申请人： Tamami Takahashi ,  Fumihiko Sakata ,  Norio Kimura ,  Masako Kodera ,  Atsushi Shigeta

发明人： Tamami Takahashi ,  Fumihiko Sakata ,  Norio Kimura ,  Masako Kodera ,  Atsushi Shigeta

IPC分类号： B24B37/013 ,  B24B37/04 ,  B24B49/16 ,  B24B7/22

CPC分类号： B24B37/013 ,  B24B49/16

摘要： A method and apparatus for determining a planar end point on a workpiece such as a semiconductor wafer in a polishing process for polishing the workpiece to a flat mirror finish. The workpiece having an uneven surface is held by a top ring and pressed against a polishing platen. The workpiece is moved relative to the polishing platen to polish the workpiece, and a change in a frictional force between the workpiece and the polishing platen is detected. A reference time when the workpiece having an uneven surface is polished to a flat surface is determined based on the change of the frictional force between the workpiece and the polishing platen. The time when a certain period of polishing time from the reference time elapses is determined as an endpoint on the workpiece.

摘要翻译： 一种用于在用于将工件抛光到平面镜面抛光的抛光工艺中确定诸如半导体晶片的工件上的平面终点的方法和装置。 具有不平坦表面的工件由顶环保持并压靠在研磨台板上。 工件相对于研磨台板移动以抛光工件，并且检测到工件和抛光台板之间的摩擦力的变化。 基于工件和研磨台板之间的摩擦力的变化，确定具有不平坦表面的工件被抛光到平坦表面的参考时间。 从参考时间经过一定时间的抛光时间经过的时间被确定为工件上的端点。

公开(公告)号：US07055535B2

公开(公告)日：2006-06-06

申请号：US10629678

申请日：2003-07-30

申请人： Junji Kunisawa ,  Norio Kimura ,  Kenya Ito ,  Akira Fukunaga ,  Yuuki Inoue ,  Hiroshi Tomita ,  Soichi Nadahara ,  Motoyuki Sato

发明人： Junji Kunisawa ,  Norio Kimura ,  Kenya Ito ,  Akira Fukunaga ,  Yuuki Inoue ,  Hiroshi Tomita ,  Soichi Nadahara ,  Motoyuki Sato

IPC分类号： B08B3/08 ,  B25B11/00 ,  H01L21/306

CPC分类号： H01L21/6838 ,  Y10S134/902 ,  Y10T279/11

摘要： A holding unit holds a substrate to enable a surface of the substrate to be processed. The unit has a vacuum suction member that comes into contact with a peripheral portion of the surface of the substrate and sucks the substrate. A processing apparatus holds the wafer stably and allows an edge, a bevel portion and/or a back surface of the wafer to be processed.

摘要翻译： 保持单元保持基板以使得能够处理基板的表面。 该单元具有与基板的表面的周边部分接触并吸附基板的真空吸附构件。 处理装置稳定地保持晶片，并且允许晶片的边缘，斜面部分和/或背面被处理。

公开(公告)号：US08895960B2

公开(公告)日：2014-11-25

申请号：US12515585

申请日：2007-11-21

申请人： Masaki Murata ,  Nobuhide Yoneya ,  Norio Kimura

发明人： Masaki Murata ,  Nobuhide Yoneya ,  Norio Kimura

IPC分类号： H01L29/08 ,  H01L51/00 ,  H01L51/10 ,  H01L51/05

CPC分类号： H01L51/0095 ,  H01L51/0035 ,  H01L51/0083 ,  H01L51/0541 ,  H01L51/0545 ,  H01L51/105 ,  Y10T428/31533 ,  Y10T428/31681 ,  Y10T428/31692

摘要： A semiconductor device is provided and includes a field effect transistor having a gate electrode, a gate insulating layer, a channel forming region composed of an organic semiconductor material layer and a source/drain electrode made of a metal. A portion of the source/drain electrode in contact with the organic semiconductor material layer comprising the channel forming region is covered with an electrode coating material. Because the electrode coating material is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode composed of the metal, low contact resistance and high mobility can be achieved.

摘要翻译： 提供一种半导体器件，并且包括具有栅电极，栅极绝缘层，由有机半导体材料层构成的沟道形成区域和由金属制成的源极/漏极电极的场效应晶体管。 与包含沟道形成区域的有机半导体材料层接触的源极/漏极电极的一部分被电极涂覆材料覆盖。 由于电极涂层材料由具有与金属离子结合的官能团的有机分子和与由金属构成的源/漏电极结合的官能团构成，所以可以实现低接触电阻和高迁移率。

公开(公告)号：US08657135B2

公开(公告)日：2014-02-25

申请号：US13505155

申请日：2010-10-29

申请人： Daisuke Yamashita ,  Norio Kimura ,  Masakazu Yoshida ,  Mitsuo Tashiro

发明人： Daisuke Yamashita ,  Norio Kimura ,  Masakazu Yoshida ,  Mitsuo Tashiro

IPC分类号： A61J9/04 ,  A61J11/02

CPC分类号： A61J9/04 ,  A61J11/02 ,  A61J11/04

摘要： An artificial nipple can include a nipple tip section that can sufficiently reach the sucking fossa and can be appropriately squashed The artificial nipple can have a base section that widens to match an attachment object, an areola section formed contiguously to the base section and that extends while narrowing gradually, and a nipple section that extends from the areola section and that narrows more than the areola section. A flange section can be provided in the base section with a predetermined thickness. A check valve can be formed with a valve body so as to be entirely accommodated within the thickness dimension of the flange, and provided in the base section.

摘要翻译： 人造乳头可以包括可以充分到达吸吮窝并能够适当地挤压的乳头末端部分。人造乳头可以具有加宽以匹配附着对象的基部部分，与基部部分连续形成并且延伸的乳晕部分 逐渐变细，以及从乳晕部分延伸并且比乳晕部分更窄的乳头部分。 凸缘部分可以以预定厚度设置在基部部分中。 止回阀可以形成有阀体，以便完全容纳在凸缘的厚度尺寸内，并设置在基部中。

公开(公告)号：US08614839B2

公开(公告)日：2013-12-24

申请号：US12458875

申请日：2009-07-27

申请人： Motoya Sano ,  Takashi Fujii ,  Hiroshi Kubo ,  Shinya Kitaoka ,  Takeshi Akai ,  Atsushi Kanaya ,  Shingo Matsushita ,  Norio Kimura ,  Kenichiro Morita

发明人： Motoya Sano ,  Takashi Fujii ,  Hiroshi Kubo ,  Shinya Kitaoka ,  Takeshi Akai ,  Atsushi Kanaya ,  Shingo Matsushita ,  Norio Kimura ,  Kenichiro Morita

IPC分类号： H04N1/04 ,  H04N1/40

CPC分类号： H04N1/1215 ,  H04N1/00588 ,  H04N1/00602 ,  H04N1/0061 ,  H04N1/0062 ,  H04N1/00652 ,  H04N1/00689 ,  H04N1/00694 ,  H04N1/00705 ,  H04N1/0071 ,  H04N1/00713 ,  H04N1/00732 ,  H04N1/00734 ,  H04N1/00745 ,  H04N1/0075 ,  H04N1/00755 ,  H04N1/00774 ,  H04N1/00782 ,  H04N1/125 ,  H04N1/193 ,  H04N1/2032 ,  H04N2201/0098

摘要： In an image reader, a reading member fixedly mounted in the image reader reads an image on a sheet conveyed into the image reader. A guide is disposed opposite the reading member to support the sheet with respect to the reading member. A guide moving member moves the guide with respect to the reading member in a main scanning direction in which the reading member reads the image on the sheet. A guide rotating member rotates the guide in a sub-scanning direction perpendicular to the main scanning direction. A controller controls the reading member to scan different positions on the guide moved by the guide moving member and rotated by the guide rotating member to generate shading data.

摘要翻译： 在图像读取器中，固定地安装在图像读取器中的读取部件读取传送到图像读取器中的片材上的图像。 引导件布置成与读取构件相对，以相对于读取构件支撑片材。 引导移动构件在读取构件读取片材上的图像的主扫描方向上相对于读取构件移动引导件。 导向旋转构件沿垂直于主扫描方向的副扫描方向旋转引导件。 控制器控制读取构件扫描由引导移动构件移动并由引导旋转构件旋转的引导件上的不同位置，以产生阴影数据。

公开(公告)号：US08038140B2

公开(公告)日：2011-10-18

申请号：US12659152

申请日：2010-02-26

申请人： Norio Kimura ,  Hideki Tobinaga ,  Akira Hirose ,  Shinya Kitaoka ,  Motoya Sano ,  Atsushi Kanaya ,  Michitaka Suzuki

发明人： Norio Kimura ,  Hideki Tobinaga ,  Akira Hirose ,  Shinya Kitaoka ,  Motoya Sano ,  Atsushi Kanaya ,  Michitaka Suzuki

IPC分类号： B65H5/00

CPC分类号： B65H7/18 ,  B65H3/0607 ,  B65H3/0684 ,  B65H2404/6111 ,  B65H2405/3321 ,  B65H2511/11 ,  B65H2511/514 ,  B65H2513/10 ,  B65H2513/412 ,  B65H2513/50 ,  B65H2513/514 ,  B65H2701/1313 ,  B65H2801/39 ,  B65H2220/01 ,  B65H2220/02 ,  B65H2220/11 ,  B65H2220/03

摘要： A document feeding device includes a carrying unit capable of carrying documents, a drawing device drawing and supplying the documents, a drawing device drive source driving the drawing device, a separation unit including a separation device to separate the documents one by one, a separation device drive source driving the separation device, a conveying device conveying the documents, a reading unit including a reading device to read information of the documents, a discharge device discharging the documents, a first document detector provided between a document set position and the separation unit to detect the documents, and a second document detector provided downstream of the separation unit and near a separation position to detect the documents. The first and second document detectors detect the trailing end of each of the documents to control the operation of the drawing device on the basis of the result of the detection.

摘要翻译： 文件馈送装置包括能够携带文件的携带单元，绘图和提供文件的绘图装置，驱动绘图装置的绘图装置驱动源，包括分离装置的分离单元，用于逐个分离文件;分离装置 驱动分离装置的驱动源，传送文件的传送装置，读取单元，包括读取文件信息的读取装置，放出文件的放电装置，设置在原稿设置位置和分离单元之间的第一文件检测器， 检测文档，以及第二文档检测器，其设置在分离单元的下游并且靠近分离位置以检测文档。 第一和第二文档检测器检测每个文档的后端，以根据检测结果控制绘图装置的操作。

公开(公告)号：US20110155905A1

公开(公告)日：2011-06-30

申请号：US12937145

申请日：2009-04-10

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Yoshihiko Naito ,  Kenji Terao ,  Norio Kimura ,  Kenji Watanabe

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Yoshihiko Naito ,  Kenji Terao ,  Norio Kimura ,  Kenji Watanabe

IPC分类号： G01N23/225 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J37/22 ,  H01J37/244 ,  H01J37/29 ,  H01J2237/24475 ,  H01J2237/24585 ,  H01J2237/24592 ,  H01J2237/2805 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01L22/12

摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.

摘要翻译： 提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。 该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。 电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级 发射电子和镜电子作为待观察的电子进行混合。 要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。 对于100nm以下的细小异物和图案，可以快速进行观察和检查。