公开(公告)号：US5028797A

公开(公告)日：1991-07-02

申请号：US413739

申请日：1989-09-28

申请人： Naoto Abe ,  Shigeyuki Suda ,  Koji Uda ,  Hirohisa Ohta ,  Noriyuki Nose

发明人： Naoto Abe ,  Shigeyuki Suda ,  Koji Uda ,  Hirohisa Ohta ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7096 ,  G03F9/7049

摘要： An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.

公开(公告)号：US5459573A

公开(公告)日：1995-10-17

申请号：US291747

申请日：1994-08-17

申请人： Naoto Abe ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Noriyuki Nose

发明人： Naoto Abe ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G01D5/26 ,  G03F9/00 ,  H01L21/68 ,  H01L31/12 ,  H01L33/00 ,  H01S5/06 ,  H01S5/062 ,  H01S5/0683 ,  G01N21/86

CPC分类号： G03F9/7088 ,  G03F9/7049 ,  H01L21/68 ,  H01L21/682 ,  H01S5/06835 ,  H01S5/06216

摘要： A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.

摘要翻译： 一种可用于对准掩模和半导体晶片的位置检测装置，其中由半导体激光器产生的激光束通过预定的光学系统投射到形成在掩模和晶片上的对准标记，并且由标记反射的光被 用于产生电信号的累积型传感器，根据电信号检测掩模和晶片之间的相对位置关系。 为了获得适当的标记信号，控制入射在累积传感器上的光量。 在该装置中，半导体激光器的发射光强度保持恒定，并且通过控制半导体激光器的工作周期来控制入射到积聚传感器上的光量。 此外，半导体激光器的激活定时从累积型传感器的累积开始到半导体激光器在其致动之后被热稳定所需的时间前进。 由积累传感器产生的标记检测信号是精确的。

公开(公告)号：US5148038A

公开(公告)日：1992-09-15

申请号：US804514

申请日：1991-12-10

申请人： Noriyuki Nose ,  Naoto Abe

发明人： Noriyuki Nose ,  Naoto Abe

IPC分类号： G03F9/00

CPC分类号： G03F9/7076 ,  G03F9/7023

摘要： A device for detecting a positional relationship between opposed first and second objects. The device includes a light source for projecting light to the first and second objects; a photodetecting system for detecting two lights from one of the first and second objects illuminated by the light from the light source, the photodetecting system detecting those two lights the position of incidence of each of which on a predetermined plane is changeable with the positional relationship between the first and second objects in a direction perpendicular to the direction in which the first and second objects are opposed; a position detecting system for detecting the positional relationship between the first and second objects in a direction perpendicular to the opposing direction of the first and second objects, on the basis of the relationship of the two lights, on the predetermined plane, as detected by the photodetecting system; and an interval detecting system for detecting the positional relationship between the first and second objects in the opposing direction, by using at least one of the two lights detected by the photodetecting system.

公开(公告)号：US5327221A

公开(公告)日：1994-07-05

申请号：US919380

申请日：1992-07-29

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.

摘要翻译： 一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置 第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。 第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态 在预定方向上的物体与第一光不同。 基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。

公开(公告)号：US5379108A

公开(公告)日：1995-01-03

申请号：US91959

申请日：1993-07-15

申请人： Noriyuki Nose ,  Naoto Abe

发明人： Noriyuki Nose ,  Naoto Abe

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/70

摘要： An alignment system includes an alignment detector for detecting a relative deviation of the mask and the wafer from a predetermined positional relationship, a stage mechanism for moving the mask relative to the wafer, an interferometer device for producing information related to the movement by the stage mechanism, and a controller for determining an input to be applied to the stage mechanism so as to bring the mask and the wafer into the predetermined positional relationship, on the basis of a detected value obtained through the alignment detector and a measured value obtained through the interferometer device, both being uptaken at the same timing, and for controlling the stage mechanism on the basis of the thus determined input.

摘要翻译： 对准系统包括用于检测掩模和晶片与预定位置关系的相对偏离的对准检测器，用于使掩模相对于晶片移动的平台机构，用于产生与平台机构的移动有关的信息的干涉仪装置 以及控制器，用于基于通过对准检测器获得的检测值和通过干涉仪获得的测量值，确定要施加到舞台机构的输入以使掩模和晶片达到预定位置关系的控制器 装置，两者都在相同的定时被吸收，并且基于这样确定的输入来控制舞台机构。

公开(公告)号：US5861952A

公开(公告)日：1999-01-19

申请号：US984509

申请日：1992-12-02

申请人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

发明人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

IPC分类号： G01N21/94 ,  G01B9/02 ,  G01N21/88

CPC分类号： G01N21/94

摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

摘要翻译： 具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。 激光束随后被半反射镜分开。 其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。 另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。 在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。 同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

公开(公告)号：US5486919A

公开(公告)日：1996-01-23

申请号：US76951

申请日：1993-06-15

申请人： Toshihiko Tsuji ,  Seiji Takeuchi ,  Kyoichi Miyazaki ,  Minoru Yoshii ,  Noriyuki Nose ,  Tetsuzo Mori

发明人： Toshihiko Tsuji ,  Seiji Takeuchi ,  Kyoichi Miyazaki ,  Minoru Yoshii ,  Noriyuki Nose ,  Tetsuzo Mori

IPC分类号： G01J9/02 ,  G01J9/04 ,  G01N21/88 ,  G01N21/94 ,  G03F7/20 ,  G01B9/02

CPC分类号： G03F7/70616 ,  G01N21/88 ,  G01N21/94 ,  G03F7/7065 ,  G03F7/70916 ,  G01J2009/0261 ,  G01J9/04 ,  G01N2021/4792 ,  G01N21/8806

摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.

摘要翻译： 公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长 ，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。

公开(公告)号：US5465148A

公开(公告)日：1995-11-07

申请号：US139143

申请日：1993-10-21

申请人： Takahiro Matsumoto ,  Noriyuki Nose ,  Kenji Saito ,  Koichi Sentoku

发明人： Takahiro Matsumoto ,  Noriyuki Nose ,  Kenji Saito ,  Koichi Sentoku

IPC分类号： G01B9/02 ,  G01B11/24 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70633 ,  G03F9/70

摘要： A first Savart plate and an object to be measured are arranged on the light path of a Zeeman light source. The object to be measured is constructed of a diffraction grating on a mask and a diffraction grating on a wafer. A second Savart plate, a deflection plate and a photoelectric detector are sequentially arranged in the light path for the diffracted beams from the measured object. The output of the photoelectric detector is connected to a phase-difference unit to detect the phase difference between two beat signals. Herein, the light is split into two beams by the Savart plate. After a diffraction is caused by the diffraction gratings, thereafter, the beams are re-synthesized by the Savart plates. The two beams travel on the same light path, thereby improving a measurement accuracy.

摘要翻译： 第一萨瓦特板和待测对象被布置在塞曼光源的光路上。 要测量的对象由掩模上的衍射光栅和晶片上的衍射光栅构成。 第二萨瓦特板，偏转板和光电检测器依次布置在来自测量对象的衍射光束的光路中。 光电检测器的输出连接到相位差单元，以检测两个差拍信号之间的相位差。 这里，萨瓦特板将光分成两束。 衍射由衍射光栅引起之后，光束由Savart板重新合成。 两个光束在相同的光路上行进，从而提高测量精度。

公开(公告)号：US5432603A

公开(公告)日：1995-07-11

申请号：US153038

申请日：1993-11-17

申请人： Koichi Sentoku ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saito ,  Toshihiko Tsuji ,  Takahiro Matsumoto

发明人： Koichi Sentoku ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saito ,  Toshihiko Tsuji ,  Takahiro Matsumoto

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/70

摘要： An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.

摘要翻译： 在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件，光学元件将来自双频线性偏振激光束源的光束分成两束光束 之后，这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。 一对镜子垂直地设置在掩模上方，并且一对透镜，一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。 两个光电检测器的输出变为差拍信号，并且测量这些拍频信号之间的相位差，从而实现掩模和晶片的对准。 由于光学元件由多个偏振分束器组成，因此减少了包括在每个光束中的泄漏光。

公开(公告)号：US5161176A

公开(公告)日：1992-11-03

申请号：US802705

申请日：1991-12-06

申请人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

发明人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70066

摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

摘要翻译： 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。