Method for producing an optoelectronic semiconductor component and optoelectronic semiconductor component

    公开(公告)号:US09893232B2

    公开(公告)日:2018-02-13

    申请号:US15514489

    申请日:2015-09-24

    CPC classification number: H01L33/0095 H01L33/486 H01L33/642 H01L2933/005

    Abstract: The invention provides an optoelectronic semiconductor component and a method for producing an optoelectronic semiconductor component (10), comprising the following steps: A) arranging at least one semiconductor chip (2) on a carrier (1), B) applying an electrically insulating photoresist (3) to a top side (1a) of the carrier (1) and to the semiconductor chip (2), C) curing the photoresist (3) with a baking step, D) patterning the photoresist (3) by exposure, F) developing the photoresist (3), wherein the photoresist (3) is removed at least from a radiation penetration surface (2b) of the semiconductor chip (2), G) again curing the photoresist (3) with a baking step, and H) applying an electrically conductive contact layer (4) to the photoresist (3), wherein the electrically conductive contact layer (4) is in places at a distance (A) from a marginal surface (3a) of the photoresist (3) which faces towards the semiconductor chip (2), wherein the marginal surface (3a) facing towards the semiconductor chip (2) is exposed in places.

    Method for separating regions of a semiconductor layer

    公开(公告)号:US09865776B2

    公开(公告)日:2018-01-09

    申请号:US15413281

    申请日:2017-01-23

    Abstract: The invention relates to a method for separating regions of a semiconductor layer and for introducing an outcoupling structure into an upper side of the semiconductor layer, the outcoupling structure being provided to couple light out of the semiconductor layer. The upper side of the semiconductor layer is covered by a mask having first openings for introducing the outcoupling structure and at least a second opening, which is provided to introduce a separating trench into the semiconductor layer. With the aid of an etching method, the outcoupling structure is introduced into the upper side of the semiconductor layer in the region of the first openings and simultaneously a separating trench passing through the semiconductor layer is introduced into the semiconductor layer via the second opening, and a region of the semiconductor layer is separated.

    METHOD FOR SEPARATING REGIONS OF A SEMICONDUCTOR LAYER
    5.
    发明申请
    METHOD FOR SEPARATING REGIONS OF A SEMICONDUCTOR LAYER 有权
    用于分离半导体层的区域的方法

    公开(公告)号:US20150287880A1

    公开(公告)日:2015-10-08

    申请号:US14430872

    申请日:2013-09-26

    Abstract: The invention relates to a method for separating regions of a semiconductor layer and for introducing an outcoupling structure into an upper side of the semiconductor layer, the outcoupling structure being provided to couple light out of the semiconductor layer. The upper side of the semiconductor layer is covered by a mask having first openings for introducing the outcoupling structure and at least a second opening, which is provided to introduce a separating trench into the semiconductor layer. With the aid of an etching method, the outcoupling structure is introduced into the upper side of the semiconductor layer in the region of the first openings and simultaneously a separating trench passing through the semiconductor layer is introduced into the semiconductor layer via the second opening, and a region of the semiconductor layer is separated.

    Abstract translation: 本发明涉及一种用于分离半导体层的区域并将输出耦合结构引入半导体层的上侧的方法,该耦合结构用于将光耦合到半导体层之外。 半导体层的上侧被掩模覆盖,该掩模具有用于引入外耦合结构的第一开口和至少一个第二开口,该第二开口用于将分离沟槽引入半导体层。 借助于蚀刻方法,在第一开口的区域中将外耦合结构引入半导体层的上侧,并且通过该半导体层的分离沟槽同时经由第二开口引入半导体层,并且 半导体层的区域被分离。

    Method for separating regions of a semiconductor layer
    7.
    发明授权
    Method for separating regions of a semiconductor layer 有权
    分离半导体层的区域的方法

    公开(公告)号:US09589943B2

    公开(公告)日:2017-03-07

    申请号:US14430872

    申请日:2013-09-26

    Abstract: The invention relates to a method for separating regions of a semiconductor layer and for introducing an outcoupling structure into an upper side of the semiconductor layer, the outcoupling structure being provided to couple light out of the semiconductor layer. The upper side of the semiconductor layer is covered by a mask having first openings for introducing the outcoupling structure and at least a second opening, which is provided to introduce a separating trench into the semiconductor layer. With the aid of an etching method, the outcoupling structure is introduced into the upper side of the semiconductor layer in the region of the first openings and simultaneously a separating trench passing through the semiconductor layer is introduced into the semiconductor layer via the second opening, and a region of the semiconductor layer is separated.

    Abstract translation: 本发明涉及一种用于分离半导体层的区域并将输出耦合结构引入半导体层的上侧的方法,该耦合结构用于将光耦合到半导体层之外。 半导体层的上侧被掩模覆盖,该掩模具有用于引入外耦合结构的第一开口和至少一个第二开口,该第二开口用于将分离沟槽引入半导体层。 借助于蚀刻方法,在第一开口的区域中将外耦合结构引入半导体层的上侧,并且通过该半导体层的分离沟槽同时经由第二开口引入半导体层,并且 半导体层的区域被分离。

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