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1.发明授权公开(公告)号：US09523919B2
公开(公告)日：2016-12-20
申请号：US14117230
申请日：2012-05-23
CPC分类号： G03F7/2022 , B29C35/0888 , B29C35/0894 , B29C35/10 , B29C37/0053 , B29C59/046 , B29C2035/0827 , B29C2035/0838 , B29C2035/0877 , G03F7/203
摘要： Methods for making differentially pattern cured microstructured articles are disclosed, using a molding tool having a microstructured surface, a patterned irradiation to generate irradiate and non-irradiated regions in a radiation curable resin. Different combinations of molding tools and patterned irradiation provide numerous variants of differentially pattern cured microstructured articles without requiring costly modification of the molding tools.
摘要翻译： 公开了使用具有微结构化表面的成型工具，图案化照射以在可辐射固化树脂中产生照射和未照射区域的制造差异图案固化的微结构物品的方法。 模制工具和图案化照射的不同组合提供差异图案固化的微结构制品的许多变体，而不需要对成型工具进行昂贵的改造。
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公开(公告)号：US20150079521A1
公开(公告)日：2015-03-19
申请号：US14117230
申请日：2012-05-23
IPC分类号： G03F7/20
CPC分类号： G03F7/2022 , B29C35/0888 , B29C35/0894 , B29C35/10 , B29C37/0053 , B29C59/046 , B29C2035/0827 , B29C2035/0838 , B29C2035/0877 , G03F7/203
摘要： Methods for making differentially pattern cured microstructured articles are disclosed, using a molding tool having a microstructured surface, a patterned irradiation to generate irradiate and non-irradiated regions in a radiation curable resin. Different combinations of molding tools and patterned irradiation provide numerous variants of differentially pattern cured microstructured articles without requiring costly modification of the molding tools.
摘要翻译： 公开了使用具有微结构化表面的成型工具，图案化照射以在可辐射固化树脂中产生照射和未照射区域的制造差异图案固化的微结构物品的方法。 模制工具和图案化照射的不同组合提供差异图案固化的微结构制品的许多变体，而不需要对成型工具进行昂贵的改造。
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公开(公告)号：US06952264B2
公开(公告)日：2005-10-04
申请号：US10023376
申请日：2001-12-13
IPC分类号： B05D3/06 , B05D7/00 , B41F23/04 , G01J1/00 , G01J1/02 , G01J1/04 , G01J1/42 , G21K5/00 , G21K5/04 , G01N21/84
CPC分类号： G01J1/02 , B41F23/0406 , G01J1/0271 , G01J1/04 , G01J1/0403 , G01J1/0425 , G01J1/0462 , G01J1/42 , G01J1/429
摘要： The invention includes a method for collecting radiation. An electromechanical radiation collection device is disposed in a roll to collect radiation directed at the roll. The invention is also an apparatus comprising a roll having an outer surface. An electromechanical radiation collection device is disposed in the roll.
摘要翻译： 本发明包括收集辐射的方法。 机电辐射收集装置设置在卷筒中以收集指向卷筒的辐射。 本发明也是一种包括具有外表面的辊的设备。 机电辐射收集装置设置在卷筒中。
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公开(公告)号：US09302291B2
公开(公告)日：2016-04-05
申请号：US14232671
申请日：2012-08-01
申请人： Christopher S. Lyons , Kent T. Engle , Steven R. Vanhoose , Terence D. Spawn , Joseph M. Pieper , Edward J. Anderson , Walter Stoss
发明人： Christopher S. Lyons , Kent T. Engle , Steven R. Vanhoose , Terence D. Spawn , Joseph M. Pieper , Edward J. Anderson , Walter Stoss
CPC分类号： C23C16/45561 , B01D3/10 , B05D1/60 , B05D2252/02 , C23C14/12 , C23C14/228 , C23C14/24 , C23C14/544 , C23C14/562 , C23C14/58 , C23C14/5806 , C23C14/582 , C23C16/50
摘要： A system for processing vapor. The system includes a vapor source for producing a vapor and an outlet conduit coupled to the vapor source for carrying the vapor from the vapor source. Downstream of the vapor source the outlet conduit separates into a vapor bypass conduit and a vapor feed conduit. The system further includes a first vapor control valve disposed in the bypass conduit, a second vapor control valve disposed in the feed conduit, a first vacuum chamber connected to the bypass conduit, and a second vacuum chamber connected to the feed conduit.
摘要翻译： 蒸汽处理系统 该系统包括用于产生蒸汽的蒸汽源和与蒸汽源耦合的出口导管，用于承载来自蒸气源的蒸气。 在蒸汽源的下游，出口导管分离成蒸气旁路管道和蒸气供给导管。 该系统还包括设置在旁路管道中的第一蒸汽控制阀，设置在进料管道中的第二蒸汽控制阀，连接到旁路管道的第一真空室和连接到进料管道的第二真空室。
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公开(公告)号：US06555823B2
公开(公告)日：2003-04-29
申请号：US09746884
申请日：2000-12-22
IPC分类号： G01J142
CPC分类号： G01J1/04 , G01J1/0204 , G01J1/0271 , G01J1/0425 , G01J1/044
摘要： The invention is a pneumatically actuated energy collection device. The device includes a support which has an energy collector thereon. A shutter is slidably attached to the support and can be moved between a first “closed” position and a second “open” position. In its first position, the shutter covers the collector and in its second position, the shutter uncovers the collector. The shutter is biased into one of the positions. A chamber is disposed adjacent to the shutter so that when the chamber is pressurized, the shutter bias is overcome and the shutter is moved between the first position and the second position.
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