公开(公告)号：US20110177649A1

公开(公告)日：2011-07-21

申请号：US13011109

申请日：2011-01-21

申请人： Oliver Rattunde ,  Stephan Voser

发明人： Oliver Rattunde ,  Stephan Voser

IPC分类号： H01L31/0216

CPC分类号： C23C14/0652 ,  C23C14/0042 ,  C23C14/0094 ,  C23C14/3492 ,  H01L31/02168 ,  H01L31/028 ,  H01L31/03682 ,  H01L31/03762 ,  H01L31/1868 ,  Y02E10/546 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： A method for the deposition of an anti-reflection film on a substrate is disclosed. A substrate including a plurality of solar cell structures is provided and placed in a vacuum chamber with a target including silicon. A flow of a nitrogen-containing reactive gas into the vacuum chamber is set to a first value while a voltage between the target and ground is switched off and then increased to a second value. A voltage is applied between the target and ground, whereby a film of silicon and nitrogen is deposited on the substrate in a flow of the nitrogen-containing reactive gas which is higher than the first value.

摘要翻译： 公开了一种在衬底上沉积抗反射膜的方法。 提供包括多个太阳能电池结构的基板并且放置在具有包括硅的靶的真空室中。 将含氮反应性气体流入真空室的流量设定为第一值，同时关闭目标和地面之间的电压，然后增加到第二值。 在靶和地之间施加电压，由此在高于第一值的含氮反应气体的流动下，在衬底上沉积硅和氮的膜。

公开(公告)号：US08263489B2

公开(公告)日：2012-09-11

申请号：US13011109

申请日：2011-01-21

申请人： Oliver Rattunde ,  Stephan Voser

发明人： Oliver Rattunde ,  Stephan Voser

IPC分类号： H01L21/4763 ,  H01L31/0232

CPC分类号： C23C14/0652 ,  C23C14/0042 ,  C23C14/0094 ,  C23C14/3492 ,  H01L31/02168 ,  H01L31/028 ,  H01L31/03682 ,  H01L31/03762 ,  H01L31/1868 ,  Y02E10/546 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： A method for the deposition of an anti-reflection film on a substrate is disclosed. A substrate including a plurality of solar cell structures is provided and placed in a vacuum chamber with a target including silicon. A flow of a nitrogen-containing reactive gas into the vacuum chamber is set to a first value while a voltage between the target and ground is switched off and then increased to a second value. A voltage is applied between the target and ground, whereby a film of silicon and nitrogen is deposited on the substrate in a flow of the nitrogen-containing reactive gas which is higher than the first value.

摘要翻译： 公开了一种在衬底上沉积抗反射膜的方法。 提供包括多个太阳能电池结构的基板并且放置在具有包括硅的靶的真空室中。 将含氮反应性气体流入真空室的流量设定为第一值，同时关闭目标和地面之间的电压，然后增加到第二值。 在靶和地之间施加电压，由此在高于第一值的含氮反应气体的流动下，在衬底上沉积硅和氮的膜。

公开(公告)号：US09214589B2

公开(公告)日：2015-12-15

申请号：US13256979

申请日：2010-03-15

申请人： Stephan Voser ,  Oliver Rattunde ,  Martin Dubs ,  Gerald Feistritzer ,  Volker Wuestenhagen ,  Gerhard Dovids

发明人： Stephan Voser ,  Oliver Rattunde ,  Martin Dubs ,  Gerald Feistritzer ,  Volker Wuestenhagen ,  Gerhard Dovids

IPC分类号： H01L31/18 ,  H01L21/67

CPC分类号： H01L31/18 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207

摘要： Throughput of manufacturing thin-film solar panels by inline technique is made substantially independent from the time extent of different surface treatment steps by accordingly subdividing treatment steps in sub-steps performed in inline subsequent treatment stations. Treatment duration in each of the subsequent treatment stations is equal(τ).

摘要翻译： 通过在线技术制造薄膜太阳能电池板的生产能力通过相应地在后续处理站中执行的子步骤中分开处理步骤而与不同表面处理步骤的时间范围基本上独立。 每个后续治疗站的治疗持续时间相等（τ）。

公开(公告)号：US20120009730A1

公开(公告)日：2012-01-12

申请号：US13256979

申请日：2010-03-15

申请人： Stephan Voser ,  Oliver Rattunde ,  Martin Dubs ,  Gerald Feistritzer ,  Volker Wuestenhagen ,  Gerhard Dovids

发明人： Stephan Voser ,  Oliver Rattunde ,  Martin Dubs ,  Gerald Feistritzer ,  Volker Wuestenhagen ,  Gerhard Dovids

IPC分类号： H01L31/18

CPC分类号： H01L31/18 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207

摘要： Throughput of manufacturing thin-film solar panels by inline technique is made substantially independent from the time extent of different surface treatment steps by accordingly subdividing treatment steps in sub-steps performed in inline subsequent treatment stations. Treatment duration in each of the subsequent treatment stations is equal (τ).

摘要翻译： 通过在线技术制造薄膜太阳能电池板的生产能力通过相应地在后续处理站中执行的子步骤中分开处理步骤而与不同的表面处理步骤的时间范围基本上独立。 每个后续治疗站的治疗持续时间相等（τ）。

公开(公告)号：US08870513B2

公开(公告)日：2014-10-28

申请号：US13257001

申请日：2010-03-11

申请人： Stephan Voser ,  Gerhard Dovids

发明人： Stephan Voser ,  Gerhard Dovids

IPC分类号： H01L21/677 ,  H01L21/67

CPC分类号： H01L21/67736 ,  H01L21/67201 ,  H01L21/67748 ,  H01L21/67751 ,  Y10S414/139

摘要： A transport arrangement (100) for bi-directionally transporting substrates towards and from a load lock (5) comprises a first substrate handler (1) swivelable about a first axis (A1) and with at least two first substrate carriers (1a, 1b). A second substrate handler (20) swivelable about a second axis (A20) comprises at least four second substrate carriers (20a to 20d). First and second substrate carriers are mutually aligned respectively in one position of their respective swiveling trajectory paths as one of the first substrate carriers is aligned with one of the second substrate carriers and the other of the first substrate carriers is aligned with the load lock (5). The first substrate carriers (1a, 1b) are movable towards and from the load lock (5) once aligned there with and thereby form respectively external valves of the load lock (5).

摘要翻译： 用于将基板双向运送到负载锁（5）的传送装置（100）包括可绕第一轴线（A1）可旋转的第一基板处理器（1）和至少两个第一基板载体（1a，1b） 。 围绕第二轴线（A20）可旋转的第二衬底处理器（20）包括至少四个第二衬底支架（20a至20d）​​。 第一和第二基板载体分别在它们各自的旋转轨迹路径的一个位置上相互对准，因为第一基板载体之一与第二基板载体中的一个对准，并且第一基板载体中的另一个与负载锁定（5 ）。 第一基板载体（1a，1b）可以朝向和离开装载锁（5）移动，一旦与其对准，从而分别形成加载锁（5）的外部阀。

公开(公告)号：US06802942B2

公开(公告)日：2004-10-12

申请号：US10263157

申请日：2002-10-02

申请人： Stephan Voser ,  Martin Dubs

发明人： Stephan Voser ,  Martin Dubs

IPC分类号： C23C1434

CPC分类号： C23C14/50 ,  C23C14/541 ,  C23C16/4583

摘要： To generate an especially good heat transfer between a seating face of a storage plate support and a storage plate, during coating with a sputter source in a vacuum installation, the seating face of the storage plate support is slightly annularly convexly arched and the storage plate is clamped in the center as well as on its outer margin by a center mask and an outer mask against the arched seating face. Hereby an especially good heat transfer is attained with very low arching d, whereby the storage plate is treated gently and simultaneously, during the coating process, no layer thickness distribution problems occur through arching that is too large.

摘要翻译： 为了在存储板支撑件的座面和存储板之间产生特别好的热传递，在真空装置中用溅射源涂覆的过程中，储存板支撑件的座面略微呈凸形拱形，储存板为 通过中心面罩和外部面罩夹在中心及其外缘上，以抵抗拱形座面。 因此，通过非常低的拱形d获得特别好的热传递，由此在涂布过程中缓和地同时处理储存板，通过太大的拱形不会发生层厚度分布问题。

公开(公告)号：US06916407B2

公开(公告)日：2005-07-12

申请号：US10432428

申请日：2001-11-06

申请人： Stephan Voser ,  Eduard Karl Lorenz

发明人： Stephan Voser ,  Eduard Karl Lorenz

IPC分类号： C23C14/34 ,  G11B7/26 ,  H01J37/34 ,  C23C14/35

CPC分类号： H01J37/3423 ,  C23C14/3407 ,  H01J37/3408

摘要： Method for sputtering from a dielectric target (9) in a vacuum chamber (2) with a high frequency gas discharge, the target (9) being mounted on a cooled metallic back plate (10) and this back plate forming an electrode (10) supplied with high frequency, includes a target thickness (Td) profiled (15) differently over the surface such that in the regions of a desired decrease of the sputtering rate the target thickness (Td) is selected to be greater than in the remaining regions.

摘要翻译： 一种用高频气体放电从真空室（2）中的电介质靶（9）溅射的方法，将靶（9）安装在冷却的金属背板（10）上，该后板形成电极（10） 以高频率供给，包括在表面上不同的目标厚度（Td）（15），使得在期望的溅射速率降低的区域中，目标厚度（Td）被选择为大于其余区域中的大小。

公开(公告)号：US5882171A

公开(公告)日：1999-03-16

申请号：US728634

申请日：1996-10-10

申请人： Peter Tinner ,  Josef Marthy ,  Roman Schertler ,  Stephan Voser

发明人： Peter Tinner ,  Josef Marthy ,  Roman Schertler ,  Stephan Voser

IPC分类号： B65G47/86 ,  B01J3/02 ,  B65G49/07 ,  C23C14/56 ,  C23C16/54 ,  G11B7/26 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67236 ,  C23C14/566 ,  C23C14/568 ,  G11B7/26 ,  Y10S414/121 ,  Y10S414/135 ,  Y10S414/139 ,  Y10T29/49075 ,  Y10T29/53065

摘要： A transport and transfer arrangement for a workpiece in a vacuum treatment apparatus has a first transport member with at least one first workpiece holder and a second transport member with at least one second workpiece holder. The first and second transport members are movable relative to each other and in a position in which said one first and said one second workpiece holders are in a spaced face-to-face position. At least one transfer armature member is made of magnetic material. The first and second workpiece holders are part of controllable magnetic arrangement which generates in the spaced face-to-face position and between the workpiece holders, a magnetic force controllable to act in either direction and magnetically driving said transfer armature member controllably in a first direction from the first workpiece holder towards and onto said second workpiece holder and vice versa in a second direction as the workpiece holders are face to face. The transfer armature member is releasably firmly attachable to the workpiece with respect to the first and second directions so as to convey the workpiece both in the first and in said second direction, respectively from said first workpiece holder towards and onto the second workpiece holder and vice versa.

摘要翻译： 用于真空处理设备中的工件的输送和传送装置具有第一传送构件，其具有至少一个第一工件保持器和具有至少一个第二工件保持器的第二传送构件。 第一和第二输送构件可相对于彼此移动并且在所述一个第一和第二个第二工件保持器处于间隔开的面对位置的位置中。 至少一个转移衔铁件由磁性材料制成。 第一和第二工件保持器是可控磁性布置的一部分，其在间隔开的面对面位置和工件保持器之间产生可控制的作用于任一方向的磁力，并且以可沿第一方向可控地驱动所述转移衔铁件 从第一工件保持件朝向和位于所述第二工件保持器上，并且反之亦然，在工件保持器面对面时沿第二方向。 转移电枢构件相对于第一和第二方向可释放地牢固地附接到工件，以便将工件沿第一和第二方向分别从所述第一工件保持件朝向和向上传送到第二工件保持器和副 反之亦然。

公开(公告)号：US20120003064A1

公开(公告)日：2012-01-05

申请号：US13257001

申请日：2010-03-11

申请人： Stephan Voser ,  Gerhard Dovids

发明人： Stephan Voser ,  Gerhard Dovids

IPC分类号： H01L21/677

CPC分类号： H01L21/67736 ,  H01L21/67201 ,  H01L21/67748 ,  H01L21/67751 ,  Y10S414/139

摘要： A transport arrangement (100) for bi-directionally transporting substrates towards and from a load lock (5) comprises a first substrate handler (1) swivelable about a first axis (A1) and with at least two first substrate carriers (1a, 1b). A second substrate handler (20) swivelable about a second axis (A20) comprises at least four second substrate carriers (20a to 20d). First and second substrate carriers are mutually aligned respectively in one position of their respective swiveling trajectory paths as one of the first substrate carriers is aligned with one of the second substrate carriers and the other of the first substrate carriers is aligned with the load lock (5). The first substrate carriers (1a, 1b) are movable towards and from the load lock (5) once aligned there with and thereby form respectively external valves of the load lock (5).

摘要翻译： 用于将基板双向传送至负载锁定件（5）的传送装置（100）包括可围绕第一轴线（A1）可旋转的第一基板处理器（1）和至少两个第一基板载体（1a，1b） 。 围绕第二轴线（A20）可旋转的第二衬底处理器（20）包括至少四个第二衬底支架（20a至20d）​​。 第一和第二基板载体分别在它们各自的旋转轨迹路径的一个位置上相互对准，因为第一基板载体之一与第二基板载体中的一个对准，并且第一基板载体中的另一个与负载锁定（5 ）。 第一基板载体（1a，1b）可以朝向和离开装载锁（5）移动，一旦与其对准，从而分别形成加载锁（5）的外部阀。

公开(公告)号：US06453543B1

公开(公告)日：2002-09-24

申请号：US09283251

申请日：1999-04-01

申请人： Peter Tinner ,  Josef Marthy ,  Roman Schertler ,  Stephan Voser

发明人： Peter Tinner ,  Josef Marthy ,  Roman Schertler ,  Stephan Voser

IPC分类号： H01F706

CPC分类号： H01L21/67236 ,  C23C14/566 ,  C23C14/568 ,  G11B7/26 ,  Y10S414/121 ,  Y10S414/135 ,  Y10S414/139 ,  Y10T29/49075 ,  Y10T29/53065

摘要： Disclosed is a workpiece conveyor and delivery device for a vacuum processing plant. Workpieces are delivered from one device to another, both devices being located opposite each other and moving in relation to each other. A controllable magnet arrangement is provided on one of the devices. A moveable armature element acts as a holding device for the workpiece on one of the two devices which move in relation to each other, namely the device provided with the magnet arrangement. Magnet arrangement is driven to activate the holding device which can be deactivated for delivery of workpiece.

摘要翻译： 公开了一种用于真空处理设备的工件输送机和输送装置。 工件从一个设备传送到另一个设备，两个设备彼此相对定位并相对于彼此移动。 其中一个装置上设有一个可控磁体装置。 可移动的电枢元件用作相对于彼此移动的两个装置中的一个上的工件的保持装置，即设置有磁体装置的装置。 驱动磁体布置以启动保持装置，其可以被停用以输送工件。