OPTOELECTRONIC SEMICONDUCTOR COMPONENT AND METHOD FOR PRODUCING THE SAME

    公开(公告)号:US20220069160A1

    公开(公告)日:2022-03-03

    申请号:US17415003

    申请日:2019-12-18

    IPC分类号: H01L33/06 H01L33/00 H01L33/24

    摘要: An optoelectronic semiconductor device comprises an active zone comprising sub-layers for forming a quantum well structure. Differences in energy levels of the quantum well structure are smaller in a central region of the optoelectronic semiconductor device than in an edge region of the optoelectronic semiconductor device. According to further embodiments, an optoelectronic semiconductor device comprises an active zone comprising a sub-layer which is suitable for forming a quantum well structure. In the active zone, quantum dot structures are formed in a central region of the optoelectronic semiconductor device. No quantum dot structures are formed in an edge region of the optoelectronic semiconductor device.