公开(公告)号：US07190707B2

公开(公告)日：2007-03-13

申请号：US10739961

申请日：2003-12-17

申请人： Palash P. Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Kyle Webb

发明人： Palash P. Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Kyle Webb

IPC分类号： H01S3/22

CPC分类号： B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/04 ,  G01J1/0418 ,  G01J1/4257 ,  G01J2001/0285 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery pat. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.

摘要翻译： 公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光光脉冲束传送 从气体放电激光器的输出拍摄到使用包含在输出激光脉冲光束中的光的工作装置的输入; 可操作地连接到射束输送罩的清洗机构; 外壳内的原位波束参数监视和调节机构，包括可伸缩的豆重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在外壳内的光束衰减器单元，其可调节地安装在外壳内用于定位在光束输送光点内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块 每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。 可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。 可以提供外部运动学对准工具。 公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

公开(公告)号：US20070160103A1

公开(公告)日：2007-07-12

申请号：US11715082

申请日：2007-03-06

申请人： Palash Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Webb

发明人： Palash Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Webb

IPC分类号： H01S3/22

CPC分类号： B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/04 ,  G01J1/0418 ,  G01J1/4257 ,  G01J2001/0285 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.

摘要翻译： 公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光束脉冲束传送 从气体放电激光器的输出到使用包含在输出激光脉冲光束中的光的工作装置的输入的路径; 可操作地连接到射束输送罩的清洗机构; 壳体内的原位光束参数监视和调节机构，包括可伸缩光束重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在可调节地安装在外壳内的外壳内的光束衰减器单元，用于定位在光束输送路径内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块 每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。 可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。 可以提供外部运动学对准工具。 公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

公开(公告)号：US07230964B2

公开(公告)日：2007-06-12

申请号：US10425361

申请日：2003-04-29

申请人： Plash P. Das ,  R. Kyle Webb ,  Marco Giovanardi ,  Gregory Francis ,  Huckleberry B. Dorn ,  Kyle P. Erlandsen ,  John W. Nelson ,  Richard L. Sandstrom ,  Alexander I. Ershov

发明人： Plash P. Das ,  R. Kyle Webb ,  Marco Giovanardi ,  Gregory Francis ,  Huckleberry B. Dorn ,  Kyle P. Erlandsen ,  John W. Nelson ,  Richard L. Sandstrom ,  Alexander I. Ershov

IPC分类号： H01S3/22 ,  G21G5/00

CPC分类号： G03F7/7055 ,  G02B26/0816 ,  G02B27/0972 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70058 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/136 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

摘要翻译： 本发明提供了一种向生产线机器输送光束的模块化高重复率紫外线气体放电激光光源。 该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。 优选实施例包括用于光束衰减的设备，用于自动反馈光束对准的设备和用于在安装和维护期间精确的光学模块定位的设备。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。