公开(公告)号：US07190707B2

公开(公告)日：2007-03-13

申请号：US10739961

申请日：2003-12-17

申请人： Palash P. Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Kyle Webb

发明人： Palash P. Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Kyle Webb

IPC分类号： H01S3/22

CPC分类号： B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/04 ,  G01J1/0418 ,  G01J1/4257 ,  G01J2001/0285 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery pat. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.

摘要翻译： 公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光光脉冲束传送 从气体放电激光器的输出拍摄到使用包含在输出激光脉冲光束中的光的工作装置的输入; 可操作地连接到射束输送罩的清洗机构; 外壳内的原位波束参数监视和调节机构，包括可伸缩的豆重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在外壳内的光束衰减器单元，其可调节地安装在外壳内用于定位在光束输送光点内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块 每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。 可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。 可以提供外部运动学对准工具。 公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

公开(公告)号：US07139301B2

公开(公告)日：2006-11-21

申请号：US10701280

申请日：2003-11-03

申请人： Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  Palash P. Das ,  Richard L. Sandstrom ,  John M. Algots ,  Khurshid Ahmed

发明人： Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  Palash P. Das ,  Richard L. Sandstrom ,  John M. Algots ,  Khurshid Ahmed

IPC分类号： H01S3/22

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

公开(公告)号：US6128323A

公开(公告)日：2000-10-03

申请号：US157067

申请日：1998-09-18

申请人： David W. Myers ,  Herve A. Besaucele ,  Palash P. Das ,  Thomas P. Duffey ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Thomas Hofmann ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  Robert G. Ozarski ,  Gamaralalage G. Padmabandu ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Paul S. Thompson ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb ,  Paolo Zambon

发明人： David W. Myers ,  Herve A. Besaucele ,  Palash P. Das ,  Thomas P. Duffey ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Thomas Hofmann ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  Robert G. Ozarski ,  Gamaralalage G. Padmabandu ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Paul S. Thompson ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb ,  Paolo Zambon

IPC分类号： G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08 ,  H01S3/081 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80 ,  H01S3/00

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225 ,  H03K17/80 ,  H03K3/57 ,  H01S3/08009 ,  H01S3/0812 ,  H01S3/1392 ,  H01S3/2251 ,  H01S3/2256

摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

摘要翻译： 本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。 可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。 允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。 该室设计用于在较低的氟浓度下运行。 在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。 这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次 具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。 用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

公开(公告)号：US06671294B2

公开(公告)日：2003-12-30

申请号：US09918773

申请日：2001-07-27

申请人： Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  Palash P. Das ,  Richard L. Sandstrom ,  John M. Algots ,  Khurshid Ahmed

发明人： Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  Palash P. Das ,  Richard L. Sandstrom ,  John M. Algots ,  Khurshid Ahmed

IPC分类号： H01S310

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

公开(公告)号：US06704339B2

公开(公告)日：2004-03-09

申请号：US10233253

申请日：2002-08-30

申请人： Leonard Lublin ,  David J. Warkentin ,  Palash P. Das ,  Brian C. Klene ,  R. Kyle Webb ,  Herve A. Besaucele ,  Ronald L. Spangler ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  Shahryar Rokni

发明人： Leonard Lublin ,  David J. Warkentin ,  Palash P. Das ,  Brian C. Klene ,  R. Kyle Webb ,  Herve A. Besaucele ,  Ronald L. Spangler ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  Shahryar Rokni

IPC分类号： H01S3101

CPC分类号： H01S3/005 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

摘要翻译： 本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。 该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

公开(公告)号：US07884303B2

公开(公告)日：2011-02-08

申请号：US11201877

申请日：2005-08-11

申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

IPC分类号： B23K26/00

CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

摘要： A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，并且扩展 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够的强度分布的倍率 陡峭的侧壁允许现场停止在工件处保持足够陡峭的梁轮廓。

公开(公告)号：US07061959B2

公开(公告)日：2006-06-13

申请号：US10884547

申请日：2004-07-01

申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

IPC分类号： H01S3/22

CPC分类号： H01S3/0818 ,  B23K26/042 ,  B23K26/0622 ,  B23K26/0738 ,  B23K26/705 ,  H01L21/02532 ,  H01L21/02675 ,  H01S3/225 ,  H01S3/2255 ,  H01S3/2308 ,  H01S3/2366

摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.

摘要翻译： 公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光 脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。 该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。 该系统可以包括振荡器激光单元中的发散控制。 发散控制可以包括不稳定的谐振器装置。 该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。 光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。

公开(公告)号：US07016388B2

公开(公告)日：2006-03-21

申请号：US10712688

申请日：2003-11-12

申请人： Brian Klene ,  Palash P. Das ,  Steve Grove ,  Alexander Ershov ,  Scot Smith ,  Xiaojiang Pan ,  Richard L. Sandstrom

发明人： Brian Klene ,  Palash P. Das ,  Steve Grove ,  Alexander Ershov ,  Scot Smith ,  Xiaojiang Pan ,  Richard L. Sandstrom

IPC分类号： H01S3/22

CPC分类号： G03F7/7055 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

公开(公告)号：US06693939B2

公开(公告)日：2004-02-17

申请号：US10141216

申请日：2002-05-07

申请人： Brian Klene ,  Palash P. Das ,  Steve Grove ,  Alexander Ershov ,  Scot Smith ,  Xiaojiang Pan ,  Richard L. Sandstrom

发明人： Brian Klene ,  Palash P. Das ,  Steve Grove ,  Alexander Ershov ,  Scot Smith ,  Xiaojiang Pan ,  Richard L. Sandstrom

IPC分类号： H01S322

CPC分类号： G03F7/70933 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

摘要翻译： 本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。 该系统包括用于将激光束传送到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

公开(公告)号：US6028880A

公开(公告)日：2000-02-22

申请号：US109596

申请日：1998-07-02

申请人： Jason R. Carlesi ,  Shahryar Rokni ,  Mengxiong Gong ,  Tom A. Watson ,  Palash P. Das ,  Michael C. Binder ,  Muljadi Tantra ,  David J. Tammadge ,  Daniel G. Patterson

发明人： Jason R. Carlesi ,  Shahryar Rokni ,  Mengxiong Gong ,  Tom A. Watson ,  Palash P. Das ,  Michael C. Binder ,  Muljadi Tantra ,  David J. Tammadge ,  Daniel G. Patterson

IPC分类号： G03F7/20 ,  H01S3/036 ,  H01S3/225

CPC分类号： G03F7/70558 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/225

摘要： An excimer laser system with a fluorine control having a fixed volume inject bottle in which fluorine is injected prior to it being injected into the laser chamber. A manifold and feedback control system is provided to permit precise injection at rates approaching continuous fluorine injection. The system permits the laser to be operated in a small sweet spot as measured by a narrow range of charging voltage.

摘要翻译： 具有氟控制的准分子激光系统具有固定体积的注射瓶，其中在注入氟注入激光室之前注入氟。 提供歧管和反馈控制系统以允许以接近连续氟注入的速率进行精确喷射。 该系统允许激光器在小范围的充电电压测量的小甜点中操作。