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32 条记录 (耗时 0.039 秒)

    Method for photolithographic definition of recessed features on a semiconductor wafer utilizing auto-focusing alignment
    4.
    发明授权
    Method for photolithographic definition of recessed features on a semiconductor wafer utilizing auto-focusing alignment 失效
    利用自动聚焦对准在半导体晶片上的凹版特征的光刻定义方法

    公开(公告)号：US5783340A

    公开(公告)日：1998-07-21

    申请号：US903985

    申请日：1997-07-31

    申请人： Anthony J. Farino ,  Stephen Montague ,  Jeffry J. Sniegowski ,  James H. Smith ,  Paul J. McWhorter

    发明人： Anthony J. Farino ,  Stephen Montague ,  Jeffry J. Sniegowski ,  James H. Smith ,  Paul J. McWhorter

    IPC分类号： B81B3/00 ,  B81B7/00 ,  B81B7/02 ,  G03F7/09 ,  G03F7/207 ,  G03F9/00 ,  G01B11/00

    CPC分类号： G03F7/094 ,  B81C1/00246 ,  G03F9/70 ,  B81C2203/0728 ,  G01P2015/0828

    摘要： A method is disclosed for photolithographically defining device features up to the resolution limit of an auto-focusing projection stepper when the device features are to be formed in a wafer cavity at a depth exceeding the depth of focus of the stepper. The method uses a focusing cavity located in a die field at the position of a focusing light beam from the auto-focusing projection stepper, with the focusing cavity being of the same depth as one or more adjacent cavities wherein a semiconductor device is to be formed. The focusing cavity provides a bottom surface for referencing the focusing light beam and focusing the stepper at a predetermined depth below the surface of the wafer, whereat the device features are to be defined. As material layers are deposited in each device cavity to build up a semiconductor structure such as a microelectromechanical system (MEMS) device, the same material layers are deposited in the focusing cavity, raising the bottom surface and re-focusing the stepper for accurately defining additional device features in each succeeding material layer. The method is especially applicable for forming MEMS devices within a cavity or trench and integrating the MEMS devices with electronic circuitry fabricated on the wafer surface.

    摘要翻译： 公开了一种用于光刻地限定器件特征的方法，直到在超过步进器的焦深深度的晶片腔中形成器件特征时，自动聚焦投影步进器的分辨率极限。 该方法使用位于来自自动聚焦投影步进机的聚焦光束的位置处的模场中的聚焦腔，其中聚焦腔具有与一个或多个相邻空腔相同的深度，其中将形成半导体器件 。 聚焦腔提供用于参考聚焦光束的底表面，并将步进器聚焦在晶片表面下方的预定深度处，其中将限定器件特征。 当材料层沉积在每个器件腔中以建立诸如微机电系统（MEMS）器件的半导体结构时，相同的材料层沉积在聚焦腔中，提高底表面并重新聚焦步进器以准确地限定附加的 每个后续材料层中的器件特征。 该方法特别适用于在腔或沟槽内形成MEMS器件，并将MEMS器件与在晶片表面上制造的电子电路集成。

    Pressure control system for sealed enclosures
    5.
    发明授权
    Pressure control system for sealed enclosures 有权
    密封外壳的压力控制系统

    公开(公告)号：US07362540B2

    公开(公告)日：2008-04-22

    申请号：US11053826

    申请日：2005-02-09

    申请人： William F. Repphun ,  James H. Smith

    发明人： William F. Repphun ,  James H. Smith

    IPC分类号： G11B33/14

    CPC分类号： G11B33/121 ,  G11B33/1486

    摘要： A pressure control system for a sealed enclosure may include opposing one-way valves to limit the differential pressure between the atmospheres internal and external to the sealed enclosure. The pressure control system may allow the internal atmosphere to vent out of a first one-way valve if the internal pressure exceeds the external pressure by a first predetermined pressure. The pressure control system may allow the external atmosphere to be drawn in through a second one-way valve if the external pressure exceeds the internal pressure by a second predetermined pressure. By allowing the exchange of gasses only when the differential pressure falls outside of a predetermined range, overall contamination may be reduced. By reducing the ingress of contaminants, such as dust, water, smog, and outgassed substances, performance may be improved and service life of components housed within the sealed enclosure may be extended.

    摘要翻译： 用于密封外壳的压力控制系统可以包括相对的单向阀，以限制密封外壳内部和外部的气氛之间的压差。 如果内部压力超过外部压力第一预定压力，压力控制系统可允许内部空气从第一单向阀排出。 如果外部压力超过内部压力第二预定压力，则压力控制系统可以允许外部大气通过第二单向阀被吸入。 通过仅当差压超出预定范围时才允许气体换气，可能会降低总体污染。 通过减少诸如灰尘，水，烟雾和脱气物质等污染物的进入，可以提高性能，并且可以延长容纳在密封外壳内的部件的使用寿命。

    Inking apparatus
    7.
    发明授权
    Inking apparatus 失效
    油墨装置

    公开(公告)号：US4050379A

    公开(公告)日：1977-09-27

    申请号：US687288

    申请日：1976-05-17

    申请人： James H. Smith ,  Sherman S. Kumpf

    发明人： James H. Smith ,  Sherman S. Kumpf

    IPC分类号： B41J2/305 ,  B41K3/56 ,  B41F1/40

    CPC分类号： B41K3/56

    摘要： An inking device for record media includes a self-contained ink reservoir bordered by a holder portion as one wall of the reservoir, and a backing plate as another wall adjacent a porous rubber electro pad. The backing plate includes a plurality of chamfered apertures therethrough which are circumscribed by a like number of slotted tubes which tubes separate the backing plate and the holder portion. A steel ball is positioned within each tube and controls the flow of ink from the ink reservoir to the electro pad by reason of swinging movement of the device wherein the ball is unseated from the chamfered aperture in the downward direction of movement upon the electro pad striking the record media to permit flow of ink to the pad, and the ball is reseated on the aperture during return movement of the device to stop the flow of ink to the pad. A low hydraulic pressure occurs during the striking action to unseat the ball and a suction occurs on the return movement to reseat the ball.

    摘要翻译： 用于记录介质的上墨装置包括由作为储存器的一个壁的保持器部分界定的独立的墨水储存器，以及作为邻近多孔橡胶电垫的另一壁的背板。 背板包括多个通过其穿过的倒角孔，它们被相同数量的开槽管包围，管子分离背板和保持器部分。 钢球位于每个管内，并且由于该装置的摆动运动而控制墨水从油墨储存器到电焊垫的流动，其中，在电击打击时，球从向下移动方向上的倒角孔脱离 记录介质允许油墨流动到垫上，并且在装置返回运动期间将球重新放在孔上，以阻止油墨流入垫。 在打击动作期间发生低液压压力以使球移动，并且在返回运动上产生吸力以重新安放球。

    HUMIDITY CONTROL METHOD AND APPARATUS FOR USE IN AN ENCLOSED ASSEMBLY
    8.
    发明申请
    HUMIDITY CONTROL METHOD AND APPARATUS FOR USE IN AN ENCLOSED ASSEMBLY 有权
    湿度控制方法和装置用于封闭的装配

    公开(公告)号：US20090121032A1

    公开(公告)日：2009-05-14

    申请号：US12355520

    申请日：2009-01-16

    申请人： Paul A. Beatty ,  Robert A. Bruce ,  Michael D. Ries ,  James H. Smith

    发明人： Paul A. Beatty ,  Robert A. Bruce ,  Michael D. Ries ,  James H. Smith

    IPC分类号： G05D22/00

    CPC分类号： G11B33/1453

    摘要： A humidity control method and apparatus that can be utilized to provide humidity control within an enclosed assembly such as a disc drive. The apparatus includes a container that is at least partially formed of a material through which water vapor can freely move. The apparatus also includes a humidity-controlling mixture that comprises at least one salt and a superabsorbent polymer. The humidity-controlling mixture is enclosed within the container.

    摘要翻译： 一种湿度控制方法和装置，其可用于在诸如盘驱动器的封闭组件内提供湿度控制。 该装置包括至少部分地由水蒸气可自由移动的材料形成的容器。 所述设备还包括包含至少一种盐和超吸收性聚合物的调湿混合物。 调湿混合物封闭在容器内。

    Humidity control method and apparatus for use in an enclosed assembly
    9.
    发明授权
    Humidity control method and apparatus for use in an enclosed assembly 有权
    用于封闭组件的湿度控制方法和装置

    公开(公告)号：US07478760B2

    公开(公告)日：2009-01-20

    申请号：US10970960

    申请日：2004-10-22

    申请人： Paul A. Beatty ,  Robert A. Bruce ,  Michael D. Ries ,  James H. Smith

    发明人： Paul A. Beatty ,  Robert A. Bruce ,  Michael D. Ries ,  James H. Smith

    IPC分类号： F24F3/14 ,  F24F11/00 ,  B01F3/02 ,  G11B33/14

    CPC分类号： G11B33/1453

    摘要： A humidity control method and apparatus that can be utilized to provide humidity control within an enclosed assembly such as a disc drive. The apparatus includes a container that is at least partially formed of a material through which water vapor can freely move. The apparatus also includes a humidity-controlling mixture that comprises at least one salt and a superabsorbent polymer. The humidity-controlling mixture is enclosed within the container.

    摘要翻译： 一种湿度控制方法和装置，其可用于在诸如盘驱动器的封闭组件内提供湿度控制。 该装置包括至少部分地由水蒸气可自由移动的材料形成的容器。 所述设备还包括包含至少一种盐和超吸收性聚合物的调湿混合物。 调湿混合物封闭在容器内。

    Fluid-borne contaminant protection using a filter assembly with a leading edge guide surface
    10.
    发明授权
    Fluid-borne contaminant protection using a filter assembly with a leading edge guide surface 失效

    公开(公告)号：US07130149B2

    公开(公告)日：2006-10-31

    申请号：US10274862

    申请日：2002-10-21

    申请人： Yiren Hong ,  ChoonKiat Lim ,  Pohlye Lim ,  James H. Smith ,  Walter Wong

    发明人： Yiren Hong ,  ChoonKiat Lim ,  Pohlye Lim ,  James H. Smith ,  Walter Wong

    IPC分类号： G11B33/14

    CPC分类号： G11B25/043 ,  G11B33/146

    摘要： Method and apparatus for protecting a data storage device from fluid-borne contaminants. The device includes a housing in which a rotatable disc is supported, the disc having a data recording surface and an outermost perimeter. A filter assembly includes a first filter adjacent to the data recording surface and a second filter disposed beyond the outermost perimeter of the disc. During disc rotation, fluidic currents are generated and impinge a leading edge guide surface of the first filter. A first portion of the currents passes into a gap between the first filter and the data recording surface. A second portion of the currents passes along the leading edge guide surface to the second filter. The first filter is preferably characterized as a chemical adsorbent filter which adsorbs vapor phase (gaseous) contaminants, and the second filter is preferably characterized as a pass-through recirculation filter which captures particulate contaminants.