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公开(公告)号：US09235046B2
公开(公告)日：2016-01-12
申请号：US13754548
申请日：2013-01-30
Applicant: Pixtronix, Inc.
Inventor： Javier Villarreal , Timothy J. Brosnihan , Jasper L. Steyn , Richard S. Payne , Stephen R. Lewis
CPC classification number: G02B26/02 , B81B3/007 , B81B2201/045 , B81B2203/0163 , B81B2203/051 , B81C2201/053 , B81C2201/112 , G02B26/023 , G09G3/22
Abstract: This disclosure provides systems, methods and apparatus for providing relatively thinner and less stiff compliant beams for a shutter assembly. A protective coating is deposited and patterned over the shutter assembly before it is released from a sacrificial mold over which the shutter assembly is formed. Because some primary surfaces of the compliant beams are in contact with the sacrificial mold, these primary surfaces are not coated with the protective coating. Therefore, when the shutter assembly is finally released, the resulting compliant beams are relatively thinner and less stiff providing a reduction in an actuation voltage used to operate the shutter assembly. In some instances, the protective coating is patterned into discontinuous segments before release.
Abstract translation: 本公开提供了用于为快门组件提供相对较薄且较不硬的柔性梁的系统，方法和装置。 在从快门组件形成的牺牲模具释放之前，将保护涂层沉积并在其上形成图案。 由于柔性梁的一些主表面与牺牲模具接触，所以这些主表面没有涂覆保护涂层。 因此，当快门组件最终被释放时，所产生的柔性梁相对较薄并且较不硬，从而降低用于操作闸板组件的致动电压。 在一些情况下，保护性涂层在释放之前被图案化成不连续段。
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2.发明授权Display apparatus with densely packed electromechanical systems display elements 有权具有密集机电系统的显示装置显示元件公开(公告)号：US09223128B2
公开(公告)日：2015-12-29
申请号：US13718833
申请日：2012-12-18
Applicant: Pixtronix, Inc.
Inventor： Jignesh Gandhi , Stephen R. Lewis , Timothy J. Brosnihan
CPC classification number: G02B26/02 , G09G3/3433 , G09G2300/0426
Abstract: This disclosure provides systems, methods and apparatus for reducing undesired capacitance and electrostatic attraction among components of electromechanical systems (EMS) displays. An apparatus includes an array of display elements, a control matrix, and an electric insulation layer. The display elements each include a movable light blocking component coupled to a conductive beam. The control matrix includes a plurality of interconnects, including at least one switched interconnect, which passes under and is electrically isolated from at least one of the conductive beam and the movable light blocking component.
Abstract translation: 本公开提供了用于减少机电系统（EMS）显示器的组件之间的不期望的电容和静电吸引的系统，方法和装置。 一种装置包括显示元件阵列，控制矩阵和电绝缘层。 显示元件各自包括耦合到导电束的可移动遮光元件。 所述控制矩阵包括多个互连，所述多个互连包括至少一个开关互连，所述至少一个开关互连在所述导电束和所述可移动遮光部件中的至少一个下通过并与之隔离。
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公开(公告)号：US20140218374A1
公开(公告)日：2014-08-07
申请号：US13759769
申请日：2013-02-05
Applicant: PIXTRONIX, INC.
Inventor： Jianru Shi , Richard S. Payne , Timothy J. Brosnihan , Eugene Fike , Edward Buckley , Javier Villarreal
IPC: G02B26/02
CPC classification number: G02B26/02 , B81B3/00 , G02B26/023
Abstract: This disclosure provides systems, methods and apparatus for providing multi-level multi-state shutter assemblies. The shutter assembly includes at least a first shutter at a first height over a substrate and a second shutter at a second height over the substrate. Both the first shutter and the second shutter can be operated in an open or closed state for passing or partially blocking light propagating through an aperture. In some implementations, the shutter assembly can operate in four states: a fully transmissive state, a fully obstructive state and two partially transmissive states based on the open or closed states of the first and second shutters.
Abstract translation: 本公开提供了用于提供多级多状态快门组件的系统，方法和装置。 快门组件至少包括位于衬底上的第一高度处的第一快门和在衬底上的第二高度处的第二快门。 第一快门和第二快门都可以在打开或关闭状态下操作，以通过或部分阻挡通过孔传播的光。 在一些实施方案中，快门组件可以以四种状态操作：基于第一和第二快门的打开或关闭状态的完全透射状态，完全阻塞状态和两个部分透射状态。
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公开(公告)号：US20140210864A1
公开(公告)日：2014-07-31
申请号：US13754548
申请日：2013-01-30
Applicant: PIXTRONIX, INC.
Inventor： Javier Villarreal , Timothy J. Brosnihan , Jasper L. Steyn , Richard S. Payne , Stephen R. Lewis
CPC classification number: G02B26/02 , B81B3/007 , B81B2201/045 , B81B2203/0163 , B81B2203/051 , B81C2201/053 , B81C2201/112 , G02B26/023 , G09G3/22
Abstract: This disclosure provides systems, methods and apparatus for providing relatively thinner and less stiff compliant beams for a shutter assembly. A protective coating is deposited and patterned over the shutter assembly before it is released from a sacrificial mold over which the shutter assembly is formed. Because some primary surfaces of the compliant beams are in contact with the sacrificial mold, these primary surfaces are not coated with the protective coating. Therefore, when the shutter assembly is finally released, the resulting compliant beams are relatively thinner and less stiff providing a reduction in an actuation voltage used to operate the shutter assembly. In some instances, the protective coating is patterned into discontinuous segments before release.
Abstract translation: 本公开提供了用于为快门组件提供相对较薄且较不硬的柔性梁的系统，方法和装置。 在从快门组件形成的牺牲模具释放之前，将保护涂层沉积并在其上形成图案。 由于柔性梁的一些主表面与牺牲模具接触，所以这些主表面没有涂覆保护涂层。 因此，当快门组件最终被释放时，所产生的柔性梁相对较薄并且较不硬，从而降低用于操作闸板组件的致动电压。 在一些情况下，保护性涂层在释放之前被图案化成不连续段。
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公开(公告)号：US09170421B2
公开(公告)日：2015-10-27
申请号：US13759769
申请日：2013-02-05
Applicant: Pixtronix, Inc.
Inventor： Jianru Shi , Richard S. Payne , Timothy J. Brosnihan , Eugene Fike , Edward Buckley , Javier Villarreal
CPC classification number: G02B26/02 , B81B3/00 , G02B26/023
Abstract: This disclosure provides systems, methods and apparatus for providing multi-level multi-state shutter assemblies. The shutter assembly includes at least a first shutter at a first height over a substrate and a second shutter at a second height over the substrate. Both the first shutter and the second shutter can be operated in an open or closed state for passing or partially blocking light propagating through an aperture. In some implementations, the shutter assembly can operate in four states: a fully transmissive state, a fully obstructive state and two partially transmissive states based on the open or closed states of the first and second shutters.
Abstract translation: 本公开提供了用于提供多级多状态快门组件的系统，方法和装置。 快门组件至少包括位于衬底上的第一高度处的第一快门和在衬底上的第二高度处的第二快门。 第一快门和第二快门都可以在打开或关闭状态下操作，以通过或部分阻挡通过孔传播的光。 在一些实施方案中，快门组件可以以四种状态操作：基于第一和第二快门的打开或关闭状态的完全透射状态，完全阻塞状态和两个部分透射状态。
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Patent Agency Ranking
公开(公告)号：US20150055205A1
公开(公告)日：2015-02-26
申请号：US13973852
申请日：2013-08-22
Applicant: Pixtronix, Inc.
Inventor： Tyler A. Dunn , Timothy J. Brosnihan
CPC classification number: G02B26/02 , B81B3/0086 , B81B5/00 , B81B2201/045 , B81B2203/0118 , B81B2203/04 , B81B2203/056 , B81C1/00634 , B81C2201/0161 , G02B26/023 , G02B26/0841
Abstract: This disclosure provides systems, methods, and apparatus for a MEMS display incorporating extended height actuators. A light modulating component can be positioned between a substrate and an opposing surface coupled to the substrate. A suspended electrode can be coupled to the light modulating component and suspended between the substrate and the opposing surface. An extended-height electrode can be positioned immediately adjacent to the suspended electrode, and can extend from the substrate up to a height beyond the height of the suspended electrode. The suspended electrode and the extended-height electrode can be configured to move the light modulating component laterally with respect to the substrate.
Abstract translation: 本公开提供了用于包括扩展高度致动器的MEMS显示器的系统，方法和装置。 光调制组件可以位于衬底和耦合到衬底的相对表面之间。 悬挂的电极可以耦合到光调制部件并悬挂在基板和相对的表面之间。 延伸高度的电极可以紧邻悬挂的电极定位，并且可以从衬底延伸到高于悬挂电极的高度的高度。 悬置电极和延伸高度电极可以被配置为相对于衬底横向移动光调制组件。
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公开(公告)号：US20140225904A1
公开(公告)日：2014-08-14
申请号：US13766475
申请日：2013-02-13
Applicant: PIXTRONIX, INC.
Inventor： Mark B. Andersson , Timothy J. Brosnihan , Javier Villarreal , Joyce Wu
IPC: G02F1/01
CPC classification number: G02F1/0128 , G02B26/023 , G02F1/0102
Abstract: This disclosure provides systems, methods and apparatus for forming display structures having shutters that have a different height than corresponding actuators. In one aspect, a display apparatus includes an electrostatic actuator including opposing beam electrodes having primary faces normal to a substrate on which they are formed. The height of at least one of the opposing beam electrodes defines an actuator height. The apparatus also includes a shutter configured to be driven by the electrostatic actuator. The shutter includes at least one protrusion, the protrusion having a first sidewall and a second sidewall normal to a primary plane of the shutter, wherein a first sidewall height of the first sidewall is substantially different from the actuator height.
Abstract translation: 本公开提供了用于形成具有与相应的致动器不同的高度的百叶窗的显示结构的系统，方法和装置。 一方面，显示装置包括静电致动器，该静电致动器包括相对的光束电极，所述相对的光束电极具有与形成它们的基板垂直的主面。 至少一个相对的梁电极的高度限定了致动器的高度。 该装置还包括构造成由静电致动器驱动的快门。 闸板包括至少一个突起，该突起具有第一侧壁和垂直于活门主要平面的第二侧壁，其中第一侧壁的第一侧壁高度与致动器高度基本上不同。
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公开(公告)号：US20130335806A1
公开(公告)日：2013-12-19
申请号：US14012505
申请日：2013-08-28
Applicant: Pixtronix, Inc.
Inventor： Jasper Lodewyk Steyn , Timothy J. Brosnihan , Joyce H. Wu , Mark B. Andersson , Richard S. Payne , John J. Fijol , Roger W. Barton , Nesbitt W. Hagood, IV
IPC: G02B26/00
CPC classification number: G02B26/00 , G02B26/02 , G02B26/0841 , G09G3/2022 , G09G3/3406 , G09G3/3433 , G09G2300/08 , G09G2310/0235 , G09G2320/0633
Abstract: The invention relates to a light modulator including a substrate having a surface and a modulation assembly coupled to the substrate that includes a modulation element and a first compliant beam. The first compliant beam includes a first segment that extend away from a first anchor and a second segment that extends back towards the first anchor. The length of the first segment is different than the length of the second segment.
Abstract translation: 本发明涉及一种光调制器，其包括具有表面的基板和耦合到基板的调制组件，该调制组件包括调制元件和第一柔性梁。 第一柔性梁包括从第一锚固体延伸的第一段和朝向第一锚向后延伸的第二段。 第一段的长度不同于第二段的长度。
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公开(公告)号：US09122047B2
公开(公告)日：2015-09-01
申请号：US13731511
申请日：2012-12-31
Applicant: Pixtronix, Inc.
Inventor： Eugene E. Fike, III , Timothy J. Brosnihan
CPC classification number: G02B26/00 , B81B3/0005 , B81B7/0012 , B81B7/0029 , B81B2201/045 , B81C1/0096 , G02B26/02 , G02B27/0006 , G02F1/0102 , G09G3/00
Abstract: This disclosure provides systems, methods and apparatus for preventing particles from entering electromechanical systems (EMS) display devices. In one aspect, an apparatus includes a plate, a substrate supporting at least one EMS device, a seal joining the plate and the substrate to define a cavity therebetween and at least one port for receiving a fluid, and a filter disposed between the port and the EMS device. The filter includes elements formed on at least one of a surface of the substrate and a surface of the plate, defining a gap sized to allow the received fluid to pass and to inhibit non-fluidic particles carried in the fluid from the EMS device.
Abstract translation: 本公开提供了用于防止颗粒进入机电系统（EMS）显示装置的系统，方法和装置。 在一个方面，一种装置包括板，支撑至少一个EMS装置的基板，连接板和基板的密封件，以在其间限定一个空腔，以及用于接收流体的至少一个端口，以及设置在端口和 EMS设备。 过滤器包括形成在基板的表面和板的表面中的至少一个上的元件，其限定了尺寸允许接收的流体通过并且抑制从EMS装置流入的流体中的非流体颗粒的间隙。
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公开(公告)号：US20140268292A1
公开(公告)日：2014-09-18
申请号：US13796952
申请日：2013-03-12
Applicant: PIXTRONIX, INC.
Inventor： Ye Wang , Timothy J. Brosnihan
IPC: G02B26/00
CPC classification number: G02B26/00 , G02B26/007 , G02B26/02 , G02B26/023 , G02B26/0816 , G02B26/0833 , G02B26/0841 , G02B27/0068 , G02B2027/0118 , G02F1/155 , G02F1/19 , G02F1/29 , G02F1/292 , G02F2203/24
Abstract: This disclosure provides systems, methods and apparatus incorporating display elements having light modulators that can operate in more than two states. In some implementations, the light modulator assembly includes an electrostatic actuator that includes a load electrode coupled to a shutter and a drive electrode set positioned proximate to the load electrode. The drive electrode set includes a plurality of discrete portions that are configured to drive the light modulator assembly to a plurality of different light modulator states. In some such implementations, the portions of the drive electrode set are positioned opposite to corresponding regions of the load electrode. In some implementations, the portions are arranged such that the portions are configured to electrostatically engage with adjacent regions of the load electrode.
Abstract translation: 本公开提供了结合具有可以在两种以上状态下操作的光调制器的显示元件的系统，方法和装置。 在一些实施方案中，光调制器组件包括静电致动器，其包括耦合到快门的负载电极和靠近负载电极定位的驱动电极组。 驱动电极组包括多个分立部分，其被配置为将光调制器组件驱动到多个不同的光调制器状态。 在一些这样的实施方案中，驱动电极组的部分与负载电极的对应区域相对定位。 在一些实施方式中，这些部分被布置成使得这些部分构造成与负载电极的相邻区域静电接合。
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