摘要:
A low-index silica coating may be made by forming silica sol including a silane and/or a colloidal silica. The silica precursor may be deposited on a substrate (e.g., glass substrate) to form a coating layer. The coating layer may then be cured and/or fired using temperature(s) of from about 550 to 700° C. A barrier undercoating including a metal oxide, such as, silica, alumina, titania, zirconia, and/or an oxynitride of silica may be deposited between the coating layer and substrate. Preferably, the barrier undercoating does not substantially affect the percent transmission or reflection of the low-index silica coating. The low-index silica based coating may be used as an antireflective (AR) film on a front glass substrate of a photovoltaic device (e.g., solar cell) or any other suitable application in certain example instances.
摘要:
A first-surface mirror or other substrate includes protective coating and is for use in a solar collector, projection television, or the like. In certain example embodiments, a protective coating is formed over a reflective coating of a first surface mirror. In other aspects, this application is related to other coated articles, including, for example, articles (such as insulating glass (IG) window units) having coatings providing for low emissivity. In certain example embodiments, the protective coating may comprise organic materials containing alkyl chains or fluoro-alkyl chains and reactive functionalities comprising silicon and/or phosphorous so as to protect the reflective coating and improve durability.
摘要:
Certain embodiments of this invention relates to a coated article including a substrate (e.g., glass substrate) which supports a coating thereon, wherein the coating includes at least one layer of or including SbOxNy. This layer is desirable for blocking (reflection and/or absorption) of at least some ultraviolet (UV) radiation. In certain example embodiments of this invention, the layer of SbOxNy may be used as a dielectric layer in a low-E (low-emissivity) coating, and may improve UV-blocking capability of such a low-E coating. Coated articles in certain example embodiments of this invention may be used in the context of windows.
摘要翻译:本发明的某些实施例涉及一种包括在其上支撑涂层的基底(例如,玻璃基底)的涂层制品,其中该涂层包括至少一层或包括SbO x N SUB>。 该层对于阻挡(反射和/或吸收)至少一些紫外(UV)辐射是理想的。 在本发明的某些示例性实施例中,SbO x N N y层可以用作低E(低发射率)涂层中的电介质层,并且可以 提高这种低E涂层的UV阻隔能力。 在本发明的某些示例性实施例中的涂层制品可以在窗口的上下文中使用。
摘要:
Certain example embodiments relate to robust semi-transparent coatings that are suitable for use in a wide variety of display-on-demand mirror applications, and methods of making the same. In certain example embodiments, a coated article includes a coating supported by a glass substrate. A reflective metal-inclusive layer is formed, directly or indirectly, on the glass substrate. A silicon oxide inclusive layer is formed, directly or indirectly, on the reflective metallic layer. A titanium oxide inclusive layer is formed, directly or indirectly, on the silicon oxide inclusive layer. The metal-inclusive layer is formed so as to reflect incoming light away from the glass substrate such that substantially less incoming light would be reflected away from the glass substrate if lighting were provided on a side of the glass substrate opposite the coating than if no lighting were provided. The surface of the coated article need not necessarily be conductive. The metal-inclusive layer may be connected to a power source so as to heat it (e.g., for defogging purposes).
摘要:
Certain example embodiments relate to robust semi-transparent coatings that are suitable for use in a wide variety of display-on-demand mirror applications, and methods of making the same. In certain example embodiments, a coated article includes a coating supported by a glass substrate. A reflective metal-inclusive layer is formed, directly or indirectly, on the glass substrate. A silicon oxide inclusive layer is formed, directly or indirectly, on the reflective metallic layer. A titanium oxide inclusive layer is formed, directly or indirectly, on the silicon oxide inclusive layer. The metal-inclusive layer is formed so as to reflect incoming light away from the glass substrate such that substantially less incoming light would be reflected away from the glass substrate if lighting were provided on a side of the glass substrate opposite the coating than if no lighting were provided. The surface of the coated article need not necessarily be conductive. The metal-inclusive layer may be connected to a power source so as to heat it (e.g., for defogging purposes).
摘要:
Certain embodiments of this invention relates to a coated article including a substrate (e.g., glass substrate) which supports a coating thereon, wherein the coating includes at least one layer of or including SbOxNy. This layer is desirable for blocking (reflection and/or absorption) of at least some ultraviolet (UV) radiation. In certain example embodiments of this invention, the layer of SbOxNy may be used as a dielectric layer in a low-E (low-emissivity) coating, and may improve UV-blocking capability of such a low-E coating. Coated articles in certain example embodiments of this invention may be used in the context of windows.
摘要翻译:本发明的某些实施方案涉及包括在其上支撑涂层的基底(例如玻璃基底)的涂覆制品,其中所述涂层包括至少一层或包含SbO x N y。 该层对于阻挡(反射和/或吸收)至少一些紫外(UV)辐射是理想的。 在本发明的某些示例性实施例中,SbO x N y层可以用作低E(低辐射率)涂层中的电介质层,并且可以改善这种低E涂层的UV阻挡能力。 在本发明的某些示例性实施例中的涂层制品可以在窗口的上下文中使用。
摘要:
Certain examples relate to lighting system covers that include AR-coated textured glass, and/or methods of making the same. In certain examples, at least one light source is provided proximate to a cover comprising a glass substrate. The glass substrate includes an anti-reflective (AR) coating on the surface that is closer to the at least one light source, and the glass substrate is textured (e.g., such that it is substantially prismatic in texture) on the surface opposite the AR-coated surface. The surface of the glass substrate on which the AR coating is formed may be a flat, irregular, or textured matte. An optional AR coating also may be formed on the textured surface of the glass substrate.
摘要:
Certain example embodiments relate to lighting system covers that include AR-coated textured glass, and/or methods of making the same. In certain example embodiments, at least one light source is provided proximate to a cover comprising a glass substrate. The glass substrate includes an anti-reflective (AR) coating on the surface that is closer to the at least one light source, and the glass substrate is textured (e.g., such that it is substantially prismatic in texture) on the surface opposite the AR-coated surface. The surface of the glass substrate on which the AR coating is formed may be a flat, irregular, or textured matte. An optional AR coating also may be formed on the textured surface of the glass substrate.
摘要:
Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. The front electrode has a transparent conductive oxide (TCO) film having first and second layers (continuous or discontinuous) of the same material (e.g., zinc oxide, zinc aluminum oxide, indium-tin-oxide, or tin oxide), where the first TCO layer is sputter-deposited using a ceramic sputtering target(s) and the second TCO layer of the same material is sputter-deposited using a metallic or substantially metallic sputtering target(s). This allows the better quality TCO of the film, deposited more slowly via the ceramic target(s), to be formed using the ceramic target and the lesser quality TCO of the film to be deposited more quickly and cost effectively via the metallic target(s). After the etching, most or all of the better quality ceramic-deposited TCO remains whereas much of the lesser quality metallic-deposited TCO of the film was removed during the etching process.
摘要:
Certain example embodiments of this invention relate to a front electrode provided on an etched/patterned front glass substrate for use in a photovoltaic device or the like. The glass is a low-iron soda-lime-silica based glass. Etching of the glass may include immersing the soda-lime-silica based glass in an acid inclusive solution such as hydrofluoric acid (e.g., HF in aqueous solution) and/or hydrofluoric acid with a buffer, in order to selectively dissolve some of the glass thereby producing at least one textured/patterned substantially transparent surface of the glass substrate. A front electrode (single or multi-layered) is then formed (e.g., via sputter-deposition) on the textured surface of the front glass substrate, and may be used in a photovoltaic device or the like.