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    Optical substrate and method and apparatus for producing optical substrates
    2.
    发明申请
    Optical substrate and method and apparatus for producing optical substrates 审中-公开
    光学基板及其制造方法及装置

    公开(公告)号：US20040051987A1

    公开(公告)日：2004-03-18

    申请号：US10381398

    申请日：2003-09-09

    发明人： Stefan Bauer ,  Markus Kuhr ,  Bram Vengerling ,  Klutz Klippe ,  Burkhard Danielzik

    IPC分类号： G02B005/08 ,  G02B007/182

    CPC分类号： G02B1/115 ,  C03C17/22 ,  C03C17/3447 ,  C03C17/3452 ,  C03C17/3458 ,  G02B6/132 ,  G02B2006/12109

    摘要： To enable the time required to produce an optical substrate on which one or more layers which influence the propagation of light are to be arranged to be reduced, and preferably to provide this optical substrate with significantly lower surface stresses, the invention describes the use of an application method and an optical substrate produced using this method, in which at least one of the layers comprises halogen atoms or a halogen compound as a result of the production.

    摘要翻译： 为了实现制造其上要布置减少影响光的传播的一个或多个层的光学基板所需的时间，并且优选地为该光学基板提供显着较低的表面应力，本发明描述了使用 施加方法和使用该方法制造的光学基板，其中至少一个层包含卤素原子或作为生产的结果的卤素化合物。

    Process for formation of tin oxide film
    3.
    发明授权
    Process for formation of tin oxide film 失效
    氧化锡膜的形成工艺

    公开(公告)号：US4770901A

    公开(公告)日：1988-09-13

    申请号：US892643

    申请日：1986-08-04

    申请人： Yukihiro Katoh ,  Hideo Kawahara ,  Masato Hyohdou ,  Hironobu Yamamoto

    发明人： Yukihiro Katoh ,  Hideo Kawahara ,  Masato Hyohdou ,  Hironobu Yamamoto

    IPC分类号： B05D5/12 ,  C03C17/34 ,  C03C17/40 ,  C23C16/02 ,  C23C18/12 ,  B05D3/02

    CPC分类号： C03C17/3458 ,  C23C16/0272

    摘要： A process for formation of tin oxide film is described, wherein a glass substrate is heated to a high temperature and then tin oxide film is formed on the surface of said substrate by a thermal decomposition oxidation reaction caused by bringing a tin compound or a mixture of a tin compound and a fluorine-containing compound into contact with the surface of said glass substrate, and wherein prior to the formation of tin oxide film, said glass substrate is preliminarily brought into contact with a solution of chloride of a metal belonging to Group IVB of the Periodic Table so that a layer of a composition containing the chloride of the Group IVB metal as the primary component is formed on the surface of said substrate.

    摘要翻译： 描述了形成氧化锡膜的方法，其中将玻璃基板加热到高温，然后通过使锡化合物或其混合物的混合物引起的热分解氧化反应在所述基板的表面上形成氧化锡膜 锡化合物和含氟化合物与所述玻璃基板的表面接触，并且其中在形成氧化锡膜之前，预先使所述玻璃基板与属于第IVB族的金属的氯化物溶液接触 ，使得在所述基材的表面上形成含有作为主要成分的IVB族金属的氯化物的组合物层。

    Method of making glass including surface treatment with aluminum chloride using combustion deposition prior to deposition of antireflective coating
    4.
    发明授权
    Method of making glass including surface treatment with aluminum chloride using combustion deposition prior to deposition of antireflective coating 有权
    在沉积防反射涂层之前，使用燃烧沉积法制造玻璃的方法，包括用氯化铝进行表面处理

    公开(公告)号：US07923063B2

    公开(公告)日：2011-04-12

    申请号：US12000200

    申请日：2007-12-10

    申请人： Bernd Disteldorf ,  Pramod K. Sharma ,  Nathan P. Mellott

    发明人： Bernd Disteldorf ,  Pramod K. Sharma ,  Nathan P. Mellott

    IPC分类号： B05D5/06

    CPC分类号： G02B1/113 ,  C03C17/002 ,  C03C17/3417 ,  C03C17/3458 ,  C03C2217/732 ,  C03C2218/15 ,  H01L31/02167 ,  H01L31/18

    摘要： This invention relates to a method of making glass. In certain example embodiments, a major surface(s) of the glass is treated with aluminum chloride (e.g., AlCl3). This treating, or application of an aluminum chloride based layer on the glass substrate, may be performed using combustion deposition. The combustion deposition may be performed at or just prior to the annealing lehr in certain example embodiments, or at any other suitable location. The aluminum chloride barrier layer, applied at a desirable glass temperature, helps to reduce sodium leaching or diffusion from the glass during conditions such as high heat and/or humidity, thereby improving the durability and/or stability of the resulting product.

    摘要翻译： 本发明涉及制造玻璃的方法。 在某些示例性实施方案中，玻璃的主表面用氯化铝（例如AlCl 3）处理。 可以使用燃烧沉积来在玻璃基板上处理或施加氯化铝基层。 燃烧沉积可以在某些示例性实施例中或在任何其它适当位置处在退火退火炉之前或之前进行。 以期望的玻璃温度施加的氯化铝阻挡层有助于在诸如高热和/或湿度的条件期间减少钠浸出或扩散玻璃，从而提高所得产品的耐久性和/或稳定性。

    Method of making glass including surface treatment with aluminum chloride using combustion deposition prior to deposition of antireflective coating
    5.
    发明申请
    Method of making glass including surface treatment with aluminum chloride using combustion deposition prior to deposition of antireflective coating 有权
    在沉积防反射涂层之前，使用燃烧沉积法制造玻璃的方法，包括用氯化铝进行表面处理

    公开(公告)号：US20090148709A1

    公开(公告)日：2009-06-11

    申请号：US12000200

    申请日：2007-12-10

    申请人： Bernd Disteldorf ,  Pramod K. Sharma ,  Nathan P. Mellott

    发明人： Bernd Disteldorf ,  Pramod K. Sharma ,  Nathan P. Mellott

    IPC分类号： C23C16/06 ,  B32B17/06

    CPC分类号： G02B1/113 ,  C03C17/002 ,  C03C17/3417 ,  C03C17/3458 ,  C03C2217/732 ,  C03C2218/15 ,  H01L31/02167 ,  H01L31/18

    摘要： This invention relates to a method of making glass. In certain example embodiments, a major surface(s) of the glass is treated with aluminum chloride (e.g., AlCl3). This treating, or application of an aluminum chloride based layer on the glass substrate, may be performed using combustion deposition. The combustion deposition may be performed at or just prior to the annealing lehr in certain example embodiments, or at any other suitable location. The aluminum chloride barrier layer, applied at a desirable glass temperature, helps to reduce sodium leaching or diffusion from the glass during conditions such as high heat and/or humidity, thereby improving the durability and/or stability of the resulting product.

    摘要翻译： 本发明涉及制造玻璃的方法。 在某些示例性实施方案中，玻璃的主表面用氯化铝（例如AlCl 3）处理。 可以使用燃烧沉积来在玻璃基板上处理或施加氯化铝基层。 燃烧沉积可以在某些示例性实施例中或在任何其它适当位置处在退火退火炉之前或之前进行。 以期望的玻璃温度施加的氯化铝阻挡层有助于在诸如高热和/或湿度的条件期间减少钠浸出或扩散玻璃，从而提高所得产品的耐久性和/或稳定性。

    Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same
    7.
    发明申请
    Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same 审中-公开
    制造防反射二氧化硅涂层的方法，所得产品和包含该涂层的光伏器件

    公开(公告)号：US20090101209A1

    公开(公告)日：2009-04-23

    申请号：US11976079

    申请日：2007-10-19

    申请人： Pramod K. Sharma ,  Nathan P. Mellott ,  Desaraju V. Varaprasad ,  Yiwei Lu ,  Scott V. Thomsen

    发明人： Pramod K. Sharma ,  Nathan P. Mellott ,  Desaraju V. Varaprasad ,  Yiwei Lu ,  Scott V. Thomsen

    IPC分类号： H01L31/04 ,  C03C17/23 ,  B32B17/00 ,  H01L31/18

    CPC分类号： C03C17/3417 ,  C03C17/23 ,  C03C17/3458 ,  C03C2217/213 ,  C03C2217/734 ,  C03C2218/113 ,  C03C2218/365 ,  G02B1/113 ,  H01L31/02168 ,  H01L31/0392 ,  Y02E10/50 ,  Y10T428/31612

    摘要： A low-index silica coating may be made by forming silica sol including a silane and/or a colloidal silica. The silica precursor may be deposited on a substrate (e.g., glass substrate) to form a coating layer. The coating layer may then be cured and/or fired using temperature(s) of from about 550 to 700° C. A barrier undercoating including a metal oxide, such as, silica, alumina, titania, zirconia, and/or an oxynitride of silica may be deposited between the coating layer and substrate. Preferably, the barrier undercoating does not substantially affect the percent transmission or reflection of the low-index silica coating. The low-index silica based coating may be used as an antireflective (AR) film on a front glass substrate of a photovoltaic device (e.g., solar cell) or any other suitable application in certain example instances.

    摘要翻译： 可以通过形成包括硅烷和/或胶体二氧化硅的二氧化硅溶胶来制备低折射率二氧化硅涂层。 二氧化硅前体可以沉积在基底（例如玻璃基底）上以形成涂层。 然后可以使用约550-700℃的温度来固化和/或烧制涂层。包含金属氧化物（例如二氧化硅，氧化铝，二氧化钛，氧化锆和/或氧氮化物）的屏障底涂层 二氧化硅可以沉积在涂层和基底之间。 优选地，阻挡层底涂层基本上不影响低折射率二氧化硅涂层的透射率或反射率。 低折射率二氧化硅基涂层可以在某些示例情况下用作光伏器件（例如，太阳能电池）的前玻璃基板上的抗反射（AR）膜或任何其它合适的应用。

    Soil retardant coating and method for forming the same
    8.
    发明授权
    Soil retardant coating and method for forming the same 失效
    土壤阻燃涂料及其形成方法

    公开(公告)号：US3676186A

    公开(公告)日：1972-07-11

    申请号：US3676186D

    申请日：1970-09-11

    申请人： RESEARCH CORP

    发明人： PYTLEWSKI LOUIS L

    IPC分类号： B05D5/08 ,  B41M1/36 ,  C01G19/00 ,  C03C17/22 ,  C03C17/25 ,  C03C17/34 ,  B44D1/14 ,  B05B5/00 ,  C03C23/00

    CPC分类号： C03C17/3458 ,  B05D5/08 ,  B41M1/36 ,  C01G19/00 ,  C03C17/22 ,  C03C17/25 ,  C03C17/253 ,  C03C17/3417 ,  C03C2217/211 ,  C03C2217/229 ,  C03C2217/28 ,  C03C2217/29 ,  C03C2218/11 ,  C03C2218/113 ,  C03C2218/114 ,  Y10T428/265

    摘要： POSITIVELY CHARGED COATINGS ARE PROVIDED COMPRISED OF POSITIVELY CHARGED PARTICLS OF A SALT OF A METAL, THE METALLIC ELEMENT OF WHICH EXHIBITS TWO STABLE STATES OF OXIDATION SIMULTANEOUSLY WHILE IN SOLUTION. THE COATINGS MAY FURTHER HAVE AN ADDITIONAL LAYER OF NEGATIVELY CHARGED SILICA PARTICLES OVER THE POSTIVELY CHARGED COATINGS. THE COATINGS OF THIS INVENTION ARE SUBSTANTIVE TO NEGATIVELY CHARGED SURFACES SUCH AS GLASS AND ARE ALSO HYDROPHILIC. WHEN WATER STRIKES THE COATED SURFACE, THERE IS A PREFERENTIAL WETTING OUT AND REMOVAL OF SOILS FROM THE SURFACE. THE COATINS OF THIS COMPOSITIONS ARE ESPECIALLY USEFUL AS SOIL RETARDANT COATINS FOR WINDOW GLASS AND OTHER NEGATIVELY CHARGED SURFACES SUDH AS TEXTILES, METALS, PAINTED SURFACES, PLASTIC AND THE LIKE.

    摘要翻译： 提供了无机锡氧化物聚合物，其由主要部分的下式的重复单元组成：其中至少一个基团R 1 -R 4是-OH或-O-，并且基团R 1 -R 4中的至少一个是阴离子 的锡（IV）的水溶性盐如氯化物，溴化物，硝酸盐，硫酸盐阴离子等，其余基团是-OH，-O-或如上所定义的阴离子和少部分重复单元 式为：其中M1为二价金属离子，M2为三价金属离子。 M1和M2是相同或不同金属的金属离子。 合适的金属离子在水性体系中表现出两种稳定的氧化态。 本发明的聚合物带正电并具有高亲水性。 本发明的聚合物特别可用于改变基材的表面特性，例如赋予正常疏水性材料亲水性。