利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

19 条记录 (耗时 0.023 秒)

    Magnetic head having a deposited second magnetic shield and fabrication method therefor
    1.
    发明申请
    Magnetic head having a deposited second magnetic shield and fabrication method therefor 审中-公开
    具有沉积的第二磁屏蔽的磁头及其制造方法

    公开(公告)号：US20060002023A1

    公开(公告)日：2006-01-05

    申请号：US10883327

    申请日：2004-06-30

    申请人： Quang Le ,  Edwin Hin Lee ,  Jui-Lung Li ,  Nian-Xiang Sun ,  Yi Zheng

    发明人： Quang Le ,  Edwin Hin Lee ,  Jui-Lung Li ,  Nian-Xiang Sun ,  Yi Zheng

    IPC分类号： G11B5/147 ,  G11B5/127 ,  G11B5/33

    CPC分类号： B82Y10/00 ,  G11B5/3163 ,  G11B5/3912

    摘要： The magnetic head includes a second magnetic shield that is fabricated in a deposition process. The present invention therefore does not require the deposition of the electrically conductive seed layer. In a preferred embodiment, the deposited second magnetic shield is comprised of cobalt zirconium tantalum (CZT). Because the CZT material is relatively soft, it is preferably deposited within an opening formed in a relatively hard RIEable material such as Ta2O5, SiO2, Si3N3, and SiOxNy, such that a subsequent chemical mechanical polishing (CMP) step can be conducted down to the surface of the relatively hard layer.

    摘要翻译： 磁头包括在沉积工艺中制造的第二磁屏蔽。 因此，本发明不要求导电种子层的沉积。 在优选实施例中，所沉积的第二磁屏蔽由钴锆钽（CZT）组成。 由于CZT材料相对较软，因此优选沉积在形成于相对较硬的RIEable材料（例如Ta 2 O 5，SiO 2）中的开口内， SUB>，Si 3 N 3 N 3和SiO x N N y，使得随后的化学机械抛光（ CMP）步骤可以向下传导到相对硬的层的表面。

    WRITE POLE FABRICATION FOR PERPENDICULAR RECORDING
    2.
    发明申请
    WRITE POLE FABRICATION FOR PERPENDICULAR RECORDING 失效
    写字符制造用于完整记录

    公开(公告)号：US20060288565A1

    公开(公告)日：2006-12-28

    申请号：US11469132

    申请日：2006-08-31

    申请人： Quang Le ,  Edward Lee ,  Jui-Lung Li ,  Aron Pentek ,  Nian-Xiang Sun

    发明人： Quang Le ,  Edward Lee ,  Jui-Lung Li ,  Aron Pentek ,  Nian-Xiang Sun

    IPC分类号： G11B5/127

    CPC分类号： G11B5/1278 ,  G11B5/112 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

    摘要： Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.

    摘要翻译： 形成写头的方法 一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层，其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层，停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。 另一种方法包括沉积至少邻近极尖的介电材料层，其中电介质材料层围绕掩模层延伸。 另一种方法包括在极尖中形成凹陷。

    Method for forming a write head having an air bearing surface (ABS)
    4.
    发明授权
    Method for forming a write head having an air bearing surface (ABS) 失效
    用于形成具有空气轴承表面（ABS）的写入头的方法

    公开(公告)号：US07464457B2

    公开(公告)日：2008-12-16

    申请号：US11469132

    申请日：2006-08-31

    申请人： Quang Le ,  Edward Hin Pong Lee ,  Jui-Lung Li ,  Aron Peniek ,  Nian-Xiang Sun

    发明人： Quang Le ,  Edward Hin Pong Lee ,  Jui-Lung Li ,  Aron Peniek ,  Nian-Xiang Sun

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/1278 ,  G11B5/112 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

    摘要： Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.

    摘要翻译： 形成写头的方法 一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层，其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层，停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。 另一种方法包括沉积至少邻近极尖的介电材料层，其中电介质材料层围绕掩模层延伸。 另一种方法包括在极尖中形成凹陷。

    Self aligned wrap around shield for perpendicular magnetic recording
    5.
    发明授权
    Self aligned wrap around shield for perpendicular magnetic recording 有权
    自对准绕线屏蔽用于垂直磁记录

    公开(公告)号：US07649712B2

    公开(公告)日：2010-01-19

    申请号：US11116753

    申请日：2005-04-27

    申请人： Quang Le ,  Nian-Xiang Sun ,  Howard Gordon Zolla

    发明人： Quang Le ,  Nian-Xiang Sun ,  Howard Gordon Zolla

    IPC分类号： G11B5/33

    CPC分类号： G11B5/1278 ,  G11B5/1475 ,  G11B5/23 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

    摘要： A write element for use in perpendicular magnetic recording. The write element including a write pole and a self aligned wrap around shield that can have a trailing shield gap thickness that is different from its side shield gap thickness. The materials making up the trailing shield gap and the side shield gaps can be different materials or can be the same material deposited in two different steps. The side or wrap around portions of the trailing shield can extend down to the level of the leading edge of the write pole or can terminate at some point between the levels of the leading and trailing edge to form a partial wrap around trailing shield.

    摘要翻译： 用于垂直磁记录的写入元件。 写入元件包括写入极和自对准的围绕屏蔽的外壳，其可以具有与其侧屏蔽间隙厚度不同的后屏蔽间隙厚度。 构成后屏蔽间隙和侧屏蔽间隙的材料可以是不同的材料，或者可以是在两个不同步骤中沉积的相同材料。 后挡板的侧面或环绕的部分可以向下延伸到写柱的前缘的水平面，或者可以在前缘和后缘的水平面之间的某个点处终止，以形成围绕后挡板的部分包裹。

    Self aligned wrap around shield for perpendicular magnetic recording
    8.
    发明申请
    Self aligned wrap around shield for perpendicular magnetic recording 有权
    围绕屏蔽的自对准涡卷用于垂直磁记录

    公开(公告)号：US20060044682A1

    公开(公告)日：2006-03-02

    申请号：US11116753

    申请日：2005-04-27

    申请人： Quang Le ,  Nian-Xiang Sun ,  Howard Zolla

    发明人： Quang Le ,  Nian-Xiang Sun ,  Howard Zolla

    IPC分类号： G11B5/147

    CPC分类号： G11B5/1278 ,  G11B5/1475 ,  G11B5/23 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

    摘要： A write element for use in perpendicular magnetic recording. The write element including a write pole and a self aligned wrap around shield that can have a trailing shield gap thickness that is different from its side shield gap thickness. The materials making up the trailing shield gap and the side shield gaps can be different materials or can be the same material deposited in two different steps. The side or wrap around portions of the trailing shield can extend down to the level of the leading edge of the write pole or can terminate at some point between the levels of the leading and trailing edge to form a partial wrap around trailing shield.

    摘要翻译： 在垂直磁记录中使用的写元件。 包括写磁极和围绕屏蔽一个自对准包裹，可以有一个尾屏蔽间隙的厚度是从其侧面屏蔽间隙的厚度不同的写元件。 的材料构成的尾屏蔽件间隙和侧屏蔽间隙可以是不同的材料，或者可以是沉积于两个不同的步骤相同的材料。 侧或缠绕在尾屏蔽件的部分可以向下延伸到写入极的前缘的水平或可以在前缘和后缘的电平之间的一些点终止以形成围绕尾屏蔽件的部分包裹。

    Write pole and method of manufacturing the same
    9.
    发明申请
    Write pole and method of manufacturing the same 失效
    写极和制造方法相同

    公开(公告)号：US20060044681A1

    公开(公告)日：2006-03-02

    申请号：US10931649

    申请日：2004-08-31

    申请人： Quang Le ,  Howard Zolla ,  Nian-Xiang Sun

    发明人： Quang Le ,  Howard Zolla ,  Nian-Xiang Sun

    IPC分类号： G11B5/127 ,  G11B5/23

    CPC分类号： G11B5/1475 ,  G11B5/1278 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046

    摘要： A magnetic write head and method of fabrication, in accordance with one embodiment of the present invention, includes depositing a first hard mask layer on a layer of magnetic material, depositing a second hard mask layer on the first hard mask layer, depositing a third hard mask layer on the second hard mask layer and forming a soft mask upon the third hard mask layer defining a write pole. The third hard mask layer exposed by the soft mask is etched utilizing a first chemistry, wherein the pattern of the write pole is transferred from the soft mask to the third hard mask. The second and first hard mask layers exposed by the patterned third hard mask are etched utilizing a second chemistry thereby forming a first and second hard mask. The selectivity of the second chemistry favors the first and second hard mask layers over the third hard mask. The layer of magnetic material exposed by the first hard mask is milled such that a beveled write pole is formed. The selectivity of the milling favors the magnetic material over the first hard mask

    摘要翻译： 根据本发明的一个实施例的磁写头和制造方法包括在第一硬掩模层上沉积第一硬掩模层，在第一硬掩模层上沉积第二硬掩模层， 掩模层，并且在限定写入极的第三硬掩模层上形成软掩模。 利用第一化学蚀刻由软掩模曝光的第三硬掩模层，其中写极的图案从软掩模转移到第三硬掩模。 通过图案化的第三硬掩模暴露的第二和第一硬掩模层利用第二化学物质进行蚀刻，从而形成第一和第二硬掩模。 第二化学品的选择性有利于第三硬掩模上的第一和第二硬掩模层。 由第一硬掩模曝光的磁性材料层被研磨成形成斜面的写入极。 铣削的选择性有利于磁性材料超过第一个硬掩模

    Method for enhancing wafer alignment marks
    10.
    发明申请
    Method for enhancing wafer alignment marks 失效
    增强晶圆对准标记的方法

    公开(公告)号：US20050266357A1

    公开(公告)日：2005-12-01

    申请号：US10857151

    申请日：2004-05-28

    申请人： Amanda Baer ,  Nian-Xiang Sun ,  Sue Zhang ,  Yi Zheng

    发明人： Amanda Baer ,  Nian-Xiang Sun ,  Sue Zhang ,  Yi Zheng

    IPC分类号： G03F7/00 ,  G03F9/00

    CPC分类号： G03F9/7084 ,  G03F9/7076 ,  G03F9/708

    摘要： A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for the alignment marks is prepared by depositing material for the transfer layer. In alternative embodiments an oversized trench is formed in the target area prior to the deposition of the transfer layer. The alignment marks can fabricated in the layer(s) deposited by the existing process or alternatively, the original layers can be removed and replaced with a layer of material selected to have comparable etching properties (definition layer).

    摘要翻译： 描述了通过将对准标记蚀刻到下面的对准标记转印层中来增强在晶片上相对薄的层中限定的对准标记的方法。 通过沉积用于转印层的材料来制备对准标记的目标区域。 在替代实施例中，在沉积转移层之前，在目标区域中形成尺寸过大的沟槽。 对准标记可以在通过现有工艺沉积的层中制造，或者替代地，原始层可被移除并被选择为具有相当的蚀刻性质（定义层）的材料层替代。