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    WRITE POLE FABRICATION FOR PERPENDICULAR RECORDING
    1.
    发明申请
    WRITE POLE FABRICATION FOR PERPENDICULAR RECORDING 失效
    写字符制造用于完整记录

    公开(公告)号：US20060288565A1

    公开(公告)日：2006-12-28

    申请号：US11469132

    申请日：2006-08-31

    申请人： Quang Le ,  Edward Lee ,  Jui-Lung Li ,  Aron Pentek ,  Nian-Xiang Sun

    发明人： Quang Le ,  Edward Lee ,  Jui-Lung Li ,  Aron Pentek ,  Nian-Xiang Sun

    IPC分类号： G11B5/127

    CPC分类号： G11B5/1278 ,  G11B5/112 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

    摘要： Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.

    摘要翻译： 形成写头的方法 一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层，其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层，停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。 另一种方法包括沉积至少邻近极尖的介电材料层，其中电介质材料层围绕掩模层延伸。 另一种方法包括在极尖中形成凹陷。

    Magnetic head having a deposited second magnetic shield and fabrication method therefor
    3.
    发明申请
    Magnetic head having a deposited second magnetic shield and fabrication method therefor 审中-公开
    具有沉积的第二磁屏蔽的磁头及其制造方法

    公开(公告)号：US20060002023A1

    公开(公告)日：2006-01-05

    申请号：US10883327

    申请日：2004-06-30

    申请人： Quang Le ,  Edwin Hin Lee ,  Jui-Lung Li ,  Nian-Xiang Sun ,  Yi Zheng

    发明人： Quang Le ,  Edwin Hin Lee ,  Jui-Lung Li ,  Nian-Xiang Sun ,  Yi Zheng

    IPC分类号： G11B5/147 ,  G11B5/127 ,  G11B5/33

    CPC分类号： B82Y10/00 ,  G11B5/3163 ,  G11B5/3912

    摘要： The magnetic head includes a second magnetic shield that is fabricated in a deposition process. The present invention therefore does not require the deposition of the electrically conductive seed layer. In a preferred embodiment, the deposited second magnetic shield is comprised of cobalt zirconium tantalum (CZT). Because the CZT material is relatively soft, it is preferably deposited within an opening formed in a relatively hard RIEable material such as Ta2O5, SiO2, Si3N3, and SiOxNy, such that a subsequent chemical mechanical polishing (CMP) step can be conducted down to the surface of the relatively hard layer.

    摘要翻译： 磁头包括在沉积工艺中制造的第二磁屏蔽。 因此，本发明不要求导电种子层的沉积。 在优选实施例中，所沉积的第二磁屏蔽由钴锆钽（CZT）组成。 由于CZT材料相对较软，因此优选沉积在形成于相对较硬的RIEable材料（例如Ta 2 O 5，SiO 2）中的开口内， SUB>，Si 3 N 3 N 3和SiO x N N y，使得随后的化学机械抛光（ CMP）步骤可以向下传导到相对硬的层的表面。

    Method for forming a write head having an air bearing surface (ABS)
    4.
    发明授权
    Method for forming a write head having an air bearing surface (ABS) 失效
    用于形成具有空气轴承表面（ABS）的写入头的方法

    公开(公告)号：US07464457B2

    公开(公告)日：2008-12-16

    申请号：US11469132

    申请日：2006-08-31

    申请人： Quang Le ,  Edward Hin Pong Lee ,  Jui-Lung Li ,  Aron Peniek ,  Nian-Xiang Sun

    发明人： Quang Le ,  Edward Hin Pong Lee ,  Jui-Lung Li ,  Aron Peniek ,  Nian-Xiang Sun

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/1278 ,  G11B5/112 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

    摘要： Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.

    摘要翻译： 形成写头的方法 一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层，其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层，停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。 另一种方法包括沉积至少邻近极尖的介电材料层，其中电介质材料层围绕掩模层延伸。 另一种方法包括在极尖中形成凹陷。

    Method for fabricating narrow magnetic read width TMR/CPP sensors
    5.
    发明授权
    Method for fabricating narrow magnetic read width TMR/CPP sensors 有权
    制造窄磁读宽TMR / CPP传感器的方法

    公开(公告)号：US08011084B2

    公开(公告)日：2011-09-06

    申请号：US12184054

    申请日：2008-07-31

    申请人： Quang Le ,  Jui-Lung Li

    发明人： Quang Le ,  Jui-Lung Li

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3909 ,  B82Y10/00 ,  B82Y25/00 ,  G01R33/093 ,  G01R33/098 ,  G11B5/3163 ,  G11B5/3932 ,  G11B2005/3996 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A method for manufacturing a manufacturing a magnetoresistive sensor that allows the sensor to be constructed with a very narrow and well controlled track width. The method includes depositing a layer of diamond like carbon over a series of sensor layers. A first mask is then formed to define a sensor, and an ion milling is performed to remove sensor material not protected by the first mask. Then, a second mask is formed, and a hard bias layer is deposited to the thickness of the sensor layers. The second mask is then lifted off and a CMP is performed to remove the first mask structure. Because all areas other than the area directly over the sensor are substantially planar a quick, gentle CMP can be used to remove the first mask layer even if the first mask is small, such as for definition of a very narrow track-width sensor.

    摘要翻译： 一种用于制造磁阻传感器的方法，该传感器允许传感器被构造成具有非常窄且良好控制的轨道宽度。 该方法包括在一系列传感器层上沉积一层类似金刚石的碳。 然后形成第一掩模以限定传感器，并且执行离子铣削以去除未被第一掩模保护的传感器材料。 然后，形成第二掩模，并且在传感器层的厚度上沉积硬偏置层。 然后将第二掩模剥离并执行CMP以除去第一掩模结构。 由于除传感器正上方的区域以外的所有区域基本上是平面的（由于第二掩模的移除和硬偏置材料的低水平），可以使用快速，温和的CMP来去除第一掩模层，即使 第一个掩模很小，如定义非常窄的轨道宽度传感器。

    Method for manufacturing a magnetoresistive sensor having a flat shield
    9.
    发明授权
    Method for manufacturing a magnetoresistive sensor having a flat shield 有权
    具有平面屏蔽的磁阻传感器的制造方法

    公开(公告)号：US08296930B2

    公开(公告)日：2012-10-30

    申请号：US12645323

    申请日：2009-12-22

    申请人： Shin Funada ,  Quang Le ,  Thomas L. Leong ,  Jui-Lung Li ,  Chang-Man Park ,  Ning Shi ,  Hicham M. Sougrati

    发明人： Shin Funada ,  Quang Le ,  Thomas L. Leong ,  Jui-Lung Li ,  Chang-Man Park ,  Ning Shi ,  Hicham M. Sougrati

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3163 ,  G11B5/112 ,  G11B5/3912 ,  G11B5/398 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

    摘要： A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield to be very thin.

    摘要翻译： 一种用于制造磁阻传感器的方法，其导致传感器具有非常平坦的顶部磁屏蔽。 该过程包括沉积多个传感器层，然后在传感器层上沉积薄的高密度碳CMP停止层，并在CMP停止层上形成掩模。 执行离子铣削来定义传感器。 然后沉积薄的绝缘层和磁性硬偏置层。 进行化学机械抛光以除去掩模，并执行反应离子蚀刻以除去剩余的碳CMP停止层。 因为CMP停止层非常致密且硬，所以可以使其非常薄。 这意味着当通过反应离子蚀刻去除时，在传感器上几乎没有凹口，从而允许上部屏蔽（沉积在其上）非常薄。

    TMR READER WITHOUT DLC CAPPING STRUCTURE
    10.
    发明申请
    TMR READER WITHOUT DLC CAPPING STRUCTURE 有权
    TMR读取器，无DLC封装结构

    公开(公告)号：US20120127616A1

    公开(公告)日：2012-05-24

    申请号：US12954508

    申请日：2010-11-24

    申请人： HONGLIN ZHU ,  Liubo Hong ,  Hicham M. Sougrati ,  Quang Le ,  Jui-Lung Li ,  Chando Park

    发明人： HONGLIN ZHU ,  Liubo Hong ,  Hicham M. Sougrati ,  Quang Le ,  Jui-Lung Li ,  Chando Park

    IPC分类号： G11B5/33 ,  B44C1/22 ,  B05D5/12

    CPC分类号： G11B5/3163 ,  G01R33/098 ,  G11B5/3909 ,  G11B5/3929 ,  G11B5/3932

    摘要： Embodiments herein generally relate to TMR readers and methods for their manufacture. The embodiments discussed herein disclose TMR readers that utilize a structure that avoids use of the DLC layer over the sensor structure and over the hard bias layer. The capping structure over the sensor structure functions as both a protective layer for the sensor structure and a CMP stop layer. The hard bias capping structure functions as both a protective structure for the hard bias layer and as a CMP stop layer. The capping structures that are free of DLC reduce the formation of notches in the second shield layer so that second shield layer is substantially flat.

    摘要翻译： 本文的实施方案通常涉及TMR读取器及其制造方法。 本文讨论的实施例公开了使用避免在传感器结构上以及硬偏压层上使用DLC层的结构的TMR读取器。 传感器结构上的封盖结构用作传感器结构的保护层和CMP停止层。 硬偏置封盖结构既用作硬偏置层的保护结构又用作CMP停止层。 没有DLC的封盖结构减少了第二屏蔽层中的凹口的形成，使得第二屏蔽层基本上是平的。