Electroprocessing profile control
    7.
    发明授权
    Electroprocessing profile control 失效
    电加工配置文件控制

    公开(公告)号:US07709382B2

    公开(公告)日:2010-05-04

    申请号:US11877233

    申请日:2007-10-23

    摘要: Embodiments of the present invention provide methods of electroprocessing a substrate. One embodiment of the present invention provides a method comprises pressing a substrate against a polishing pad with a force less than about two pounds per square inch, the substrate contacting a first electrode of the polishing pad, applying an electrical bias to the substrate with the first electrode relative to a second electrode of the polishing pad, wherein the second electrode is disposed below the second electrode, and biasing a third electrode disposed in the polishing pad radially outward of the second electrode.

    摘要翻译: 本发明的实施方案提供了对基底进行电处理的方法。 本发明的一个实施方案提供了一种方法,包括以小于约2磅/平方英寸的力将衬底压靠抛光垫,衬底与抛光垫的第一电极接触,将第一电极施加电偏压至衬底 电极,其中所述第二电极设置在所述第二电极下方,并且偏置设置在所述抛光垫中的第三电极,所述第三电极位于所述第二电极的径向外侧。

    Methods and apparatus for cleaning an edge of a substrate
    10.
    发明申请
    Methods and apparatus for cleaning an edge of a substrate 审中-公开
    用于清洁衬底边缘的方法和设备

    公开(公告)号:US20080216867A1

    公开(公告)日:2008-09-11

    申请号:US11411215

    申请日:2006-04-24

    IPC分类号: B08B7/00

    摘要: In one aspect, an apparatus for cleaning an edge of a substrate is provided. The apparatus includes (1) one or more rollers of a first diameter adapted to contact an edge of a substrate and rotate the substrate; and (2) one or more rollers of a second diameter that is larger than the first diameter adapted to contact an edge of the substrate and to clean the edge of the substrate. The one or more rollers of the first diameter and the one or more rollers of the second diameter may be adapted to rotate at substantially the same speed. Numerous other aspects are provided.

    摘要翻译: 一方面,提供了一种用于清洁基板的边缘的装置。 该设备包括(1)一个或多个第一直径的辊,其适于接触衬底的边缘并旋转衬底; 和(2)一个或多个第二直径的辊,其大于适于接触所述衬底的边缘并且清洁所述衬底的所述边缘的所述第一直径。 第一直径的一个或多个辊和第二直径的一个或多个辊可以适于以基本上相同的速度旋转。 提供了许多其他方面。