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    Computerized method and device for calculating an orthogonal x-ray attenuation of a subject using a measured, x-ray attenuation reference
    1.
    发明授权
    Computerized method and device for calculating an orthogonal x-ray attenuation of a subject using a measured, x-ray attenuation reference 有权
    用于使用测量的x射线衰减参考计算对象的正交X射线衰减的计算机化方法和装置

    公开(公告)号：US07289595B2

    公开(公告)日：2007-10-30

    申请号：US11418656

    申请日：2006-05-05

    申请人： Rainer Raupach ,  Andreas Schaller ,  Christoph Süss ,  Heiko Wolf

    发明人： Rainer Raupach ,  Andreas Schaller ,  Christoph Süss ,  Heiko Wolf

    IPC分类号： A61B6/00

    CPC分类号： A61B6/032 ,  A61B6/583 ,  Y10S378/901

    摘要： In method and module for calculation of an orthogonal x-ray attenuation of a subject using a measured reference x-ray attenuation in computed tomography, the reference x-ray attenuation and the orthogonal attenuation are provided as input quantities for an automatic dose control of the computed tomography apparatus. The positioning of the subject with regard to the rotation axis of the computed tomography apparatus is taken into account in the calculation of the orthogonal x-ray attenuation detection of the table height of the subject table.

    摘要翻译： 在计算机断层摄影中使用测量的参考x射线衰减来计算受试者的正交x射线衰减的方法和模块中，提供参考x射线衰减和正交衰减作为输入量，用于自动剂量控制 计算机断层摄影装置。 在计算被摄体台的台面高度的正交x射线衰减检测的计算中，考虑到被检体相对于计算机断层摄影装置的旋转轴的位置。

    Accurate deposition of nano-objects on a surface
    3.
    发明授权
    Accurate deposition of nano-objects on a surface 有权
    将纳米物体精确沉积在表面上

    公开(公告)号：US08821965B2

    公开(公告)日：2014-09-02

    申请号：US13456596

    申请日：2012-04-26

    申请人： Urs T. Duerig ,  Felix Holzner ,  Cyrill Kuemin ,  Armin W. Knoll ,  Philip Paul ,  Heiko Wolf

    发明人： Urs T. Duerig ,  Felix Holzner ,  Cyrill Kuemin ,  Armin W. Knoll ,  Philip Paul ,  Heiko Wolf

    IPC分类号： B05D5/12 ,  B82Y30/00 ,  B82Y40/00 ,  B82B3/00 ,  C23C14/04 ,  C23C18/04 ,  C23C18/06 ,  C23C18/08

    CPC分类号： B82B3/0076 ,  B05D5/12 ,  B82B3/0014 ,  B82Y30/00 ,  B82Y40/00 ,  C23C14/04 ,  C23C18/04 ,  C23C18/06 ,  C23C18/08

    摘要： The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate. The invention also provides a semiconductor device which includes a substrate and nano-objects accurately disposed on the substrate

    摘要翻译： 本发明特别涉及用于在表面上沉积纳米物体的方法。 该方法包括：在其一个表面上提供具有表面图案的基底; 在所述基板的所述表面上提供转印层; 在与所述表面图案限定的位置处平行于所述基板的所述表面平行于所述转印层的表面上的功能化区域，例如与纳米物体呈现增强的结合相互作用; 沉积纳米物体并使其在功能化区域被捕获; 并通过能量刺激来减少转移层，以将聚合物分解成蒸发单元，直到纳米物体到达基底表面。 本发明还提供一种半导体器件，其包括衬底和准确地设置在衬底上的纳米物体

    ACCURATE DEPOSITION OF NANO-OBJECTS ON A SURFACE
    4.
    发明申请
    ACCURATE DEPOSITION OF NANO-OBJECTS ON A SURFACE 有权
    精确沉积在表面上的纳米对象

    公开(公告)号：US20130009287A1

    公开(公告)日：2013-01-10

    申请号：US13606326

    申请日：2012-09-07

    申请人： Urs T. Duerig ,  Felix Holzner ,  Cyrill Kuemin ,  Armin W. Knoll ,  Philip Paul ,  Heiko Wolf

    发明人： Urs T. Duerig ,  Felix Holzner ,  Cyrill Kuemin ,  Armin W. Knoll ,  Philip Paul ,  Heiko Wolf

    IPC分类号： H01L29/02

    CPC分类号： B82B3/0076 ,  B05D5/12 ,  B82B3/0014 ,  B82Y30/00 ,  B82Y40/00 ,  C23C14/04 ,  C23C18/04 ,  C23C18/06 ,  C23C18/08

    摘要： The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate. The invention also provides a semiconductor device which includes a substrate and nano-objects accurately disposed on the substrate.

    摘要翻译： 本发明特别涉及用于在表面上沉积纳米物体的方法。 该方法包括：在其一个表面上提供具有表面图案的基底; 在所述基板的所述表面上提供转印层; 在与所述表面图案限定的位置处平行于所述基板的所述表面平行于所述转印层的表面上的功能化区域，例如与纳米物体呈现增强的结合相互作用; 沉积纳米物体并使其在功能化区域被捕获; 并通过高能刺激来减薄转移层，以将聚合物分解成蒸发单元，直到纳米物体到达基底表面。 本发明还提供一种半导体器件，其包括衬底和准确地设置在衬底上的纳米物体。

    X-RAY RADIATION DIAPHRAGM AND CONTROL METHOD THEREFOR, AND CT DEVICE EMBODYING SAME
    7.
    发明申请
    X-RAY RADIATION DIAPHRAGM AND CONTROL METHOD THEREFOR, AND CT DEVICE EMBODYING SAME 有权
    X射线辐射透镜及其控制方法及其CT装置

    公开(公告)号：US20080317212A1

    公开(公告)日：2008-12-25

    申请号：US12143287

    申请日：2008-06-20

    申请人： Ulrich Kuehn ,  Heiko Wolf

    发明人： Ulrich Kuehn ,  Heiko Wolf

    IPC分类号： G21K1/04

    CPC分类号： A61B6/06 ,  A61B6/027 ,  G21K1/04

    摘要： A collimator device has at least one masking device that is adjustable between two end positions for collimation of a beam fan in an x-ray CT device, wherein the x-ray fan is schematically not masked in a first end position. The x-ray beam is more than half-masked in a second end position of the masking device. In a method for operation of such a collimator device as well as an x-ray CT device for examination of a subject having an x-ray source, a collimator device, and a control device for regulation of the aperture width of the masking device, an x-ray detector is arranged opposite the x-ray source and the collimator device and that detects the x-rays modified due to the intervening examination subject; and an image construction device reconstructs an image of the examination subject therefrom.

    摘要翻译： 准直器装置具有至少一个可在两个端部位置之间调节的掩模装置，用于准直X射线CT装置中的束扇，其中，X射线风扇在第一端部位置中未示意地未被遮蔽。 在掩蔽装置的第二端位置，X射线束大于半掩模。 在这种准直器装置的操作方法以及用于检查具有x射线源的对象的X射线CT装置，准直器装置和用于调节掩蔽装置的孔径宽度的控制装置中， X射线检测器布置在x射线源和准直器装置的对面，并且检测由于介入检查对象而修改的x射线; 并且图像构造装置从其重建检查对象的图像。

    X-ray radiation diaphragm and control method therefor, and CT device embodying same
    10.
    发明授权
    X-ray radiation diaphragm and control method therefor, and CT device embodying same 有权
    X射线辐射光圈及其控制方法及其体现的CT装置

    公开(公告)号：US07953208B2

    公开(公告)日：2011-05-31

    申请号：US12143287

    申请日：2008-06-20

    申请人： Ulrich Kuehn ,  Heiko Wolf

    发明人： Ulrich Kuehn ,  Heiko Wolf

    IPC分类号： G21K1/04

    CPC分类号： A61B6/06 ,  A61B6/027 ,  G21K1/04

    摘要： A collimator device has at least one masking device that is adjustable between two end positions for collimation of a beam fan in an x-ray CT device, wherein the x-ray fan is schematically not masked in a first end position. The x-ray beam is more than half-masked in a second end position of the masking device. In a method for operation of such a collimator device as well as an x-ray CT device for examination of a subject having an x-ray source, a collimator device, and a control device for regulation of the aperture width of the masking device, an x-ray detector is arranged opposite the x-ray source and the collimator device and that detects the x-rays modified due to the intervening examination subject; and an image construction device reconstructs an image of the examination subject therefrom.

    摘要翻译： 准直器装置具有至少一个可在两个端部位置之间调节的掩模装置，用于准直X射线CT装置中的束扇，其中，X射线风扇在第一端部位置中未示意地未被遮蔽。 在掩蔽装置的第二端位置，X射线束大于半掩模。 在这种准直器装置的操作方法以及用于检查具有x射线源的对象的X射线CT装置，准直器装置和用于调节掩蔽装置的孔径宽度的控制装置中， X射线检测器布置在x射线源和准直器装置的对面，并且检测由于介入检查对象而修改的x射线; 并且图像构造装置从其重建检查对象的图像。