公开(公告)号：US20070088794A1

公开(公告)日：2007-04-19

申请号：US11237640

申请日：2005-09-27

申请人： Robert Akins ,  Brian Klene ,  Albert Cefalo ,  William Cray

发明人： Robert Akins ,  Brian Klene ,  Albert Cefalo ,  William Cray

IPC分类号： G06F15/16

CPC分类号： H04L67/16 ,  H04L63/10 ,  H04L67/28 ,  H04L67/2809

摘要： A method of providing the service of obtaining information for a client is disclosed, which may comprise, providing a search service brokering internet location; providing an information search identification internet location accessible on or through the search service brokering internet location; providing an information search reference internet location associated with the information search identification internet location; and providing access to a searcher to the information search reference internet location to log in a reference. The search service brokering internet location may comprise a search service broker web-site; and the search identification internet location may comprise a search service broker web-site search web-page; and, the search reference internet location may comprise a search service broker web-site reference web-page. The method may also comprise date stamping the log in of a reference.

摘要翻译： 公开了一种为客户端提供获取信息的服务的方法，其可以包括：提供检索服务代理互联网位置; 提供在或通过搜索服务代理互联网位置访问的信息搜索识别互联网位置; 提供与信息搜索识别互联网位置相关联的信息搜索参考互联网位置; 以及向搜索者提供访问信息搜索参考互联网位置以登录参考。 搜索服务代理互联网位置可以包括搜索服务代理网站; 并且搜索标识互联网位置可以包括搜索服务代理网站搜索网页; 并且，搜索参考互联网位置可以包括搜索服务代理网站参考网页。 该方法还可以包括对引用登录的日期。

公开(公告)号：US07016388B2

公开(公告)日：2006-03-21

申请号：US10712688

申请日：2003-11-12

申请人： Brian Klene ,  Palash P. Das ,  Steve Grove ,  Alexander Ershov ,  Scot Smith ,  Xiaojiang Pan ,  Richard L. Sandstrom

发明人： Brian Klene ,  Palash P. Das ,  Steve Grove ,  Alexander Ershov ,  Scot Smith ,  Xiaojiang Pan ,  Richard L. Sandstrom

IPC分类号： H01S3/22

CPC分类号： G03F7/7055 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

公开(公告)号：US06693939B2

公开(公告)日：2004-02-17

申请号：US10141216

申请日：2002-05-07

申请人： Brian Klene ,  Palash P. Das ,  Steve Grove ,  Alexander Ershov ,  Scot Smith ,  Xiaojiang Pan ,  Richard L. Sandstrom

发明人： Brian Klene ,  Palash P. Das ,  Steve Grove ,  Alexander Ershov ,  Scot Smith ,  Xiaojiang Pan ,  Richard L. Sandstrom

IPC分类号： H01S322

CPC分类号： G03F7/70933 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

摘要翻译： 本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。 该系统包括用于将激光束传送到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。