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1.发明申请公开(公告)号：US20070195304A1
公开(公告)日：2007-08-23
申请号：US11646609
申请日：2006-12-28
申请人： Robert Harned , Cheng-Qun Gui , Pieter De Jager
发明人： Robert Harned , Cheng-Qun Gui , Pieter De Jager
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G02B17/061 , G03F7/70233 , G03F7/70308 , G03F7/706 , G03F7/70791
摘要： An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.
摘要翻译： 用于制造平板显示器（FPD）的曝光系统包括适于支撑掩模版的掩模版台。 衬底台适于支撑衬底。 反射光学系统适于将掩模版成像到基底上。 反射光学系统包括主镜，包括第一镜和第二镜以及次镜。 当通过第一反射镜，次反射镜和第二反射镜的反射将掩模版的图像投影到基板上时，反射光学系统具有足够的自由度用于三阶像差的对准和校正。
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公开(公告)号：US20060139745A1
公开(公告)日：2006-06-29
申请号：US11019672
申请日：2004-12-23
IPC分类号： G02B7/182
CPC分类号： G03F7/70275 , G02B17/002 , G02B17/008 , G02B17/0812 , G03F7/70233
摘要： A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.
摘要翻译： 一种用于具有多个镜像成像系统的光刻设备的投影系统。 在一个实施例中，镜像成像系统布置成两行，每行垂直于投影系统的扫描方向。 每个镜像成像系统都具有相关的成像领域。 镜像成像系统以排除扫描方向上的相邻成像场之间的间隙的方式排列。 每个镜像成像系统包括与凹面镜同心地布置的凹面镜和凸面镜。 凹面镜具有可独立移动的第一反射镜部分和第二反射镜部分。 在一个实施例中，每个镜像成像系统具有相关联的相位，并且一行中的镜像成像系统与另一行中的镜像成像系统定位成180度异相。
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公开(公告)号：US20050275840A1
公开(公告)日：2005-12-15
申请号：US10854770
申请日：2004-05-27
IPC分类号： G01B11/00 , G01B11/14 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70275 , G03F9/7088
摘要： An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A substrate is supported on a substrate table and a projection system is used to project the alignment beam onto a target portion of the substrate. A positioning system causes relative movement between the substrate and the projection system. An array of lenses is arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion. An array of detectors is arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of the intensity of light reflected to it from the substrate through the respective lens. A processor is connected to the outputs of the detectors for deriving data representing the position of the lens array relative to the substrate from the outputs of the detectors.
摘要翻译： 光学位置评估装置和方法具有照射系统，其提供对准的辐射束，并且位置数据源自对准光束的反射。 基板被支撑在基板台上，并且使用投影系统将对准光束投影到基板的目标部分上。 定位系统引起基板和投影系统之间的相对移动。 透镜阵列被布置成使得阵列中的每个透镜将对准光束的相应部分聚焦到目标部分的相应部分上。 一组检测器被布置成使得阵列中的每个检测器通过阵列中的相应透镜来检测从基板反射的光，并且通过相应的透镜提供代表从基板反射的光的强度的输出。 处理器连接到检测器的输出，用于从检测器的输出导出表示透镜阵列相对于基板的位置的数据。
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公开(公告)号：US20070206172A1
公开(公告)日：2007-09-06
申请号：US11717174
申请日：2007-03-13
申请人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
发明人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
IPC分类号： G03B27/72
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
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公开(公告)号：US20060132750A1
公开(公告)日：2006-06-22
申请号：US11018927
申请日：2004-12-22
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.
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公开(公告)号：US20060256309A1
公开(公告)日：2006-11-16
申请号：US11485958
申请日：2006-07-14
申请人： Cheng-Qun Gui , Pieter de Jager
发明人： Cheng-Qun Gui , Pieter de Jager
IPC分类号： G03B27/52
CPC分类号： G03F7/7025 , G03F7/70258 , G03F7/70275 , G03F7/70291 , G03F7/70791 , G03F7/70816 , G03F7/70825 , G03F7/7085
摘要： An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.
摘要翻译： 一种用于调整由光引擎相对于衬底产生的图案化光束的衬底上的位置的装置。 该排列移动一组聚焦元件，每个聚焦元件相对于独立可控元件的阵列将图案化束的一部分聚焦到衬底上的一个点上，以将图案赋予图案化的束。
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公开(公告)号：US20060098175A1
公开(公告)日：2006-05-11
申请号：US10983336
申请日：2004-11-08
IPC分类号： G03B27/00
CPC分类号： G03F7/70475 , G03F7/70275 , G03F7/70291 , G03F7/70358
摘要： A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. A maximum intensity of a first part of each beam directed towards a first portion of the track can be greater than a maximum intensity of a second part of that beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.
摘要翻译： 一种用于曝光衬底的光刻设备和方法。 照明系统提供一系列由单独可控元件的阵列构图的辐射束。 图案化的光束通过透镜阵列投射到基板的目标部分上。 阵列中的每个透镜将图案化束的相应部分朝向衬底引导。 位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。 投影系统被定位成使得每个光束沿着衬底上的一系列轨道中的相应一个被扫描。 轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并且被两个梁扫描。 朝向轨道的第一部分的每个光束的第一部分的最大强度可以大于朝向轨道的第二部分的该光束的第二部分的最大强度，使得第一部分和第二部分 轨道暴露于基本上相同的最大强度的辐射。 相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。
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公开(公告)号：US20050243295A1
公开(公告)日：2005-11-03
申请号：US10835601
申请日：2004-04-30
申请人： Pieter de Jager , Cheng-Qun Gui
发明人： Pieter de Jager , Cheng-Qun Gui
CPC分类号： G03F7/70258 , G03F7/70275
摘要： A lithographic apparatus and method project a patterned beam of radiation onto a substrate supported by a substrate table. The pattern is imparted to the beam using a patterning system. The patterned beam is projected onto a target portion of the substrate by a projection system. The projection system defines a pupil between the patterning system and the substrate table. A series of lens components are located between the pupil and the substrate table. The lens components comprise a beam expander, for expanding the beam from the pupil, and an array of lenses extending transversely relative to the beam such that each lens of the array focuses a respective portion of the projection beam onto a respective part of the target portion of the substrate. The position of at least one of the lens components is adjusted to adjust the magnification of the projection system.
摘要翻译： 光刻设备和方法将图案化的辐射束投射到由衬底台支撑的衬底上。 使用图案化系统将图案赋予束。 图案化的光束通过投影系统投射到基板的目标部分上。 投影系统在图案化系统和衬底台之间限定光瞳。 一系列透镜组件位于光瞳和衬底台之间。 透镜部件包括用于从瞳孔扩展光束的光束扩展器和相对于光束横向延伸的透镜阵列，使得阵列的每个透镜将投影光束的相应部分聚焦到目标部分的相应部分上 的基底。 调整至少一个透镜部件的位置以调整投影系统的放大率。
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公开(公告)号：US20050179884A1
公开(公告)日：2005-08-18
申请号：US10779823
申请日：2004-02-18
申请人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
发明人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
摘要翻译： 提供了一种用于将照明系统的辐射分配到两个或更多个图案形成装置的辐射分布系统，每个图案装置用于构图辐射束，随后将其投影到衬底上。
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公开(公告)号：US20060001847A1
公开(公告)日：2006-01-05
申请号：US10880435
申请日：2004-06-30
申请人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam of radiation, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate supported on a substrate table. The projection system comprises an array of lenses located at a spacing from the substrate such that each lens in the array focuses a respective part of the patterned beam onto the substrate. A displacement system causes relative displacement between the lens array and the substrate. A particle detector is positioned to detect particles on the substrate which are approaching the lens array as a result of relative displacement between the lens array and the substrate. A free working distance control system is arranged to increase the spacing between the lens array and the substrate in response to detection of a particle by the detector such that the lens array is moved away from the substrate as relative displacement causes the detected particle to pass the lens array. Thus damage to the lens array as a result of for example scratching by particles carried on the substrate surface can be avoided.
摘要翻译： 一种光刻设备和方法，其中照明系统提供投影辐射束，图案化系统将光束赋予其横截面中的图案，并且投影系统将图案化的光束投影到支撑在衬底上的衬底的目标部分上 表。 投影系统包括位于与衬底间隔的透镜阵列，使得阵列中的每个透镜将图案化束的相应部分聚焦到衬底上。 位移系统导致透镜阵列和基底之间的相对位移。 定位粒子检测器以检测由于透镜阵列和基底之间的相对位移而正在接近透镜阵列的基底上的颗粒。 布置一个自由的工作距离控制系统以响应于检测器检测到的颗粒而增加透镜阵列和基板之间的间距，使得透镜阵列相对于基板移动离开基板，因为相对位移导致检测到的颗粒通过 镜头阵列 因此，可以避免由于例如由承载在基板表面上的颗粒划伤而导致的透镜阵列的损坏。
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