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公开(公告)号：US06395449B1
公开(公告)日：2002-05-28
申请号：US09540791
申请日：2000-03-31
IPC分类号： G03C172
CPC分类号： G03F7/094
摘要： Compositions useful for a lift-off resist in a bilayer metal lift-off process which comprise a mixture of at least one solvent, at least one polyglutarimide resin and an effective amount of at least one dissolution rate modifier selected from a group consisting of 2,3,4,2′,3′,4′-hexahydroxybenzophenone; hexahydroxyspirobiindane; 2,4,2′,4′-tetrahydroxybenzophenone; 1,1,1-tris-hydroxyphenylethane; 1,7-bis-(hydroxy-3-methoxyphenyl)-1,6-heptadiene-3,5-dione and at least one arylsulfonate ester of these poly-hydroxy aromatic compounds.
摘要翻译： 用于双层金属剥离方法中的剥离抗蚀剂的组合物，其包含至少一种溶剂，至少一种聚戊二酰亚胺树脂和有效量的至少一种溶解速率改性剂的混合物，所述溶解速率改性剂选自2， 3,4,2'，3'，4'-六羟基二苯甲酮; 六羟基苯乙酮 2,4,2'，4'-四羟基二苯甲酮; 1,1,1-三羟基苯乙烷; 1,1-双 - （羟基-3-甲氧基苯基）-1,6-庚二烯-3,5-二酮和这些多羟基芳族化合物的至少一种芳基磺酸酯。
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公开(公告)号：US06391523B1
公开(公告)日：2002-05-21
申请号：US09748422
申请日：2000-12-26
IPC分类号： G03F7004
CPC分类号： C08J3/091 , C08J2363/00 , C09D163/04 , G03F7/0048 , G03F7/0385 , C08L2666/28
摘要： A composition useful for a thick-film negative resist comprising a mixture of at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin and at least one photoacid generator in a coating solvent, a majority amount of said coating solvent being cyclopentanone.
摘要翻译： 一种用于厚膜负性抗蚀剂的组合物，其包含至少一种环氧化多官能双酚A甲醛酚醛清漆树脂和至少一种光致酸发生剂在涂料溶剂中的混合物，大部分所述涂料溶剂是环戊酮。
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公开(公告)号：US20110267409A1
公开(公告)日：2011-11-03
申请号：US13068245
申请日：2011-05-06
IPC分类号： B41J2/01
CPC分类号： B41J2/015 , C09D11/10 , C09D11/36 , G03F7/0045 , G03F7/0048 , G03F7/038 , G03F7/16 , H05K1/095 , H05K3/125 , H05K2203/013 , H05K2203/0783
摘要： The present invention is directed to a printable composition, comprising: 0.5 to 60 wt % of a polymer selected from the group consisting of epoxy, Novolac and poly(dimethylglutarimide); and 40-99.5 wt % of a solvent composition comprising (1) a high boiling point solvent having a flash point greater than about 10° C. and a boiling point greater than about 130° C. and (2) a low boiling point solvent having a flash point less than 30° C. and a boiling point less than or equal to 130° C., all weight percents based on the total weight of the composition. The present invention is also directed to methods of forming patterned substrates using the above compositions. The compositions of the invention are useful for printing electronic materials onto a substrate using a piezo-electric printer.
摘要翻译： 本发明涉及一种可印刷组合物，其包含：0.5至60重量％的选自环氧树脂，酚醛清漆和聚（二甲基戊二酰亚胺）的聚合物; 和40-99.5重量％的溶剂组合物，其包含（1）闪点大于约10℃，沸点大于约130℃的高沸点溶剂和（2）低沸点溶剂 闪点小于30℃，沸点小于或等于130℃，所有重量百分比均基于组合物的总重量。 本发明还涉及使用上述组合物形成图案化衬底的方法。 本发明的组合物可用于使用压电打印机将电子材料印刷到基底上。
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公开(公告)号：US20220146936A1
公开(公告)日：2022-05-12
申请号：US17092867
申请日：2020-11-09
申请人： Daniel J. Nawrocki , Yasumasa Akatsuka , Katie Han
发明人： Daniel J. Nawrocki , Yasumasa Akatsuka , Katie Han
摘要： Disclosed and claimed herein are photoimageable dielectric compositions for dielectric passivation layers, dielectric protection layers as well as dielectric redistribution layers for use in the manufacture of semiconductors, semiconductor packages and circuit board constructions. More specifically it relates to photoimageable polymers containing vinyl groups capable of being crosslinked during processing and post cured at lower temperatures and shorter times than conventional dielectric materials. The processed compositions are characterized by low dielectric constants and low dissipation factors as well as low moisture uptake, chemical and thermal stability, flexibility and excellent HAST (Highly Accelerated Stress Test) and TCT (Thermal Cycling Test) results. The invention also relates to low dk/df dielectric compositions that are not photoimageable
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公开(公告)号：US20090081379A1
公开(公告)日：2009-03-26
申请号：US12283724
申请日：2008-09-15
CPC分类号： B41J2/015 , C09D11/10 , C09D11/36 , G03F7/0045 , G03F7/0048 , G03F7/038 , G03F7/16 , H05K1/095 , H05K3/125 , H05K2203/013 , H05K2203/0783
摘要： The present invention is directed to a printable composition, comprising: 0.5 to 60 wt % of a polymer selected from the group consisting of epoxy, Novolac and poly(dimethylglutarimide); and 40-99.5 wt % of a solvent composition comprising (1) a high boiling point solvent having a flash point greater than about 10° C. and a boiling point greater than about 130° C. and (2) a low boiling point solvent having a flash point less than 30° C. and a boiling point less than or equal to 130° C., all weight percents based on the total weight of the composition. The present invention is also directed to methods of forming patterned substrates using the above compositions. The compositions of the invention are useful for printing electronic materials onto a substrate using a piezo-electric printer.
摘要翻译： 本发明涉及一种可印刷组合物，其包含：0.5至60重量％的选自环氧树脂，酚醛清漆和聚（二甲基戊二酰亚胺）的聚合物; 和40-99.5重量％的溶剂组合物，其包含（1）闪点大于约10℃，沸点大于约130℃的高沸点溶剂和（2）低沸点溶剂 闪点小于30℃，沸点小于或等于130℃，所有重量百分比均基于组合物的总重量。 本发明还涉及使用上述组合物形成图案化衬底的方法。 本发明的组合物可用于使用压电打印机将电子材料印刷到基底上。
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公开(公告)号：US20170329222A1
公开(公告)日：2017-11-16
申请号：US15591399
申请日：2017-05-10
申请人： Daniel J. Nawrocki , Qingzhou Cui , Nao Honda
发明人： Daniel J. Nawrocki , Qingzhou Cui , Nao Honda
IPC分类号： G03F7/038 , G03F7/004 , H01L21/027 , G03F7/38 , G03F7/20 , C08G75/30 , G03F7/16 , G03F7/039 , G03F7/32 , H01L23/00
CPC分类号： G03F7/038 , C08G75/30 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/039 , G03F7/162 , G03F7/164 , G03F7/168 , G03F7/2004 , G03F7/322 , G03F7/325 , G03F7/38 , H01L21/0274 , H01L24/02 , H01L2224/02311
摘要： The invention relates to polysulfonamide compositions for use as redistribution layers as used in the manufacture of semiconductors and semiconductor packages. More specifically it relates to photoimageable polysulfonamide composition for redistribution applications. The invention also relates to the use of the compositions in semiconductor manufacture.
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7.发明申请EPOXY FORMULATIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES 审中-公开用于制造低表面能源基板上的缓解图案的环氧配方和工艺公开(公告)号：US20140302430A1
公开(公告)日：2014-10-09
申请号：US14241745
申请日：2012-09-05
IPC分类号： G03F7/038
CPC分类号： G03F7/038 , C08G59/3218 , C08L63/00 , G03F7/0046 , G03F7/11
摘要： The present invention is directed to a permanent epoxy photoresist composition useful for making negative-tone, permanent photoresist relief patterns on low surface energy polymer substrates, comprising: (A) one or more epoxy resins according to Formulas I-VI, (B) one or more cationic photoinitiators; (C) one or more film casting solvents; and (D) one or more fluorinated compounds. The present invention is also directed to methods of forming a permanent photoresist relief pattern on a low surface energy polymer substrate using the disclosed composition.
摘要翻译： 本发明涉及一种永久性环氧光刻胶组合物，其用于在低表面能聚合物基材上制备负色，永久性光刻胶浮雕图形，其包括：（A）一种或多种根据式I-VI，（B）的一种或多种环氧树脂 或更多的阳离子光引发剂; （C）一种或多种薄膜浇铸溶剂; 和（D）一种或多种氟化化合物。 本发明还涉及使用所公开的组合物在低表面能聚合物基材上形成永久性光刻胶浮雕图案的方法。
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公开(公告)号：US08313571B2
公开(公告)日：2012-11-20
申请号：US12283724
申请日：2008-09-15
CPC分类号： B41J2/015 , C09D11/10 , C09D11/36 , G03F7/0045 , G03F7/0048 , G03F7/038 , G03F7/16 , H05K1/095 , H05K3/125 , H05K2203/013 , H05K2203/0783
摘要： The present invention is directed to a printable composition, comprising: 0.5 to 60 wt % of a polymer selected from the group consisting of epoxy, Novolac and poly(dimethylglutarimide); and 40-99.5 wt % of a solvent composition comprising (1) a high boiling point solvent having a flash point greater than about 10° C. and a boiling point greater than about 130° C. and (2) a low boiling point solvent having a flash point less than 30° C. and a boiling point less than or equal to 130° C., all weight percents based on the total weight of the composition. The present invention is also directed to methods of forming patterned substrates using the above compositions. The compositions of the invention are useful for printing electronic materials onto a substrate using a piezo-electric printer.
摘要翻译： 本发明涉及一种可印刷组合物，其包含：0.5至60重量％的选自环氧树脂，酚醛清漆和聚（二甲基戊二酰亚胺）的聚合物; 和40-99.5重量％的溶剂组合物，其包含（1）闪点大于约10℃，沸点大于约130℃的高沸点溶剂和（2）低沸点溶剂 闪点小于30℃，沸点小于或等于130℃，所有重量百分比均基于组合物的总重量。 本发明还涉及使用上述组合物形成图案化衬底的方法。 本发明的组合物可用于使用压电打印机将电子材料印刷到基底上。
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公开(公告)号：US20210009723A1
公开(公告)日：2021-01-14
申请号：US16506751
申请日：2019-07-09
摘要： The invention relates to acid-labile, crosslinked polymers. More specifically, the invention relates to acid-labile, crosslinked polymers useful in photosensitive compositions as well as method of their use in photoresist applications
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公开(公告)号：US08313173B2
公开(公告)日：2012-11-20
申请号：US13068245
申请日：2011-05-06
CPC分类号： B41J2/015 , C09D11/10 , C09D11/36 , G03F7/0045 , G03F7/0048 , G03F7/038 , G03F7/16 , H05K1/095 , H05K3/125 , H05K2203/013 , H05K2203/0783
摘要： The present invention is directed to a printable composition, comprising: 0.5 to 60 wt % of a polymer selected from the group consisting of epoxy, Novolac and poly(dimethylglutarimide); and 40-99.5 wt % of a solvent composition comprising (1) a high boiling point solvent having a flash point greater than about 10° C. and a boiling point greater than about 130° C. and (2) a low boiling point solvent having a flash point less than 30° C. and a boiling point less than or equal to 130° C., all weight percents based on the total weight of the composition. The present invention is also directed to methods of forming patterned substrates using the above compositions. The compositions of the invention are useful for printing electronic materials onto a substrate using a piezo-electric printer.
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