利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

5 条记录 (耗时 0.028 秒)

    LPP EUV drive laser input system
    1.
    发明申请
    LPP EUV drive laser input system 失效
    LPP EUV驱动激光输入系统

    公开(公告)号：US20060289806A1

    公开(公告)日：2006-12-28

    申请号：US11168785

    申请日：2005-06-28

    申请人： Rodney Simmons ,  John Viatella ,  Jerzy Hoffman ,  R. Webb ,  Alexander Bykanov ,  Oleh Khodykin

    发明人： Rodney Simmons ,  John Viatella ,  Jerzy Hoffman ,  R. Webb ,  Alexander Bykanov ,  Oleh Khodykin

    IPC分类号： G21G4/00

    CPC分类号： H05G2/001

    摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.

    摘要翻译： 公开了一种激光产生的等离子体（“LPP”）极紫外（“EUV”）光源及其操作方法，其可以包括具有室壁的EUV等离子体生产室; 在室壁中的驱动激光入口窗口; 在入口窗口中间的驱动激光入口外壳和腔室内的等离子体起始位置，并且包括入口外壳远端开口; 在远端开口和入口窗之间的至少一个孔板包括至少一个驱动激光通道孔。 至少一个孔板可以包括至少两个孔板，其包括限定孔板中间空间的第一孔板和第二孔板。 至少一个驱动激光孔通道可以包括至少两个驱动激光孔通道。 激光通道孔可以限定足够大的开口，使得驱动激光束通过而不衰减，并且足够小以基本上减少通过入口窗口方向的穿过激光通道孔的碎屑。

    Discharge produced plasma EUV light source
    4.
    发明申请
    Discharge produced plasma EUV light source 失效

    公开(公告)号：US20070023711A1

    公开(公告)日：2007-02-01

    申请号：US11493945

    申请日：2006-07-26

    申请人： Igor Fomenkov ,  William Partlo ,  Gerry Blumenstock ,  Nortbert Bowering ,  I. Oliver ,  Xiaojiang Pan ,  Rodney Simmons

    发明人： Igor Fomenkov ,  William Partlo ,  Gerry Blumenstock ,  Nortbert Bowering ,  I. Oliver ,  Xiaojiang Pan ,  Rodney Simmons

    IPC分类号： G01J3/10

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70908 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H01S3/005 ,  H01S3/225 ,  H05G2/005 ,  H05H1/06

    摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO2. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

    EUV light source
    5.
    发明申请
    EUV light source 失效
    EUV光源

    公开(公告)号：US20070102653A1

    公开(公告)日：2007-05-10

    申请号：US11323397

    申请日：2005-12-29

    申请人： Norbert Bowering ,  Bjorn Hansson ,  Rodney Simmons

    发明人： Norbert Bowering ,  Bjorn Hansson ,  Rodney Simmons

    IPC分类号： G21K5/04

    CPC分类号： H05G2/003 ,  H05G2/006

    摘要： An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising a terminal end comprising an opening facing the exit opening; a first exit sleeve chamber housing the first exit sleeve and having an EUV light exit opening; a gas supply mechanism supplying gas under a pressure higher than the pressure within the plasma production chamber to the first exit sleeve chamber. The first exit sleeve may be tapered toward the terminal end opening, and may, e.g., be conical in shape comprising a narrowed end at the terminal end.

    摘要翻译： 公开了一种EUV光源及其操作方法，其可以包括：EUV等离子体生成室，其包括室壁，该室壁包括用于使产生的EUV光聚焦到聚焦点的通过的出口; 第一EUV出口套筒，其包括终端，所述终端包括面向所述出口的开口; 第一出口套筒室，其容纳所述第一出口套筒并具有EUV光出口; 气体供给机构，其在高于等离子体生成室内的压力的压力下向第一出口套筒室供给气体。 第一出口套筒可以朝向终端开口渐缩，并且可以例如是在终端处包括窄端的圆锥形形状。