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公开(公告)号：US5101005A
公开(公告)日：1992-03-31
申请号：US348633
申请日：1989-05-18
IPC分类号： C08G73/10
CPC分类号： C08G73/105
摘要： The present invention provides cross-linkable polyimide polymers having at least one repeating unit of the sturcture of: ##STR1## wherein n is the number of repeating groups and A is a tetravalent aromatic organic radical wherein each pair of carbonyl groups are attached to adjacent carbons in the ring moiety A.It has been found that polyimides having the structure of formula I may be crosslinked at surprisingly low temperatures when heated from about 75 to about 110.degree. C. to form infusible and solvent resistant shapes, thereby rendering them useful in the preparation of films, laminates and composites where inertness to solvents is a prerequisite.
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公开(公告)号：US4803147A
公开(公告)日：1989-02-07
申请号：US124742
申请日：1987-11-24
IPC分类号： C08G73/10 , C08G73/12 , C08L79/08 , G03F7/037 , H01L21/027 , H01L21/312 , G03C1/68
CPC分类号： C08G73/105 , C08G73/1039 , C08G73/123 , C08L79/08 , G03F7/037 , Y10S430/107
摘要： A photosensitive polyimide polymer composition comprising a solvent soluble polyimide condensation product of an aromatic dianhydride and an aromatic diamine, a polyfunctional ethylenically unsaturated monomer and a photoinitiator. The solvent soluble polyimides of the composition are prepared from at least one compound selected from 2,2-hexafluoro-bis-(3,4-dicarboxyphenyl)tetracarboxylic dianhydride; 1,1-bis-[4-(1,2-dicarboxyphenyl)]-1-phenyl-2,2,2-trifluoroethane dianhydride; 2,2-hexafluoro-bis(3-aminophenyl)propane; 2,2-hexafluoro-bis(4-aminophenyl)propane; 2,2-hexafluoro-bis-[4-(3-aminophenoxy)phenyl]propane; 2,2-hexafluoro-bis-[4-(4-aminophenoxy)phenyl]propane and 1,1-bis-(4-aminopheny)-1-phenyl-2,2,2-trifluoroethane or mixtures thereof.
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3.发明授权Polymers prepared from 4,4'-bis(2-[3,4(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydride 失效由4,4'-双（2- [3,4（二羧基苯基）六氟异丙基]二苯醚二酐制备的聚合物
公开(公告)号：US5055550A
公开(公告)日：1991-10-08
申请号：US497081
申请日：1990-03-21
CPC分类号： C07C65/24 , C08G69/40 , C08G73/105 , C08G73/1057 , C08G73/1064 , C08G73/12 , G03F7/0387 , Y10T428/31721
摘要： This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The products of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(3,4-(dicarboxyphenyl)hexafluoroisopropyl]diphenyl ether dianhydride.
摘要翻译： 本发明涉及显示低熔点，更好的溶解度，低介电常数，优异的热和热氧化稳定性以及改进的加工特性的新的含氟聚酰亚胺，聚酰胺酸/酯，聚酰胺，加成聚酰亚胺和酰亚胺低聚物。 本发明的产物的特征在于它们衍生自4,4'-双[2-（3,4-（二羧基苯基）六氟异丙基]二苯醚二酐。
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4.发明授权Polymers prepared from 4,4'-bis[2-(3,4-(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydride 失效由4,4'-双[2-（3,4-（二羧基苯基）六氟异丙基]二苯醚二酐制备的聚合物
公开(公告)号：US4931540A
公开(公告)日：1990-06-05
申请号：US124720
申请日：1987-11-24
IPC分类号： G03F7/037 , C07C65/24 , C08F290/00 , C08F299/00 , C08G69/40 , C08G73/10 , C08G73/12 , C08L79/08 , G03F7/038
CPC分类号： C07C65/24 , C08G69/40 , C08G73/105 , C08G73/1057 , C08G73/1064 , C08G73/12 , G03F7/0387
摘要： This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The products of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(3,4-(dicarboxyphenyl)hexafluoroisopropyl]diphenyl ether dianhydride.
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5.发明授权Polymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether 失效由4,4'-双[2-（氨基（卤代）苯氧基苯基）六氟异丙基]二苯基醚制备的聚合物
公开(公告)号：US5037949A
公开(公告)日：1991-08-06
申请号：US489448
申请日：1990-03-06
CPC分类号： C07C65/24 , C07C217/90 , C08G69/40 , C08G73/105 , C08G73/1057 , C08G73/1064 , C08G73/123 , C08G73/124 , G03F7/0387
摘要： This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The products of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(amino(halo)phenoxyphenyl)hexafluoroisopropyl]diphenyl ether.
摘要翻译： 本发明涉及显示低熔点，更好的溶解度，低介电常数，优异的热和热氧化稳定性以及改善的加工特性的新的含氟聚酰亚胺，聚酰胺酸/酯，聚酰胺，加成聚酰亚胺和酰亚胺低聚物。 本发明的产物的特征在于它们衍生自4,4'-双[2-（氨基（卤代）苯氧基苯基）六氟异丙基]二苯醚。
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6.发明授权Polymers prepared from 4,4'-bis(2-(amino(halo) phenoxyphenyl) hexafluoroisopropyl) diphenyl ether 失效由4,4'-双（2-（氨基（卤代）苯氧基苯基）六氟异丙基）二苯基醚制备的聚合物
公开(公告)号：US4925915A
公开(公告)日：1990-05-15
申请号：US124704
申请日：1987-11-24
CPC分类号： C08G69/40 , C07C217/90 , C07C65/24 , C08G73/105 , C08G73/1057 , C08G73/1064 , C08G73/123 , C08G73/124 , G03F7/0387
摘要： This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The product of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(amino(halo)phenoxyphenyl)-hexafluoroisopropyl]diphenyl ether.
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公开(公告)号：US4978738A
公开(公告)日：1990-12-18
申请号：US217914
申请日：1988-07-12
IPC分类号： C08G73/10
CPC分类号： C08G73/1042 , C08G73/1039
摘要： High molecular weight polyimides are formed by polycondensation of 2,2-bis(4-aminophenyl) hexafluoropropane or 2,2-bis(3-aminophenyl) hexafluoropropane with one or more of bis-(3,4 dicarboxyphenyl) ether dianhydride; 3,3', 4,4' benzophenone tetracarboxylic acid dianhydride; 3,3', 4,4' diphenyl tetracarboxylic acid dianhydride and 2,2-bis(3,4 dicarboxyphenyl) hexafluoropropane dianhydride. Generally, the polymers of the present invention are characterized by a molecular weight of more than about 90,000.
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公开(公告)号：US4877653A
公开(公告)日：1989-10-31
申请号：US217796
申请日：1988-07-12
IPC分类号： B05D3/02
CPC分类号： C08J7/08 , C08J2379/08 , Y10T428/31721
摘要： A method of insolubilizing solvent soluble polyimides comprising the imidized condensation products of an aromatic dianhydride and a primary aromatic diamine wherein at least one of said dianhydride or diamine is selected from the group consisting of 2,2-hexafluoro-bis(3,4-dicarboxyphenyl)propane dianhydride; 2,2-hexafluoro-bis(3-aminophenyl) propane; 2,2-hexafluoro-bis(4-aminophenyl)propane; 2,2-hexafluoro-bis-[4-(3-aminophenoxy)phenyl]propane; 2,2-hexafluoro-bis[4-(4-aminophenoxy)phenyl]propane; 1,1-bis(4-aminophenyl)-1-phenyl-2,2,2-trifluoroethane; 1,1-bis-[4-(1,2-dicarboxyphenyl)]-1-phenyl-2,2,2-trifluoroethane dianhydride and mixtures thereof.The method comprises forming a shaped article or film comprising the polyimides and subjecting same to a heat annealing process at a temperature of at least 325.degree. C. and for a period of time sufficient to insolubilize the polyimide. Preferred temperatures range from 350.degree. C. to 400.degree. C. for a period of time of at least 45 minutes to about 2 hours.
摘要翻译： 一种不溶解溶剂可溶性聚酰亚胺的方法，其包括芳族二酐和伯芳族二胺的酰亚胺化缩合产物，其中所述二酐或二胺中的至少一种选自2,2-六氟双（3,4-二羧基苯基 ）丙烷二酐; 2,2-三氟 - 双（3-氨基苯基）丙烷; 2,2-四氟 - 双（4-氨基苯基）丙烷; 2,2-二氟 - 双 - [4-（3-氨基苯氧基）苯基]丙烷; 2,2-六氟双[4-（4-氨基苯氧基）苯基]丙烷; 1,1-双（4-氨基苯基）-1-苯基-2,2,2-三氟乙烷; 1,1-双 - [4-（1,2-二羧基苯基）] -1-苯基-2,2,2-三氟乙烷二酐及其混合物。 该方法包括形成包含聚酰亚胺的成形制品或薄膜，并在至少325℃的温度下进行热退火处理，并使其持续足以使聚酰亚胺不溶化的时间。 优选的温度为350℃至400℃，时间为至少45分钟至约2小时。
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9.发明授权Composition for stripping photoresist and organic materials from substrate surfaces 失效用于从基材表面剥离光致抗蚀剂和有机材料的组合物公开(公告)号：US06368421B1
公开(公告)日：2002-04-09
申请号：US09113892
申请日：1998-07-10
申请人： Joseph E. Oberlander , Mark S. Slezak , Dinesh N. Khanna , Dana L. Durham , Lawrence F. Spinicelli
发明人： Joseph E. Oberlander , Mark S. Slezak , Dinesh N. Khanna , Dana L. Durham , Lawrence F. Spinicelli
IPC分类号： B08B304
CPC分类号： G03F7/426
摘要： The invention relates to the field of microelectronics, such as integrated circuits, and more particularly to compositions and methods of removing photoresists or other organic materials from the surfaces of substrates used in the fabrication of integrated circuits. In particular the present invention relates to amine-free stripping compositions comprising solvent and surfactant that can effectively remove organic materials without corroding the underlying substrate, and the invention also relates to methods for removing these organic materials with the novel stripping composition.
摘要翻译： 本发明涉及微电子学领域，例如集成电路，更具体地涉及从用于制造集成电路的衬底表面去除光致抗蚀剂或其它有机材料的组合物和方法。 特别地，本发明涉及不含无溶剂和表面活性剂的无胺汽提组合物，其可有效去除有机材料而不腐蚀下面的基底，本发明还涉及用新的汽提组合物除去这些有机材料的方法。
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公开(公告)号：US6106995A
公开(公告)日：2000-08-22
申请号：US373319
申请日：1999-08-12
IPC分类号： G03F7/004 , C09D5/00 , C09D179/00 , G03F7/09 , G03F7/11 , H01L21/027 , G03C1/492
CPC分类号： G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising an admixture of:a) a polymer defined by the following structure: ##STR1## where, R.sub.1 & R.sub.2 are independently hydrogen, or C.sub.1 to C.sub.5 alkylR.sub.3 is a methyl, ethyl, propyl or butyl groupR.sub.4 -R.sub.7 are independently hydrogen, or C.sub.1 to C.sub.5 alkyln=10 to 50,000(b) a fluorine-containing, sparingly water-soluble (0.1%-10% by weight in water) organic C.sub.3 -C.sub.13 aliphatic carboxylic acid;(c) a non-metallic hydroxide; and(d) a solvent.The invention also relates to a method for producing such an antireflective coating composition and to a method for producing a microelectronic device using such an antireflective coating composition in conjunction with a photoresist composition.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含以下混合物的混合物：a）由以下结构定义的聚合物：其中R1和R2独立地为氢，或C1至C5烷基，R3为甲基，乙基，丙基或丁基R4 -R7独立地为氢，或C 1至C 5烷基n = 10至50,000（b）含氟的微水溶性（0.1重量％-10重量％的水）有机C 3 -C 13脂族羧酸; （c）非金属氢氧化物; 和（d）溶剂。 本发明还涉及一种制备这种抗反射涂料组合物的方法和一种使用这种抗反射涂料组合物与光致抗蚀剂组合物一起生产微电子器件的方法。
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