Crosslinkable polyimides from bis (aminophenoxy) benzonitriles
    7.
    发明授权
    Crosslinkable polyimides from bis (aminophenoxy) benzonitriles 失效
    来自BIS(氨基苯氧基)苯并噻唑的交联聚氨酯

    公开(公告)号:US5101005A

    公开(公告)日:1992-03-31

    申请号:US348633

    申请日:1989-05-18

    IPC分类号: C08G73/10

    CPC分类号: C08G73/105

    摘要: The present invention provides cross-linkable polyimide polymers having at least one repeating unit of the sturcture of: ##STR1## wherein n is the number of repeating groups and A is a tetravalent aromatic organic radical wherein each pair of carbonyl groups are attached to adjacent carbons in the ring moiety A.It has been found that polyimides having the structure of formula I may be crosslinked at surprisingly low temperatures when heated from about 75 to about 110.degree. C. to form infusible and solvent resistant shapes, thereby rendering them useful in the preparation of films, laminates and composites where inertness to solvents is a prerequisite.

    Process for insolublizing solvent soluble polyimide compositions
    8.
    发明授权
    Process for insolublizing solvent soluble polyimide compositions 失效
    不溶解溶剂可溶性聚酰亚胺组合物的方法

    公开(公告)号:US4877653A

    公开(公告)日:1989-10-31

    申请号:US217796

    申请日:1988-07-12

    IPC分类号: B05D3/02

    摘要: A method of insolubilizing solvent soluble polyimides comprising the imidized condensation products of an aromatic dianhydride and a primary aromatic diamine wherein at least one of said dianhydride or diamine is selected from the group consisting of 2,2-hexafluoro-bis(3,4-dicarboxyphenyl)propane dianhydride; 2,2-hexafluoro-bis(3-aminophenyl) propane; 2,2-hexafluoro-bis(4-aminophenyl)propane; 2,2-hexafluoro-bis-[4-(3-aminophenoxy)phenyl]propane; 2,2-hexafluoro-bis[4-(4-aminophenoxy)phenyl]propane; 1,1-bis(4-aminophenyl)-1-phenyl-2,2,2-trifluoroethane; 1,1-bis-[4-(1,2-dicarboxyphenyl)]-1-phenyl-2,2,2-trifluoroethane dianhydride and mixtures thereof.The method comprises forming a shaped article or film comprising the polyimides and subjecting same to a heat annealing process at a temperature of at least 325.degree. C. and for a period of time sufficient to insolubilize the polyimide. Preferred temperatures range from 350.degree. C. to 400.degree. C. for a period of time of at least 45 minutes to about 2 hours.

    摘要翻译: 一种不溶解溶剂可溶性聚酰亚胺的方法,其包括芳族二酐和伯芳族二胺的酰亚胺化缩合产物,其中所述二酐或二胺中的至少一种选自2,2-六氟双(3,4-二羧基苯基 )丙烷二酐; 2,2-三氟 - 双(3​​-氨基苯基)丙烷; 2,2-四氟 - 双(4-氨基苯基)丙烷; 2,2-二氟 - 双 - [4-(3-氨基苯氧基)苯基]丙烷; 2,2-六氟双[4-(4-氨基苯氧基)苯基]丙烷; 1,1-双(4-氨基苯基)-1-苯基-2,2,2-三氟乙烷; 1,1-双 - [4-(1,2-二羧基苯基)] -1-苯基-2,2,2-三氟乙烷二酐及其混合物。 该方法包括形成包含聚酰亚胺的成形制品或薄膜,并在至少325℃的温度下进行热退火处理,并使其持续足以使聚酰亚胺不溶化的时间。 优选的温度为350℃至400℃,时间为至少45分钟至约2小时。

    Photoresist compositions containing polyamides polybenzoxa from
bis((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ethers
    9.
    发明授权
    Photoresist compositions containing polyamides polybenzoxa from bis((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ethers 失效
    含有二((氨基羟基苯基)六氟异丙基)二苯基醚的聚酰胺聚苯并恶唑的光致抗蚀剂组合物

    公开(公告)号:US5011753A

    公开(公告)日:1991-04-30

    申请号:US476332

    申请日:1990-02-07

    摘要: Heat resistant, shapable, hydroxy and/or alkoxy-substituted polyamides derived from at least one diamine selected from unsubstituted and substituted 4,4'-bis[2-(4-amino-3-hydroxyphenyl)hexafluoroisopropyl)]diphenyl ether 4,4'-bis-[2-(3-amino-4-hydroxyphenyl)hexafluoroisopropyl]diphenyl ether and a dicarboxylic acid or a derivative thereof e.g. its acid halo or ester. The polyamides of the invention may be thermally cured to form polybenzoxazoles of higher heat resistance which are stable to hydrolytic, chemical and radiation attack.The polyamides of the invention may be formed into shaped articles by molding, extrusion and solvent casting processes preferably in the presence of a solvent or diluent and then optionally converted into heat resistant, insoluble polybenzoxazoles. These shaped articles are useful in aircraft, electronic and other commercial applications where heat, chemical and radiation resistance are desired in conjunction with good mechanical and electrical properties.

    摘要翻译: 衍生自至少一种选自未取代的和取代的4,4'-双[2-(4-氨基-3-羟基苯基)六氟异丙基)]二苯基醚4,4'-二胺的二胺的耐热,可成形的羟基和/或烷氧基取代的聚酰胺 ' - 双 - [2-(3-氨基-4-羟基苯基)六氟异丙基]二苯醚和二羧酸或其衍生物例如 其酸卤素或酯。 本发明的聚酰胺可以被热固化以形成对于水解,化学和辐射攻击是稳定的较高耐热性的聚苯并恶唑。 本发明的聚酰胺可以通过模制,挤出和溶剂浇铸方法形成成型制品,优选在溶剂或稀释剂的存在下,然后任选地转化成耐热不溶性聚苯并恶唑。 这些成型制品在飞机,电子和其他商业应用中是有用的,其中需要耐热,耐化学性和耐辐射性以及良好的机械和电学性能。

    Base developable negative acting photoresists
    10.
    发明授权
    Base developable negative acting photoresists 失效
    基础可显影负性光致抗蚀剂

    公开(公告)号:US5106720A

    公开(公告)日:1992-04-21

    申请号:US405493

    申请日:1989-09-11

    IPC分类号: C08G73/10 G03F7/023 G03F7/038

    摘要: A base developable negative acting photoresist composition which is thermally stable, provides high resolution at short exposure times and is capable of development by means of conventional aqueous alkaline developers. The present compositions comprise an alkali soluble hydroxylated polyamide and/or polyimide binder material, a photopolymerizable compound containing at least two ethylenically-unsaturated double bonds, and a light-sensitive photoinitiator.

    摘要翻译: 具有热稳定性的基底显影负性光致抗蚀剂组合物在短曝光时间下提供高分辨率,并且能够通过常规水性碱性显影剂显影。 本发明的组合物包含碱溶性羟基化聚酰胺和/或聚酰亚胺粘合剂材料,含有至少两个烯键式不饱和双键的光聚合化合物和光敏光引发剂。